TW201905022A - Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product of the composition, and use of the cured product - Google Patents

Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product of the composition, and use of the cured product

Info

Publication number
TW201905022A
TW201905022A TW107119167A TW107119167A TW201905022A TW 201905022 A TW201905022 A TW 201905022A TW 107119167 A TW107119167 A TW 107119167A TW 107119167 A TW107119167 A TW 107119167A TW 201905022 A TW201905022 A TW 201905022A
Authority
TW
Taiwan
Prior art keywords
compound
resin composition
active energy
curable resin
energy ray
Prior art date
Application number
TW107119167A
Other languages
Chinese (zh)
Other versions
TWI770188B (en
Inventor
吉澤恵理
山本和義
Original Assignee
日商日本化藥股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本化藥股份有限公司 filed Critical 日商日本化藥股份有限公司
Publication of TW201905022A publication Critical patent/TW201905022A/en
Application granted granted Critical
Publication of TWI770188B publication Critical patent/TWI770188B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/20General preparatory processes
    • C08G64/30General preparatory processes using carbonates
    • C08G64/302General preparatory processes using carbonates and cyclic ethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4215Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461Unsaturated monoacids
    • C08G59/1466Acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C09D163/10Epoxy resins modified by unsaturated compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D169/00Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

An objective of the present invention is to provide an active energy ray curable resin composition which provides a cured film excellent in heat resistance and developability. The present invention provides a reactive polycarboxylic acid compound (A) which is formed by reacting an epoxy carboxylate compound (d) with a polybasic acid anhydride (e) represented by the following formula (2) or formula (3); wherein, the epoxy carboxylate compound (d) is obtained by reacting a carboxylic acid compound (b) having an ethylenically unsaturated group and a carboxy group polymerizable in one molecule with a compound (c), if necessary, having both a hydroxyl group and a carboxy group in one molecule, in an epoxy resin (a) represented by the following formula (1). In the formula, R may be the same or different and each represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, a represents 1 to 3, respectively; n represents an average value of 1 to 20. In the formula (2), R1 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms; m represents an integer of 1 to 3.

Description

反應性多元羧酸化合物、使用該化合物之活性能量線硬化型樹脂組成物、該組成物之硬化物及該硬化物之用途    Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, hardened product of the composition, and use of the hardened product   

本發明係關於新穎之反應性多元羧酸化合物(A)、含有該化合物(A)之活性能量線硬化型樹脂組成物及該組成物之硬化物。特別是關於亦可應用作為彩色阻劑(color resist)、濾色片用之阻劑材料、黑色基質材料之阻劑材料較佳新穎之反應性多元羧酸化合物、含有該化合物之活性能量線硬化型樹脂組成物及該組成物之硬化物。 The present invention relates to a novel reactive polycarboxylic acid compound (A), an active energy ray-curable resin composition containing the compound (A), and a cured product of the composition. In particular, it is preferably a novel and reactive polycarboxylic acid compound that can also be used as a color resist, a resist material for a color filter, and a black matrix material, and an active energy ray hardener containing the compound. Type resin composition and hardened material of the composition.

印刷電路板係以於可攜式機器的小型輕量化、提升通訊速度提升為目標,而被要求高精度、高密度化,隨之,對被覆其電路本身之阻焊劑的要求亦逐漸提高,相較以往之要求,係要求更維持耐熱性、熱穩定性,同時能夠為基板密著性、高絕緣性、可承受無電解電鍍性之性 能,並要求具有更強靭之硬化物性的皮膜形成用材料。 Printed circuit boards are aimed at the miniaturization and lightweight of portable devices and the improvement of communication speed. They are required to have high precision and high density. Along with this, the requirements for solder resist covering the circuit itself have gradually increased. Compared with the previous requirements, it is required to maintain heat resistance and thermal stability, and at the same time to be able to provide substrate adhesion, high insulation, and ability to withstand electroless plating, and a film-forming material with stronger hardening properties. .

就該等材料而言,使一般的環氧樹脂與具有羧酸及羥基之化合物和丙烯酸一起反應所得之羧酸酯化合物,為低酸價同時具有優異之顯影性的材料一事已為公知,再者,該化合物具有阻劑印墨適合性亦為公知(專利文獻1)。 As for these materials, it is known that a carboxylic acid ester compound obtained by reacting a general epoxy resin with a compound having a carboxylic acid and a hydroxyl group and acrylic acid is a material having a low acid value and excellent developability. In addition, it is also known that this compound has suitability for a resist ink. (Patent Document 1).

另一方面,以酚芳烷基型環氧樹脂(例如日本化藥製NC-3000等)作為基本骨架之酸改性環氧丙烯酸酯係在硬化後顯示高的強靭性之材料一事,已為一般所公知,而且亦對於將之使用作為阻焊劑的用途一事進行研究(專利文獻2)。 On the other hand, the use of phenol aralkyl-type epoxy resins (such as NC-3000 manufactured by Nippon Kayaku Co., Ltd.) as the basic skeleton of acid-modified epoxy acrylates, which have high strength and toughness after hardening, has been It is generally known and the use of it as a solder resist has also been studied (Patent Document 2).

此外,亦已知使碳黑等分散於以酚芳烷基型環氧樹脂作為基本骨架之酸改性環氧丙烯酸酯中並使用於液晶顯示面板等於黑色基質阻劑(專利文獻3)。再者,發現即使是其他的酚-二環戊二烯骨架亦可應用於黑色阻劑,且與著色顏料具有良好的親和性,並發現所得之組成物即使顏料濃度高,亦可成為具有良好的顯影性之阻劑材料等(專利文獻4)。 In addition, it is also known to disperse carbon black and the like in an acid-modified epoxy acrylate having a phenolaralkyl-type epoxy resin as a basic skeleton and to use it as a black matrix resist for a liquid crystal display panel (Patent Document 3). Furthermore, it was found that even other phenol-dicyclopentadiene skeletons can be applied to black resists, and have good affinity with colored pigments, and it has been found that the resulting composition can have good properties even with high pigment concentrations. Developable resistive materials and the like (Patent Document 4).

[專利文獻1]日本特開平06-324490號公報 [Patent Document 1] Japanese Unexamined Patent Publication No. 06-324490

[專利文獻2]日本特開平09-211860號公報 [Patent Document 2] Japanese Patent Laid-Open No. 09-211860

[專利文獻3]日本特開2004-295094號公報 [Patent Document 3] Japanese Patent Laid-Open No. 2004-295094

[專利文獻4]日本特開2009-102501號公報 [Patent Document 4] Japanese Patent Laid-Open No. 2009-102501

然而,以具有酚-二環戊二烯骨架之環氧樹脂作為基本骨架之酸改性環氧丙烯酸酯,雖然碳黑等著色顏料與樹脂良好地親和並分散顏料,但由於顯影性差,故必須具有更高顏料濃度下之顯影性。 However, an acid-modified epoxy acrylate using an epoxy resin having a phenol-dicyclopentadiene skeleton as a basic skeleton, although colored pigments such as carbon black and the resin have good affinity and disperse the pigment, but because of poor developability, it is necessary It has developability at higher pigment concentration.

因此,本發明之目的在於提供一種改善上述之習知技術的問題,著色顏料等之分散性優,且即使顏料濃度高亦具有良好的顯影特性之酸改性環氧丙烯酸酯化合物,以及含有該化合物之活性能量線硬化型樹脂組成物。 Therefore, an object of the present invention is to provide an acid-modified epoxy acrylate compound having improved dispersibility of a colored pigment, etc., and having good developing characteristics even if the pigment concentration is high, and to improve the problems of the above-mentioned conventional technology, and to contain the same. Active energy ray-curable resin composition of a compound.

本發明人等為了解決前述課題,致力於研究之結果,發現使用的樹脂組成物為將具有酚-二環戊二烯構造之環氧樹脂與含有不飽和基之羧酸及依需要之在一分子中兼具羥基及羧基之化合物的反應物再與特定之多元酸酐反應的反應物時,可解決前述課題,遂完成本發明。 In order to solve the aforementioned problems, the present inventors have worked hard to find out the results of the research, and found that the resin composition used was an epoxy resin having a phenol-dicyclopentadiene structure, an unsaturated carboxylic acid, and one as needed. When the reactant of a compound having both a hydroxyl group and a carboxyl group in the molecule is reacted with a specific polybasic acid anhydride, the aforementioned problems can be solved, and the present invention has been completed.

亦即,本發明係關於: That is, the present invention relates to:

〔1〕一種反應性多元羧酸化合物(A),係使使下述式(1)所示之環氧樹脂(a)與一分子中兼具可聚合之乙烯性不飽和基及羧基之羧酸化合物(b)、依需要之在一分子中兼具羥基及羧基之化合物(c)反應而得到反應性環氧羧酸酯化合物(d),再使該反應性環氧羧酸酯化合物(d)與以下述式(2)或式(3)所示之多元酸酐(e)反應者; [1] A reactive polycarboxylic acid compound (A), in which an epoxy resin (a) represented by the following formula (1) and a carboxyl group having both a polymerizable ethylenically unsaturated group and a carboxyl group are combined. An acid compound (b) and a compound (c) having both a hydroxyl group and a carboxyl group in one molecule are reacted to obtain a reactive epoxy carboxylic acid ester compound (d), and the reactive epoxy carboxylic acid ester compound ( d) reacting with a polybasic acid anhydride (e) represented by the following formula (2) or formula (3);

式中,R可為相同亦可為相異,表示氫原子、鹵素原子或碳數1至4之烴基,a分別表示1至3;n係表示平均值為1至20之整數; In the formula, R may be the same or different, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, and a represents 1 to 3 respectively; n represents an integer of 1 to 20;

式(2)中,R1係分別獨立地表示氫原子、碳數1至10之烷基,m表示1至3之整數。 In the formula (2), R 1 independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and m represents an integer of 1 to 3.

〔2〕一種活性能量線硬化型樹脂組成物,係包含前述〔1〕所述之反應性多元羧酸化合物(A)。 [2] An active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) according to the above [1].

〔3〕如前述〔2〕所述之活性能量線硬化型樹脂組成物,其係包含前述反應性多元羧酸化合物(A)以外之反應 性化合物(B)。 [3] The active energy ray-curable resin composition according to the above [2], which contains a reactive compound (B) other than the reactive polycarboxylic acid compound (A).

〔4〕如前述〔2〕或〔3〕項所述之活性能量線硬化型樹脂組成物,其係包含光聚合起始劑。 [4] The active energy ray-curable resin composition according to the item [2] or [3], which contains a photopolymerization initiator.

〔5〕如前述〔2〕至〔4〕項中任一項所述之活性能量線硬化型樹脂組成物,其係成形用材料。 [5] The active energy ray-curable resin composition according to any one of the above [2] to [4], which is a molding material.

〔6〕如前述〔2〕至〔4〕項中任一項所述之活性能量線硬化型樹脂組成物,其係皮膜形成用材料。 [6] The active energy ray-curable resin composition according to any one of the above [2] to [4], which is a material for forming a film.

〔7〕如前述〔2〕至〔4〕項中任一項所述之活性能量線硬化型樹脂組成物,其係阻劑材料組成物。 [7] The active energy ray-curable resin composition according to any one of the above [2] to [4], which is a resist material composition.

〔8〕一種硬化物,係前述〔2〕至〔7〕項中任一項所述之活性能量線硬化型樹脂組成物的硬化物。 [8] A cured product, which is a cured product of the active energy ray-curable resin composition according to any one of the items [2] to [7].

〔9〕一種物品,係經前述〔8〕項所述之硬化物被覆(overcoat)而成者。 [9] An article obtained by overcoating the hardened article according to the item [8].

含有本發明之反應性多元羧酸化合物(A)之活性能量線硬化型樹脂組成物不僅獲得強靭的硬化物,在使乾燥溶劑之狀態中亦具有優異的樹脂物性。又,使本發明之活性能量線硬化型樹脂組成物藉由紫外線等活性能量線等硬化所得之硬化物,因耐熱性優,且可微細地鹼顯影,故適宜用在成形用材料、皮膜形成用材料、阻劑材料。 The active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) of the present invention not only obtains a tough hardened product, but also has excellent resin physical properties in a state where the solvent is dried. In addition, the hardened product obtained by hardening the active energy ray-curable resin composition of the present invention with active energy rays such as ultraviolet rays is excellent in heat resistance and can be finely alkali-developed. Therefore, it is suitable for forming materials and film formation. Materials, resist materials.

而且,就與著色顏料之親和性高而言,因為本發明之反應性多元羧酸改性化合物及含有該化合物之活性能量線硬化型樹脂組成物即使在高的顏料濃度中亦可發揮良 好的顯影性,故適用在彩色阻劑、濾色片用之阻劑材料,尤其是黑色基質材料等。 In addition, since the affinity with the coloring pigment is high, the reactive polycarboxylic acid-modified compound of the present invention and the active energy ray-curable resin composition containing the compound can exhibit good performance even at high pigment concentrations Developability, so it is suitable for color resists, resist materials for color filters, especially black matrix materials.

再者,含有本發明之反應性多元羧酸化合物(A)的活性能量線硬化型樹脂組成物係具有於熱及及機械上之強靭性、良好的保存穩定性、進一步可承受高溫高濕或冷熱衝擊之高可靠性,故亦可使用於特別要求高的可靠性之印刷電路板用阻焊劑、多層印刷電路板用層間絕緣材料、可撓性印刷電路板用阻焊劑、鍍覆阻劑、感光性光學波導等用途。 Furthermore, the active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) of the present invention has thermal and mechanical toughness, good storage stability, and can withstand high temperature and humidity or High reliability due to hot and cold shocks, so it can also be used in soldering resists for printed circuit boards that require high reliability, interlayer insulation materials for multilayer printed circuit boards, solder resists for flexible printed circuit boards, plating resists, Applications such as photosensitive optical waveguides.

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

本發明之反應性多元羧酸化合物(A),可藉由下述方式得到:使具有下述式(1)所示之構造的環氧樹脂(a)與在一分子中兼具可聚合之乙烯性不飽和基及羧基之羧酸化合物(b)、依需要之在一分子中兼具羥基及羧基之化合物(c)反應,獲得反應性環氧羧酸酯化合物(d)。然後,使反應性環氧羧酸酯化合物(d)與下述式(2)或式(3)所示之多元酸酐(e)反應而得到。 The reactive polycarboxylic acid compound (A) of the present invention can be obtained by combining an epoxy resin (a) having a structure represented by the following formula (1) with a polymerizable compound in one molecule. The carboxylic acid compound (b) having an ethylenically unsaturated group and a carboxyl group is reacted with a compound (c) having both a hydroxyl group and a carboxyl group in one molecule as needed to obtain a reactive epoxy carboxylic acid ester compound (d). Then, the reactive epoxy carboxylic acid ester compound (d) is obtained by reacting a polybasic acid anhydride (e) represented by the following formula (2) or formula (3).

(式中,R可為相同亦可為相異,表示氫原子、鹵素原子或碳數1至4之烴基,a分別表示1至3;n係表示平均值為1至20之整數) (In the formula, R may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and a represents 1 to 3 respectively; n represents an integer of 1 to 20)

(式(2)中,R1係分別獨立地表示氫原子、碳數1至10之烷基,m表示1至3之整數) (In the formula (2), R 1 independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and m represents an integer of 1 to 3)

前述式(1)中之碳數1至4的烴基表示甲基、乙基、伸乙基、丙基、伸丙基、丁基、伸丁基等飽和及不飽和烴基。 The hydrocarbon group having 1 to 4 carbon atoms in the aforementioned formula (1) represents a saturated and unsaturated hydrocarbon group such as methyl, ethyl, ethylene, propyl, propyl, butyl, or butyl.

首先,說明對羧酸酯化合物賦予反應性,用以獲得反應性環氧羧酸酯化合物(d)之羧酸酯化步驟。 First, a carboxylic acid esterification step for imparting reactivity to a carboxylic acid ester compound to obtain a reactive epoxy carboxylic acid ester compound (d) will be described.

在本發明使用之前述式(1)所示之環氧樹脂(a)(以下,亦僅稱為為「環氧樹脂(a)」)就各種商品名而言,例如一般可取得XD-1000(日本化藥股份有限公司製)等。 The epoxy resin (a) represented by the aforementioned formula (1) (hereinafter, also simply referred to as "epoxy resin (a)") used in the present invention is generally available in various trade names such as XD-1000 (Made by Nippon Kayaku Co., Ltd.), etc.

在本發明中,在一分子中兼具可聚合之乙烯性不飽和基及羧基之羧酸化合物(b)(以下亦僅稱為「羧酸化合物(b)」)為用以賦予對活性能量線的反應性而使其反應者。乙烯性不飽和基及羧基只要為分別在分子內具有一個以上者即無限制。 In the present invention, a carboxylic acid compound (b) (hereinafter also simply referred to as "carboxylic acid compound (b)") having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule is used to impart active energy to the compound. The reactivity of the line makes it a responder. The ethylenically unsaturated group and the carboxyl group are not limited as long as they each have one or more in the molecule.

在一分子中兼具可聚合之乙烯性不飽和基及羧基之羧酸化合物(b),可舉例如:(甲基)丙烯酸類、巴豆酸、α-氰基桂皮酸、桂皮酸或者飽和或不飽和的二元酸與含有不飽和基之單縮水甘油基化合物的反應物等。在上述中,(甲基)丙烯酸類可舉例如:(甲基)丙烯酸、β-苯乙烯基丙烯酸、β-呋喃甲基丙烯酸、(甲基)丙烯酸二聚物、飽和或不飽和二元酸酐與在1分子中具有1個羥基之(甲基)丙烯酸酯衍生物的等莫耳反應物之半酯類、飽和或不飽和二元酸與單縮水甘油基(甲基)丙烯酸酯衍生物類之等莫耳反應物的半酯類等在一分子中含有一個羧基之單羧酸化合物、進一步與在一分子中具有複數個羥基之(甲基)丙烯酸酯衍生物的等莫耳反應物之半酯類、飽和或不飽和二元酸與具有複數個環氧基之縮水甘油基(甲基)丙烯酸酯衍生物類的等莫耳反應物之半酯類等在一分子中具有複數個羧基之多元羧酸化合物等。 Examples of the carboxylic acid compound (b) having a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule include (meth) acrylic acid, crotonic acid, α-cyanocinnamic acid, cinnamic acid, or saturated or Reactants of an unsaturated dibasic acid with a monoglycidyl compound containing an unsaturated group, and the like. In the above, (meth) acrylics may be exemplified by (meth) acrylic acid, β-styrylacrylic acid, β-furan methacrylic acid, (meth) acrylic acid dimer, saturated or unsaturated dibasic acid anhydride Half-esters, isomorphic reactants with (Meth) acrylate derivatives having one hydroxyl group in one molecule, saturated or unsaturated dibasic acids and monoglycidyl (meth) acrylate derivatives Mole reactants such as half-esters and other mono-molecular compounds containing one carboxyl group in one molecule, and other moire reactants with (meth) acrylate derivatives having a plurality of hydroxyl groups in one molecule Half-esters of isomers, such as half-esters, saturated or unsaturated dibasic acids, and glycidyl (meth) acrylate derivatives with multiple epoxy groups, etc., have multiple carboxyl groups in one molecule Polycarboxylic acid compounds.

此等之中,若考量環氧樹脂(a)與羧酸化合物(b)之反應穩定性,羧酸化合物(b)較佳係單羧酸,併用單羧酸與多元羧酸之情形下,較佳係以單羧酸之莫耳量/多元羧酸之莫耳量所示之值為15以上。 Among these, if the reaction stability of the epoxy resin (a) and the carboxylic acid compound (b) is considered, the carboxylic acid compound (b) is preferably a monocarboxylic acid, and when a monocarboxylic acid and a polycarboxylic acid are used, It is preferable that the value shown by the molar amount of a monocarboxylic acid / the molar amount of a polycarboxylic acid is 15 or more.

就設為活性能量線硬化型樹脂組成物時之靈敏度之點而言,最佳係可舉例:(甲基)丙烯酸、(甲基)丙烯酸與ε-己內酯之反應生成物或桂皮酸。 In terms of sensitivity when the active energy ray-curable resin composition is used, the best examples include (meth) acrylic acid, a reaction product of (meth) acrylic acid and ε-caprolactone, or cinnamic acid.

在一分子中兼具一個以上的可聚合之乙烯性不飽和基及一個以上羧基的化合物,較佳係在化合物中不具有羥基者。 The compound having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule is preferably one having no hydroxyl group in the compound.

在本發明所使用之在一分子中兼具羥基及羧基之化合物(c)(以下亦僅稱為「化合物(c)),係以在羧酸酯化合物中導入羥基為目的而使其反應者。此等係有:在一分子中兼具一個羥基及一個羧基之化合物、在一分子中兼具二個以上羥基及一個羧基之化合物、在一分子中兼具一個以上羥基及二個以上羧基的化合物。 The compound (c) having both a hydroxyl group and a carboxyl group in one molecule (hereinafter also referred to simply as "compound (c))" used in the present invention is a person who reacts with the purpose of introducing a hydroxyl group into a carboxylic acid ester compound. These are: compounds having one hydroxyl group and one carboxyl group in one molecule, compounds having two or more hydroxyl groups and one carboxyl group in one molecule, and one or more hydroxyl groups and two or more carboxyl groups in one molecule. compound of.

在一分子中兼具一個羥基及一個羧基之化合物可舉例如:羥基丙酸、羥基丁酸、羥基硬脂酸等。而且,在一分子中兼具二個以上羥基及一個羧基之化合物,可列舉如:二羥甲基乙酸、二羥甲基丙酸、二羥甲基丁酸等。在一分子中兼具一個以上羥基及二個以上羧基的化合物,可列舉:羥基鄰苯二甲酸等。 Examples of compounds having both a hydroxyl group and a carboxyl group in a molecule include hydroxypropionic acid, hydroxybutyric acid, and hydroxystearic acid. Examples of the compound having two or more hydroxyl groups and one carboxyl group in one molecule include dimethylolacetic acid, dimethylolpropionic acid, and dimethylolbutanoic acid. Examples of the compound having one or more hydroxyl groups and two or more carboxyl groups in one molecule include hydroxyphthalic acid and the like.

此等之中,若考量本發明之效果,較佳係在一分子中含有二個以上羥基者。再者,若考量羧酸酯化反應之穩定 性,較佳係在一分子中具有一個羥基者。最佳係在一分子中具有二個羥基及一個羧基者。若考量原材料之取得,係以二羥甲基丙酸及二羥甲基丁酸為特別適宜。 Among these, if the effect of the present invention is considered, it is preferred that it contains two or more hydroxyl groups in one molecule. Furthermore, if the stability of the carboxylic acid esterification reaction is considered, it is preferable to have one hydroxyl group in one molecule. The most preferred is one having two hydroxyl groups and one carboxyl group in one molecule. If considering the acquisition of raw materials, dimethylolpropionic acid and dimethylolbutyric acid are particularly suitable.

在一分子中兼具一個以上之羥基及一個以上之羧基的化合物,較佳係在化合物中不具有可聚合之乙烯性不飽和基者。 The compound having one or more hydroxyl groups and one or more carboxyl groups in one molecule is preferably one which does not have a polymerizable ethylenically unsaturated group in the compound.

在該羧酸酯化反應中之環氧樹脂(a)與羧酸化合物(b)及化合物(c)之裝填比例,係可依照用途而適當地改變。亦即,全部之環氧基經羧酸酯化時,為了不殘留未反應之環氧基,作為反應性環氧羧酸酯化合物(d)之保存穩定性高。此時,係僅利用所導入之雙鍵所致之反應性。 The filling ratio of the epoxy resin (a) to the carboxylic acid compound (b) and the compound (c) in the carboxylic acid esterification reaction can be appropriately changed according to the application. That is, when all epoxy groups are esterified with a carboxylic acid, in order that the unreacted epoxy group does not remain, the storage stability as a reactive epoxy carboxylate compound (d) is high. In this case, only the reactivity caused by the introduced double bond is used.

另一方面,亦可將羧酸化合物(b)及化合物(c)之裝填量減量,使殘留未反應之環氧基,藉此複合性地利用所導入之不飽和鍵所致的反應性、及殘留之環氧基所致的反應,例如複合性地利用光陽離子觸媒所致的聚合反應和熱聚合反應。但是,此時需留意就反應性環氧羧酸酯化合物(d)之保存及製造條件進行研討。 On the other hand, it is also possible to reduce the loading amount of the carboxylic acid compound (b) and the compound (c) so that unreacted epoxy groups remain, thereby making use of the reactivity caused by the unsaturated bonds introduced in a complex manner, And the reaction caused by the residual epoxy group, for example, the polymerization reaction and the thermal polymerization reaction caused by the photo-cation catalyst are used in combination. However, at this time, it is necessary to pay attention to the research on storage and production conditions of the reactive epoxy carboxylic acid ester compound (d).

製造不使環氧基殘留之反應性環氧羧酸酯化合物(d)時,相對於環氧樹脂(a)1當量,羧酸化合物(b)及化合物(c)之總計較佳為90至120當量%。若為此範圍,則能夠以比較穩定的條件來製造。羧酸化合物之裝填量較此範圍還多時,因過剩之羧酸化合物(b)及化合物(c)會殘留,故不佳。 When producing a reactive epoxy carboxylic acid ester compound (d) which does not leave an epoxy group, the total of the carboxylic acid compound (b) and the compound (c) is preferably 90 to 1 equivalent to the epoxy resin (a). 120 equivalent%. Within this range, it can be manufactured under relatively stable conditions. If the loading amount of the carboxylic acid compound is more than this range, the excess carboxylic acid compound (b) and the compound (c) remain, which is not preferable.

此外,使環氧基殘留時,相對於環氧樹脂(a)1當量,羧酸化合物(b)及化合物(c)之總計係以20至90當量%為較佳。超出該範圍時,複合硬化之效果變差。當然,此時對於反應中之凝膠化、反應性環氧羧酸酯化合物(d)之經時穩定性需充分地加以留意。 When the epoxy group is left, the total amount of the carboxylic acid compound (b) and the compound (c) is preferably 20 to 90 equivalent% based on 1 equivalent of the epoxy resin (a). Beyond this range, the effect of compound hardening becomes worse. Of course, in this case, it is necessary to pay sufficient attention to the gelation during the reaction and the stability of the reactive epoxy carboxylic acid ester compound (d) with time.

羧酸酯化反應係可在無溶劑下使其反應、亦可以溶劑稀釋而使其反應。在此可使用之溶劑,只要是對於羧酸酯化反應為惰性的溶劑即無特別限定。 The carboxylic acid esterification reaction can be performed without a solvent, or it can be diluted with a solvent and allowed to react. The solvent that can be used here is not particularly limited as long as it is a solvent that is inert to the carboxylic acid esterification reaction.

較佳的溶劑之使用量應依照所得之樹脂的黏度、使用用途而適當調整,惟較佳係固體成分含有率為90至30質量%,更佳係以成為80至50質量%之方式使用。 The use amount of the preferred solvent should be appropriately adjusted according to the viscosity of the obtained resin and the use, but it is more preferably that the solid content content is 90 to 30% by mass, and more preferably that it is used in a manner of 80 to 50% by mass.

就具體例示而言,可舉例如:甲苯、二甲苯、乙基苯、四甲基苯等芳香族系烴溶劑、己烷、辛烷、癸烷等脂肪族系烴溶劑、及其等之混合物的石油醚、白汽油(white gasoline)、溶劑石油腦(solvent naphtha)等、酯系溶劑、醚系溶劑、酮系溶劑等。 Specific examples include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene; aliphatic hydrocarbon solvents such as hexane, octane, and decane; and mixtures thereof. Petroleum ether, white gasoline, solvent naphtha, etc., ester solvents, ether solvents, ketone solvents, etc.

酯系溶劑可列舉:乙酸乙酯、乙酸丙酯、乙酸丁酯等之烷基乙酸酯類、γ-丁內酯等之環狀酯類、乙二醇單甲基醚乙酸酯、二乙二醇單甲基醚單乙酸酯、二乙二醇單乙基醚單乙酸酯、三乙二醇單乙基醚單乙酸酯、二乙二醇單丁基醚單乙酸酯、丙二醇單甲基醚單乙酸酯、丁二醇單甲基醚乙酸酯等單或聚伸烷二醇單烷基醚單乙酸酯類、戊二酸二烷酯、琥珀酸二烷酯、己二酸二烷酯等多 元羧酸烷基酯類等。 Examples of the ester-based solvent include ethyl acetate, alkyl acetates such as propyl acetate, butyl acetate, cyclic esters such as γ-butyrolactone, ethylene glycol monomethyl ether acetate, and diethyl ether. Glycol monomethyl ether monoacetate, diethylene glycol monoethyl ether monoacetate, triethylene glycol monoethyl ether monoacetate, diethylene glycol monobutyl ether monoacetate, Mono- or polyalkylene glycol monoalkyl ether monoacetates such as propylene glycol monomethyl ether monoacetate, butanediol monomethyl ether acetate, dialkyl glutarate, dialkyl succinate, Polycarboxylic acid alkyl esters such as dialkyl adipate.

醚系溶劑可列舉:二乙基醚、乙基丁基醚等之烷基醚類、乙二醇二甲基醚、乙二醇二乙基醚、二丙二醇二甲基醚、二丙二醇二乙基醚、三乙二醇二甲基醚、三乙二醇二乙基醚等甘醇醚類、四氫呋喃等環狀醚類等。 Examples of the ether-based solvent include alkyl ethers such as diethyl ether, ethyl butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, and dipropylene glycol diethyl ether. Glycol ethers, triethylene glycol dimethyl ether, triethylene glycol diethyl ether and other glycol ethers, and cyclic ethers such as tetrahydrofuran.

酮系溶劑可列舉:丙酮、甲乙酮、環己酮、異佛酮等。 Examples of the ketone-based solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.

除此之外,可在後述之反應性多元羧酸化合物(A)以外的反應性化合物(B)(以下亦僅稱為為「反應性化合物(B)」)等單獨或混合有機溶劑中進行。此時,使用作為硬化型樹脂組成物時,可直接利用作為組成物,故為較佳。 In addition, it can be performed in a single or mixed organic solvent such as a reactive compound (B) (hereinafter, also simply referred to as "reactive compound (B)") other than the reactive polycarboxylic acid compound (A) described later. . In this case, when it is used as a curable resin composition, it can be directly used as a composition, so it is preferable.

反應時,為了促進反應,以使用觸媒為較佳,該觸媒之使用量係相對於反應物,亦即相對於環氧樹脂(a)、羧酸化合物(b)及化合物(c)及視需要之溶劑和其他之反應物的總量100質量份,為0.1至10質量份。此時之反應溫度為60至150℃,又,反應時間較佳係5至60小時。可使用之觸媒的具體例,可舉例如:三乙基胺、苯甲基二甲基胺、氯化三乙基銨、溴化苯甲基三甲基銨、碘化苯甲基三甲基銨、三苯基膦、三苯基(triphenylstibine)、甲基三苯基、辛酸鉻、辛酸鋯等已知之一般的鹼性觸媒等。 During the reaction, in order to promote the reaction, it is better to use a catalyst. The amount of the catalyst used is relative to the reactant, that is, relative to the epoxy resin (a), the carboxylic acid compound (b), and the compound (c) and The total amount of the solvent and other reactants as necessary is 100 parts by mass, and is 0.1 to 10 parts by mass. The reaction temperature at this time is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours. Specific examples of usable catalysts include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethyl iodide. Ammonium, triphenylphosphine, triphenylstibine, methyltriphenyl , Known as general alkaline catalysts, such as chromium octoate and zirconium octoate.

又,亦可使用熱聚合抑制劑。熱聚合抑制劑較佳係使用氫醌單甲基醚、2-甲基氫醌、氫醌、二苯基 苦味肼、二苯基胺、3,5-二-第三丁基-4-羥基甲苯等。 A thermal polymerization inhibitor may be used. The thermal polymerization inhibitor is preferably a hydroquinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenylpicrin, diphenylamine, 3,5-di-third-butyl-4-hydroxyl. Toluene, etc.

羧酸酯化反應係可一邊適當地進行取樣,一邊使試樣之酸價成為5mgKOH/g以下,較佳係3mgKOH/g以下之時間點為終點。 The carboxylic acid esterification reaction system can appropriately take a sample while setting the acid value of the sample to 5 mgKOH / g or less, preferably 3 mgKOH / g or less as the end point.

如此方式所得之反應性環氧羧酸酯化合物(d)的較佳之分子量範圍,在GPC中之聚苯乙烯換算重量平均分子量為1,000至50,000之範圍,更佳係2,000至30,000。 The preferred molecular weight range of the reactive epoxy carboxylic acid ester compound (d) obtained in this way is a polystyrene equivalent weight average molecular weight in GPC in the range of 1,000 to 50,000, more preferably 2,000 to 30,000.

小於上述分子量時,無法充分發揮硬化物之強靭性,又,相較於上述分子量為過大時,黏度變高且塗佈等變困難。 When the molecular weight is less than the above molecular weight, the toughness of the cured product cannot be fully exhibited. In addition, when the molecular weight is too large, the viscosity becomes high, and coating and the like become difficult.

其次,詳述酸加成步驟(以下,亦僅稱為「本酸加成反應」)。酸加成步驟之進行目的係依需要將羧基導入在前步驟中所得之反應性環氧羧酸酯化合物(d)中,並獲得反應性多元羧酸化合物(A)。亦即,藉由使羧酸酯化反應所產生之羥基與前述式(2)或式(3)所示之多元酸酐(e)(以下亦僅稱為「多元酸酐(e)」)進行加成反應,以經由酯鍵而導入羧基。 Next, the acid addition step will be described in detail (hereinafter, also referred to simply as "the present acid addition reaction"). The purpose of performing the acid addition step is to introduce a carboxyl group into the reactive epoxy carboxylic acid ester compound (d) obtained in the previous step as necessary, and obtain a reactive polycarboxylic acid compound (A). That is, the hydroxyl group generated by the esterification reaction of the carboxylic acid is added to the polybasic acid anhydride (e) represented by the aforementioned formula (2) or formula (3) (hereinafter also simply referred to as "polybasic acid anhydride (e)"). It reacts to introduce a carboxyl group via an ester bond.

前述式(2)中之碳數1至10的烷基可列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基。前述式(2)中之R1,較佳係氫原子、甲基。 Examples of the alkyl group having 1 to 10 carbon atoms in the formula (2) include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl. R 1 in the formula (2) is preferably a hydrogen atom or a methyl group.

前述多元酸酐(e)較佳係下述式(4)所示之化合物。 The polybasic acid anhydride (e) is preferably a compound represented by the following formula (4).

使前述多元酸酐(e)加成之反應係可藉由在前述羧酸酯化反應液加入多元酸酐(e)來進行。添加量應依照用途而適當地予以變更。 The reaction for adding the polybasic acid anhydride (e) can be performed by adding the polybasic acid anhydride (e) to the carboxylic acid esterification reaction solution. The addition amount should be appropriately changed according to the application.

前述多元酸酐(e)之添加量,例如欲使用本發明之反應性多元羧酸化合物(A)作為鹼水溶液顯影型之阻劑材料時,較佳係以使最終所得之反應性多元羧酸化合物(A)的固體成分酸價(依據JISK5601-2-1:1999)之計算值成為較佳的20至120mg‧KOH/g、更佳的30至110mg‧KOH/g之方式來裝填多元酸酐(e)。此時之固體成分酸價為該範圍時,表示本發明之活性能量線硬化型樹脂組成物的鹼水溶液顯影性顯示良好的顯影性。亦即,圖案化(patterning)性良好及對過顯影之管理幅度亦廣,而且,亦不殘留過剩之酸酐。 The amount of the polybasic acid anhydride (e) to be added, for example, when the reactive polycarboxylic acid compound (A) of the present invention is to be used as an alkaline aqueous solution development-type inhibitor material, it is preferred that the reactive polycarboxylic acid compound finally obtained is used. (A) The calculated value of the solid component acid value (according to JISK5601-2-1: 1999) becomes a preferable 20 to 120 mg‧KOH / g, and a more preferable 30 to 110 mg‧KOH / g to fill the polybasic acid anhydride ( e). When the solid component acid value at this time is within this range, it means that the developability of the alkaline aqueous solution of the active energy ray-curable resin composition of the present invention shows good developability. That is, the patterning property is good and the management of over-development is wide, and there is no excess acid anhydride remaining.

反應時,為了促進反應,以使用觸媒為較佳,相對於反應物、亦即相對於從環氧化合物(a)、羧酸化合物(b)及化合物(c)所得之反應性環氧羧酸酯化合物(d)、及多元酸酐(e)以及依需要之溶劑等其他之反應物的總量,該觸媒之使用量為0.1至10質量份。此時之反應溫度為60至150℃,而且反應時間較佳係5至60小時。可使用之觸媒的具體例可舉例如:三乙基胺、苯甲基 二甲基胺、氯化三乙基銨、溴化苯甲基三甲基銨、碘化苯甲基三甲基銨、三苯基膦、三苯基、甲基三苯基、辛酸鉻、辛酸鋯等。 In the reaction, in order to promote the reaction, it is preferable to use a catalyst, which is relative to the reactant, that is, to the reactive epoxy carboxylic acid obtained from the epoxy compound (a), the carboxylic acid compound (b), and the compound (c). The total amount of the acid ester compound (d), the polybasic acid anhydride (e), and other reactants such as a solvent as needed, the catalyst is used in an amount of 0.1 to 10 parts by mass. The reaction temperature at this time is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours. Specific examples of usable catalysts include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethyliodide Ammonium, triphenylphosphine, triphenyl Methyltriphenyl , Chromium octoate, zirconium octoate, etc.

本酸加成反應係可以無溶劑反應、或者亦可以溶劑稀釋而使其反應。在此可使用之溶劑,只要對於酸加成反應為惰性溶劑即無特別限定。此外,在前步驟之羧酸酯化反應使用溶劑而製造時,在對於該兩種反應為惰性之條件下,可不去除溶劑而直接供給至下個步驟之酸加成反應。可使用之溶劑可為與在羧酸酯化反應所能使用者相同者。 The present acid addition reaction system may be reacted without a solvent or may be diluted with a solvent to cause the reaction. The solvent that can be used here is not particularly limited as long as it is an inert solvent for the acid addition reaction. In addition, when the carboxylic acid esterification reaction in the previous step is produced using a solvent, under conditions that are inert to these two reactions, it can be directly supplied to the acid addition reaction in the next step without removing the solvent. The solvent that can be used may be the same as that which can be used by the carboxylic acid esterification reaction.

較佳的溶劑之使用量應依照所得之樹脂的黏度、使用用途而予以適當調整,惟較佳係相對於固體成分含有率係使用90至30質量%,更佳係使用80至50質量%。 The amount of the preferred solvent should be appropriately adjusted in accordance with the viscosity of the obtained resin and the use, but it is more preferably that the solid content content is 90 to 30% by mass, and more preferably 80 to 50% by mass.

除此之外,亦可在前述反應性化合物(B)等單獨或混合有機溶劑中進行。此時,使用作為硬化型樹脂組成物時,可直接利用作為組成物,故為較佳。 Alternatively, it may be performed in a single or mixed organic solvent such as the aforementioned reactive compound (B). In this case, when it is used as a curable resin composition, it can be directly used as a composition, so it is preferable.

又,熱聚合抑制劑等較佳係使用與前述羧酸酯化反應中之例示相同者。 The thermal polymerization inhibitor and the like are preferably the same as those exemplified in the carboxylic acid esterification reaction.

本酸加成反應係適當地進行取樣,同時將反應物之酸價成為所設定之酸價的±10%的範圍之點設為終點。 In the present acid addition reaction, sampling is appropriately performed, and at the same time, the point at which the acid value of the reactant becomes a range of ± 10% of the set acid value is set as the end point.

如此方式所得之反應性多元羧酸化合物(A)的較佳分子量範圍,在GPC中之聚苯乙烯換算重量平均 分子量為500至50,000之範圍,更佳係1,000至30,000,特佳係1000至10000。 The preferred molecular weight range of the reactive polycarboxylic acid compound (A) obtained in this way is a polystyrene-equivalent weight average molecular weight in GPC ranging from 500 to 50,000, more preferably 1,000 to 30,000, and particularly preferably 1,000 to 10,000. .

小於上述分子量時,無法充分發揮硬化物之強靭性,又,相較於上述分子量為過大時,黏度變高,塗佈等變困難。 When the molecular weight is smaller than the above molecular weight, the toughness of the hardened material cannot be fully exerted. In addition, when the molecular weight is too large, the viscosity becomes high, and coating and the like become difficult.

在本發明可使用之反應性化合物(B)的具體例,可舉例如自由基反應型之丙烯酸酯類、陽離子反應型之其他環氧化合物類、對該兩者感應之乙烯化合物類等所謂之反應性寡聚物類。 Specific examples of the reactive compound (B) usable in the present invention include so-called free radical reactive acrylates, cation reactive other epoxy compounds, and ethylene compounds which are sensitive to both. Reactive oligomers.

可使用之丙烯酸酯類可列舉:單官能(甲基)丙烯酸酯類、多官能(甲基)丙烯酸酯類、其他環氧丙烯酸酯、聚酯丙烯酸酯、胺甲酸乙酯丙烯酸酯等。 Examples of usable acrylates include monofunctional (meth) acrylates, polyfunctional (meth) acrylates, other epoxy acrylates, polyester acrylates, and urethane acrylates.

單官能(甲基)丙烯酸酯類可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸月桂酯、聚乙二醇(甲基)丙烯酸酯、聚乙二醇(甲基)丙烯酸酯單甲基醚、(甲基)丙烯酸苯基乙酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸四氫呋喃甲酯等。 Examples of monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, lauryl (meth) acrylate, and polyethylene glycol (formaldehyde). Base) acrylate, polyethylene glycol (meth) acrylate monomethyl ether, phenylethyl (meth) acrylate, isoamyl (meth) acrylate, cyclohexyl (meth) acrylate, (formyl) Group) benzyl acrylate, tetrahydrofuran methyl (meth) acrylate, and the like.

多官能(甲基)丙烯酸酯類可列舉:丁二醇二(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、壬二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、二乙烯基二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、參(甲基)丙烯醯基氧乙基三聚異氰酸酯、聚丙二醇二(甲基)丙烯酸酯、己二酸環氧二(甲基)丙 烯酸酯、雙酚環氧乙烷二(甲基)丙烯酸酯、氫化雙酚環氧乙烷二(甲基)丙烯酸酯、雙酚二(甲基)丙烯酸酯、羥基三甲基乙酸新戊二醇之ε-己內酯加成物的二(甲基)丙烯酸酯、二新戊四醇與ε-己內酯之反應物的聚(甲基)丙烯酸酯、二新戊四醇聚(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥乙基丙烷三(甲基)丙烯酸酯及其環氧乙烷加成物、新戊四醇三(甲基)丙烯酸酯及其環氧乙烷加成物、新戊四醇四(甲基)丙烯酸酯及其環氧乙烷加成物、二新戊四醇六(甲基)丙烯酸酯及其環氧乙烷加成物等。 Examples of polyfunctional (meth) acrylates include butanediol di (meth) acrylate, hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and nonanediol di (Meth) acrylate, ethylene glycol di (meth) acrylate, divinyl di (meth) acrylate, polyethylene glycol di (meth) acrylate, ginsyl (meth) acryl fluorenyloxy Ethyl tripolyisocyanate, polypropylene glycol di (meth) acrylate, adipic acid epoxy di (meth) acrylate, bisphenol ethylene oxide di (meth) acrylate, hydrogenated bisphenol ethylene oxide Di (meth) acrylate, bisphenol di (meth) acrylate, bis- (meth) acrylate of ε-caprolactone adduct of neopentyl glycol of hydroxytrimethylacetate, dipentaerythritol Poly (meth) acrylates reacting with ε-caprolactone, dipentaerythritol poly (meth) acrylate, trimethylolpropane tri (meth) acrylate, trihydroxyethylpropane tri (Meth) acrylate and its ethylene oxide adduct, neopentaerythritol tri (meth) acrylate and its ethylene oxide adduct, neopentaerythritol tetra (meth) acrylate and its Ethylene oxide adduct, Dipentaerythritol hexa (meth) acrylate and its ethylene oxide adduct.

可使用之乙烯基化合物類可列舉:乙烯醚類、苯乙烯類、其他乙烯化合物。乙烯醚類可列舉:乙基乙烯醚、丙基乙烯醚、羥基乙基乙烯醚、乙二醇二乙烯醚等。苯乙烯類可列舉:苯乙烯、甲基苯乙烯、乙基苯乙烯等。其他乙烯化合物可列舉:三烯丙基三聚異氰酸酯、三甲基烯丙基三聚異氰酸酯等。 Usable vinyl compounds include vinyl ethers, styrenes, and other vinyl compounds. Examples of the vinyl ethers include ethyl vinyl ether, propyl vinyl ether, hydroxyethyl vinyl ether, and ethylene glycol divinyl ether. Examples of the styrenes include styrene, methylstyrene, and ethylstyrene. Examples of other ethylene compounds include triallyl trimer isocyanate, trimethylallyl trimer isocyanate, and the like.

再者,所謂之反應性寡聚物類可列舉:在同一分子內兼具對活性能量線可官能化之官能基及胺甲酸乙酯鍵的胺甲酸乙酯丙烯酸酯、在同一分子內兼具同樣地對於活性能量線為可官能化之官能基及酯鍵的聚酯丙烯酸酯、在同一分子內兼具衍生自其他環氧樹脂且對於活性能量線為可官能化之官能基的環氧丙烯酸酯、可複合性地使用此等鍵結之反應性寡聚物等。 Examples of the so-called reactive oligomers include urethane acrylate having both a functional group capable of functionalizing an active energy ray and a urethane bond in the same molecule, and having both urethane bonds in the same molecule. Similarly, for polyester acrylates whose active energy ray is a functionalizable functional group and an ester bond, epoxy acrylic acid which has both derived from other epoxy resins in the same molecule and which is a functional group functionalizable for active energy ray. Esters, reactive oligomers, and the like that can be used in combination.

又,陽離子反應型單體只要為一般具有環氧基之化合物即無特別限定。可舉例如(甲基)丙烯酸縮水 甘油基酯、甲基縮水甘油基醚、乙基縮水甘油基醚、丁基縮水甘油基醚、雙酚A二縮水甘油基醚、3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯(UNION CARBIDE公司製「CYRACURE UVR-6110」等)、3,4-環氧環己基乙基-3,4-環氧環己烷羧酸酯、乙烯環己烯二環氧化物(UNION CARBIDE公司製「ELR-4206」等)、檸檬烯二環氧化物(DAICEL化學工業公司製「CELLOXIDE 3000」等)、烯丙基環己烯二環氧化物、3,4-環氧基-4-甲基環己基-2-環氧丙烷、2-(3,4-環氧環己基-5,5-螺-3,4-環氧基)環己烷-間二烷、雙(3,4-環氧環己基)己二酸酯(UNION CARBIDE公司製「CYRACURE UVR-6128」等)、雙(3,4-環氧環己基甲基)己二酸酯、雙(3,4-環氧環己基)醚、雙(3,4-環氧環己基甲基)醚、雙(3,4-環氧環己基)二乙基矽氧烷等。 The cation-reactive monomer is not particularly limited as long as it is a compound generally having an epoxy group. For example, glycidyl (meth) acrylate, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, bisphenol A diglycidyl ether, 3,4-epoxy ring Hexylmethyl-3,4-epoxycyclohexane carboxylate ("CYRACURE UVR-6110" manufactured by UNION CARBIDE, etc.), 3,4-epoxycyclohexylethyl-3,4-epoxycyclohexane Carboxylic acid ester, ethylene cyclohexene diepoxide ("ELR-4206" manufactured by UNION CARBIDE, etc.), limonene diepoxide ("CELLOXIDE 3000" manufactured by DAICEL Chemical Industries, etc.), allyl cyclohexene di Epoxide, 3,4-epoxy-4-methylcyclohexyl-2-propylene oxide, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy Cyclohexane-Meta Alkane, bis (3,4-epoxycyclohexyl) adipate ("CYRACURE UVR-6128" manufactured by UNION CARBIDE, etc.), bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4-epoxycyclohexyl) ether, bis (3,4-epoxycyclohexylmethyl) ether, bis (3,4-epoxycyclohexyl) diethylsiloxane, and the like.

此等之中,反應性化合物(B)最佳係自由基硬化型之丙烯酸酯類。為陽離子型時,因羧酸會與環氧基反應,故必須設為2液混合型。 Among these, the reactive compound (B) is preferably a radical curing type acrylate. When it is a cationic type, a carboxylic acid and an epoxy group react, so it must be a two-liquid mixed type.

使本發明之反應性多元羧酸化合物(A)與其他之反應性化合物(B)混合而獲得本發明之活性能量線硬化型樹脂組成物。此時,亦可依照用途而適當加入其他成分。 The reactive polycarboxylic acid compound (A) of the present invention is mixed with other reactive compounds (B) to obtain an active energy ray-curable resin composition of the present invention. At this time, other components may be appropriately added depending on the application.

本發明之活性能量線硬化型樹脂組成物,在組成物中含有反應性多元羧酸化合物(A)97至5質量份,較佳係87至10質量份,其他反應性化合物(B)3至 95質量份,更佳係3至90質量份。依需要可含有其他之成分0至80質量份。 The active energy ray-curable resin composition of the present invention contains 97 to 5 parts by mass of the reactive polycarboxylic acid compound (A), preferably 87 to 10 parts by mass, and the other reactive compounds (B) from 3 to 95 parts by mass, more preferably 3 to 90 parts by mass. It may contain 0 to 80 mass parts of other components as needed.

此外,以使本發明之活性能量線硬化型樹脂組成物適合於各種用途為目的,亦可在組成物中以70重量份為上限而加入其他成分。其他成分可列舉光聚合起始劑、其他之添加劑、著色材料、硬化促進劑、以及以賦予適塗佈性等為目的而用以調整黏度所添加之揮發性溶劑等。於下述例示可使用之其他成分。 In addition, for the purpose of making the active energy ray-curable resin composition of the present invention suitable for various uses, other components may be added to the composition with an upper limit of 70 parts by weight. Other components include a photopolymerization initiator, other additives, a coloring material, a hardening accelerator, and a volatile solvent added to adjust viscosity for the purpose of imparting suitable coating properties and the like. Other components that can be used are exemplified below.

本發明之活性能量線硬化型樹脂組成物可更含有光聚合起始劑。光聚合起始劑較佳係自由基型光聚合起始劑、陽離子系光聚合起始劑。 The active energy ray-curable resin composition of the present invention may further contain a photopolymerization initiator. The photopolymerization initiator is preferably a radical photopolymerization initiator or a cationic photopolymerization initiator.

自由基型光聚合起始劑可舉例如苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻丙基醚、苯偶姻異丁基醚等苯偶姻類;乙醯苯、2,2-二乙氧基-2-苯基乙醯苯、1,1-二氯乙醯苯、2-羥基-2-甲基-苯基丙烷-1-酮、二乙氧基乙醯苯、1-羥基環己基苯基酮、2-甲基-1-〔4-(甲基硫)苯基〕-2-嗎啉基-丙烷-1-酮等乙醯苯類;2-乙基蒽醌、2-第三丁基蒽醌、2-氯蒽醌、2-戊基蒽醌等蒽醌類;2,4-二乙基硫雜蒽酮、2-異丙基硫雜蒽酮、2-氯硫雜蒽酮等硫雜蒽酮類;乙醯苯二甲基縮醛、苯甲基二甲基縮醛等縮醛類;二苯甲酮、4-苯甲醯基-4’-甲基二苯基硫醚、4,4’-雙甲基胺基二苯甲酮等二苯甲酮類;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等氧化膦類等公知一般的自由基型光聚合起始劑。 Examples of the radical-type photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether and the like; Toluene, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone, 2-hydroxy-2-methyl-phenylpropane-1-one, diethoxy Acetophenones such as ethylacetophenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinyl-propane-1-one; Anthraquinones such as 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-chloroanthraquinone, and 2-pentylanthraquinone; 2,4-diethylthioanthrone, 2-isopropyl Zanthrones such as thiaxanthone, 2-chlorothioxanthone; acetals such as acetophenone dimethyl acetal, benzyl dimethyl acetal; benzophenone, 4-benzoyl Benzophenones such as fluorenyl-4'-methyldiphenylsulfide, 4,4'-bismethylaminobenzophenone; 2,4,6-trimethylbenzylbenzophenone Well-known general radical photopolymerization initiators, such as phosphine oxides, phosphine oxides, such as bis (2,4,6-trimethylbenzyl) -phenylphosphine oxide, and the like.

此外,陽離子系光聚合起始劑可列舉:路易斯酸之重氮鹽、路易斯酸之錪鹽、路易斯酸之鋶鹽、路易斯酸之鏻鹽、其他之鹵化物、三系起始劑、硼酸鹽系起始劑及其他之光酸產生劑等。 Examples of the cationic photopolymerization initiator include diazonium salts of Lewis acids, phosphonium salts of Lewis acids, phosphonium salts of Lewis acids, phosphonium salts of Lewis acids, other halides, and Based initiators, borate based initiators, and other photoacid generators.

路易斯酸之重氮鹽可列舉:對甲氧基苯基重氮氟磷酸鹽、N,N-二乙基胺基苯基重氮六氟磷酸鹽(三新化學工業公司製Sunaid SI-60L/SI-80L/SI-100L等)等,路易斯酸之錪鹽可列舉:二苯基錪六氟磷酸鹽、二苯基錪六氟銻酸鹽等,路易斯酸之鋶鹽可列舉:三苯基鋶六氟磷酸鹽(Union Carbide公司製Cyracure UVI-6990等)、三苯基鋶六氟銻酸鹽(Union Carbide公司製Cyracure UVI-6974等)等,路易斯酸之鏻鹽可列舉:三苯基鏻六氟銻酸鹽等。 Examples of the diazonium salt of Lewis acid include p-methoxyphenyldiazofluorophosphate, N, N-diethylaminophenyldiazohexafluorophosphate (Sunaid SI-60L / manufactured by Sanxin Chemical Industry Co., Ltd.) SI-80L / SI-100L, etc.), examples of phosphonium salts of Lewis acids include diphenyl sulfonium hexafluorophosphate, diphenyl sulfonium hexafluoroantimonate, etc., and examples of phosphonium salts of Lewis acid include triphenyl Samarium hexafluorophosphate (Cyracure UVI-6990, manufactured by Union Carbide, etc.), triphenyl samarium hexafluoroantimonate (Cyracure UVI-6974, manufactured by Union Carbide, etc.), etc. Examples of the phosphonium salts of Lewis acids include triphenyl鏻 Hexafluoroantimonate and so on.

其他之鹵化物可列舉:2,2,2-三氯-〔1-4’-(二甲基乙基)苯基〕乙酮(AKZO公司製Trigonal PI等)、2,2-二氯-1-4-(苯氧基苯基)乙酮(Sandoz公司製Sandray1000等)、α,α,α-三溴甲基苯基碸(製鐵化學公司製BMPS等)等。三系起始劑可列舉:2,4,6-參(三氯甲基)-三、2,4-三氯甲基-(4’-甲氧基苯基)-6-三(Panchim公司製Triazine A等)、2,4-三氯甲基-(4’-甲氧基苯乙烯基)-6-三(Panchim公司製Triazine PMS等)、2,4-三氯甲基-(胡椒基)-6-三(Panchim公司製Triazine PP等)、2,4-三氯甲基-(4’-甲氧基萘基)-6-三(Panchim公司製Triazine B等)、2〔2’(5- 甲基呋喃基)亞乙基〕-4,6-雙(三氯甲基)-均三(三和化學公司製等)、2(2’-呋喃基亞乙基)-4,6-雙(三氯甲基)-均三(三和化學公司製)等。 Other halides include 2,2,2-trichloro- [1-4 '-(dimethylethyl) phenyl] ethanone (Trigonal PI, etc., manufactured by AKZO Corporation), and 2,2-dichloro- 1-4- (phenoxyphenyl) ethanone (Sandray1000, manufactured by Sandoz, etc.), α, α, α-tribromomethylphenylphosphonium (BMPS, etc. manufactured by Iron Chemicals Corporation), and the like. three Examples of system initiators: 2,4,6-ginseng (trichloromethyl) -tris , 2,4-trichloromethyl- (4'-methoxyphenyl) -6-tri (Triazine A, etc., manufactured by Panchim), 2,4-trichloromethyl- (4'-methoxystyryl) -6-tri (Triazine PMS, etc., manufactured by Panchim), 2,4-trichloromethyl- (piperyl) -6-tri (Triazine PP, etc., manufactured by Panchim), 2,4-trichloromethyl- (4'-methoxynaphthyl) -6-tri (Triazine B, etc., manufactured by Panchim), 2 [2 '(5-methylfuranyl) ethylene] -4,6-bis (trichloromethyl) -mesanthine (Manufactured by Sanwa Chemical Co., Ltd.), 2 (2'-furanylethylene) -4,6-bis (trichloromethyl) -mesan (Manufactured by Sanwa Chemical Co., Ltd.).

硼酸鹽系光聚合起始劑可舉例如:日本感光色素製NK-3876及NK-3881等,其他之光酸產生劑等可舉例如9-苯基吖啶、2,2’-雙(鄰氯苯基)-4,4’,5,5’-四苯基-1,2-聯咪唑(黑金化成公司製聯咪唑等)、2,2-偶氮雙(2-胺基-丙烷)二氫氯化物(和光純藥公司製V50等)、二氫氯化2,2-偶氮雙〔2-(咪唑啉-2基)丙烷〕(和光純藥公司製VA044等)、〔η-5-2-4-(環十五基)(1,2,3,4,5,6,η)-(甲基乙基)-苯〕鐵(II)六氟磷酸鹽(Ciba Geigy公司製Irgacure261等)、雙(y5-環戊二烯基)雙〔2,6-二氟-3-(1H-吡咯-1-基)苯基〕鈦(Ciba Geigy公司製CGI-784等)等。 Examples of the borate-based photopolymerization initiator include NK-3876 and NK-3881 made by Japan Photosensitivity Pigment, and other photoacid generators include 9-phenylacridine, 2,2'-bis (ortho) (Chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2-biimidazole (biimidazole produced by Kurojin Kasei Co., Ltd.), 2,2-azobis (2-amino-propane) Dihydrochloride (V50 manufactured by Wako Pure Chemical Industries, Ltd.), 2,2-azobis [2- (imidazolin-2yl) propane] dihydrochloride (VA044 manufactured by Wako Pure Chemical Industries, etc.), [η- 5-2-4- (cyclopentadecyl) (1,2,3,4,5,6, η)-(methylethyl) -benzene] iron (II) hexafluorophosphate (manufactured by Ciba Geigy) Irgacure261, etc.), bis (y5-cyclopentadienyl) bis [2,6-difluoro-3- (1H-pyrrole-1-yl) phenyl] titanium (CGI-784, manufactured by Ciba Geigy, etc.) and the like.

此外,亦可併用偶氮雙異丁腈等偶氮系起始劑、過氧化苯甲醯等對熱感應的過氧化物系自由基型起始劑等。又,亦可併用自由基系與陽離子系之兩種光聚合起始劑。光聚合起始劑可單獨使用1種,亦可將2種以上併用。 In addition, an azo-based initiator such as azobisisobutyronitrile, a peroxide-based radical initiator such as benzamidine peroxide, and the like, which are thermally sensitive, may be used in combination. In addition, two types of photopolymerization initiators of a radical type and a cationic type may be used in combination. The photopolymerization initiator may be used singly or in combination of two or more kinds.

此等之中,考量本發明之反應性多元羧酸化合物(A)的特性,則以自由基型光聚合起始劑為特佳。 Among these, in consideration of the characteristics of the reactive polycarboxylic acid compound (A) of the present invention, a radical-type photopolymerization initiator is particularly preferred.

再者,本發明之活性能量線硬化型樹脂組成物可含有著色顏料。著色顏料例如亦可使用不以著色為目的之所謂的體質顏料。可舉例如:滑石、硫酸鋇、碳酸 鈣、碳酸鎂、鈦酸鋇、氫氧化鋁、二氧化矽、黏土等。 The active energy ray-curable resin composition of the present invention may contain a colored pigment. As the coloring pigment, for example, a so-called extender pigment that is not used for coloring can be used. Examples include talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, aluminum hydroxide, silicon dioxide, clay, and the like.

再者,本發明之活性能量線硬化型樹脂組成物依需要可含有其他之添加劑。其他之添加劑可使用例如:三聚氰胺等熱硬化觸媒、Aerosil等搖變賦予劑、聚矽氧系、氟系之調平劑和消泡劑、氫醌、氫醌單甲基醚等聚合抑制劑、穩定劑、抗氧化劑等。 Furthermore, the active energy ray-curable resin composition of the present invention may contain other additives as necessary. Other additives can be used, for example, thermosetting catalysts such as melamine, shake-imparting agents such as Aerosil, polysiloxane-based, fluorine-based leveling agents and defoamers, polymerization inhibitors such as hydroquinone, hydroquinone monomethyl ether, and the like. , Stabilizers, antioxidants, etc.

其他對活性能量線不顯示反應性之樹脂類(所謂的惰性聚合物)亦可使用例如其他之環氧樹脂、酚樹脂、胺甲酸乙酯樹脂、聚酯樹脂、酮甲醛樹脂、甲酚樹脂、二甲苯樹脂、苯二甲酸二烯丙酯樹脂、苯乙烯樹脂、胍胺樹脂、天然及合成橡膠、丙烯酸樹脂、聚烯烴樹脂、及此等之改性物。此等係以在樹脂組成物中以至40質量份為止之範圍使用為較佳。 Other resins (so-called inert polymers) that do not show reactivity to the active energy ray can also use other epoxy resins, phenol resins, urethane resins, polyester resins, ketone-formaldehyde resins, cresol resins, Xylene resin, diallyl phthalate resin, styrene resin, guanamine resin, natural and synthetic rubber, acrylic resin, polyolefin resin, and modified products thereof. These are preferably used in the resin composition in a range of up to 40 parts by mass.

特別是欲在阻焊劑用途使用反應性多元羧酸化合物(A)時,較佳係使用公知一般之環氧樹脂作為對活性能量線不顯示反應性之樹脂類。其在藉由活性能量線之反應、硬化後仍會殘留源自反應性多元羧酸化合物(A)之羧基,就結果而言,其硬化物係耐水性、水解性差。因此,藉由使用環氧樹脂,使殘留之羧基進一步羧酸酯化,形成更牢固的交聯構造。該公知一般之環氧樹脂可使用前述陽離子反應型單體。 In particular, when a reactive polycarboxylic acid compound (A) is to be used for a solder resist application, it is preferable to use a known general epoxy resin as a resin which does not exhibit reactivity to active energy rays. The carboxyl group derived from the reactive polycarboxylic acid compound (A) remains after hardening by the reaction of the active energy ray, and as a result, the cured product is poor in water resistance and hydrolysis resistance. Therefore, by using an epoxy resin, the remaining carboxyl group is further carboxylated to form a stronger crosslinked structure. The known general epoxy resin can use the aforementioned cationic reactive monomer.

又,依照使用目的,就調整黏度之目的而言,亦可在樹脂組成物中在至50質量份、更佳係至35質量份為止之範圍中添加揮發性溶劑。 In addition, depending on the purpose of use, for the purpose of adjusting the viscosity, a volatile solvent may be added to the resin composition in a range of up to 50 parts by mass, more preferably up to 35 parts by mass.

本發明之活性能量線硬化型樹脂組成物係藉由活性能量線而容易地硬化。此處,活性能量線之具體例可列舉:紫外線、可見光線、紅外線、X射線、γ射線、雷射光線等電磁波、α射線、β射線、電子射線等粒子線等。考量本發明之適宜的用途時,此等之中,較佳為紫外線、雷射光線、可見光線、或電子射線。 The active energy ray-curable resin composition of the present invention is easily hardened by active energy rays. Specific examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays, and laser rays, particle rays such as alpha rays, beta rays, and electron rays. In consideration of a suitable application of the present invention, among these, ultraviolet rays, laser rays, visible rays, or electron rays are preferred.

在本發明中所謂成形用材料係指於「將未硬化之組成物置入模具內,或壓附模具,使物體成形後,藉由活性能量線引起硬化反應並使其成形者」或是「對未硬化之組成物照射雷射等焦點光等而引起硬化反應並使其成形」之用途所使用之材料。 In the present invention, the material for molding refers to "the person who puts an unhardened composition into a mold, or press-fits the mold to shape an object, and causes a hardening reaction by active energy rays to shape it" or "the "Uncured composition is irradiated with focus light such as laser to cause curing reaction"

具體的用途係可列舉成形為平面狀之薄片、用以保護元件之密封材、對未硬化之組成物壓抵經微細加工之「模具」而進行微細成形之所謂奈米印刷材料、進一步之特別是在熱方面要求嚴苛之發光二極體、光電轉換元件等之周邊密封材料等的用途。 Specific applications include flat sheets, sealing materials to protect components, so-called nano-printing materials that are formed by pressing a non-hardened composition against a micro-molded "mold", and further forming a special shape. It is used for peripheral sealing materials such as light-emitting diodes, photoelectric conversion elements, etc., where thermal requirements are severe.

在本發明中所謂的皮膜形成用材料係以被覆基材表面作為目的而應用者。具體的用途係可作為:凹版印墨、柔版印墨、絲網印墨、套版印墨等之印墨材料;硬塗層、上塗層、罩印、透明塗層等之塗佈材料;積層用、光碟用之其他各種接著劑、黏著劑等之接著材料;阻焊劑、蝕刻阻劑、微機器用阻劑等之阻劑材料等。再者,將皮膜形成用材料暫時性塗佈於剝離性基材並膜化之後,貼合於原本目的之基材並形成皮膜之所謂乾膜,亦可作為皮膜形 成用材料。 The material for forming a film in the present invention is applied for the purpose of covering the surface of a substrate. Specific uses can be used as: gravure printing ink, flexographic printing ink, screen printing ink, overprint printing ink and other printing materials; hard coating, top coating, overprint, transparent coating and other coating materials ; Adhesive materials for lamination and other various adhesives and adhesives for optical discs; resist materials such as solder resist, etching resist, micro-machine resist, etc. Further, a so-called dry film, which is formed by temporarily applying a film-forming material to a peelable substrate and forming a film, and then attaching it to the original substrate to form a film, can also be used as a film-forming material.

本發明也包括對前述硬化型樹脂組成物照射活性能量線所得之硬化物,而且亦包括具有該硬化物之層的多層材料。 The present invention also includes a hardened material obtained by irradiating the hardened resin composition with active energy rays, and also includes a multilayer material having a layer of the hardened material.

此等之中,藉由導入反應性多元羧酸化合物(A)之羧基,對基材之密著性會提高,故較佳係使用作為用以被覆塑膠基材或金屬基材之用途。 Among these, the introduction of the carboxyl group of the reactive polycarboxylic acid compound (A) improves the adhesion to the substrate, and therefore it is preferably used for coating a plastic substrate or a metal substrate.

再者,活用未反應之反應性多元羧酸化合物(A)對於鹼水溶液為可溶性之特徴而使用作為鹼水顯影型阻劑材料組成物亦為佳。 Furthermore, it is also preferable to use an unreacted reactive polycarboxylic acid compound (A) as an alkali aqueous development type resist material composition, which is soluble in an alkaline aqueous solution.

在本發明中所謂的阻劑材料組成物係指在基材上形成該組成物之皮膜層,其後,局部地照射紫外線等活性能量線,並欲利用照射部、未照射部之物理性質的差異而進行描繪之活性能量線感應型的組成物。具體而言,係使照射部或未照射部以某些方法,例如以溶劑等、鹼溶液等使溶解等而去除,並以進行描繪作為目的所使用之組成物。 The term “resistive material composition” as used in the present invention refers to a film layer on which the composition is formed on a substrate, and thereafter, active energy rays such as ultraviolet rays are locally irradiated, and the physical properties of the irradiated portion and the unirradiated portion are used. An active energy ray-sensitive composition for drawing a difference. Specifically, it is a composition used for the purpose of rendering the irradiated part or unirradiated part by some methods, for example, dissolving it with a solvent or the like, an alkali solution, or the like, and drawing it.

本發明之阻劑材料組成物的活性能量線硬化型樹脂組成物係可應用於可圖案化之各種材料,例如,特別是有用於阻焊劑材料、增層(build up)工法用之層間絕緣材,亦可進一步作為光波導而利用於如印刷電路板、光電子基板、光基板之電性/電子/光基材等。 The active energy ray-curable resin composition of the resist material composition of the present invention can be applied to various materials that can be patterned, for example, interlayer insulation materials used in solder resist materials and build-up methods It can also be used as an optical waveguide for electrical / electronic / optical substrates such as printed circuit boards, optoelectronic substrates, and optical substrates.

特別適宜的用途係可活用耐熱性或顯影性為良好之特性,而廣泛使用於感光性膜、附支撐物之感光 性膜、預浸物等絕緣樹脂片、電路基板(積層板用途、多層印刷電路板用途等)、阻焊劑、底部填充材、黏晶(die bonding)材、半導體封裝材、填縫樹脂、構件鑲埋樹脂等需要樹脂組成物之用途。其中,因為即使在高顏料濃度中亦可發揮良好的顯影性,故亦可適合使用於彩色阻劑、濾色片用之阻劑材料、特別是黑色基質材料等。 Particularly suitable applications are those that can make good use of heat resistance or developability, and are widely used for insulating resin sheets such as photosensitive films, photosensitive films with supports, prepregs, circuit boards (multilayer board applications, multilayer printing Circuit board applications, etc.), solder resist, underfill materials, die bonding materials, semiconductor packaging materials, caulking resins, component embedding resins and other applications that require resin compositions. Among them, since good developability can be exhibited even at a high pigment concentration, it can be suitably used for a color resist, a resist material for a color filter, and particularly a black matrix material.

再者,亦可適合使用在多層印刷電路板之絕緣層用樹脂組成物(以感光性樹脂組成物之硬化物作為絕緣層之多層印刷電路板)、層間絕緣層用樹脂組成物(以感光性樹脂組成物之硬化物作為層間絕緣層之多層印刷電路板)、鍍覆形成用樹脂組成物(在感光性樹脂組成物之硬化物上形成有鍍覆之多層印刷電路板)等。 Furthermore, a resin composition for an insulating layer of a multilayer printed circuit board (a multilayer printed circuit board using a cured product of a photosensitive resin composition as an insulating layer) and a resin composition for an interlayer insulating layer (with a photosensitive composition) can also be suitably used. A hardened body of the resin composition is a multilayer printed wiring board as an interlayer insulating layer), a resin composition for plating formation (a multilayered printed circuit board having a plating formed on a hardened body of the photosensitive resin composition), and the like.

使用本發明之活性能量線硬化型樹脂組成物的圖案化,例如可以如下之方式進行。在基板上以網版印刷法、噴塗法、輥塗法、靜電塗裝法、簾幕塗佈法、旋轉塗佈法等方法以0.1至200μm之膜厚塗佈本發明之活性能量線硬化型樹脂組成物,使塗膜通常在50至110℃,較佳係在60至100℃之溫度乾燥,藉此可形成塗膜。其後,經由形成有曝光圖案之光罩而對塗膜直接或間接地以通常10至2000mJ/cm2左右的強度照射紫外線等高能量線,使用後述之顯影液,藉由例如噴塗、振動浸漬、覆液(puddle)、刷塗等獲得所希望之圖案。 Patterning using the active energy ray-curable resin composition of the present invention can be performed, for example, as follows. The active energy ray hardening type of the present invention is coated on a substrate by a screen printing method, a spray coating method, a roll coating method, an electrostatic coating method, a curtain coating method, a spin coating method and the like at a film thickness of 0.1 to 200 μm. The resin composition allows the coating film to be dried at a temperature of usually 50 to 110 ° C, preferably 60 to 100 ° C, thereby forming a coating film. Thereafter, the coating film is directly or indirectly irradiated with high-energy rays such as ultraviolet rays through the photomask formed with an exposure pattern at an intensity of usually about 10 to 2000 mJ / cm 2, and a developing solution to be described later is used, for example, by spray coating or vibration immersion. , Puddle, brushing, etc. to obtain the desired pattern.

上述顯影所使用之鹼水溶液可使用:氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、 磷酸鈉、磷酸鉀等無機鹼水溶液,氫氧化四甲基銨、氫氧化四乙基銨、氫氧化四丁基銨、單乙醇胺、二乙醇胺、三乙醇胺等有機鹼水溶液。在該水溶液中,可更含有有機溶劑、緩衝劑、錯合劑、染料或顏料。 The alkali aqueous solution used for the above development can be used: potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium phosphate, potassium phosphate and other inorganic alkali aqueous solutions, tetramethylammonium hydroxide, hydrogen Aqueous organic bases such as tetraethylammonium oxide, tetrabutylammonium hydroxide, monoethanolamine, diethanolamine, and triethanolamine. The aqueous solution may further contain an organic solvent, a buffer, a complexing agent, a dye, or a pigment.

此外,特別適宜使用於要求以活性能量線所致之硬化反應前之機械強度的乾膜用途。亦即,因本發明所用之環氧樹脂(a)的羥基、環氧基之平衡係在特定之範圍,故儘管本發明之反應性多元羧酸化合物(A)為比較高之分子量,依然可發揮良好的顯影性。 In addition, it is particularly suitable for dry film applications that require mechanical strength before the hardening reaction caused by active energy rays. That is, since the balance between the hydroxyl group and the epoxy group of the epoxy resin (a) used in the present invention is in a specific range, the reactive polycarboxylic acid compound (A) of the present invention can still be used despite its relatively high molecular weight. Show good developability.

形成皮膜之方法無特別限制,但可任意採用凹版等之凹版印刷方式、柔版等之凸版印刷方式、絲網等之孔版印刷方式、套版等之平版印刷方式、輥塗佈器、刮刀塗佈器、模塗佈器、簾幕式塗佈器、旋轉塗佈器等各種塗佈方式。 The method for forming a film is not particularly limited, but gravure printing methods such as gravure, letterpress printing methods such as flexographic printing, stencil printing methods such as screen printing, lithographic printing methods such as register, roll coater, doctor blade coating Various coating methods such as cloth applicators, die applicators, curtain applicators, and spin applicators.

本發明之活性能量線硬化型樹脂組成物的硬化物係指對本發明之活性能量線硬化型樹脂組成物照射活性能量線並使其硬化者。 The cured product of the active energy ray-curable resin composition of the present invention refers to an active energy ray-curable resin composition of the present invention which is irradiated with an active energy ray and hardened.

經塗覆本發明之活性能量線硬化型樹脂組成物的物品係表示使本發明中所示之活性能量線硬化型樹脂組成物在基材上形成皮膜並硬化,而得到至少由二層以上之層而成的材料。 The article coated with the active energy ray-curable resin composition of the present invention means that the active energy ray-curable resin composition shown in the present invention is formed on a substrate and hardened to obtain at least two or more layers. Layered material.

[實施例][Example]

以下,藉實施例更詳細說明本發明,但本發明不受此等實施例限定。此外,實施例中,只要無特別 聲明,%即表示質量%。 Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited by these examples. In the examples, unless otherwise stated,% means% by mass.

軟化點、環氧當量、酸價係以如下之條件進行測定。 The softening point, epoxy equivalent, and acid value were measured under the following conditions.

1)環氧當量:以依據JISK7236:2001之方法測定。 1) Epoxy equivalent: measured by a method according to JISK7236: 2001.

2)軟化點:以依據JISK7234:1986之方法測定。 2) Softening point: Measured in accordance with JISK7234: 1986.

3)酸價:以依據JISK0070:1992之方法測定。 3) Acid value: Measured in accordance with JISK0070: 1992.

4)GPC之測定條件如以下。 4) The measurement conditions of GPC are as follows.

機種:TOSOH HLC-8220GPC Model: TOSOH HLC-8220GPC

管柱:Super HZM-N Column: Super HZM-N

溶析液:THF(四氫呋喃);0.35ml/分鐘、40℃ Eluate: THF (tetrahydrofuran); 0.35ml / min, 40 ° C

檢測器:RI(示差折射計) Detector: RI (differential refractometer)

分子量標準:聚苯乙烯 Molecular weight standard: polystyrene

(合成例1至3):反應性環氧羧酸酯化合物(d)之合成     (Synthesis Examples 1 to 3): Synthesis of Reactive Epoxycarboxylate Compound (d)    

加入XD-1000(日本化藥股份有限公司製、軟化點74.8℃、環氧當量255g/eq‧)255g、作為羧酸化合物(b)之丙烯酸(AA)或甲基丙烯酸(MAA)為表1中記載之量、作為化合物(c)之二羥甲基丙酸(以下,簡稱為「DMPA」)為表1中記載之量。加入作為觸媒之三苯基膦3g、並以固體成分含有率成為80質量%之方式加入作為溶劑之丙二醇單甲基醚單乙酸酯,在100℃反應24小時,獲得反應性環氧羧酸酯化合物(d)溶液。 Add XD-1000 (manufactured by Nippon Kayaku Co., Ltd., softening point 74.8 ° C, epoxy equivalent 255g / eq‧) 255g, acrylic acid (AA) or methacrylic acid (MAA) as the carboxylic acid compound (b) is shown in Table 1 The amount described in Table 1, and dimethylolpropionic acid (hereinafter, simply referred to as "DMPA") as the compound (c) is the amount described in Table 1. 3 g of triphenylphosphine as a catalyst was added, and propylene glycol monomethyl ether monoacetate was added as a solvent so that the solid content ratio became 80% by mass. The reaction was performed at 100 ° C for 24 hours to obtain a reactive epoxy carboxylate Ester compound (d) solution.

(實施例1、比較例1):反應性多元羧酸化合物(A)之調製     (Example 1, Comparative Example 1): Preparation of reactive polycarboxylic acid compound (A)    

在所得之反應性環氧羧酸酯化合物(d)溶液200g中,以表2記載之化合物、量(g)添加作為多元酸酐(e)、及以固體成分含有率成為65%之方式)添加作為溶劑之丙二醇單甲基醚單乙酸酯,加熱至100℃後,使其酸加成反應,獲得反應性多元羧酸化合物(A)溶液。將所得之反應性多元羧酸化合物(A)的固體成分酸價(AV:mgKOH/g)記載於表2中。固體成分酸價(mg‧KOH/g)測定係以溶液進行測定並換算成固體成分之值。 To 200 g of the obtained reactive epoxycarboxylic acid ester compound (d) solution, the compound described in Table 2 and the amount (g) were added as the polybasic acid anhydride (e), and the solid content content was added to 65%). The propylene glycol monomethyl ether monoacetate as a solvent was heated to 100 ° C, and then subjected to an acid addition reaction to obtain a solution of a reactive polycarboxylic acid compound (A). Table 2 shows the solid content acid value (AV: mgKOH / g) of the obtained reactive polycarboxylic acid compound (A). The solid content acid value (mg‧KOH / g) is measured by a solution and converted into a value of the solid content.

HTMA:1,2,4-環己烷三羧酸-1,2-酐、三菱氣體化學股份有限公司製 HTMA: 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, manufactured by Mitsubishi Gas Chemical Co., Ltd.

NTA:降莰烷三羧酸酐、參照日本專利5532123號之合成品 NTA: norbornane tricarboxylic anhydride, synthetic product with reference to Japanese Patent No. 5532123

THPA:1,2,3,6-四氫鄰苯二甲酸酐、新日本理化股份有限公司製 THPA: 1,2,3,6-tetrahydrophthalic anhydride, manufactured by New Japan Physical and Chemical Co., Ltd.

SA:Rikacid SA琥珀酸酐、新日本理化股份有限公司製 SA: Rikacid SA succinic anhydride, made by New Japan Physical & Chemical Co., Ltd.

(實施例2及比較例2):阻劑材料組成物之調製     (Example 2 and Comparative Example 2): Preparation of a composition of a resist material    

加入實施例1及比較例1所得之反應性多元羧酸化合物(A)54.44g、作為其他之反應性化合物(B)的HX-220(商品名:日本化藥股份有限公司製二丙烯酸酯單體)3.54g、作為光聚合起始劑之Irgacure 907(Ciba Specialty Chemicals製)4.72g及Kayacure DETX-S(日本化藥股份有限公司製)0.47g、作為硬化劑成分之NC-3000(日本化藥製)14.83g、作為硬化促進劑之三聚氰胺1.05g及作為濃度調整溶媒之甲乙酮20.95g,以球磨機進行混練,並使其均勻分散,獲得阻劑材料樹脂組成物。 54.44 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1 and HX-220 (trade name: Diacrylate Monomer manufactured by Nippon Kayaku Co., Ltd.) were added as other reactive compounds (B). 3.54 g), Irgacure 907 (manufactured by Ciba Specialty Chemicals) 4.72 g and Kayacure DETX-S (manufactured by Nippon Kayaku Co., Ltd.) 0.47 g as a photopolymerization initiator 14.83 g, 1.05 g of melamine as a hardening accelerator, and 20.95 g of methyl ethyl ketone as a concentration-adjusting solvent were kneaded with a ball mill and uniformly dispersed to obtain a resin composition of a resist material.

將所得之該組成物藉由輥塗佈法均勻地塗佈於成為支撐膜之銅箔的膜,使其通過溫度70℃之熱風乾燥爐,形成厚度30μm之樹脂層。其後,以1%碳酸鈉水溶液進 行噴霧顯影,並依至完全顯影為止之時間、即所謂之顯影時間(break time)來評估顯影性(單位:秒)。將結果表示於表3。 The obtained composition was uniformly applied to a film of a copper foil as a support film by a roll coating method, and passed through a hot-air drying oven at a temperature of 70 ° C to form a resin layer having a thickness of 30 µm. Thereafter, spray development was performed with a 1% sodium carbonate aqueous solution, and the developability (unit: second) was evaluated in terms of the time until the complete development, the so-called break time. The results are shown in Table 3.

從上述之結果,使用本發明之反應性多元羧酸化合物(A)的阻劑材料組成物係具有良好的顯影性。 From the results described above, the resist material composition system using the reactive polycarboxylic acid compound (A) of the present invention has good developability.

(實施例3及比較例3):耐熱分解性之評估     (Example 3 and Comparative Example 3): Evaluation of thermal decomposition resistance    

加入實施例1及比較例1所得之反應性多元羧酸化合物(A)8g、作為光聚合起始劑之Irgacure 907(Ciba Specialty Chemicals製)0.2g及Kayacure DETX-S(日本化藥股份有限公司製)0.01g、作為硬化劑成分之NC-3000(日本化藥製)0.403g、作為硬化促進劑之三苯基膦0.017g及丙二醇單甲基醚單乙酸酯0.446g,均勻塗佈於聚醯亞胺膜,使其通過溫度80℃之熱風乾燥 爐,形成厚度20μm之樹脂層後,以紫外線曝光裝置(OAK製作所股份有限公司,型號HMW-680GW)曝光,獲得硬化物。將所製作之硬化物以寬度5mm切出。其後,安置於TA Instruments製黏彈性測定裝置RSA-G2,空氣環境中,以頻率10Hz、昇溫速度2℃/分鐘來測定tanδ,並將tanδ之最大值的溫度設為Tg。將結果表示於表4。 8 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1, 0.2 g of Irgacure 907 (manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator, and Kayacure DETX-S (Nippon Kayaku Co., Ltd.) were added. (Manufactured) 0.01 g, NC-3000 (manufactured by Nippon Kayaku) 0.403 g as a hardener component, 0.017 g of triphenylphosphine as a hardening accelerator, and 0.446 g of propylene glycol monomethyl ether monoacetate, and uniformly applied to The polyimide film was passed through a hot air drying oven at a temperature of 80 ° C to form a resin layer having a thickness of 20 µm, and then exposed to an ultraviolet exposure device (OAK Manufacturing Co., Ltd., model HMW-680GW) to obtain a cured product. The produced hardened product was cut out with a width of 5 mm. Thereafter, it was set in a viscoelasticity measuring device RSA-G2 made by TA Instruments, and tan δ was measured at a frequency of 10 Hz and a heating rate of 2 ° C./min in an air environment, and the temperature of the maximum value of tan δ was set to Tg. The results are shown in Table 4.

從上述之結果,可知使用本發明之反應性多元羧酸化合物(A)的活性能量線硬化型樹脂組成物係相較於比較用之樹脂組成物,為耐熱性優異。 From the results described above, it is understood that the active energy ray-curable resin composition system using the reactive polycarboxylic acid compound (A) of the present invention is superior in heat resistance compared to the resin composition for comparison.

(實施例4及比較例4):有關顏料分散性之評估     (Example 4 and Comparative Example 4): Evaluation of pigment dispersibility    

加入實施例1及比較例1所得之反應性多元羧酸化合物(A)20g、作為其他反應性化合物(B)之DPHA(商品名: 日本化藥股份有限公司製丙烯酸酯單體)5.0g、作為有機溶劑之丙二醇單甲基醚乙酸酯10g、作為著色顏料之三菱碳黑MA-100 15g或10g,進行攪拌。進一步,加入35g之玻璃珠,以塗料震盪器(paint shaker)進行分散1小時。將分散結束後之分散液以線棒塗佈器# 2塗佈於聚對苯二甲酸乙二酯膜上,以80℃之溫風乾燥機乾燥10分鐘。使用60°反射光澤計(堀場製作所IG-331光澤計)測定乾燥終止後之塗膜表面的光澤,評估碳黑之分散性。將結果表示於表5中。光澤之值愈高,則顏料分散性愈良好。 20 g of the reactive polycarboxylic acid compound (A) obtained in Example 1 and Comparative Example 1 and 5.0 g of DPHA (trade name: acrylate monomer manufactured by Nippon Kayaku Co., Ltd.) as another reactive compound (B) were added, 10 g of propylene glycol monomethyl ether acetate as an organic solvent and 15 g or 10 g of Mitsubishi carbon black MA-100 as a coloring pigment were stirred. Furthermore, 35 g of glass beads were added, and dispersion was performed for 1 hour using a paint shaker. The dispersion liquid after the completion of the dispersion was coated on a polyethylene terephthalate film with a wire rod applicator # 2, and dried with a warm air dryer at 80 ° C for 10 minutes. The gloss of the coating film surface after the drying was terminated was measured using a 60 ° reflection gloss meter (Horiba IG-331 gloss meter) to evaluate the dispersibility of carbon black. The results are shown in Table 5. The higher the gloss value, the better the pigment dispersibility.

從上述之結果明顯可確認到,從含有實施例1所得之反應性多元羧酸化合物(A)的樹脂組成物所得之塗膜,相較於比較例,係光澤值高且顏料分散性優異。 再者,含有本發明之反應性多元羧酸化合物(A)的樹脂組成物即使在著色顏料之含量較多的情形下,光澤之值也無變化。相對於此,可知比較例之反應性多元羧酸化合物若增加著色顏料之含量,則光澤降低,含量分散性低。因此,可確認到本發明之反應性多元羧酸化合物(A)的顏料分散性係不依存於著色顏料之含量且優異者。 It is apparent from the above results that the coating film obtained from the resin composition containing the reactive polycarboxylic acid compound (A) obtained in Example 1 has a higher gloss value and superior pigment dispersibility than the comparative example. In addition, the resin composition containing the reactive polycarboxylic acid compound (A) of the present invention does not change the value of gloss even when the content of the colored pigment is large. On the other hand, it can be seen that when the reactive polycarboxylic acid compound of the comparative example increases the content of the coloring pigment, the gloss decreases and the content dispersibility is low. Therefore, it was confirmed that the pigment dispersibility of the reactive polycarboxylic acid compound (A) of the present invention is excellent in that it does not depend on the content of the colored pigment.

綜上所述,使用本發明之反應性多元羧酸化合物(A)的活性能量線硬化型樹脂組成物之硬化物,因耐熱性優異,可微細地鹼顯影,故適宜用於成形用材料、皮膜形成用材料、阻劑材料。特別是在高的顏料濃度中亦可發揮良好的顯影性,故可適合使用在彩色阻劑、濾色片用之阻劑材料、特別是黑色基質材料等。 In summary, the hardened product of the active energy ray-curable resin composition using the reactive polycarboxylic acid compound (A) of the present invention is excellent in heat resistance and can be finely alkali-developed, so it is suitable for molding materials, Film forming material and resist material. In particular, good developability can be exhibited even at a high pigment concentration, so it can be suitably used as a color resist, a resist material for a color filter, especially a black matrix material.

Claims (9)

一種反應性多元羧酸化合物(A),係使下述式(1)所示之環氧樹脂(a)與一分子中兼具可聚合之乙烯性不飽和基及羧基之羧酸化合物(b)、依需要之在一分子中兼具羥基及羧基之化合物(c)反應而得到反應性環氧羧酸酯化合物(d),再使該反應性環氧羧酸酯化合物(d)與以下述式(2)或式(3)所示之多元酸酐(e)反應者; 式中,R可為相同亦可為相異,表示氫原子、鹵素原子或碳數1至4之烴基,a分別表示1至3;n係表示平均值為1至20之整數; 式(2)中,R 1係分別獨立地表示氫原子、碳數1至10 之烷基,m表示1至3之整數。 A reactive polycarboxylic acid compound (A) is an epoxy resin (a) represented by the following formula (1) and a carboxylic acid compound (b having a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule) ), If necessary, a compound (c) having both a hydroxyl group and a carboxyl group in a molecule is reacted to obtain a reactive epoxy carboxylic acid ester compound (d), and the reactive epoxy carboxylic acid ester compound (d) is Respondents of the polybasic acid anhydride (e) represented by formula (2) or formula (3); In the formula, R may be the same or different, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, and a represents 1 to 3 respectively; n represents an integer of 1 to 20; In the formula (2), R 1 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and m represents an integer of 1 to 3. 一種活性能量線硬化型樹脂組成物,係包含申請專利範圍第1項所述之反應性多元羧酸化合物(A)。     An active energy ray-curable resin composition containing the reactive polycarboxylic acid compound (A) described in item 1 of the patent application scope.     如申請專利範圍第2項所述之活性能量線硬化型樹脂組成物,其係包含前述反應性多元羧酸化合物(A)以外之反應性化合物(B)。     The active energy ray-curable resin composition according to item 2 of the scope of application for a patent, which comprises a reactive compound (B) other than the reactive polycarboxylic acid compound (A).     如申請專利範圍第2或3項所述之活性能量線硬化型樹脂組成物,其係包含光聚合起始劑。     The active energy ray-curable resin composition according to item 2 or 3 of the scope of patent application, which comprises a photopolymerization initiator.     如申請專利範圍第2至4項中任一項所述之活性能量線硬化型樹脂組成物,其係成形用材料。     The active energy ray-curable resin composition according to any one of claims 2 to 4 of the scope of patent application, which is a molding material.     如申請專利範圍第2至4項中任一項所述之活性能量線硬化型樹脂組成物,其係皮膜形成用材料。     The active-energy-ray-curable resin composition according to any one of claims 2 to 4, which is a material for forming a film.     如申請專利範圍第2至4項中任一項所述之活性能量線硬化型樹脂組成物,其係阻劑材料組成物。     The active energy ray-curable resin composition according to any one of claims 2 to 4 of the scope of application for a patent, which is a resist material composition.     一種硬化物,係申請專利範圍第2至7項中任一項所述之活性能量線硬化型樹脂組成物之硬化物。     A hardened product is a hardened product of the active energy ray-curable resin composition according to any one of claims 2 to 7.     一種物品,係經申請專利範圍第8項所述之硬化物被覆而成者。     An article made of hardened material as described in item 8 of the scope of patent application.    
TW107119167A 2017-06-19 2018-06-04 Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured product thereof and use thereof TWI770188B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-119264 2017-06-19
JP2017119264 2017-06-19

Publications (2)

Publication Number Publication Date
TW201905022A true TW201905022A (en) 2019-02-01
TWI770188B TWI770188B (en) 2022-07-11

Family

ID=64801959

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107119167A TWI770188B (en) 2017-06-19 2018-06-04 Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured product thereof and use thereof

Country Status (4)

Country Link
JP (2) JP7236817B2 (en)
KR (1) KR102429128B1 (en)
CN (2) CN115010905A (en)
TW (1) TWI770188B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7236812B2 (en) * 2017-04-27 2023-03-10 日本化薬株式会社 Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof
JP7236813B2 (en) * 2017-04-28 2023-03-10 日本化薬株式会社 Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof
JP7479130B2 (en) * 2019-09-20 2024-05-08 日鉄ケミカル&マテリアル株式会社 Epoxy acrylate resin, alkali-soluble resin, resin composition containing same, and cured product thereof
JP7016485B2 (en) * 2019-12-11 2022-02-07 三菱瓦斯化学株式会社 Compounds and manufacturing methods thereof, resin compositions, resin sheets, multilayer printed wiring boards, and semiconductor devices.

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877659B2 (en) 1993-05-10 1999-03-31 日本化薬株式会社 Resist ink composition and cured product thereof
JP3657049B2 (en) 1996-02-06 2005-06-08 日本化薬株式会社 Resin composition, resist ink resin composition and cured products thereof
JP2004295094A (en) 2003-03-07 2004-10-21 Toshiba Corp Color image forming device and color image forming method
JP2005352472A (en) 2004-05-14 2005-12-22 Mitsubishi Chemicals Corp Resin composition for liquid crystal panel, cured product, liquid crystal panel and liquid crystal display
JP4634905B2 (en) * 2005-10-07 2011-02-16 互応化学工業株式会社 Photosensitive resin composition, cured product and printed wiring board
JP5473208B2 (en) 2007-10-23 2014-04-16 日本化薬株式会社 Novel epoxy carboxylate compound, derivative thereof, active energy ray-curable resin composition containing the same, and cured product thereof
KR101484661B1 (en) * 2007-08-21 2015-01-20 니폰 가야꾸 가부시끼가이샤 Reactive Carboxylate Compound, Active-energy-ray-curable Resin Composition Utilizing the Same and Use of the Same
JP2009227848A (en) * 2008-03-24 2009-10-08 Nippon Kayaku Co Ltd Epoxycarboxylate compound with little chlorine content, derivative thereof, active energy ray-curable resin composition containing the same, and cured product thereof
KR20120085256A (en) * 2009-10-06 2012-07-31 닛뽄 가야쿠 가부시키가이샤 Polycarboxylic acid composition, process for preparation thereof, and curable resin compositions containing the polycarboxylic acid composition
JP5948317B2 (en) * 2011-04-07 2016-07-06 日本化薬株式会社 Polyvalent carboxylic acid resin and composition thereof
JP5814691B2 (en) * 2011-08-11 2015-11-17 互応化学工業株式会社 Resin resin composition
JP6061576B2 (en) * 2012-09-10 2017-01-18 株式会社タムラ製作所 Photosensitive resin composition and printed wiring board having cured film of photosensitive resin composition
JP6021621B2 (en) * 2012-12-07 2016-11-09 日本化薬株式会社 Active energy ray curable resin composition, and display element spacer and / or color filter protective film using the same
JP6184087B2 (en) 2012-12-07 2017-08-23 日本化薬株式会社 Active energy ray curable resin composition, and display element spacer and / or color filter protective film using the same
JP6095104B2 (en) 2012-12-26 2017-03-15 日本化薬株式会社 Active energy ray-curable resin composition, colored spacer for display element, and black matrix
JP6075772B2 (en) 2013-04-18 2017-02-08 日本化薬株式会社 Resin composition and cured product thereof
JP6204734B2 (en) * 2013-07-16 2017-09-27 互応化学工業株式会社 Resin composition for solder resist
JP5981505B2 (en) * 2013-09-30 2016-08-31 株式会社タムラ製作所 Photosensitive resin composition
JP6325873B2 (en) 2014-03-31 2018-05-16 株式会社タムラ製作所 Photosensitive resin
JP6392549B2 (en) * 2014-05-28 2018-09-19 株式会社タムラ製作所 Alkali-soluble resin composition and printed wiring board having cured film of alkali-soluble resin composition
JP6717566B2 (en) * 2015-04-08 2020-07-01 昭和電工株式会社 Photosensitive resin, photosensitive resin composition, cured product and color filter
CN111154072B (en) * 2015-06-25 2022-09-30 东丽株式会社 Epoxy resin composition, fiber-reinforced composite material, molded article, and pressure vessel
JP6346228B2 (en) * 2015-09-29 2018-06-20 株式会社タムラ製作所 Photosensitive resin composition
JP6421161B2 (en) * 2015-11-27 2018-11-07 株式会社タムラ製作所 Photosensitive resin composition
TWI746707B (en) * 2017-01-31 2021-11-21 日商日本化藥股份有限公司 Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured article of the composition and use of the cured article
JP7236812B2 (en) * 2017-04-27 2023-03-10 日本化薬株式会社 Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof
JP7236813B2 (en) * 2017-04-28 2023-03-10 日本化薬株式会社 Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and use thereof

Also Published As

Publication number Publication date
JP2019001998A (en) 2019-01-10
JP7236817B2 (en) 2023-03-10
CN115010905A (en) 2022-09-06
KR20180138137A (en) 2018-12-28
JP2022166094A (en) 2022-11-01
CN109134826A (en) 2019-01-04
TWI770188B (en) 2022-07-11
KR102429128B1 (en) 2022-08-03
JP7378550B2 (en) 2023-11-13

Similar Documents

Publication Publication Date Title
TWI468430B (en) A reactive carboxylic acid ester compound, an active energy ray-hardening resin composition using the same, and a use thereof
TWI682944B (en) Reactive epoxy carboxylate compound and resin composition containing the same and cured article of the resin composition
TWI635109B (en) Method for manufacturing reactive epoxy carboxylate compound, resin composition and cured article thereof, article
TWI746707B (en) Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured article of the composition and use of the cured article
JP7378550B2 (en) Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and uses thereof
JP7361170B2 (en) Reactive polycarboxylic acid compound, active energy ray-curable resin composition using the same, cured product thereof, and uses thereof
JP7462709B2 (en) Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured product thereof, and uses thereof
JP5473208B2 (en) Novel epoxy carboxylate compound, derivative thereof, active energy ray-curable resin composition containing the same, and cured product thereof
JP2009120737A (en) Reactive carboxylate compound, active energy ray-curable resin composition using the same, and application of the resin composition
TWI821398B (en) Reactive polycarboxylic acid resin mixture, active energy ray-curable resin composition using the same and cured product thereof, and reactive epoxy carboxylate resin mixture
WO2013172009A1 (en) Reactive polyester compound and active energy ray-curable resin composition
JP2009275167A (en) Reactive carboxylate compound, active energy ray-curable resin composition utilizing the same, and use of the same
TWI699381B (en) Epoxy resin, reactive carboxylate compound, curable resin composition using the same, and uses thereof