JP2022035121A - 基板処理方法および基板処理装置 - Google Patents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/12—Velocity of flow; Quantity of flow, e.g. by varying fan speed, by modifying cross flow area
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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Abstract
Description
Display)用基板、光ディスク用基板、磁気ディスク用基板、光磁気ディスク用基板、フォトマスク用基板、セラミック基板、太陽電池用基板などが含まれる。
Mechanical Interface)ポッド、OC(Open Cassette)など)を複数個保持することができる容器保持部121を有している。また、インデクサ部120は、容器保持部121に保持された容器Cにアクセスして、未処理の基板Wを容器Cから取り出したり、処理済みの基板Wを容器Cに収納したりするためのインデクサロボット122を備えている。各容器Cには、複数枚の基板Wがほぼ水平な姿勢で収容されている。
・基板Wの表面中央部を経由して基板Wの表面周縁部に供給する第1供給態様(同図中の1点鎖線矢印)と、
・基板Wの表面中央部を経由せずに基板Wの表面周縁部に供給する第2供給態様(同図中の点線矢印)と、
が存在する。そして、制御部4がバルブ66c、68cの開閉を制御することで、窒素ガスの供給を停止するモードと、第1供給態様のみを実行するモードと、第2供給態様のみを実行するモードと、第1供給態様および第2供給態様を同時に実行するモードとが選択的に切り替えられる。また、同図への図示を省略しているが、制御部4からの指令に応じて第1供給態様および第2供給態様で供給する窒素ガスの流量をそれぞれ独立して可変制御可能となっている。なお、本実施形態では、窒素ガスを本発明の「不活性ガス」として用いているが、これ以外に、除湿されたアルゴンガスなどの不活性ガスを用いてもよい。
4…制御部
20…チャンバ
21…内部空間
66a…中央ガス吐出口(第1吐出部、第2吐出部)
67…周縁ガス吐出口(第2吐出部)
81~83…流量計
541,542…ガス吐出口(第2吐出部)
AX1…(凝固体の)回転軸線
PT…パターン
S9…昇華処理
SB…凝固体
SB1…(凝固体の)中央領域
SS…昇華性物質
W…基板
Wf…(基板の)表面
Claims (9)
- 液体を経ずに気体に変化する昇華性物質を含む凝固体が表面全体に形成された基板から前記凝固体を昇華させて前記基板を乾燥させる基板処理方法であって、
前記基板の表面中央部に向けて第1気体を吐出して前記第1気体を前記凝固体の全体を経由して前記基板の周辺に流通させて前記凝固体の全体を昇華させる第1昇華工程と、
前記基板の表面周縁部に向けて第2気体を吐出して前記第2気体を前記凝固体のうち前記表面周縁部上の周縁領域を経由して前記基板の周辺に流通させて前記周縁領域を昇華させる第2昇華工程と、を備え、
前記第2昇華工程の開始が前記第1昇華工程よりも早い、または
前記第2気体の流量が前記第1気体の流量よりも多い
ことを特徴とする基板処理方法。 - 請求項1に記載の基板処理方法であって、
前記第2昇華工程の開始後、前記第2気体の吐出を継続したまま前記第1昇華工程が開始される、基板処理方法。 - 請求項2に記載の基板処理方法であって、
前記第1昇華工程の開始後における前記第1気体の流量は第1流量であり、
前記第2気体の流量は前記第1流量よりも多い第2流量である、基板処理方法。 - 請求項2に記載の基板処理方法であって、
前記第1昇華工程の開始時点より、
前記第1気体の流量は時間経過に伴って増大する一方で、前記第2気体の流量は時間経過に伴って減少する、基板処理方法。 - 請求項1に記載の基板処理方法であって、
前記第1昇華工程は前記第2昇華工程と同時または前記第2昇華工程の開始以降に開始され、
前記第2気体の流量は前記第1気体の流量よりも多い第2流量である、基板処理方法。 - 請求項1に記載の基板処理方法であって、
前記第2昇華工程を行った後で前記第1昇華工程が実行される、基板処理方法。 - 請求項2、3、4または6に記載の基板処理方法であって、
前記第1昇華工程および前記第2昇華工程が実行されるチャンバの内部空間を排気する工程と、
前記内部空間に存在する気体成分および前記内部空間から排気される気体成分のうちの少なくとも一方の流量値を計測する工程と、を備え、
前記流量値に基づいて前記第1昇華工程を開始するタイミングを決定する、基板処理方法。 - 請求項2、3、4または6に記載の基板処理方法であって、
前記第1昇華工程および前記第2昇華工程が実行されるチャンバの内部空間を排気する工程と、
前記内部空間に存在する気体状の昇華性物質および前記内部空間から排気される気体状の昇華性物質のうちの少なくとも一方を昇華性物質検出センサで検出する工程と、を備え、
前記昇華性物質検出センサの検出値に基づいて前記第1昇華工程を開始するタイミングを決定する、基板処理方法。 - 液体を経ずに気体に変化する昇華性物質を含む凝固体が表面全体に形成された基板から前記凝固体を昇華させて前記基板を乾燥させる基板処理装置であって、
前記基板の表面中央部に向けて第1気体を吐出する第1吐出部と、
前記基板の表面周縁部に向けて第2気体を吐出する第2吐出部と、
前記第1吐出部から前記第1気体を吐出させて前記第1気体を前記凝固体の全体を経由して前記基板の周辺に流通させて前記凝固体の全体を昇華させ、前記第2吐出部から前記第2気体を吐出させて前記第2気体を前記凝固体のうち前記表面周縁部上の周縁領域を経由して前記基板の周辺に流通させて前記周縁領域を昇華させる制御部と、を備え、
前記制御部は、前記第2気体の吐出開始を前記第1気体の吐出開始よりも早める吐出タイミング制御および前記第2気体の流量を前記第1気体の流量よりも多くする流量制御の少なくとも一方を行う
ことを特徴とする基板処理装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2020139221A JP7446181B2 (ja) | 2020-08-20 | 2020-08-20 | 基板処理方法および基板処理装置 |
TW110116724A TWI781609B (zh) | 2020-08-20 | 2021-05-10 | 基板處理方法及基板處理裝置 |
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