JP2021532581A5 - - Google Patents

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Publication number
JP2021532581A5
JP2021532581A5 JP2021502883A JP2021502883A JP2021532581A5 JP 2021532581 A5 JP2021532581 A5 JP 2021532581A5 JP 2021502883 A JP2021502883 A JP 2021502883A JP 2021502883 A JP2021502883 A JP 2021502883A JP 2021532581 A5 JP2021532581 A5 JP 2021532581A5
Authority
JP
Japan
Prior art keywords
gas
distributor
mixer
internal volume
annular arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021502883A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021532581A (ja
JP7410120B2 (ja
Filing date
Publication date
Priority claimed from US16/040,326 external-priority patent/US10943769B2/en
Application filed filed Critical
Publication of JP2021532581A publication Critical patent/JP2021532581A/ja
Publication of JP2021532581A5 publication Critical patent/JP2021532581A5/ja
Priority to JP2023215337A priority Critical patent/JP7686055B2/ja
Application granted granted Critical
Publication of JP7410120B2 publication Critical patent/JP7410120B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021502883A 2018-07-19 2019-07-18 ガス分配器および流量検証器 Active JP7410120B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023215337A JP7686055B2 (ja) 2018-07-19 2023-12-21 ガス分配器および流量検証器

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/040,326 US10943769B2 (en) 2018-07-19 2018-07-19 Gas distributor and flow verifier
US16/040,326 2018-07-19
PCT/US2019/042490 WO2020018850A1 (en) 2018-07-19 2019-07-18 Gas distributor and flow verifier

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023215337A Division JP7686055B2 (ja) 2018-07-19 2023-12-21 ガス分配器および流量検証器

Publications (3)

Publication Number Publication Date
JP2021532581A JP2021532581A (ja) 2021-11-25
JP2021532581A5 true JP2021532581A5 (https=) 2022-08-23
JP7410120B2 JP7410120B2 (ja) 2024-01-09

Family

ID=69162522

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021502883A Active JP7410120B2 (ja) 2018-07-19 2019-07-18 ガス分配器および流量検証器
JP2023215337A Active JP7686055B2 (ja) 2018-07-19 2023-12-21 ガス分配器および流量検証器

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023215337A Active JP7686055B2 (ja) 2018-07-19 2023-12-21 ガス分配器および流量検証器

Country Status (6)

Country Link
US (2) US10943769B2 (https=)
JP (2) JP7410120B2 (https=)
KR (2) KR102763394B1 (https=)
CN (2) CN120332666A (https=)
TW (2) TWI893498B (https=)
WO (1) WO2020018850A1 (https=)

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US10256075B2 (en) * 2016-01-22 2019-04-09 Applied Materials, Inc. Gas splitting by time average injection into different zones by fast gas valves
US10943769B2 (en) 2018-07-19 2021-03-09 Lam Research Corporation Gas distributor and flow verifier
KR20240166040A (ko) * 2019-03-01 2024-11-25 램 리써치 코포레이션 통합된 툴 리프트
CN114121585B (zh) * 2020-08-26 2023-10-31 中微半导体设备(上海)股份有限公司 一种等离子体处理装置及气体供应方法
US12068135B2 (en) 2021-02-12 2024-08-20 Applied Materials, Inc. Fast gas exchange apparatus, system, and method
KR102627141B1 (ko) * 2023-07-20 2024-01-23 (주)효진이앤하이 플라즈마 가스 변환 시스템

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JP3442604B2 (ja) * 1996-02-15 2003-09-02 株式会社フジキン 混合ガスの供給方法及び混合ガス供給装置並びにこれらを備えた半導体製造装置
JP4454725B2 (ja) * 1998-12-28 2010-04-21 株式会社オムニ研究所 ガス混合装置およびガス混合ブロック
JP4764574B2 (ja) * 2001-08-31 2011-09-07 東京エレクトロン株式会社 処理装置の運転方法
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7510624B2 (en) * 2004-12-17 2009-03-31 Applied Materials, Inc. Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
US20080102011A1 (en) * 2006-10-27 2008-05-01 Applied Materials, Inc. Treatment of effluent containing chlorine-containing gas
CN101556904B (zh) * 2008-04-10 2010-12-01 北京北方微电子基地设备工艺研究中心有限责任公司 一种气体分配装置及应用该分配装置的半导体处理设备
US20090275206A1 (en) 2008-05-05 2009-11-05 Applied Materials, Inc. Plasma process employing multiple zone gas distribution for improved uniformity of critical dimension bias
WO2011159690A2 (en) 2010-06-15 2011-12-22 Applied Materials, Inc. Multiple precursor showerhead with by-pass ports
KR101693673B1 (ko) 2010-06-23 2017-01-09 주성엔지니어링(주) 가스분배수단 및 이를 포함한 기판처리장치
US8528338B2 (en) * 2010-12-06 2013-09-10 General Electric Company Method for operating an air-staged diffusion nozzle
JP6123208B2 (ja) 2012-09-28 2017-05-10 東京エレクトロン株式会社 成膜装置
US9157730B2 (en) * 2012-10-26 2015-10-13 Applied Materials, Inc. PECVD process
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TWI693638B (zh) 2014-04-07 2020-05-11 美商蘭姆研究公司 獨立於配置的氣體輸送系統
US9679749B2 (en) * 2014-09-26 2017-06-13 Lam Research Corporation Gas distribution device with actively cooled grid
WO2017003644A1 (en) * 2015-06-30 2017-01-05 Exxonmobil Chemical Patents Inc. Gas distribution in oxidation reactions
US10022689B2 (en) * 2015-07-24 2018-07-17 Lam Research Corporation Fluid mixing hub for semiconductor processing tool
US10943769B2 (en) 2018-07-19 2021-03-09 Lam Research Corporation Gas distributor and flow verifier

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