JP2021509172A5 - - Google Patents
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- JP2021509172A5 JP2021509172A5 JP2020533736A JP2020533736A JP2021509172A5 JP 2021509172 A5 JP2021509172 A5 JP 2021509172A5 JP 2020533736 A JP2020533736 A JP 2020533736A JP 2020533736 A JP2020533736 A JP 2020533736A JP 2021509172 A5 JP2021509172 A5 JP 2021509172A5
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- Japan
- Prior art keywords
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- Prior art date
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- 239000011859 microparticle Substances 0.000 claims 7
- 239000002105 nanoparticle Substances 0.000 claims 7
- 230000005855 radiation Effects 0.000 claims 7
- 239000012952 cationic photoinitiator Substances 0.000 claims 5
- 239000000945 filler Substances 0.000 claims 5
- 239000002245 particle Substances 0.000 claims 5
- 229910018286 SbF 6 Inorganic materials 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- -1 cyclic lactone Chemical class 0.000 claims 4
- 239000000990 laser dye Substances 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 239000000049 pigment Substances 0.000 claims 4
- 150000001450 anions Chemical class 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000000975 dye Substances 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 229910020366 ClO 4 Inorganic materials 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 239000012949 free radical photoinitiator Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 230000031700 light absorption Effects 0.000 claims 2
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 claims 1
- 229910017008 AsF 6 Inorganic materials 0.000 claims 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 239000005711 Benzoic acid Substances 0.000 claims 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 claims 1
- 229940077388 benzenesulfonate Drugs 0.000 claims 1
- 235000010233 benzoic acid Nutrition 0.000 claims 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 claims 1
- 239000000306 component Substances 0.000 claims 1
- 230000035515 penetration Effects 0.000 claims 1
- 238000007493 shaping process Methods 0.000 claims 1
- 239000003381 stabilizer Substances 0.000 claims 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762612157P | 2017-12-29 | 2017-12-29 | |
| US62/612,157 | 2017-12-29 | ||
| US201862619439P | 2018-01-19 | 2018-01-19 | |
| US62/619,439 | 2018-01-19 | ||
| PCT/US2018/066346 WO2019133349A1 (en) | 2017-12-29 | 2018-12-19 | Compositions and articles for additive fabrication and methods of using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021509172A JP2021509172A (ja) | 2021-03-18 |
| JP2021509172A5 true JP2021509172A5 (https=) | 2021-12-02 |
| JP7251715B2 JP7251715B2 (ja) | 2023-04-04 |
Family
ID=65244588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020533736A Active JP7251715B2 (ja) | 2017-12-29 | 2018-12-19 | 付加造形用組成物及び物品並びにそれらの使用方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US11180594B2 (https=) |
| EP (1) | EP3732021A1 (https=) |
| JP (1) | JP7251715B2 (https=) |
| KR (1) | KR102864443B1 (https=) |
| CN (3) | CN115179545B (https=) |
| WO (1) | WO2019133349A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3732021A1 (en) * | 2017-12-29 | 2020-11-04 | DSM IP Assets B.V. | Compositions and articles for additive fabrication and methods of using the same |
| US12042985B2 (en) * | 2018-12-27 | 2024-07-23 | Stratasys Ltd. | Additive manufacturing using reinforced materials |
| CN112730880A (zh) * | 2020-12-08 | 2021-04-30 | 北京星航机电装备有限公司 | 一种增材制造设备风场校验系统及方法 |
| CN113984328B (zh) * | 2021-12-30 | 2022-03-22 | 清华大学 | 一种用于控制piv系统测量流场的三自由度调节平台 |
Family Cites Families (48)
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| US5047568A (en) | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| US5380923A (en) | 1993-04-29 | 1995-01-10 | Minnesota Mining And Manufacturing Company | Polymeric sulfonium salts and method of preparation thereof |
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| JP3117394B2 (ja) * | 1994-11-29 | 2000-12-11 | 帝人製機株式会社 | 光学的立体造形用樹脂組成物 |
| US5665792A (en) | 1995-06-07 | 1997-09-09 | E. I. Du Pont De Nemours And Company | Stabilizers for use with photoacid precursor formulations |
| US5866628A (en) * | 1996-08-30 | 1999-02-02 | Day-Glo Color Corp. | Ultraviolet and electron beam radiation curable fluorescent printing ink concentrates and printing inks |
| JPH1087963A (ja) | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | 樹脂組成物および繊維質材料成形型 |
| US6031021A (en) | 1997-04-11 | 2000-02-29 | Ncr Corporation | Thermal transfer ribbon with thermal dye color palette |
| JP4204113B2 (ja) | 1997-12-04 | 2009-01-07 | 株式会社Ａｄｅｋａ | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
| US20030149124A1 (en) | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
| JP5131888B2 (ja) | 2002-09-25 | 2013-01-30 | 株式会社Ａｄｅｋａ | 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法 |
| AU2003303482A1 (en) | 2002-12-23 | 2004-07-22 | Aprilis, Inc. | Fluoroarylsulfonium photoacid generators |
| US20050040562A1 (en) * | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
| JP4723379B2 (ja) * | 2003-09-05 | 2011-07-13 | ロディア・シミ | 高い充填剤含有量を有する安定な陽イオン重合性／架橋性歯科用組成物 |
| US7230122B2 (en) | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
| US20050101684A1 (en) * | 2003-11-06 | 2005-05-12 | Xiaorong You | Curable compositions and rapid prototyping process using the same |
| WO2005045525A1 (en) * | 2003-11-06 | 2005-05-19 | Dsm Ip Assets B.V. | Curable compositions and rapid prototyping process using the same |
| WO2005092598A1 (en) * | 2004-03-22 | 2005-10-06 | Huntsman Advanced Materials (Switzerland) Gmbh | Photocurable compositions |
| BRPI0608938A2 (pt) | 2005-04-08 | 2010-02-17 | Saint Gobain Abrasives Inc | artigo abrasivo que apresenta cromóforo ativado por meio de reação |
| JP2006348214A (ja) * | 2005-06-17 | 2006-12-28 | Jsr Corp | 光造形用光硬化性液状組成物、立体造形物及びその製造方法 |
| US7678528B2 (en) | 2005-11-16 | 2010-03-16 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| EP2135136B1 (en) * | 2007-03-20 | 2018-10-17 | DSM IP Assets B.V. | Stereolithography resin compositions and three-dimensional objects made therefrom |
| JP5304977B2 (ja) | 2007-10-04 | 2013-10-02 | セイコーエプソン株式会社 | 光硬化組成物を用いた硬化物の形成方法およびその硬化物 |
| EP2218715B1 (en) | 2007-11-28 | 2017-06-28 | Sumitomo Seika Chemicals CO. LTD. | Photoacid generator and photoreactive composition |
| JP5208573B2 (ja) | 2008-05-06 | 2013-06-12 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体 |
| EP2349993B1 (en) | 2008-10-20 | 2012-12-12 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| CN102317258B (zh) | 2009-02-20 | 2014-06-04 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂及光敏性树脂组合物 |
| WO2011004783A1 (ja) * | 2009-07-08 | 2011-01-13 | 本田技研工業株式会社 | 粒子画像流速測定方法、３次元空間の粒子画像流速測定方法、粒子画像流速測定装置および粒子画像流速測定装置におけるトレーサ粒子発生装置 |
| WO2011032210A1 (en) * | 2009-09-16 | 2011-03-24 | Monash University | Particle image velocimetry suitable for x-ray projection imaging |
| US9025849B2 (en) * | 2009-09-16 | 2015-05-05 | Monash University | Partical image velocimetry suitable for X-ray projection imaging |
| JP5849350B2 (ja) * | 2009-12-17 | 2016-01-27 | ディーエスエム アイピー アセッツ ビー．ブイ． | 基材を用いた積層造形法 |
| KR101710319B1 (ko) * | 2011-03-07 | 2017-02-24 | 산요가세이고교 가부시키가이샤 | 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법 |
| JP6056032B2 (ja) | 2013-11-05 | 2017-01-11 | ディーエスエム アイピー アセッツ ビー．ブイ． | 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 |
| US9804490B2 (en) * | 2013-12-20 | 2017-10-31 | Covestro Deutschland Ag | Holographic media with improved light sensitivity |
| US9962142B2 (en) * | 2014-11-14 | 2018-05-08 | The Regents Of The University Of California | Ultrasound-based volumetric particle tracking method |
| JP6780225B2 (ja) * | 2015-08-06 | 2020-11-04 | 株式会社リコー | 活性エネルギー線硬化型立体造形用組成物、活性エネルギー線硬化型インク、組成物収容容器、像の形成方法及び形成装置、並びに成形加工品 |
| JP6845226B2 (ja) * | 2015-09-09 | 2021-03-17 | カーボン，インコーポレイテッド | 積層造形用エポキシ二重硬化樹脂 |
| CN108027558B (zh) | 2015-10-01 | 2022-03-25 | 科思创(荷兰)有限公司 | 用于加成法制造的液体、混杂的可紫外/可见光辐射固化树脂组合物 |
| EP3377291B1 (en) * | 2015-11-17 | 2021-11-03 | Covestro (Netherlands) B.V. | Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes |
| CN108139665B (zh) | 2015-12-22 | 2022-07-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
| CN105924571B (zh) * | 2016-05-19 | 2018-08-07 | 深圳长朗智能科技有限公司 | 连续光固化三维打印材料 |
| TW201840510A (zh) * | 2016-12-20 | 2018-11-16 | 德商巴地斯顏料化工廠 | 用於積層製造(additive fabrication)的光聚合物陶瓷分散液 |
| US10239255B2 (en) * | 2017-04-11 | 2019-03-26 | Molecule Corp | Fabrication of solid materials or films from a polymerizable liquid |
| EP3732021A1 (en) | 2017-12-29 | 2020-11-04 | DSM IP Assets B.V. | Compositions and articles for additive fabrication and methods of using the same |
-
2018
- 2018-12-19 EP EP18842602.7A patent/EP3732021A1/en active Pending
- 2018-12-19 CN CN202210662915.3A patent/CN115179545B/zh active Active
- 2018-12-19 CN CN202210662066.1A patent/CN115179544B/zh active Active
- 2018-12-19 JP JP2020533736A patent/JP7251715B2/ja active Active
- 2018-12-19 KR KR1020207021790A patent/KR102864443B1/ko active Active
- 2018-12-19 CN CN201880084297.0A patent/CN111526977B/zh active Active
- 2018-12-19 US US16/957,820 patent/US11180594B2/en active Active
- 2018-12-19 WO PCT/US2018/066346 patent/WO2019133349A1/en not_active Ceased
-
2021
- 2021-10-15 US US17/502,631 patent/US11878459B2/en active Active
-
2023
- 2023-12-21 US US18/391,760 patent/US12296528B2/en active Active
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