JP2022075340A - Cdi装置 - Google Patents
Cdi装置 Download PDFInfo
- Publication number
- JP2022075340A JP2022075340A JP2020186071A JP2020186071A JP2022075340A JP 2022075340 A JP2022075340 A JP 2022075340A JP 2020186071 A JP2020186071 A JP 2020186071A JP 2020186071 A JP2020186071 A JP 2020186071A JP 2022075340 A JP2022075340 A JP 2022075340A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- flow path
- ions
- concentration
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4691—Capacitive deionisation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
- C02F2201/46125—Electrical variables
- C02F2201/46135—Voltage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/05—Conductivity or salinity
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/10—Solids, e.g. total solids [TS], total suspended solids [TSS] or volatile solids [VS]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Hydrology & Water Resources (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Molecular Biology (AREA)
- Health & Medical Sciences (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
Claims (1)
- 活物質を向き合わせてそれらの間に流路を形成し、細孔内で活物質の表面に形成される電気二重層に基づきイオンを吸着する正極および負極と、
前記流路に流入する液体に含まれるイオンの濃度を決められた閾値以上に維持する濃度制御装置と、
検出されるイオンの濃度に応じて決められる上限値未満に前記正極および前記負極に印加される電位を制御する制御回路と、
を備えることを特徴とするCDI装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020186071A JP7089570B2 (ja) | 2020-11-06 | 2020-11-06 | Cdi装置 |
CN202180074792.5A CN116547242A (zh) | 2020-11-06 | 2021-11-04 | Cdi装置 |
PCT/JP2021/040645 WO2022097691A1 (ja) | 2020-11-06 | 2021-11-04 | Cdi装置 |
EP21889243.8A EP4242178A4 (en) | 2020-11-06 | 2021-11-04 | CAPACITIVE DEIONIZATION DEVICE |
US18/143,568 US20230271856A1 (en) | 2020-11-06 | 2023-05-04 | Cdi device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020186071A JP7089570B2 (ja) | 2020-11-06 | 2020-11-06 | Cdi装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022075340A true JP2022075340A (ja) | 2022-05-18 |
JP7089570B2 JP7089570B2 (ja) | 2022-06-22 |
Family
ID=81458371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020186071A Active JP7089570B2 (ja) | 2020-11-06 | 2020-11-06 | Cdi装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20230271856A1 (ja) |
EP (1) | EP4242178A4 (ja) |
JP (1) | JP7089570B2 (ja) |
CN (1) | CN116547242A (ja) |
WO (1) | WO2022097691A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4269113A1 (en) | 2022-04-28 | 2023-11-01 | Seiko Epson Corporation | Piezoelectric actuator and manufacturing method thereof, liquid droplet discharge head, and ultrasonic device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001162283A (ja) * | 1999-12-06 | 2001-06-19 | Mitsubishi Electric Corp | イオン除去装置 |
JP2002336864A (ja) * | 2001-05-11 | 2002-11-26 | Kurita Water Ind Ltd | 脱塩水製造方法および脱塩水製造装置 |
JP2005219045A (ja) * | 2004-01-09 | 2005-08-18 | Air Water Inc | 溶液の液質制御方法および装置 |
WO2014083755A1 (ja) * | 2012-11-30 | 2014-06-05 | パナソニック株式会社 | 水処理装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002273439A (ja) * | 2001-03-22 | 2002-09-24 | Kurita Water Ind Ltd | 脱塩方法とその装置 |
US20090045048A1 (en) * | 2007-08-15 | 2009-02-19 | Roy Joseph Bourcier | Capacitive deionization system |
TWI460135B (zh) * | 2012-12-25 | 2014-11-11 | Ind Tech Res Inst | 電容脫鹽裝置 |
JP6074261B2 (ja) * | 2012-12-27 | 2017-02-01 | 野村マイクロ・サイエンス株式会社 | 医薬品用の純水製造装置の殺菌方法及び医薬品用の純水製造装置 |
US20210053849A1 (en) * | 2018-04-05 | 2021-02-25 | Mitsubishi Electric Corporation | Water treatment device and water treatment method |
JP6570692B1 (ja) | 2018-04-16 | 2019-09-04 | 株式会社タクマ | 電気二重層を用いた排水処理方法および排水処理システム |
-
2020
- 2020-11-06 JP JP2020186071A patent/JP7089570B2/ja active Active
-
2021
- 2021-11-04 CN CN202180074792.5A patent/CN116547242A/zh active Pending
- 2021-11-04 EP EP21889243.8A patent/EP4242178A4/en active Pending
- 2021-11-04 WO PCT/JP2021/040645 patent/WO2022097691A1/ja active Application Filing
-
2023
- 2023-05-04 US US18/143,568 patent/US20230271856A1/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001162283A (ja) * | 1999-12-06 | 2001-06-19 | Mitsubishi Electric Corp | イオン除去装置 |
JP2002336864A (ja) * | 2001-05-11 | 2002-11-26 | Kurita Water Ind Ltd | 脱塩水製造方法および脱塩水製造装置 |
JP2005219045A (ja) * | 2004-01-09 | 2005-08-18 | Air Water Inc | 溶液の液質制御方法および装置 |
WO2014083755A1 (ja) * | 2012-11-30 | 2014-06-05 | パナソニック株式会社 | 水処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4269113A1 (en) | 2022-04-28 | 2023-11-01 | Seiko Epson Corporation | Piezoelectric actuator and manufacturing method thereof, liquid droplet discharge head, and ultrasonic device |
Also Published As
Publication number | Publication date |
---|---|
JP7089570B2 (ja) | 2022-06-22 |
EP4242178A1 (en) | 2023-09-13 |
CN116547242A (zh) | 2023-08-04 |
US20230271856A1 (en) | 2023-08-31 |
EP4242178A4 (en) | 2024-05-01 |
WO2022097691A1 (ja) | 2022-05-12 |
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