JP2021522544A5 - - Google Patents

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Publication number
JP2021522544A5
JP2021522544A5 JP2020559478A JP2020559478A JP2021522544A5 JP 2021522544 A5 JP2021522544 A5 JP 2021522544A5 JP 2020559478 A JP2020559478 A JP 2020559478A JP 2020559478 A JP2020559478 A JP 2020559478A JP 2021522544 A5 JP2021522544 A5 JP 2021522544A5
Authority
JP
Japan
Prior art keywords
actuator
less
support member
increments
common actuator
Prior art date
Application number
JP2020559478A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2019206548A5 (https=
JP2021522544A (ja
JP7079858B2 (ja
Filing date
Publication date
Priority claimed from EP18169639.4A external-priority patent/EP3385792A3/en
Application filed filed Critical
Priority claimed from PCT/EP2019/057672 external-priority patent/WO2019206548A1/en
Publication of JP2021522544A publication Critical patent/JP2021522544A/ja
Publication of JPWO2019206548A5 publication Critical patent/JPWO2019206548A5/ja
Publication of JP2021522544A5 publication Critical patent/JP2021522544A5/ja
Application granted granted Critical
Publication of JP7079858B2 publication Critical patent/JP7079858B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020559478A 2018-04-26 2019-03-27 ステージ装置、リソグラフィ装置、コントロールユニット及び方法 Active JP7079858B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP18169639.4 2018-04-26
EP18169639.4A EP3385792A3 (en) 2018-04-26 2018-04-26 Stage apparatus for use in a lithographic apparatus
EP19150671.6 2019-01-08
EP19150671 2019-01-08
PCT/EP2019/057672 WO2019206548A1 (en) 2018-04-26 2019-03-27 Stage apparatus, lithographic apparatus, control unit and method

Publications (4)

Publication Number Publication Date
JP2021522544A JP2021522544A (ja) 2021-08-30
JPWO2019206548A5 JPWO2019206548A5 (https=) 2022-02-15
JP2021522544A5 true JP2021522544A5 (https=) 2022-02-15
JP7079858B2 JP7079858B2 (ja) 2022-06-02

Family

ID=65818534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020559478A Active JP7079858B2 (ja) 2018-04-26 2019-03-27 ステージ装置、リソグラフィ装置、コントロールユニット及び方法

Country Status (6)

Country Link
US (1) US11243476B2 (https=)
JP (1) JP7079858B2 (https=)
KR (1) KR102493253B1 (https=)
CN (1) CN112041750B (https=)
NL (1) NL2022818A (https=)
WO (1) WO2019206548A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3764165A1 (en) 2019-07-12 2021-01-13 ASML Netherlands B.V. Substrate shape measuring device
DE102019008104A1 (de) * 2019-11-21 2021-05-27 Vat Holding Ag Verfahren zur Überwachung, Positionsbestimmung und Positionierung eines Stiffthubsystems
US20240345490A1 (en) * 2021-08-24 2024-10-17 Asml Netherlands B.V. An object gripper, a method of holding an object and a lithographic apparatus
KR102883313B1 (ko) * 2022-04-04 2025-11-06 세메스 주식회사 기판 지지 장치 및 이를 포함하는 기판 하면 세정 장치
CN115709902B (zh) * 2022-11-24 2025-05-16 镇江龙源铝业有限公司 一种铝合金板带辅助支撑装置及其控制方法

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NL8300220A (nl) 1983-01-21 1984-08-16 Philips Nv Inrichting voor het stralingslithografisch behandelen van een dun substraat.
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JPH0758191A (ja) * 1993-08-13 1995-03-03 Toshiba Corp ウェハステージ装置
US5563684A (en) 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
JPH1154423A (ja) * 1997-07-31 1999-02-26 Horiba Ltd 露光装置
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP2002064132A (ja) * 2000-08-22 2002-02-28 Tokyo Electron Ltd 被処理体の受け渡し方法、被処理体の載置機構及びプローブ装置
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004228453A (ja) 2003-01-27 2004-08-12 Renesas Technology Corp 半導体装置の製造方法
US6805338B1 (en) 2003-06-13 2004-10-19 Lsi Logic Corporation Semiconductor wafer chuck assembly for a semiconductor processing device
US7307697B2 (en) 2004-05-28 2007-12-11 Board Of Regents, The University Of Texas System Adaptive shape substrate support system
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
JP2007189181A (ja) * 2006-01-10 2007-07-26 Horon:Kk 露光ステージ装置
KR20070119386A (ko) * 2006-06-15 2007-12-20 세메스 주식회사 평판 디스플레이 제조용 장비
JP5090079B2 (ja) 2007-06-27 2012-12-05 大日本スクリーン製造株式会社 減圧乾燥装置
JP5406475B2 (ja) 2008-07-28 2014-02-05 大日本スクリーン製造株式会社 熱処理装置
JP2010056217A (ja) 2008-08-27 2010-03-11 Dainippon Screen Mfg Co Ltd 基板昇降装置および基板処理装置
JP2011091070A (ja) 2009-10-20 2011-05-06 Nikon Corp 保持部材、ステージ装置、反射部材、反射装置、測定装置、露光装置、デバイス製造方法、板状部材の表面の形状を変える方法、露光方法、反射面の形状を変える方法、測定方法
JP5141707B2 (ja) * 2010-03-24 2013-02-13 株式会社安川電機 被処理体の支持機構、支持方法およびそれを備えた搬送システム
KR101866719B1 (ko) 2010-12-20 2018-06-11 에베 그룹 에. 탈너 게엠베하 웨이퍼의 장착을 위한 수용 수단
JP2013161946A (ja) 2012-02-06 2013-08-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP5912654B2 (ja) 2012-02-24 2016-04-27 株式会社東芝 基板保持装置及びパターン転写装置並びにパターン転写方法
JP2014003259A (ja) 2012-06-21 2014-01-09 Nikon Corp ロード方法、基板保持装置及び露光装置
JP2015050418A (ja) 2013-09-04 2015-03-16 東京エレクトロン株式会社 基板冷却装置、基板冷却方法及び基板処理装置
KR102247936B1 (ko) * 2013-10-30 2021-05-04 가부시키가이샤 니콘 기판 유지 장치, 노광 장치 및 디바이스 제조 방법
WO2015169616A1 (en) 2014-05-06 2015-11-12 Asml Netherlands B.V. Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method
JP5865475B2 (ja) * 2014-12-16 2016-02-17 株式会社東芝 基板保持装置及びパターン転写装置並びにパターン転写方法
EP3385792A3 (en) 2018-04-26 2018-12-26 ASML Netherlands B.V. Stage apparatus for use in a lithographic apparatus

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