JP2022166094A - Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof - Google Patents
Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof Download PDFInfo
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- JP2022166094A JP2022166094A JP2022124794A JP2022124794A JP2022166094A JP 2022166094 A JP2022166094 A JP 2022166094A JP 2022124794 A JP2022124794 A JP 2022124794A JP 2022124794 A JP2022124794 A JP 2022124794A JP 2022166094 A JP2022166094 A JP 2022166094A
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- Prior art keywords
- compound
- resin composition
- active energy
- energy ray
- curable resin
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 86
- 239000002253 acid Substances 0.000 title claims abstract description 62
- 239000011342 resin composition Substances 0.000 title claims abstract description 58
- -1 carboxylate compound Chemical class 0.000 claims abstract description 65
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 31
- 239000004593 Epoxy Substances 0.000 claims abstract description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 23
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 22
- 239000003822 epoxy resin Substances 0.000 claims abstract description 22
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 22
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 21
- 239000003999 initiator Substances 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000002430 hydrocarbons Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 239000012778 molding material Substances 0.000 claims description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical class OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 28
- 239000002904 solvent Substances 0.000 description 23
- 239000000049 pigment Substances 0.000 description 22
- 239000000047 product Substances 0.000 description 21
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000000758 substrate Substances 0.000 description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 238000006473 carboxylation reaction Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 239000007795 chemical reaction product Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 125000003700 epoxy group Chemical group 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 238000004040 coloring Methods 0.000 description 9
- 239000002841 Lewis acid Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000007259 addition reaction Methods 0.000 description 6
- 150000007517 lewis acids Chemical class 0.000 description 6
- 230000009257 reactivity Effects 0.000 description 6
- 229920006395 saturated elastomer Polymers 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 235000011118 potassium hydroxide Nutrition 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 3
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000012663 cationic photopolymerization Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical class C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 3
- TVJREYNJXLOIJW-UHFFFAOYSA-N (2-methylphenyl)-diphenylstibane Chemical compound CC1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 TVJREYNJXLOIJW-UHFFFAOYSA-N 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical class C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
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- 239000011324 bead Substances 0.000 description 2
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- LRRJQNMXIDXNIM-UHFFFAOYSA-M benzyl(trimethyl)azanium;iodide Chemical compound [I-].C[N+](C)(C)CC1=CC=CC=C1 LRRJQNMXIDXNIM-UHFFFAOYSA-M 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
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- 150000001989 diazonium salts Chemical class 0.000 description 2
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- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000007647 flexography Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PQDRJEDWHXYDCQ-UHFFFAOYSA-L fluoro-dioxido-oxo-lambda5-phosphane 4-methoxybenzenediazonium Chemical compound [O-]P([O-])(F)=O.COc1ccc(cc1)[N+]#N.COc1ccc(cc1)[N+]#N PQDRJEDWHXYDCQ-UHFFFAOYSA-L 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N glutaric acid Chemical compound OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- PSGAAPLEWMOORI-PEINSRQWSA-N medroxyprogesterone acetate Chemical compound C([C@@]12C)CC(=O)C=C1[C@@H](C)C[C@@H]1[C@@H]2CC[C@]2(C)[C@@](OC(C)=O)(C(C)=O)CC[C@H]21 PSGAAPLEWMOORI-PEINSRQWSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- FVXBCDWMKCEPCL-UHFFFAOYSA-N nonane-1,1-diol Chemical compound CCCCCCCCC(O)O FVXBCDWMKCEPCL-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical compound O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
- C08G64/30—General preparatory processes using carbonates
- C08G64/302—General preparatory processes using carbonates and cyclic ethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4215—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
- C08G59/1466—Acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
- C09D163/10—Epoxy resins modified by unsaturated compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D169/00—Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
本発明は、新規な反応性ポリカルボン酸化合物(A)、それを含有する活性エネルギー線硬化型樹脂組成物、その硬化物に関する。特に、カラーレジスト、カラーフィルタ用のレジスト材料、ブラックマトリックス材料としても適用可能なレジスト材料として好適な新規な反応性ポリカルボン酸化合物、それを含有する活性エネルギー線硬化型樹脂組成物、その硬化物に関する。 TECHNICAL FIELD The present invention relates to a novel reactive polycarboxylic acid compound (A), an active energy ray-curable resin composition containing it, and a cured product thereof. In particular, a novel reactive polycarboxylic acid compound suitable as a resist material applicable as a color resist, a resist material for color filters, and a black matrix material, an active energy ray-curable resin composition containing the same, and a cured product thereof Regarding.
プリント配線板は携帯機器の小型軽量化や通信速度の向上をめざし、高精度、高密度化が求められており、それに伴いその回路自体を被覆するソルダーレジストへの要求も増々高度となり、従来の要求よりも、さらに耐熱性、熱安定性を保ちながら基板密着性、高絶縁性、無電解金メッキ性に耐えうる性能が要求されており、より強靭な硬化物性を有する皮膜形成用材料が求められている。 Printed wiring boards are required to have high precision and high density in order to reduce the size and weight of mobile devices and improve communication speed. Even more than the requirements, there is a demand for performance that can withstand substrate adhesion, high insulation, and electroless gold plating while maintaining heat resistance and thermal stability. ing.
これら材料として、一般的なエポキシ樹脂に、カルボン酸と水酸基を有する化合物とアクリル酸を併せて反応せしめて得られるカルボキシレート化合物が、低酸価でありながら優れた現像性を有する材料として公知であり、さらにこの化合物がレジストインキ適性を有することは公知である(特許文献1)。 As these materials, carboxylate compounds obtained by reacting a general epoxy resin with a compound having a carboxylic acid and a hydroxyl group and acrylic acid are known as materials having a low acid value and excellent developability. Furthermore, it is known that this compound has suitability for resist ink (Patent Document 1).
一方、フェノールアラルキル型エポキシ樹脂(例えば日本化薬製NC-3000など)を基本骨格とした酸変性エポキシアクリレートは、硬化後に高い強靭性を示す材料として一般に公知であり、またこれを用いたソルダーレジストとしての用途についても検討が行われている(特許文献2)。 On the other hand, acid-modified epoxy acrylate having a phenol aralkyl type epoxy resin (for example, Nippon Kayaku NC-3000) as a basic skeleton is generally known as a material that exhibits high toughness after curing, and a solder resist using this The use as is also being studied (Patent Document 2).
この他、フェノールアラルキル型エポキシ樹脂を基本骨格とした酸変性エポキシアクリレートにカーボンブラック等を分散させ液晶表示パネル等に用いられるブラックマトリクスレジストに応用する試みも知られている(特許文献3)。さらに、その他フェノール-ジシクロペンタジエン骨格においてもブラックレジストに適用出来るように取り組みはなされており、良好な着色顔料との親和性を有していることを見出し、得られる組成物は高い顔料濃度でも良好な現像性を持つレジスト材料等となり得ることを見出している(特許文献4)。 In addition, an attempt to disperse carbon black or the like in an acid-modified epoxy acrylate having a phenol aralkyl epoxy resin as a basic skeleton and apply it to a black matrix resist used in liquid crystal display panels and the like is also known (Patent Document 3). Furthermore, efforts have been made to apply other phenol-dicyclopentadiene skeletons to black resists, and it was found that they have good affinity with color pigments, and the resulting composition can be used even at high pigment concentrations. It has been found that it can be a resist material or the like having good developability (Patent Document 4).
しかしながら、フェノール-ジシクロペンタジエン骨格を有するエポキシ樹脂を基本骨格とした酸変性エポキシアクリレートはカーボンブラック等の着色顔料が良好に樹脂と親和し顔料が分散するものの、現像性が悪いため、より高顔料濃度での現像性を有する必要である。
そこで、本発明は、上記の従来技術の問題点を改善し、着色顔料等の分散性に優れ、かつ高い顔料濃度でも良好な現像特性を有する酸変性エポキシアクリレート化合物及び、それを含有する活性エネルギー線硬化型樹脂組成物を提供することを目的とする。
However, acid-modified epoxy acrylate having an epoxy resin having a phenol-dicyclopentadiene skeleton as a basic skeleton has good affinity with a coloring pigment such as carbon black and disperses the pigment, but the developability is poor. It is necessary to have developability in density.
Therefore, the present invention solves the above-mentioned problems of the prior art, and provides an acid-modified epoxy acrylate compound that is excellent in dispersibility of color pigments and the like and has good development characteristics even at high pigment concentrations, and an active energy containing the same. An object of the present invention is to provide a radiation-curable resin composition.
本発明者らは前記課題を解決するため、鋭意検討を行った結果、フェノール-ジシクロペンタジエン構造を有するエポキシ樹脂と不飽和基含有カルボン酸、必要に応じて一分子中に水酸基とカルボキシ基を併せ持つ化合物との反応物を、特定の多塩基酸無水物との反応物を用いた樹脂組成物が前記課題を解決することを見いだし、本発明に到達した。 In order to solve the above problems, the present inventors have made intensive studies and found that an epoxy resin having a phenol-dicyclopentadiene structure, an unsaturated group-containing carboxylic acid, and, if necessary, a hydroxyl group and a carboxyl group in one molecule. The inventors have found that a resin composition using a reaction product with a specific polybasic acid anhydride as a reaction product with a compound having both of them solves the above-mentioned problems, and have arrived at the present invention.
即ち、本発明は、
[1]下記式(1)で表されるエポキシ樹脂(a)に、一分子中に重合可能なエチレン性不飽和基とカルボキシ基を併せ持つカルボン酸化合物(b)、必要に応じて一分子中に水酸基とカルボキシ基を併せ持つ化合物(c)を反応させて得られる反応性エポキシカルボキシレート化合物(d)を、下記式(2)又は式(3)で表される多塩基酸無水物(e)と反応させた反応性ポリカルボン酸化合物(A)、
That is, the present invention
[1] An epoxy resin (a) represented by the following formula (1), a carboxylic acid compound (b) having both a polymerizable ethylenically unsaturated group and a carboxy group in one molecule, and, if necessary, in one molecule A reactive epoxy carboxylate compound (d) obtained by reacting a compound (c) having both a hydroxyl group and a carboxy group with a polybasic acid anhydride (e) represented by the following formula (2) or formula (3) a reactive polycarboxylic acid compound (A) reacted with
(式中、Rは同一でも異なっていてもよく、水素原子、ハロゲン原子又は炭素数1~4の炭化水素基を示し、aはそれぞれ1~3を表す。nは平均値で1~20の整数を示す。) (In the formula, R may be the same or different and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, each a represents 1 to 3. n is an average value of 1 to 20 indicates an integer.)
(式(2)中R1は、各々独立して水素原子、炭素数1~10のアルキル基を表わす。mは1~3の整数を表わす。) (In formula (2), each R 1 independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. m represents an integer of 1 to 3.)
[2]前項[1]に記載の反応性ポリカルボン酸化合物(A)を含む活性エネルギー線硬化型樹脂組成物、
[3]前記反応性ポリカルボン酸化合物(A)以外の反応性化合物(B)を含む前項[2]に記載の活性エネルギー線硬化型樹脂組成物、
[4]光重合開始剤を含む前項[2]又は[3]に記載の活性エネルギー線硬化型樹脂組成物、
[5]成形用材料である前項[2]~[4]のいずれか一項に記載の活性エネルギー線硬化型樹脂組成物、
[6]皮膜形成用材料である前項[2]~[4]のいずれか一項に記載の活性エネルギー線硬化型樹脂組成物、
[7]レジスト材料組成物である前項[2]~[4]のいずれか一項に記載の活性エネルギー線硬化型樹脂組成物、
[8]前項[2]~[7]のいずれか一項に記載の活性エネルギー線硬化型樹脂組成物の硬化物、
[9]前項[8]に記載の硬化物でオーバーコートされた物品、
に関する。
[2] An active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) according to [1] above,
[3] The active energy ray-curable resin composition according to [2] above, which contains a reactive compound (B) other than the reactive polycarboxylic acid compound (A),
[4] The active energy ray-curable resin composition according to [2] or [3] above, which contains a photopolymerization initiator,
[5] The active energy ray-curable resin composition according to any one of [2] to [4] above, which is a molding material;
[6] The active energy ray-curable resin composition according to any one of [2] to [4] above, which is a film-forming material;
[7] The active energy ray-curable resin composition according to any one of [2] to [4] above, which is a resist material composition;
[8] A cured product of the active energy ray-curable resin composition according to any one of [2] to [7] above,
[9] An article overcoated with the cured product according to [8] above,
Regarding.
本発明の反応性ポリカルボン酸化合物(A)を含む活性エネルギー線硬化型樹脂組成物は強靭な硬化物を得るだけではなく、溶剤を乾燥させただけの状態においても優れた樹脂物性を有している。又、本発明の活性エネルギー線硬化型樹脂組成物を紫外線等の活性エネルギー線等により硬化して得られる硬化物は、耐熱性に優れ、微細にアルカリ現像可能であることから成形用材料、皮膜形成用材料、レジスト材料に好適である。
また、着色顔料との高い親和性から、本発明の反応性ポリカルボン酸変性化合物及びそれを含む活性エネルギー線硬化型樹脂組成物は高い顔料濃度においても良好な現像性を発揮することから、カラーレジスト、カラーフィルタ用のレジスト材料、特にブラックマトリックス材料等に適している。
The active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) of the present invention not only yields a tough cured product, but also has excellent resin physical properties even after the solvent has been dried. ing. In addition, the cured product obtained by curing the active energy ray-curable resin composition of the present invention with an active energy ray such as ultraviolet rays has excellent heat resistance and can be finely developed with an alkali. Suitable for forming materials and resist materials.
In addition, due to its high affinity with color pigments, the reactive polycarboxylic acid-modified compound of the present invention and the active energy ray-curable resin composition containing it exhibit good developability even at high pigment concentrations. Suitable for resists, resist materials for color filters, especially black matrix materials.
さらに、本発明の反応性ポリカルボン酸化合物(A)を含む活性エネルギー線硬化型樹脂組成物は熱的及び機械的な強靭性、良好な保存安定性、更には高温高湿や冷熱衝撃に耐える高い信頼性を有することから、特に高い信頼性を求められるプリント配線板用ソルダーレジスト、多層プリント配線板用層間絶縁材料、フレキシブルプリント配線板用ソルダーレジスト、メッキレジスト、感光性光導波路等の用途にも用いられる。 Furthermore, the active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) of the present invention has thermal and mechanical toughness, good storage stability, and further withstands high temperature and high humidity and thermal shock. Due to its high reliability, it is suitable for applications such as solder resists for printed wiring boards, interlayer insulating materials for multilayer printed wiring boards, solder resists for flexible printed wiring boards, plating resists, and photosensitive optical waveguides that require particularly high reliability. is also used.
以下、本発明について詳細に説明する。
本発明の反応性ポリカルボン酸化合物(A)は、下記式(1)で表される構造を有するエポキシ樹脂(a)と、一分子中に重合可能なエチレン性不飽和基とカルボキシ基を併せ持つカルボン酸化合物(b)、必要に応じて一分子中に水酸基とカルボキシ基を併せ持つ化合物(c)とを反応させ、反応性エポキシカルボキシレート化合物(d)を得る。次いで、下記式(2)又は式(3)で表される多塩基酸無水物(e)を反応させることによって得ることができる。
The present invention will be described in detail below.
The reactive polycarboxylic acid compound (A) of the present invention has both an epoxy resin (a) having a structure represented by the following formula (1) and a polymerizable ethylenically unsaturated group and a carboxy group in one molecule. A carboxylic acid compound (b) and, if necessary, a compound (c) having both a hydroxyl group and a carboxy group in one molecule are reacted to obtain a reactive epoxy carboxylate compound (d). Then, it can be obtained by reacting a polybasic acid anhydride (e) represented by the following formula (2) or formula (3).
(式中、Rは同一でも異なっていてもよく、水素原子、ハロゲン原子又は炭素数1~4の炭化水素基を示し、aはそれぞれ1~3を表す。nは平均値で1~20の整数を示す。) (In the formula, R may be the same or different and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, each a represents 1 to 3. n is an average value of 1 to 20 indicates an integer.)
(式(2)中R1は、各々独立して水素原子、炭素数1~10のアルキル基を表わす。mは1~3の整数を表わす。)
前記式(1)中の炭素数1~4の炭化水素基とは、メチル基、エチル基、エチレン基、プロピル基、プロピレン基、ブチル基、ブチレン基等の飽和及び不飽和炭化水素基を示す。
(In formula (2), each R 1 independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. m represents an integer of 1 to 3.)
The hydrocarbon group having 1 to 4 carbon atoms in the formula (1) means saturated and unsaturated hydrocarbon groups such as methyl group, ethyl group, ethylene group, propyl group, propylene group, butyl group and butylene group. .
まず、カルボキシレート化合物に反応性を付与させ、反応性エポキシカルボキシレート化合物(d)を得るための、カルボキシレート化工程について説明する。 First, the carboxylation step for imparting reactivity to the carboxylate compound and obtaining the reactive epoxy carboxylate compound (d) will be described.
本発明において用いる前記式(1)で表されるエポキシ樹脂(a)(以下、単に「エポキシ樹脂(a)」とも表す。)は、種々の商品名で、たとえば、XD-1000(日本化薬(株)製)等として、一般に入手可能である。 The epoxy resin (a) represented by the formula (1) (hereinafter also simply referred to as "epoxy resin (a)") used in the present invention has various trade names such as XD-1000 (Nippon Kayaku (manufactured by Co., Ltd.), etc., and is generally available.
本発明において、一分子中に重合可能なエチレン性不飽和基とカルボキシ基を併せ持つカルボン酸化合物(b)(以下、単に「カルボン酸化合物(b)」とも表す。)は、活性エネルギー線への反応性を付与させるために反応せしめるものである。エチレン性不飽和基とカルボキシ基はそれぞれ分子内に一個以上あるものであれば制限はない。 In the present invention, the carboxylic acid compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule (hereinafter also simply referred to as "carboxylic acid compound (b)") is a compound that is exposed to active energy rays. It is made to react in order to impart reactivity. There are no restrictions as long as there are one or more ethylenically unsaturated groups and one or more carboxyl groups in the molecule.
一分子中に重合可能なエチレン性不飽和基とカルボキシ基を併せ持つカルボン酸化合物(b)としては、例えば、(メタ)アクリル酸類やクロトン酸、α-シアノ桂皮酸、桂皮酸、或いは飽和または不飽和二塩基酸と不飽和基含有モノグリシジル化合物との反応物等が挙げられる。上記において(メタ)アクリル酸類としては、例えば(メタ)アクリル酸、β-スチリルアクリル酸、β-フルフリルアクリル酸、(メタ)アクリル酸二量体、飽和または不飽和二塩基酸無水物と1分子中に1個の水酸基を有する(メタ)アクリレート誘導体との等モル反応物である半エステル類、飽和または不飽和二塩基酸とモノグリシジル(メタ)アクリレート誘導体類との等モル反応物である半エステル類等の一分子中にカルボキシ基を一個含むモノカルボン酸化合物、さらに一分子中に複数の水酸基を有する(メタ)アクリレート誘導体との等モル反応物である半エステル類、飽和または不飽和二塩基酸と複数のエポキシ基を有するグリシジル(メタ)アクリレート誘導体類との等モル反応物である半エステル類等の一分子中にカルボキシ基を複数有するポリカルボン酸化合物等が挙げられる。 Examples of the carboxylic acid compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule include (meth)acrylic acids, crotonic acid, α-cyanocinnamic acid, cinnamic acid, saturated or unsaturated Examples thereof include reaction products of saturated dibasic acids and monoglycidyl compounds containing unsaturated groups. In the above, the (meth)acrylic acids include, for example, (meth)acrylic acid, β-styrylacrylic acid, β-furfurylacrylic acid, (meth)acrylic acid dimer, saturated or unsaturated dibasic acid anhydride and 1 Semi-esters that are equimolar reaction products with (meth)acrylate derivatives having one hydroxyl group in the molecule, and equimolar reaction products between saturated or unsaturated dibasic acids and monoglycidyl (meth)acrylate derivatives Monocarboxylic acid compounds containing one carboxy group in one molecule such as half esters, and half esters which are equimolar reaction products with (meth)acrylate derivatives having multiple hydroxyl groups in one molecule, saturated or unsaturated Examples include polycarboxylic acid compounds having multiple carboxy groups in one molecule, such as half esters, which are equimolar reaction products of dibasic acids and glycidyl (meth)acrylate derivatives having multiple epoxy groups.
これらのうち、エポキシ樹脂(a)とカルボン酸化合物(b)、の反応の安定性を考慮すると、カルボン酸化合物(b)としてはモノカルボン酸であることが好ましく、モノカルボン酸とポリカルボン酸を併用する場合でも、モノカルボン酸のモル量/ポリカルボン酸のモル量で表される値が15以上であることが好ましい。
最も好ましくは、活性エネルギー線硬化型樹脂組成物としたときの感度の点で(メタ)アクリル酸、(メタ)アクリル酸とε-カプロラクトンとの反応生成物または桂皮酸が挙げられる。
一分子中に一個以上の重合可能なエチレン性不飽和基と一個以上のカルボキシ基を併せ持つ化合物としては、化合物中に水酸基を有さないものが好ましい。
Among these, considering the stability of the reaction between the epoxy resin (a) and the carboxylic acid compound (b), the carboxylic acid compound (b) is preferably a monocarboxylic acid. is used in combination, the value represented by the molar amount of monocarboxylic acid/molar amount of polycarboxylic acid is preferably 15 or more.
Most preferred are (meth)acrylic acid, a reaction product of (meth)acrylic acid and ε-caprolactone, and cinnamic acid in terms of sensitivity when used as an active energy ray-curable resin composition.
As the compound having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule, a compound having no hydroxyl group is preferable.
本発明において用いられる一分子中に水酸基とカルボキシ基を併せ持つ化合物(c)(以下、単に「化合物(c)」とも表す。)は、カルボキシレート化合物中に水酸基を導入することを目的として反応せしめるものである。これらには、一分子中に一個の水酸基と一個のカルボキシ基を併せ持つ化合物、一分子中に二個以上の水酸基と一個のカルボキシ基を合わせもつ化合物、一分子中に一個以上の水酸基と二個以上のカルボキシ基を併せ持つ化合物がある。 The compound (c) having both a hydroxyl group and a carboxy group in one molecule (hereinafter also simply referred to as "compound (c)") used in the present invention is reacted for the purpose of introducing a hydroxyl group into the carboxylate compound. It is. These include compounds with one hydroxyl group and one carboxy group in one molecule, compounds with two or more hydroxyl groups and one carboxy group in one molecule, one or more hydroxyl groups and two hydroxyl groups in one molecule. There are compounds having the above carboxy groups.
一分子中に一個の水酸基と一個のカルボキシ基を併せ持つ化合物としては、例えばヒドロキシプロピオン酸、ヒドロキシブタン酸、ヒドロキシステアリン酸等が挙げられる。また一分子中に二個以上の水酸基と一個のカルボキシ基を合わせもつ化合物としては、ジメチロール酢酸、ジメチロールプロピオン酸、ジメチロールブタン酸等が挙げられる。一分子中に一個以上の水酸基と二個以上のカルボキシ基を併せ持つ化合物としてはヒドロキシフタル酸等が挙げられる。
これらのうち、水酸基は一分子中に二個以上含まれるものが、本発明の効果を考慮すると好ましい。さらに、カルボキシ基は一分子中一個であるものがカルボキシレート化反応の安定性を考慮すると好ましい。最も好ましくは、一分子中に二個の水酸基と一個のカルボキシル基を有するものが好ましい。原材料の入手を考慮すれば、ジメチロールプロピオン酸とジメチロールブタン酸が特に好適である。
一分子中に一個以上の水酸基と一個以上のカルボキシ基を併せ持つ化合物としては、化合物中に重合可能なエチレン性不飽和基を有さないものが好ましい。
Examples of compounds having both one hydroxyl group and one carboxyl group in one molecule include hydroxypropionic acid, hydroxybutanoic acid and hydroxystearic acid. Compounds having two or more hydroxyl groups and one carboxyl group in one molecule include dimethylolacetic acid, dimethylolpropionic acid, dimethylolbutanoic acid and the like. Examples of compounds having one or more hydroxyl groups and two or more carboxyl groups in one molecule include hydroxyphthalic acid and the like.
Among these, those containing two or more hydroxyl groups in one molecule are preferable in view of the effects of the present invention. Furthermore, it is preferable that one molecule has one carboxy group, considering the stability of the carboxylation reaction. Most preferably, one molecule has two hydroxyl groups and one carboxyl group. Considering availability of raw materials, dimethylolpropionic acid and dimethylolbutanoic acid are particularly preferred.
As the compound having both one or more hydroxyl groups and one or more carboxyl groups in one molecule, a compound having no polymerizable ethylenically unsaturated group is preferable.
このカルボキシレート化反応におけるエポキシ樹脂(a)とカルボン酸化合物(b)および化合物(c)の仕込み割合としては、用途に応じて適宜変更されるべきものである。即ち、全てのエポキシ基をカルボキシレート化した場合は、未反応のエポキシ基が残存しないために、反応性エポキシカルボキシレート化合物(d)としての保存安定性は高い。この場合は、導入した二重結合による反応性のみを利用することになる。 The ratio of the epoxy resin (a), the carboxylic acid compound (b) and the compound (c) to be charged in this carboxylation reaction should be appropriately changed according to the application. That is, when all the epoxy groups are carboxylated, no unreacted epoxy groups remain, so that the reactive epoxy carboxylate compound (d) has high storage stability. In this case, only the reactivity due to the introduced double bond is utilized.
一方、カルボン酸化合物(b)および化合物(c)の仕込み量を減量し未反応の残存エポキシ基を残すことで、導入した不飽和結合による反応性と、残存するエポキシ基による反応、例えば光カチオン触媒による重合反応や熱重合反応を複合的に利用することも可能である。しかし、この場合は反応性エポキシカルボキシレート化合物(d)の保存、及び製造条件の検討には注意を払うべきである。 On the other hand, by reducing the amounts of the carboxylic acid compound (b) and the compound (c) charged and leaving unreacted residual epoxy groups, the reactivity due to the introduced unsaturated bonds and the reaction due to the residual epoxy groups, such as photocation It is also possible to use a combination of catalytic polymerization reaction and thermal polymerization reaction. However, in this case, attention should be paid to storage of the reactive epoxy carboxylate compound (d) and examination of manufacturing conditions.
エポキシ基を残存させない反応性エポキシカルボキシレート化合物(d)を製造する場合、カルボン酸化合物(b)および化合物(c)の総計が、エポキシ樹脂(a)1当量に対し90~120当量%であることが好ましい。この範囲であれば比較的安定な条件での製造が可能である。これよりもカルボン酸化合物の仕込み量が多い場合には、過剰のカルボン酸化合物(b)および化合物(c)が残存してしまうために好ましくない。 When producing a reactive epoxy carboxylate compound (d) that does not leave epoxy groups, the total amount of the carboxylic acid compound (b) and the compound (c) is 90 to 120% by equivalent with respect to 1 equivalent of the epoxy resin (a). is preferred. Within this range, production under relatively stable conditions is possible. If the amount of the carboxylic acid compound charged is larger than this, excess carboxylic acid compound (b) and compound (c) remain, which is not preferable.
また、エポキシ基を残留させる場合には、カルボン酸化合物(b)および化合物(c)の総計が、エポキシ樹脂(a)1当量に対し20~90当量%であることが好ましい。これの範囲を逸脱する場合には、複合硬化の効果が薄くなる。もちろんこの場合は、反応中のゲル化や、反応性エポキシカルボキシレート化合物(d)の経時安定性に対して十分な注意が必要である。 Further, when the epoxy group is to remain, the total amount of the carboxylic acid compound (b) and the compound (c) is preferably 20 to 90% by equivalent with respect to 1 equivalent of the epoxy resin (a). If it deviates from this range, the effect of composite hardening is reduced. Of course, in this case, sufficient attention must be paid to gelling during the reaction and to the stability of the reactive epoxy carboxylate compound (d) over time.
カルボキシレート化反応は、無溶剤で反応させる、若しくは溶剤で希釈して反応させることも出来る。ここで用いることが出来る溶剤としては、カルボキシレート化反応に対してイナート溶剤であれば特に限定はない。 The carboxylation reaction can be carried out without a solvent or after dilution with a solvent. The solvent that can be used here is not particularly limited as long as it is an inert solvent for the carboxylation reaction.
好ましい溶剤の使用量は、得られる樹脂の粘度や使途により適宜調整されるべきものであるが、好ましくは固形分含有率90~30質量%、より好ましくは80~50質量%になるように使用される。 The preferred amount of the solvent to be used should be appropriately adjusted depending on the viscosity of the resin to be obtained and the intended use. be done.
具体的に例示すれば、例えばトルエン、キシレン、エチルベンゼン、テトラメチルベンゼン等の芳香族系炭化水素溶剤、ヘキサン、オクタン、デカン等の脂肪族系炭化水素溶剤、及びそれらの混合物である石油エーテル、ホワイトガソリン、ソルベントナフサ等、エステル系溶剤、エーテル系溶剤、ケトン系溶剤等が挙げられる。 Specific examples include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, and mixtures thereof such as petroleum ether and white. Examples include gasoline, solvent naphtha, ester solvents, ether solvents, ketone solvents, and the like.
エステル系溶剤としては、酢酸エチル、酢酸プロピル、酢酸ブチル等のアルキルアセテート類、γ-ブチロラクトン等の環状エステル類、エチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノメチルエーテルモノアセテート、ジエチレングリコールモノエチルエーテルモノアセテート、トリエチレングリコールモノエチルエーテルモノアセテート、ジエチレングリコールモノブチルエーテルモノアセテート、プロピレングリコールモノメチルエーテルモノアセテート、ブチレングリコールモノメチルエーテルアセテート等のモノ、若しくはポリアルキレングリコールモノアルキルエーテルモノアセテート類、グルタル酸ジアルキル、コハク酸ジアルキル、アジピン酸ジアルキル等のポリカルボン酸アルキルエステル類等が挙げられる。 Ester-based solvents include alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, cyclic esters such as γ-butyrolactone, ethylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether monoacetate, diethylene glycol monoethyl ether monoacetate, and triethylene. Mono or polyalkylene glycol monoalkyl ether monoacetates such as glycol monoethyl ether monoacetate, diethylene glycol monobutyl ether monoacetate, propylene glycol monomethyl ether monoacetate, butylene glycol monomethyl ether acetate, dialkyl glutarate, dialkyl succinate, adipic acid Examples thereof include polycarboxylic acid alkyl esters such as dialkyl.
エーテル系溶剤としては、ジエチルエーテル、エチルブチルエーテル等のアルキルエーテル類、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジエチルエーテル、トリエチレングリコールジメチルエーテル、トリエチレングリコールジエチルエーテル等のグリコールエーテル類、テトラヒドロフラン等の環状エーテル類等が挙げられる。 Ether solvents include alkyl ethers such as diethyl ether and ethyl butyl ether, glycols such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, triethylene glycol dimethyl ether and triethylene glycol diethyl ether. Ethers, cyclic ethers such as tetrahydrofuran, and the like are included.
ケトン系溶剤としては、アセトン、メチルエチルケトン、シクロヘキサノン、イソホロン等が挙げられる。 Ketone solvents include acetone, methyl ethyl ketone, cyclohexanone, isophorone, and the like.
このほかにも、後述する反応性ポリカルボン酸化合物(A)以外の反応性化合物(B)(以下、単に「反応性化合物(B)」とも表す。)等の単独または混合有機溶剤中で行うことができる。この場合、硬化型樹脂組成物として使用した場合には、直接に組成物として利用することが出来るので好ましい。 In addition, a reactive compound (B) other than the reactive polycarboxylic acid compound (A) described later (hereinafter also simply referred to as "reactive compound (B)") is used alone or in a mixed organic solvent. be able to. In this case, when used as a curable resin composition, it can be used directly as a composition, which is preferable.
反応時には、反応を促進させるために触媒を使用することが好ましく、該触媒の使用量は、反応物、即ちエポキシ樹脂(a)、カルボン酸化合物(b)および化合物(c)、及び場合により溶剤その他を加えた反応物の総量100質量部に対して0.1~10質量部である。その際の反応温度は60~150℃であり、また反応時間は、好ましくは5~60時間である。使用しうる触媒の具体例としては、例えばトリエチルアミン、ベンジルジメチルアミン、トリエチルアンモニウムクロライド、ベンジルトリメチルアンモニウムブロマイド、ベンジルトリメチルアンモニウムアイオダイド、トリフェニルホスフィン、トリフェニルスチビン、メチルトリフェニルスチビン、オクタン酸クロム、オクタン酸ジルコニウム等既知一般の塩基性触媒等が挙げられる。 During the reaction, it is preferable to use a catalyst to promote the reaction, and the amount of the catalyst used is determined by the amount of the reactants, that is, the epoxy resin (a), the carboxylic acid compound (b) and the compound (c), and optionally the solvent. It is 0.1 to 10 parts by mass per 100 parts by mass of the total amount of reactants including other ingredients. The reaction temperature at that time is 60 to 150° C., and the reaction time is preferably 5 to 60 hours. Specific examples of usable catalysts include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, triphenylstibine, methyltriphenylstibine, chromium octanoate, and octane. Known general basic catalysts such as zirconium oxide and the like can be mentioned.
また、熱重合禁止剤を用いることもできる。熱重合禁止剤として、ハイドロキノンモノメチルエーテル、2-メチルハイドロキノン、ハイドロキノン、ジフェニルピクリルヒドラジン、ジフェニルアミン、3,5-ジ-tert-ブチル-4ヒドロキシトルエン等を使用するのが好ましい。 A thermal polymerization inhibitor can also be used. Hydroquinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-di-tert-butyl-4hydroxytoluene and the like are preferably used as thermal polymerization inhibitors.
カルボキシレート化反応は、適宜サンプリングしながら、サンプルの酸価が5mgKOH/g以下、好ましくは3mgKOH/g以下となった時点を終点とする。 The carboxylation reaction is appropriately sampled, and the end point is when the acid value of the sample becomes 5 mgKOH/g or less, preferably 3 mgKOH/g or less.
こうして得られた反応性エポキシカルボキシレート化合物(d)の好ましい分子量範囲としては、GPCにおけるポリスチレン換算重量平均分子量が1,000から50,000の範囲であり、より好ましくは2,000から30,000である。 As a preferred molecular weight range of the reactive epoxy carboxylate compound (d) thus obtained, the polystyrene equivalent weight average molecular weight in GPC is in the range of 1,000 to 50,000, more preferably 2,000 to 30,000. is.
上記分子量よりも小さい場合には硬化物の強靭性が充分に発揮されず、また上記分子量よりも大きすぎる場合には、粘度が高くなり塗工等が困難となる。 If the molecular weight is less than the above molecular weight, the toughness of the cured product is not sufficiently exhibited, and if the molecular weight is greater than the above molecular weight, the viscosity increases and coating becomes difficult.
次に、酸付加工程(以下、単に「本酸付加反応」ともいう)について詳述する。酸付加工程は、前工程において得られた反応性エポキシカルボキシレート化合物(d)に必要に応じてカルボキシ基を導入し、反応性ポリカルボン酸化合物(A)を得ることを目的として行われる。即ち、カルボキシレート化反応により生じた水酸基に、前記式(2)又は式(3)で表される多塩基酸無水物(e)(以下、単に「多塩基酸無水物(e)」とも表す。)を付加反応させることで、エステル結合を介してカルボキシ基を導入する。 Next, the acid addition step (hereinafter also simply referred to as "acid addition reaction") will be described in detail. The acid addition step is performed for the purpose of obtaining a reactive polycarboxylic acid compound (A) by introducing a carboxy group into the reactive epoxy carboxylate compound (d) obtained in the preceding step, if necessary. That is, a polybasic acid anhydride (e) represented by the above formula (2) or formula (3) (hereinafter also simply referred to as "polybasic acid anhydride (e)") is added to the hydroxyl group generated by the carboxylation reaction. ) introduces a carboxy group via an ester bond.
前記式(2)中の炭素数1~10のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル、デシル基が挙げられる。前記式(2)中R1は水素原子、メチル基が好ましい。 Examples of alkyl groups having 1 to 10 carbon atoms in formula (2) include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl and decyl groups. R 1 in the formula (2) is preferably a hydrogen atom or a methyl group.
前記多塩基酸無水物(e)として、下記式(4)で表される化合物が好ましい。
前記多塩基酸無水物(e)を付加させる反応は、前記カルボキシレート化反応液に多塩基酸無水物(e)を加えることにより行うことができる。添加量は用途に応じて適宜変更されるべきものである。 The reaction for adding the polybasic acid anhydride (e) can be performed by adding the polybasic acid anhydride (e) to the carboxylation reaction solution. The amount to be added should be appropriately changed depending on the application.
前記多塩基酸無水物(e)の添加量は例えば、本発明の反応性ポリカルボン酸化合物(A)をアルカリ水溶液現像型のレジスト材料として用いようとする場合は、多塩基酸無水物(e)を最終的に得られる反応性ポリカルボン酸化合物(A)の固形分酸価(JISK5601-2-1:1999に準拠)が好ましくは20~120mg・KOH/gであり、より好ましくは30~110mg・KOH/g、となる計算値を仕込むことが好ましい。このときの固形分酸価がこの範囲である場合、本発明の活性エネルギー線硬化型樹脂組成物のアルカリ水溶液現像性が良好な現像性を示す。即ち、良好なパターニング性と過現像に対する管理幅も広く、また過剰の酸無水物が残留することもない。 For example, when the reactive polycarboxylic acid compound (A) of the present invention is used as an alkali aqueous solution developable resist material, the amount of the polybasic acid anhydride (e) to be added is the polybasic acid anhydride (e ) The solid content acid value of the finally obtained reactive polycarboxylic acid compound (A) (according to JISK5601-2-1: 1999) is preferably 20 to 120 mg KOH / g, more preferably 30 to It is preferable to charge a calculated value of 110 mg·KOH/g. When the solid content acid value at this time is within this range, the active energy ray-curable resin composition of the present invention exhibits good alkaline aqueous solution developability. In other words, it has good patterning properties and a wide range of control over overdevelopment, and no excess acid anhydride remains.
反応時には、反応を促進させるために触媒を使用することが好ましく、該触媒の使用量は、反応物、即ちエポキシ化合物(a)、カルボン酸化合物(b)および化合物(c)から得られた反応性エポキシカルボキシレート化合物(d)、及び多塩基酸無水物(e)、場合により溶剤その他を加えた反応物の総量に対して0.1~10質量部である。その際の反応温度は60~150℃であり、また反応時間は、好ましくは5~60時間である。使用しうる触媒の具体例としては、例えばトリエチルアミン、ベンジルジメチルアミン、トリエチルアンモニウムクロライド、ベンジルトリメチルアンモニウムブロマイド、ベンジルトリメチルアンモニウムアイオダイド、トリフェニルホスフィン、トリフェニルスチビン、メチルトリフェニルスチビン、オクタン酸クロム、オクタン酸ジルコニウム等が挙げられる。 During the reaction, it is preferable to use a catalyst to promote the reaction, and the amount of the catalyst used is the reaction obtained from the reactants, that is, the epoxy compound (a), the carboxylic acid compound (b) and the compound (c) epoxy carboxylate compound (d), polybasic acid anhydride (e), and if necessary, 0.1 to 10 parts by mass based on the total amount of reactants including a solvent and the like. The reaction temperature at that time is 60 to 150° C., and the reaction time is preferably 5 to 60 hours. Specific examples of usable catalysts include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, triphenylstibine, methyltriphenylstibine, chromium octanoate, and octane. and zirconium oxide.
本酸付加反応は、無溶剤で反応するか、若しくは溶剤で希釈して反応させることも出来る。ここで用いることが出来る溶剤としては、酸付加反応に対してイナート溶剤であれば特に限定はない。また、前工程であるカルボキシレート化反応で溶剤を用いて製造した場合には、その両反応にイナートであることを条件に、溶剤を除くことなく直接次工程である酸付加反応に供することもできる。用い得る溶剤はカルボキシレート化反応で用い得るものと同一のものでよい。 This acid addition reaction can be carried out without a solvent, or diluted with a solvent. The solvent that can be used here is not particularly limited as long as it is an inert solvent for the acid addition reaction. In addition, when a solvent is used in the carboxylation reaction, which is the preceding step, it may be subjected directly to the acid addition reaction, which is the next step, without removing the solvent, provided that it is inert in both reactions. can. Solvents that can be used can be the same as those that can be used in the carboxylation reaction.
好ましい溶剤の使用量は、得られる樹脂の粘度や使途により適宜調整されるべきものであるが、好ましくは固形分含有率90~30質量%、より好ましくは80~50質量%になるように用いられる。 The preferred amount of the solvent to be used should be appropriately adjusted depending on the viscosity of the resin to be obtained and the intended use. be done.
このほかにも、前記反応性化合物(B)等の単独または混合有機溶剤中で行うことができる。この場合、硬化型樹脂組成物として使用した場合には、直接に組成物として利用することが出来るので好ましい。 In addition, the reactive compound (B) can be used alone or in a mixed organic solvent. In this case, when used as a curable resin composition, it can be used directly as a composition, which is preferable.
また、熱重合禁止剤等は、前記カルボキシレート化反応における例示と同様のものを使用することが好ましい。 Moreover, it is preferable to use the same thermal polymerization inhibitor and the like as those exemplified in the carboxylation reaction.
本酸付加反応は、適宜サンプリングしながら、反応物の酸価が、設定した酸価のプラスマイナス10%の範囲になった点をもって終点とする。 The acid addition reaction is appropriately sampled, and the end point is reached when the acid value of the reaction product falls within the range of plus or minus 10% of the set acid value.
こうして得られた反応性ポリカルボン酸化合物(A)の好ましい分子量範囲としては、GPCにおけるポリスチレン換算重量平均分子量が500から50,000の範囲であり、より好ましくは1,000から30,000であり、特に好ましくは1000~10000である。 As a preferred molecular weight range of the reactive polycarboxylic acid compound (A) thus obtained, the weight average molecular weight in terms of polystyrene in GPC is in the range of 500 to 50,000, more preferably 1,000 to 30,000. , particularly preferably 1,000 to 10,000.
上記分子量よりも小さい場合には硬化物の強靭性が充分に発揮されず、また上記分子量よりも大きすぎる場合には、粘度が高くなり塗工等が困難となる。 If the molecular weight is less than the above molecular weight, the toughness of the cured product is not sufficiently exhibited, and if the molecular weight is greater than the above molecular weight, the viscosity increases and coating becomes difficult.
本発明において使用しうる反応性化合物(B)の具体例としては、ラジカル反応型のアクリレート類、カチオン反応型のその他エポキシ化合物類、その双方に感応するビニル化合物類等のいわゆる反応性オリゴマー類が挙げられる。 Specific examples of the reactive compound (B) that can be used in the present invention include radical reactive acrylates, cationic reactive epoxy compounds, and so-called reactive oligomers such as vinyl compounds sensitive to both of them. mentioned.
使用しうるアクリレート類としては、単官能(メタ)アクリレート類、多官能(メタ)アクリレート類、その他エポキシアクリレート、ポリエステルアクリレート、ウレタンアクリレート等が挙げられる。 Usable acrylates include monofunctional (meth)acrylates, polyfunctional (meth)acrylates, epoxy acrylates, polyester acrylates, urethane acrylates, and the like.
単官能(メタ)アクリレート類としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、ブチル(メタ)アクリレート、ラウリル(メタ)アクリレート、ポリエチレングリコール(メタ)アクリレート、ポリエチレングリコール(メタ)アクリレートモノメチルエーテル、フェニルエチル(メタ)アクリレート、イソボルニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート等が挙げられる。 Monofunctional (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, lauryl (meth)acrylate, polyethylene glycol (meth)acrylate, polyethylene glycol (meth)acrylate monomethyl ether, phenylethyl (meth)acrylate, isobornyl (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate and the like.
多官能(メタ)アクリレート類としては、ブタンジオールジ(メタ)アクリレート、ヘキサンジオールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ノナンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレンジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、トリス(メタ)アクリロイルオキシエチルイソシアヌレート、ポリプロピレングリコールジ(メタ)アクリレート、アジピン酸エポキシジ(メタ)アクリレート、ビスフェノールエチレンオキサイドジ(メタ)アクリレート、水素化ビスフェノールエチレンオキサイドジ(メタ)アクリレート、ビスフェノールジ(メタ)アクリレート、ヒドロキシビバリン酸ネオペングリコールのε-カプロラクトン付加物のジ(メタ)アクリレート、ジペンタエリスリトールとε-カプロラクトンの反応物のポリ(メタ)アクリレート、ジペンタエリスリトールポリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、トリエチロールプロパントリ(メタ)アクリレート、及びそのエチレンオキサイド付加物、ペンタエリスリトールトリ(メタ)アクリレート、及びそのエチレンオキサイド付加物、ペンタエリスリトールテトラ(メタ)アクリレート、及びそのエチレンオキサイド付加物、ジペンタエリスリトールヘキサ(メタ)アクリレート、及びそのエチレンオキサイド付加物等が挙げられる。 Polyfunctional (meth)acrylates include butanediol di(meth)acrylate, hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, nonanediol di(meth)acrylate, ethylene glycol di(meth)acrylate , diethylene di(meth)acrylate, polyethylene glycol di(meth)acrylate, tris(meth)acryloyloxyethyl isocyanurate, polypropylene glycol di(meth)acrylate, adipate epoxy di(meth)acrylate, bisphenol ethylene oxide di(meth)acrylate, Hydrogenated bisphenol ethylene oxide di(meth)acrylate, bisphenol di(meth)acrylate, di(meth)acrylate of ε-caprolactone adduct of neoopene glycol hydroxybivalate, poly of reaction product of dipentaerythritol and ε-caprolactone (meth)acrylates, dipentaerythritol poly(meth)acrylates, trimethylolpropane tri(meth)acrylates, triethylolpropane tri(meth)acrylates and their ethylene oxide adducts, pentaerythritol tri(meth)acrylates and their ethylene Oxide adducts, pentaerythritol tetra(meth)acrylate and its ethylene oxide adducts, dipentaerythritol hexa(meth)acrylate and its ethylene oxide adducts, and the like.
使用できるビニル化合物類としてはビニルエーテル類、スチレン類、その他ビニル化合物が挙げられる。ビニルエーテル類としては、エチルビニルエーテル、プロピルビニルエーテル、ヒドロキシエチルビニルエーテル、エチレングリコールジビニルエーテル等が挙げられる。スチレン類としては、スチレン、メチルスチレン、エチルスチレン等が挙げられる。その他ビニル化合物としてはトリアリルイソシアヌレート、トリメタアリルイソシアヌレート等が挙げられる。 Usable vinyl compounds include vinyl ethers, styrenes and other vinyl compounds. Vinyl ethers include ethyl vinyl ether, propyl vinyl ether, hydroxyethyl vinyl ether, ethylene glycol divinyl ether and the like. Styrenes include styrene, methylstyrene, ethylstyrene and the like. Other vinyl compounds include triallyl isocyanurate and trimethallyl isocyanurate.
さらに、いわゆる反応性オリゴマー類としては、活性エネルギー線に感応可能な官能基とウレタン結合を同一分子内に併せ持つウレタンアクリレート、同様に活性エネルギー線に感応可能な官能基とエステル結合を同一分子内に併せ持つポリエステルアクリレート、その他エポキシ樹脂から誘導され、活性エネルギー線に感応可能な官能基を同一分子内に併せ持つエポキシアクリレート、これらの結合が複合的に用いられている反応性オリゴマー等が挙げられる。 Furthermore, as so-called reactive oligomers, there are urethane acrylates having both a functional group sensitive to active energy rays and a urethane bond in the same molecule, and similarly a functional group sensitive to active energy rays and an ester bond in the same molecule. Examples include polyester acrylates having both of them, epoxy acrylates derived from other epoxy resins and having functional groups sensitive to active energy rays in the same molecule, and reactive oligomers in which these bonds are used in combination.
また、カチオン反応型単量体としては、一般的にエポキシ基を有する化合物であれば特に限定はない。例えば、グリシジル(メタ)アクリレート、メチルグリシジルエーテル、エチルグリシジルエーテル、ブチルグリシジルエーテル、ビスフェノールAジグリシジルエーテル、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート(ユニオン・カーバイド社製「サイラキュアUVR-6110」等)、3,4-エポキシシクロヘキシルエチル-3,4-エポキシシクロヘキサンカルボキシレート、ビニルシクロヘキセンジオキシド(ユニオン・カーバイド社製「ELR-4206」等)、リモネンジオキシド(ダイセル化学工業社製「セロキサイド3000」等)、アリルシクロヘキセンジオキシド、3,4-エポキシ-4-メチルシクロヘキシル-2-プロピレンオキシド、2-(3,4-エポキシシクロヘキシル-5,5-スピロ-3,4-エポキシ)シクロヘキサン-m-ジオキサン、ビス(3,4-エポキシシクロヘキシル)アジペート(ユニオン・カーバイド社製「サイラキュアUVR-6128」等)、ビス(3,4-エポキシシクロヘキシルメチル)アジペート、ビス(3,4-エポキシシクロヘキシル)エーテル、ビス(3,4-エポキシシクロヘキシルメチル)エーテル、ビス(3,4-エポキシシクロヘキシル)ジエチルシロキサン等が挙げられる。 Moreover, the cationic reactive monomer is not particularly limited as long as it is generally a compound having an epoxy group. For example, glycidyl (meth)acrylate, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate ("Cyracure" manufactured by Union Carbide) UVR-6110", etc.), 3,4-epoxycyclohexylethyl-3,4-epoxycyclohexane carboxylate, vinylcyclohexene dioxide ("ELR-4206" manufactured by Union Carbide, etc.), limonene dioxide (Daisel Chemical Industries, Ltd. manufactured by "Celoxide 3000" etc.), allylcyclohexene dioxide, 3,4-epoxy-4-methylcyclohexyl-2-propylene oxide, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy ) Cyclohexane-m-dioxane, bis (3,4-epoxycyclohexyl) adipate ("Cyracure UVR-6128" manufactured by Union Carbide, etc.), bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4- epoxycyclohexyl)ether, bis(3,4-epoxycyclohexylmethyl)ether, bis(3,4-epoxycyclohexyl)diethylsiloxane and the like.
これらのうち、反応性化合物(B)としては、ラジカル硬化型であるアクリレート類が最も好ましい。カチオン型の場合、カルボン酸とエポキシ基が反応してしまうため2液混合型にする必要が生じる。 Among these, radical-curing acrylates are most preferable as the reactive compound (B). In the case of a cationic type, it is necessary to use a two-liquid mixed type because the carboxylic acid reacts with the epoxy group.
本発明の反応性ポリカルボン酸化合物(A)と、そのほかの反応性化合物(B)とを混合せしめて本発明の活性エネルギー線硬化型樹脂組成物を得ることができる。このとき、用途に応じて適宜その他の成分を加えてもよい。 The active energy ray-curable resin composition of the present invention can be obtained by mixing the reactive polycarboxylic acid compound (A) of the present invention with another reactive compound (B). At this time, other components may be added as appropriate depending on the application.
本発明の活性エネルギー線硬化型樹脂組成物は、組成物中に反応性ポリカルボン酸化合物(A)を97~5質量部、好ましくは87~10質量部、その他反応性化合物(B)3~95質量部、さらに好ましくは3~90質量部を含む。必要に応じてその他の成分を0~80質量部含んでいてよい。 The active energy ray-curable resin composition of the present invention contains 97 to 5 parts by mass, preferably 87 to 10 parts by mass of the reactive polycarboxylic acid compound (A) in the composition, and 3 to 3 parts by mass of the other reactive compound (B). 95 parts by weight, more preferably 3 to 90 parts by weight. 0 to 80 parts by mass of other components may be included as necessary.
この他、本発明の活性エネルギー線硬化型樹脂組成物を各種用途に適合させる目的で、組成物中に70重量部を上限にその他の成分を加えることもできる。その他の成分としては光重合開始剤、その他の添加剤、着色材料、硬化促進剤、また塗工適性付与等を目的に粘度調整のため添加される揮発性溶剤等が挙げられる。下記に使用しうるその他の成分を例示する。 In addition, for the purpose of adapting the active energy ray-curable resin composition of the present invention to various uses, other components may be added to the composition up to an upper limit of 70 parts by weight. Other components include photopolymerization initiators, other additives, coloring materials, curing accelerators, and volatile solvents added to adjust viscosity for the purpose of imparting coatability. Other ingredients that may be used are exemplified below.
本発明の活性エネルギー線硬化型樹脂組成物は、さらに光重合開始剤を含むことができる。光重合開始剤としてはラジカル型光重合開始剤、カチオン系光重合開始剤が好ましい。
ラジカル型光重合開始剤としては、例えばベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾイン類;アセトフェノン、2,2-ジエトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン、2-ヒドロキシ-2-メチル-フェニルプロパン-1-オン、ジエトキシアセトフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノ-プロパン-1-オン等のアセトフェノン類;2-エチルアントラキノン、2-t-ブチルアントラキノン、2-クロロアントラキノン、2-アミルアントラキノン等のアントラキノン類;2,4-ジエチルチオキサントン、2-イソプロピルチオキサントン、2-クロロチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;ベンゾフェノン、4-ベンゾイル-4’-メチルジフェニルサルファイド、4,4’-ビスメチルアミノベンゾフェノン等のベンゾフェノン類;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド、ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキサイド等のホスフィンオキサイド類等の公知一般のラジカル型光重合開始剤が挙げられる。
The active energy ray-curable resin composition of the present invention can further contain a photopolymerization initiator. Radical photopolymerization initiators and cationic photopolymerization initiators are preferred as the photopolymerization initiator.
Examples of radical type photopolymerization initiators include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; acetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloro Acetophenone, 2-hydroxy-2-methyl-phenylpropan-1-one, diethoxyacetophenone, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propane-1 -one and other acetophenones; 2-ethylanthraquinone, 2-t-butylanthraquinone, 2-chloroanthraquinone, 2-amylanthraquinone and other anthraquinones; 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, etc. thioxanthones; acetophenone dimethyl ketal, benzyl dimethyl ketal and other ketals; benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 4,4'-bismethylaminobenzophenone and other benzophenones; 2,4,6-trimethyl Known general radical type photopolymerization initiators such as phosphine oxides such as benzoyldiphenylphosphine oxide and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide can be used.
また、カチオン系光重合開始剤としては、ルイス酸のジアゾニウム塩、ルイス酸のヨードニウム塩、ルイス酸のスルホニウム塩、ルイス酸のホスホニウム塩、その他のハロゲン化物、トリアジン系開始剤、ボレート系開始剤及びその他の光酸発生剤等が挙げられる。 Examples of cationic photopolymerization initiators include diazonium salts of Lewis acids, iodonium salts of Lewis acids, sulfonium salts of Lewis acids, phosphonium salts of Lewis acids, other halides, triazine initiators, borate initiators and Other photoacid generators and the like are included.
ルイス酸のジアゾニウム塩としては、p-メトキシフェニルジアゾニウムフロロホスホネート、N,N-ジエチルアミノフェニルジアゾニウムヘキサフロロホスホネート(三新化学工業社製サンエイドSI-60L/SI-80L/SI-100L等)等が挙げられ、ルイス酸のヨードニウム塩としては、ジフェニルヨードニウムヘキサフロロホスホネート、ジフェニルヨードニウムヘキサフロロアンチモネート等が挙げられ、ルイス酸のスルホニウム塩としては、トリフェニルスルホニウムヘキサフロロホスホネート(UnionCarbide社製CyracureUVI-6990等)、トリフェニルスルホニウムヘキサフロロアンチモネート(UnionCarbide社製CyracureUVI-6974等)等が挙げられ、ルイス酸のホスホニウム塩としては、トリフェニルホスホニウムヘキサフロロアンチモネート等が挙げられる。 Examples of diazonium salts of Lewis acids include p-methoxyphenyldiazonium fluorophosphonate, N,N-diethylaminophenyldiazonium hexafluorophosphonate (San-Aid SI-60L/SI-80L/SI-100L manufactured by Sanshin Kagaku Kogyo Co., Ltd.) and the like. Lewis acid iodonium salts include diphenyliodonium hexafluorophosphonate, diphenyliodonium hexafluoroantimonate and the like, and Lewis acid sulfonium salts include triphenylsulfonium hexafluorophosphonate (Cyracure UVI-6990 manufactured by Union Carbide, etc.). , triphenylsulfonium hexafluoroantimonate (Cyracure UVI-6974 manufactured by Union Carbide, etc.) and the like, and the phosphonium salts of Lewis acids include triphenylphosphonium hexafluoroantimonate and the like.
その他のハロゲン化物としては、2,2,2-トリクロロ-[1-4’-(ジメチルエチル)フェニル]エタノン(AKZO社製TrigonalPI等)、2,2-ジクロロ-1-4-(フェノキシフェニル)エタノン(Sandoz社製Sandray1000等)、α,α,α-トリブロモメチルフェニルスルホン(製鉄化学社製BMPS等)等が挙げられる。トリアジン系開始剤としては、2,4,6-トリス(トリクロロメチル)-トリアジン、2,4-トリクロロメチル-(4’-メトキシフェニル)-6-トリアジン(Panchim社製TriazineA等)、2,4-トリクロロメチル-(4’-メトキシスチリル)-6-トリアジン(Panchim社製TriazinePMS等)、2,4-トリクロロメチル-(ピプロニル)-6-トリアジン(Panchim社製TriazinePP等)、2,4-トリクロロメチル-(4’-メトキシナフチル)-6-トリアジン(Panchim社製TriazineB等)、2[2’(5-メチルフリル)エチリデン]-4,6-ビス(トリクロロメチル)-s-トリアジン(三和ケミカル社製等)、2(2’-フリルエチリデン)-4,6-ビス(トリクロロメチル)-s-トリアジン(三和ケミカル社製)等が挙げられる。 Other halides include 2,2,2-trichloro-[1-4′-(dimethylethyl)phenyl]ethanone (TrigonalPI manufactured by AKZO, etc.), 2,2-dichloro-1-4-(phenoxyphenyl) Examples thereof include ethanone (Sandoz Sandray 1000, etc.), α,α,α-tribromomethylphenyl sulfone (BMPS, etc. manufactured by Steel Chemical Co., Ltd.). Triazine-based initiators include 2,4,6-tris(trichloromethyl)-triazine, 2,4-trichloromethyl-(4′-methoxyphenyl)-6-triazine (TriazineA manufactured by Panchim Co., etc.), 2,4 -trichloromethyl-(4′-methoxystyryl)-6-triazine (such as TriazinePMS manufactured by Panchim), 2,4-trichloromethyl-(pipronyl)-6-triazine (such as TriazinePP manufactured by Panchim), 2,4-trichloro Methyl-(4′-methoxynaphthyl)-6-triazine (TriazineB manufactured by Panchim, etc.), 2[2′(5-methylfuryl)ethylidene]-4,6-bis(trichloromethyl)-s-triazine (Sanwa Chemical Co., Ltd.), 2(2′-furylethylidene)-4,6-bis(trichloromethyl)-s-triazine (manufactured by Sanwa Chemical Co., Ltd.), and the like.
ボレート系光重合開始剤としては、日本感光色素製NK-3876及びNK-3881等が挙げられ、その他の光酸発生剤等としては、9-フェニルアクリジン、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2-ビイミダゾール(黒金化成社製ビイミダゾール等)、2,2-アゾビス(2-アミノ-プロパン)ジヒドロクロリド(和光純薬社製V50等)、2,2-アゾビス[2-(イミダゾリン-2イル)プロパン]ジヒドロクロリド(和光純薬社製VA044等)、[イータ-5-2-4-(シクロペンタデシル)(1,2,3,4,5,6,イータ)-(メチルエチル)-ベンゼン]鉄(II)ヘキサフロロホスホネート(CibaGeigy社製Irgacure261等)、ビス(y5-シクロペンタジエニル)ビス[2,6-ジフルオロ-3-(1H-ピリ-1-イル)フェニル]チタニウム(CibaGeigy社製CGI-784等)等が挙げられる。 Examples of borate-based photopolymerization initiators include NK-3876 and NK-3881 manufactured by Japan Photosensitive Color, and other photoacid generators such as 9-phenylacridine, 2,2′-bis(o-chlorophenyl )-4,4′,5,5′-tetraphenyl-1,2-biimidazole (such as biimidazole manufactured by Kurogane Kasei Co., Ltd.), 2,2-azobis(2-amino-propane) dihydrochloride (Wako Pure Chemical Industries, Ltd. V50, etc. manufactured by Wako Pure Chemical Industries, Ltd.), 2,2-azobis[2-(imidazolin-2yl)propane] dihydrochloride (VA044, etc. manufactured by Wako Pure Chemical Industries, Ltd.), [Eta-5-2-4-(cyclopentadecyl) (1 , 2,3,4,5,6, eta)-(methylethyl)-benzene]iron(II) hexafluorophosphonate (such as Irgacure 261 manufactured by CibaGeigy), bis(y5-cyclopentadienyl)bis[2,6 -difluoro-3-(1H-pyri-1-yl)phenyl]titanium (CGI-784 manufactured by CibaGeigy, etc.) and the like.
この他、アゾビスイソブチロニトリル等のアゾ系開始剤、過酸化ベンゾイル等の熱に感応する過酸化物系ラジカル型開始剤等を併せて用いても良い。また、ラジカル系とカチオン系の双方の光重合開始剤を併せて用いても良い。光重合開始剤は、1種類を単独で用いることもできるし、2種類以上を併せて用いることもできる。 In addition, azo-based initiators such as azobisisobutyronitrile, heat-sensitive peroxide-based radical initiators such as benzoyl peroxide, and the like may be used together. Also, both radical and cationic photopolymerization initiators may be used together. A photoinitiator can also be used individually by 1 type, and can also collectively use two or more types.
これらのうち、本発明の反応性ポリカルボン酸化合物(A)の特性を考慮すれば、ラジカル型光重合開始剤が特に好ましい。 Among these, the radical type photopolymerization initiator is particularly preferable in consideration of the properties of the reactive polycarboxylic acid compound (A) of the present invention.
さらに、本発明の活性エネルギー線硬化型樹脂組成物は、着色顔料を含むことができる。着色顔料としては例えば、着色を目的としないもの、いわゆる体質顔料を用いることも出来る。例えば、タルク、硫酸バリウム、炭酸カルシウム、炭酸マグネシウム、チタン酸バリウム、水酸化アルミニウム、シリカ、クレー等が挙げられる。 Furthermore, the active energy ray-curable resin composition of the present invention can contain a coloring pigment. As the coloring pigment, for example, a so-called extender pigment, which is not intended for coloring, can also be used. Examples include talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, aluminum hydroxide, silica and clay.
さらに、本発明の活性エネルギー線硬化型樹脂組成物は、必要に応じ、その他の添加剤を含むことができる。その他の添加剤としては、例えばメラミン等の熱硬化触媒、アエロジル等のチキソトロピー付与剤、シリコーン系、フッ素系のレベリング剤や消泡剤、ハイドロキノン、ハイドロキノンモノメチルエーテル等の重合禁止剤、安定剤、酸化防止剤等を使用することが出来る。 Furthermore, the active energy ray-curable resin composition of the present invention can contain other additives, if necessary. Other additives include, for example, thermosetting catalysts such as melamine, thixotropic agents such as Aerosil, silicone-based and fluorine-based leveling agents and antifoaming agents, polymerization inhibitors such as hydroquinone and hydroquinone monomethyl ether, stabilizers, oxidation Inhibitors and the like can be used.
この他に活性エネルギー線に反応性を示さない樹脂類(いわゆるイナートポリマー)として、たとえばその他のエポキシ樹脂、フェノール樹脂、ウレタン樹脂、ポリエステル樹脂、ケトンホルムアルデヒド樹脂、クレゾール樹脂、キシレン樹脂、ジアリルフタレート樹脂、スチレン樹脂、グアナミン樹脂、天然及び合成ゴム、アクリル樹脂、ポリオレフィン樹脂、及びこれらの変性物を用いることもできる。これらは樹脂組成物中に40質量部までの範囲において用いることが好ましい。 Other resins that do not show reactivity to active energy rays (so-called inert polymers) include, for example, other epoxy resins, phenol resins, urethane resins, polyester resins, ketone formaldehyde resins, cresol resins, xylene resins, diallyl phthalate resins, Styrene resins, guanamine resins, natural and synthetic rubbers, acrylic resins, polyolefin resins, and modified products thereof can also be used. These are preferably used in the range of up to 40 parts by mass in the resin composition.
特に、ソルダーレジスト用途に反応性ポリカルボン酸化合物(A)を用いようとする場合には、活性エネルギー線に反応性を示さない樹脂類として公知一般のエポキシ樹脂を用いることが好ましい。これは活性エネルギー線によって反応、硬化させた後も反応性ポリカルボン酸化合物(A)に由来するカルボキシ基が残留してしまい、結果としてその硬化物は耐水性や加水分解性に劣ってしまう。したがって、エポキシ樹脂を用いることで残留するカルボキシル基をさらにカルボキシレート化し、さらに強固な架橋構造を形成させる。該公知一般のエポキシ樹脂は、前記カチオン反応型単量体を用いることができる。 In particular, when the reactive polycarboxylic acid compound (A) is used for solder resist applications, it is preferable to use known general epoxy resins as resins that do not show reactivity to active energy rays. This is because carboxyl groups derived from the reactive polycarboxylic acid compound (A) remain even after reaction and curing by active energy rays, and as a result, the cured product is inferior in water resistance and hydrolyzability. Therefore, by using an epoxy resin, the remaining carboxyl groups are further carboxylated to form a stronger crosslinked structure. The above cationic reactive monomers can be used for the known general epoxy resins.
また使用目的に応じて、粘度を調整する目的で、樹脂組成物中に50質量部、さらに好ましくは35質量部までの範囲において揮発性溶剤を添加することも出来る。 A volatile solvent can also be added to the resin composition in an amount of up to 50 parts by mass, more preferably up to 35 parts by mass, for the purpose of adjusting the viscosity according to the purpose of use.
本発明の活性エネルギー線硬化型樹脂組成物は活性エネルギー線によって容易に硬化する。ここで活性エネルギー線の具体例としては、紫外線、可視光線、赤外線、X線、ガンマー線、レーザー光線等の電磁波、アルファー線、ベータ線、電子線等の粒子線等が挙げられる。本発明の好適な用途を考慮すれば、これらのうち、紫外線、レーザー光線、可視光線、または電子線が好ましい。 The active energy ray-curable resin composition of the present invention is easily cured by an active energy ray. Specific examples of active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays and laser beams, and particle beams such as alpha rays, beta rays and electron beams. Of these, ultraviolet light, laser light, visible light, or electron beams are preferred in view of the preferred application of the present invention.
本発明において成形用材料とは、未硬化の組成物を型にいれ、もしくは型を押し付け、物体を成形したのち、活性エネルギー線により硬化反応を起こさせ成形させるもの、もしくは未硬化の組成物にレーザー等の焦点光等を照射し、硬化反応を起こさせ成形させる用途に用いられる材料を指す。 In the present invention, the molding material refers to a material in which an uncured composition is put into a mold or pressed against the mold to mold an object, and then a curing reaction is caused by an active energy ray to be molded, or an uncured composition is used. It refers to a material used for molding by irradiating focused light such as a laser to cause a curing reaction.
具体的な用途としては、平面状に成形したシート、素子を保護するための封止材、未硬化の組成物に微細加工された「型」を押し当て微細な成形を行う、所謂ナノインプリント材料、さらには特に熱的な要求の厳しい発光ダイオード、光電変換素子等の周辺封止材料等が好適な用途として挙げられる。 Specific applications include a sheet molded into a flat surface, a sealing material for protecting an element, a so-called nanoimprint material that presses a microfabricated "mold" against an uncured composition to perform fine molding, Furthermore, it is suitable for use as a peripheral sealing material for light-emitting diodes, photoelectric conversion elements, etc., which have particularly strict thermal requirements.
本発明において皮膜形成用材料とは、基材表面を被覆することを目的として利用されるものである。具体的な用途としては、グラビアインキ、フレキソインキ、シルクスクリーンインキ、オフセットインキ等のインキ材料、ハードコート、トップコート、オーバープリントニス、クリヤコート等の塗工材料、ラミネート用、光ディスク用他各種接着剤、粘着剤等の接着材料、ソルダーレジスト、エッチングレジスト、マイクロマシン用レジスト等のレジスト材料等がこれに該当する。さらには、皮膜形成用材料を一時的に剥離性基材に塗工しフィルム化した後、本来目的とする基材に貼合し皮膜を形成させる、いわゆるドライフィルムも皮膜形成用材料に該当する。 In the present invention, the film-forming material is used for the purpose of coating the substrate surface. Specific applications include ink materials such as gravure ink, flexographic ink, silk screen ink, and offset ink; coating materials such as hard coats, top coats, overprint varnishes and clear coats; lamination, optical discs, and various other adhesives. This includes adhesive materials such as adhesives and adhesives, and resist materials such as solder resists, etching resists, micromachine resists, and the like. Furthermore, a so-called dry film, in which a film-forming material is temporarily applied to a peelable substrate to form a film and then laminated to the intended substrate to form a film, also corresponds to the film-forming material. .
本発明には前記の硬化型樹脂組成物に活性エネルギー線を照射して得られる硬化物もふくまれ、また、該硬化物の層を有する多層材料も含まれる。 The present invention also includes a cured product obtained by irradiating the curable resin composition with an active energy ray, and also includes a multi-layer material having a layer of the cured product.
これらのうち、反応性ポリカルボン酸化合物(A)のカルボキシ基の導入によって、基材への密着性が高まるため、プラスチック基材、若しくは金属基材を被覆するための用途として用いることが好ましい。 Among these, introduction of a carboxyl group into the reactive polycarboxylic acid compound (A) enhances adhesion to substrates, and is therefore preferably used for coating plastic substrates or metal substrates.
さらには、未反応の反応性ポリカルボン酸化合物(A)が、アルカリ水溶液に可溶性となる特徴を生かして、アルカリ水現像型レジスト材料組成物として用いることも好ましい。 Furthermore, it is also preferable to use the unreacted reactive polycarboxylic acid compound (A) as an alkaline water developable resist material composition, taking advantage of the feature of being soluble in an alkaline aqueous solution.
本発明においてレジスト材料組成物とは、基材上に該組成物の皮膜層を形成させ、その後、紫外線等の活性エネルギー線を部分的に照射し、照射部、未照射部の物性的な差異を利用して描画しようとする活性エネルギー線感応型の組成物を指す。具体的には、照射部、または未照射部を何らかの方法、例えば溶剤等やアルカリ溶液等で溶解させる等して除去し、描画を行うことを目的として用いられる組成物である。 In the present invention, the resist material composition refers to forming a film layer of the composition on a substrate, then partially irradiating active energy rays such as ultraviolet rays, and determining the difference in physical properties between the irradiated portion and the non-irradiated portion. It refers to an active energy ray-sensitive composition that is to be drawn using. Specifically, it is a composition used for the purpose of drawing by removing an irradiated portion or an unirradiated portion by some method, for example, by dissolving it with a solvent or the like or an alkaline solution.
本発明のレジスト材料組成物である活性エネルギー線硬化型樹脂組成物は、パターニングが可能な種々の材料に適用でき、例えば特に、ソルダーレジスト材料、ビルドアップ工法用の層間絶縁材に有用であり、さらには光導波路としてプリント配線板、光電子基板や光基板のような電気・電子・光基材等にも利用される。 The active energy ray-curable resin composition, which is the resist material composition of the present invention, can be applied to various materials that can be patterned. Furthermore, it is also used as an optical waveguide in electrical/electronic/optical substrates such as printed wiring boards, optoelectronic substrates, and optical substrates.
特に好適な用途としては、耐熱性や現像性が良好である特性を生かして、感光性フィルム、支持体付き感光性フィルム、プリプレグ等の絶縁樹脂シート、回路基板(積層板用途、多層プリント配線板用途等)、ソルダーレジスト、アンダ-フィル材、ダイボンディング材、半導体封止材、穴埋め樹脂、部品埋め込み樹脂等、樹脂組成物が必要とされる用途の広範囲に使用できる。なかでも、高い顔料濃度においても良好な現像性を発揮することが出来ることから、カラーレジスト、カラーフィルタ用のレジスト材料、特にブラックマトリックス材料等にも好適に用いることが出来る。 Particularly suitable applications include photosensitive films, photosensitive films with supports, insulating resin sheets such as prepreg, circuit boards (laminated boards, multilayer printed wiring boards) Applications, etc.), solder resists, underfill materials, die bonding materials, semiconductor encapsulation materials, hole-filling resins, component-embedding resins, and a wide range of other applications that require resin compositions. In particular, since good developability can be exhibited even at high pigment concentrations, it can be suitably used for color resists, resist materials for color filters, particularly black matrix materials, and the like.
更に、多層プリント配線板の絶縁層用樹脂組成物(感光性樹脂組成物の硬化物を絶縁層とした多層プリント配線板)、層間絶縁層用樹脂組成物(感光性樹脂組成物の硬化物を層間絶縁層とした多層プリント配線板)、メッキ形成用樹脂組成物(感光性樹脂組成物の硬化物上にメッキが形成された多層プリント配線板)等にも好適に用いることが出来る。 Furthermore, a resin composition for an insulating layer of a multilayer printed wiring board (multilayer printed wiring board having a cured product of a photosensitive resin composition as an insulating layer), a resin composition for an interlayer insulating layer (a cured product of a photosensitive resin composition multilayer printed wiring board as an interlayer insulating layer), a resin composition for plating (multilayer printed wiring board in which plating is formed on a cured product of a photosensitive resin composition), and the like.
本発明の活性エネルギー線硬化型樹脂組成物を使用してのパターニングは、例えば次のようにして行うことができる。基板上にスクリーン印刷法、スプレー法、ロールコート法、静電塗装法、カーテンコート法、スピンコート法などの方法で0.1~200μmの膜厚で本発明の活性エネルギー線硬化型樹脂組成物を塗布し、塗膜を通常50~110℃、好ましくは60~100℃の温度で乾燥させることにより、塗膜が形成できる。その後、露光パターンを形成したフォトマスクを通じて塗膜に直接または間接に紫外線などの高エネルギー線を通常10~2000mJ/cm2程度の強さで照射し、後述する現像液を用いて、例えばスプレー、振動浸漬、パドル、ブラッシング等により所望のパターンを得ることができる。 Patterning using the active energy ray-curable resin composition of the present invention can be performed, for example, as follows. The active energy ray-curable resin composition of the present invention is applied onto a substrate to a thickness of 0.1 to 200 μm by a method such as screen printing, spraying, roll coating, electrostatic coating, curtain coating, spin coating, or the like. and dried at a temperature of usually 50 to 110°C, preferably 60 to 100°C to form a coating film. After that, the coating film is directly or indirectly irradiated with a high-energy ray such as ultraviolet rays at an intensity of about 10 to 2000 mJ/cm 2 through a photomask having an exposure pattern formed thereon. A desired pattern can be obtained by vibration dipping, paddle, brushing, or the like.
上記現像に使用されるアルカリ水溶液としては水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム、リン酸ナトリウム、リン酸カリウム等の無機アルカリ水溶液やテトラメチルアンモニウムハイドロオキサイド、テトラエチルアンモニウムハイドロオキサイド、テトラブチルアンモニウムハイドロオキサイド、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等の有機アルカリ水溶液が使用できる。この水溶液には、さらに有機溶剤、緩衝剤、錯化剤、染料または顔料を含ませることができる。 Examples of alkaline aqueous solutions used for the development include inorganic alkaline aqueous solutions such as potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium phosphate and potassium phosphate, and tetramethylammonium hydroxide. , tetraethylammonium hydroxide, tetrabutylammonium hydroxide, monoethanolamine, diethanolamine and triethanolamine. This aqueous solution may further contain organic solvents, buffers, complexing agents, dyes or pigments.
この他、活性エネルギー線による硬化反応前の機械的強度が求められるドライフィルム用途として特に好適に用いられる。即ち、本発明で用いられるエポキシ樹脂(a)の水酸基、エポキシ基のバランスが特定の範囲にあるがゆえに、本発明の反応性ポリカルボン酸化合物(A)が比較的高い分子量であるにも関わらず、良好な現像性を発揮させることが出来る。 In addition, it is particularly suitable for dry film applications that require mechanical strength before curing reaction by active energy rays. That is, since the balance between the hydroxyl group and the epoxy group of the epoxy resin (a) used in the present invention is within a specific range, the reactive polycarboxylic acid compound (A) of the present invention has a relatively high molecular weight. Therefore, good developability can be exhibited.
皮膜形成させる方法としては特に制限はないが、グラビア等の凹版印刷方式、フレキソ等の凸版印刷方式、シルクスクリーン等の孔版印刷方式、オフセット等の平版印刷方式、ロールコーター、ナイフコーター、ダイコーター、カーテンコーター、スピンコーター等の各種塗工方式が任意に採用できる。 The method for forming the film is not particularly limited, but may be an intaglio printing method such as gravure, a letterpress printing method such as flexography, a stencil printing method such as silk screen, a lithographic printing method such as offset, a roll coater, a knife coater, a die coater, or the like. Various coating methods such as curtain coater and spin coater can be arbitrarily adopted.
本発明の活性エネルギー線硬化型樹脂組成物の硬化物とは、本発明の活性エネルギー線硬化型樹脂組成物に活性エネルギー線を照射し硬化させたものを指す。 The cured product of the active energy ray-curable resin composition of the present invention refers to a product obtained by irradiating the active energy ray-curable resin composition of the present invention with an active energy ray and curing it.
本発明の活性エネルギー線硬化型樹脂組成物でオーバーコートされた物品とは、本発明において示される活性エネルギー線硬化型樹脂組成物を基材上に皮膜形成・硬化させ得られる、少なくとも二層以上の層をもってなる材料を示す。 An article overcoated with the active energy ray-curable resin composition of the present invention means at least two or more layers obtained by forming and curing a film of the active energy ray-curable resin composition shown in the present invention on a substrate. shows a material comprising a layer of
以下、本発明を実施例により更に詳細に説明するが、本発明はこれら実施例によって限定されるものではない。また、実施例中、特に断りがない限り、%は質量%を示す。 EXAMPLES The present invention will be described in more detail below with reference to Examples, but the present invention is not limited to these Examples. In addition, unless otherwise specified, % indicates mass % in the examples.
軟化点、エポキシ当量、酸価は以下の条件で測定した。
1)エポキシ当量:JISK7236:2001に準じた方法で測定した。
2)軟化点:JISK7234:1986に準じた方法で測定した。
3)酸価:JISK0070:1992に準じた方法で測定した。
4)GPCの測定条件は以下の通りである。
機種:TOSOH HLC-8220GPC
カラム:Super HZM-N
溶離液:THF(テトラヒドロフラン);0.35ml/分、40℃
検出器:RI(示差屈折計)
分子量標準:ポリスチレン
The softening point, epoxy equivalent and acid value were measured under the following conditions.
1) Epoxy equivalent: Measured according to JISK7236:2001.
2) Softening point: Measured by a method according to JISK7234:1986.
3) Acid value: Measured according to JISK0070:1992.
4) The measurement conditions of GPC are as follows.
Model: TOSOH HLC-8220GPC
Column: Super HZM-N
Eluent: THF (tetrahydrofuran); 0.35 ml/min, 40°C
Detector: RI (differential refractometer)
Molecular weight standard: Polystyrene
(合成例1~3):反応性エポキシカルボキシレート化合物(d)の合成
XD-1000(日本化薬(株)製、軟化点74.8℃、エポキシ当量255g/eq.)を255g、カルボン酸化合物(b)としてアクリル酸(AA)もしくはメタクリル酸(MAA)を表1中記載量、化合物(c)としてジメチロールプロピオン酸(以下、「DMPA」と略す)を表1中記載量加えた。触媒としてトリフェニルホスフィン3g、溶剤としてプロピレングリコールモノメチルエーテルモノアセテートを固形分含有率80%となるように加え、100℃で24時間反応させ、反応性エポキシカルボキシレート化合物(d)溶液を得た。
(Synthesis Examples 1 to 3): Synthesis of reactive epoxy carboxylate compound (d) Acrylic acid (AA) or methacrylic acid (MAA) was added in the amount described in Table 1 as compound (b), and dimethylolpropionic acid (hereinafter abbreviated as "DMPA") was added in the amount described in Table 1 as compound (c). 3 g of triphenylphosphine as a catalyst and propylene glycol monomethyl ether monoacetate as a solvent were added so that the solid content was 80%, and the mixture was reacted at 100° C. for 24 hours to obtain a reactive epoxy carboxylate compound (d) solution.
(実施例1、比較例1):反応性ポリカルボン酸化合物(A)の調製
得られた反応性エポキシカルボキシレート化合物(d)溶液200gに、多塩基酸無水物(e)として表2に記載の化合物、量(g)、及び溶剤として固形分含有率が65%なるように、プロピレングリコールモノメチルエーテルモノアセテートを添加し、100℃に加熱した後、酸付加反応させ、反応性ポリカルボン酸化合物(A)溶液を得た。得られた反応性ポリカルボン酸化合物(A)の固形分酸価(AV:mgKOH/g)を表2中に記載した。固形分酸価(mg・KOH/g)測定は溶液として測定を行い固形分での値に換算した。
(Example 1, Comparative Example 1): Preparation of reactive polycarboxylic acid compound (A) compound, the amount (g), and propylene glycol monomethyl ether monoacetate as a solvent so that the solid content is 65%, heated to 100 ° C., and then subjected to an acid addition reaction to obtain a reactive polycarboxylic acid compound (A) A solution was obtained. Table 2 shows the solid content acid value (AV: mgKOH/g) of the obtained reactive polycarboxylic acid compound (A). The solid content acid value (mg·KOH/g) was measured as a solution and converted to a solid content value.
HTMA:1,2,4-シクロヘキサントリカルボン酸-1,2-無水物、三菱ガス化学(株)製
NTA:ノルボルナントリカルボン酸無水物、特許5532123参照合成品
THPA:1,2,3,6-テトラヒドロ無水フタル酸、新日本理化(株)製
SA: リカシッドSA 無水コハク酸、新日本理化(株)製
HTMA: 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, manufactured by Mitsubishi Gas Chemical Co., Ltd. NTA: norbornanetricarboxylic acid anhydride, see patent 5532123 Synthetic product THPA: 1,2,3,6-tetrahydro Phthalic anhydride, manufactured by Shin Nippon Rika Co., Ltd. SA: Rikacid SA Succinic anhydride, manufactured by Shin Nippon Rika Co., Ltd.
(実施例2、比較例2):レジスト材料組成物の調製
実施例1及び比較例1で得られた反応性ポリカルボン酸化合物(A)を54.44g、その他の反応性化合物(B)としてHX-220(商品名:日本化薬(株)製ジアクリレート単量体)3.54g、光重合開始剤としてイルガキュアー907(チバスペシャリチィーケミカルズ製)を4.72g及びカヤキュアーDETX-S(日本化薬(株)製)を0.47g、硬化剤成分としてNC-3000(日本化薬製)を14.83g、硬化促進剤としてメラミンを1.05g及び濃度調整溶媒としてメチルエチルケトンを20.95g加え、ビーズミルにて混練し、均一に分散させレジスト材料樹脂組成物を得た。
得られた当該組成物をロールコート法により、支持フィルムとなる銅箔のフィルムに均一に塗布し、温度70℃の熱風乾燥炉を通過させ、厚さ30μmの樹脂層を形成した。その後、1%炭酸ナトリウム水溶液でスプレー現像を行い、完全に現像されきるまでの時間、いわゆるブレイクタイムをもって現像性の評価とした(単位:秒)。表3に結果を示す。
(Example 2, Comparative Example 2): Preparation of resist material composition 54.44 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1, and other reactive compounds (B) HX-220 (trade name: diacrylate monomer manufactured by Nippon Kayaku Co., Ltd.) 3.54 g, 4.72 g of Irgacure 907 (manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator and Kayacure DETX-S (Japan 0.47 g of Kayaku Co., Ltd.), 14.83 g of NC-3000 (manufactured by Nippon Kayaku) as a curing agent component, 1.05 g of melamine as a curing accelerator, and 20.95 g of methyl ethyl ketone as a concentration adjusting solvent. , kneaded in a bead mill, and uniformly dispersed to obtain a resist material resin composition.
The resulting composition was uniformly applied to a copper foil film serving as a support film by a roll coating method and passed through a hot air drying oven at a temperature of 70° C. to form a resin layer having a thickness of 30 μm. After that, spray development was carried out with a 1% sodium carbonate aqueous solution, and the developability was evaluated by the time required for complete development, the so-called break time (unit: seconds). Table 3 shows the results.
上記の結果から、本発明の反応性ポリカルボン酸化合物(A)を用いたレジスト材料組成物は良好な現像性を有している。 From the above results, the resist material composition using the reactive polycarboxylic acid compound (A) of the present invention has good developability.
(実施例3及び比較例3):耐熱分解性の評価
実施例1及び比較例1で得られた反応性ポリカルボン酸化合物(A)を8g、光重合開始剤としてイルガキュアー907(チバスペシャリチィーケミカルズ製)を0.24g及びカヤキュアーDETX-S(日本化薬(株)製)を0.01g、硬化剤成分としてNC-3000(日本化薬製)を0.403g、硬化促進剤としてトリフェニルホスフィンを0.017g及びプロピレングリコールモノメチルエーテルモノアセテートを0.446g加え、ポリイミドフィルムに均一に塗布し、温度80℃の熱風乾燥炉を通過させ、厚さ20μmの樹脂層を形成した後、紫外線露光装置((株)オーク製作所、型式HMW-680GW)で露光し、硬化物を得た。作製した硬化物を幅5mmで切り出す。その後、TA instruments製粘弾性測定装置RSA-G2にセットし、空気雰囲気中、周波数10Hz、昇温速度2℃/min.でtanδを測定し、tanδの最大値における温度をTgとした。表4に結果を示す。
(Example 3 and Comparative Example 3): Evaluation of thermal decomposition resistance 8 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1, Irgacure 907 (Ciba Specialty) as a photopolymerization initiator Chemicals) 0.24 g and Kayacure DETX-S (manufactured by Nippon Kayaku Co., Ltd.) 0.01 g, NC-3000 (manufactured by Nippon Kayaku Co., Ltd.) as a curing agent component 0.403 g, triphenyl as a curing accelerator Add 0.017 g of phosphine and 0.446 g of propylene glycol monomethyl ether monoacetate, apply evenly to the polyimide film, pass through a hot air drying oven at a temperature of 80° C., form a resin layer with a thickness of 20 μm, and then expose to ultraviolet rays. A cured product was obtained by exposure using an apparatus (model HMW-680GW manufactured by ORC Manufacturing Co., Ltd.). The prepared cured product is cut into a width of 5 mm. After that, it was set in a viscoelasticity measuring device RSA-G2 manufactured by TA Instruments, in an air atmosphere, at a frequency of 10 Hz and a temperature increase rate of 2° C./min. was measured, and the temperature at the maximum value of tan δ was defined as Tg. Table 4 shows the results.
上記の結果から、本発明の反応性ポリカルボン酸化合物(A)を用いた活性エネルギー線硬化型樹脂組成物は、比較用の樹脂組成物に比べて、耐熱性に優れていることがわかる。 From the above results, it can be seen that the active energy ray-curable resin composition using the reactive polycarboxylic acid compound (A) of the present invention is superior in heat resistance to the comparative resin composition.
(実施例4及び比較例4):顔料分散性に関する評価
実施例1及び比較例1で得られた反応性ポリカルボン酸化合物(A)を20g、その他反応性化合物(B)としてDPHA(商品名:日本化薬( 株) 製 アクリレート単量体)5.0g、有機溶剤としてプロピレングリコールモノメチルエーテルアセテート10g、着色顔料として三菱カーボンブラックMA-100を15g又は10g加え、攪拌した。さらに35gのガラスビーズを入れ、ペイントシェーカで1時間分散を行った。分散終了後の分散液を、ワイヤーバーコータ#2でポリエチレンテレフタレートフィルム上に塗工し、80℃の温風乾燥機で10分間乾燥を行った。乾燥終了後の塗膜表面の光沢を60°反射グロス計(堀場製作所IG-331光沢計)を用いて測定し、カーボンブラックの分散性を評価した。表5に結果を示す。光沢の値が高いほど、顔料分散性は良好である。
(Example 4 and Comparative Example 4): Evaluation of Pigment Dispersibility 20 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1, and DPHA (trade name) as the other reactive compound (B) : Nippon Kayaku Co., Ltd. acrylate monomer), 10 g of propylene glycol monomethyl ether acetate as an organic solvent, and 15 g or 10 g of Mitsubishi carbon black MA-100 as a coloring pigment were added and stirred. Further, 35 g of glass beads were added and dispersed with a paint shaker for 1 hour. After completion of dispersion, the dispersion was applied onto a polyethylene terephthalate film using wire bar coater #2 and dried for 10 minutes using a hot air dryer at 80°C. After drying, the glossiness of the coating film surface was measured using a 60° reflection gloss meter (Horiba IG-331 gloss meter) to evaluate the dispersibility of carbon black. Table 5 shows the results. The higher the gloss value, the better the pigment dispersibility.
上記の結果から明らかなように、実施例1で得られた反応性ポリカルボン酸化合物(A)を含む樹脂組成物から得られる塗膜は、比較例に比べて、光沢値が高く、顔料分散性に優れることが確認できる。さらに、本発明の反応性ポリカルボン酸化合物(A)を含む樹脂組成物は、着色顔料の含有量が多い場合でも、光沢の値に変化がなかった。これに対して、比較例の反応性ポリカルボン酸化合物は着色顔料の含有量が増えると光沢が低下し、含量分散性が低いことがわかる。従って、本発明の反応性ポリカルボン酸化合物(A)の顔料分散性は着色顔料の含有量に依存することなく、優れていることが確認できる。 As is clear from the above results, the coating film obtained from the resin composition containing the reactive polycarboxylic acid compound (A) obtained in Example 1 has a higher gloss value than the comparative example, and the pigment dispersion It can be confirmed that the performance is excellent. Furthermore, the resin composition containing the reactive polycarboxylic acid compound (A) of the present invention showed no change in gloss even when the content of the coloring pigment was large. On the other hand, the reactive polycarboxylic acid compounds of the comparative examples show a decrease in gloss and low content dispersibility as the content of the coloring pigment increases. Therefore, it can be confirmed that the pigment dispersibility of the reactive polycarboxylic acid compound (A) of the present invention is excellent regardless of the content of the coloring pigment.
以上より、本発明の反応性ポリカルボン酸化合物(A)を用いた活性エネルギー線硬化型樹脂組成物の硬化物は、耐熱性に優れ、微細にアルカリ現像可能であることから成形用材料、皮膜形成用材料、レジスト材料に好適である。特に、高い顔料濃度においても良好な現像性を発揮することから、カラーレジスト、カラーフィルタ用のレジスト材料、特にブラックマトリックス材料等に適している。
As described above, the cured product of the active energy ray-curable resin composition using the reactive polycarboxylic acid compound (A) of the present invention has excellent heat resistance and can be finely developed with an alkali. Suitable for forming materials and resist materials. In particular, since it exhibits good developability even at high pigment concentrations, it is suitable for color resists, resist materials for color filters, particularly black matrix materials, and the like.
Claims (9)
An article overcoated with the cured product of claim 8.
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