JP2021185393A5 - - Google Patents
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- JP2021185393A5 JP2021185393A5 JP2020090174A JP2020090174A JP2021185393A5 JP 2021185393 A5 JP2021185393 A5 JP 2021185393A5 JP 2020090174 A JP2020090174 A JP 2020090174A JP 2020090174 A JP2020090174 A JP 2020090174A JP 2021185393 A5 JP2021185393 A5 JP 2021185393A5
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- intensity distribution
- light
- exposure apparatus
- light intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005286 illumination Methods 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 10
- 210000001747 pupil Anatomy 0.000 claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims 5
- 229910052753 mercury Inorganic materials 0.000 claims 5
- 238000000034 method Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020090174A JP7570826B2 (ja) | 2020-05-25 | 2020-05-25 | 露光装置、露光方法、及び物品の製造方法 |
| TW110111515A TWI851886B (zh) | 2020-05-25 | 2021-03-30 | 曝光裝置、曝光方法及物品之製造方法 |
| KR1020210044373A KR20210145658A (ko) | 2020-05-25 | 2021-04-06 | 노광장치, 노광방법, 및 물품의 제조방법 |
| CN202110549216.3A CN113721427B (zh) | 2020-05-25 | 2021-05-20 | 曝光装置、曝光方法以及物品的制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020090174A JP7570826B2 (ja) | 2020-05-25 | 2020-05-25 | 露光装置、露光方法、及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021185393A JP2021185393A (ja) | 2021-12-09 |
| JP2021185393A5 true JP2021185393A5 (enExample) | 2023-05-23 |
| JP7570826B2 JP7570826B2 (ja) | 2024-10-22 |
Family
ID=78672714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020090174A Active JP7570826B2 (ja) | 2020-05-25 | 2020-05-25 | 露光装置、露光方法、及び物品の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7570826B2 (enExample) |
| KR (1) | KR20210145658A (enExample) |
| CN (1) | CN113721427B (enExample) |
| TW (1) | TWI851886B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7751484B2 (ja) * | 2021-12-27 | 2025-10-08 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3044778B2 (ja) * | 1990-11-14 | 2000-05-22 | 株式会社ニコン | 投影露光装置および投影露光方法 |
| JP2936190B2 (ja) * | 1992-11-25 | 1999-08-23 | 株式会社ニコン | 投影露光装置、露光方法および半導体集積回路の製造方法 |
| JP2884950B2 (ja) * | 1992-10-09 | 1999-04-19 | 株式会社ニコン | 投影露光装置、露光方法および半導体集積回路の製造方法 |
| US5552856A (en) * | 1993-06-14 | 1996-09-03 | Nikon Corporation | Projection exposure apparatus |
| JPH11317362A (ja) * | 1999-03-05 | 1999-11-16 | Nikon Corp | 走査型露光装置、および該装置を用いるデバイス製造方法 |
| US7723014B2 (en) | 2005-10-26 | 2010-05-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for photolithography in semiconductor manufacturing |
| WO2010032753A1 (ja) * | 2008-09-18 | 2010-03-25 | 株式会社ニコン | 開口絞り、光学系、露光装置及び電子デバイスの製造方法 |
| KR101855612B1 (ko) * | 2012-08-28 | 2018-05-04 | 가부시키가이샤 니콘 | 패턴 형성 장치, 및 기판 지지 장치 |
| JP2014135368A (ja) * | 2013-01-09 | 2014-07-24 | Canon Inc | 露光装置、計測方法及びデバイスの製造方法 |
| JP5843905B2 (ja) * | 2013-04-23 | 2016-01-13 | キヤノン株式会社 | 照明光学系、露光装置及びデバイス製造方法 |
| DE102016217929A1 (de) * | 2016-09-20 | 2018-03-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
| JP2018054992A (ja) * | 2016-09-30 | 2018-04-05 | キヤノン株式会社 | 照明光学系、露光装置、及び物品の製造方法 |
| CN111656284B (zh) | 2018-01-24 | 2024-04-12 | 株式会社尼康 | 曝光装置及曝光方法 |
-
2020
- 2020-05-25 JP JP2020090174A patent/JP7570826B2/ja active Active
-
2021
- 2021-03-30 TW TW110111515A patent/TWI851886B/zh active
- 2021-04-06 KR KR1020210044373A patent/KR20210145658A/ko not_active Ceased
- 2021-05-20 CN CN202110549216.3A patent/CN113721427B/zh active Active
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