JP2021067734A5 - - Google Patents

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Publication number
JP2021067734A5
JP2021067734A5 JP2019191156A JP2019191156A JP2021067734A5 JP 2021067734 A5 JP2021067734 A5 JP 2021067734A5 JP 2019191156 A JP2019191156 A JP 2019191156A JP 2019191156 A JP2019191156 A JP 2019191156A JP 2021067734 A5 JP2021067734 A5 JP 2021067734A5
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JP
Japan
Prior art keywords
optical system
projection optical
original
entrance pupil
light
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Application number
JP2019191156A
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English (en)
Japanese (ja)
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JP2021067734A (ja
JP7378265B2 (ja
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Priority to JP2019191156A priority Critical patent/JP7378265B2/ja
Priority claimed from JP2019191156A external-priority patent/JP7378265B2/ja
Priority to US17/069,146 priority patent/US11656554B2/en
Priority to KR1020200131555A priority patent/KR102865160B1/ko
Publication of JP2021067734A publication Critical patent/JP2021067734A/ja
Publication of JP2021067734A5 publication Critical patent/JP2021067734A5/ja
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Publication of JP7378265B2 publication Critical patent/JP7378265B2/ja
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JP2019191156A 2019-10-18 2019-10-18 露光装置、露光方法及び物品の製造方法 Active JP7378265B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2019191156A JP7378265B2 (ja) 2019-10-18 2019-10-18 露光装置、露光方法及び物品の製造方法
US17/069,146 US11656554B2 (en) 2019-10-18 2020-10-13 Exposure apparatus, exposure method, and method of manufacturing article
KR1020200131555A KR102865160B1 (ko) 2019-10-18 2020-10-13 노광 장치, 노광 방법 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019191156A JP7378265B2 (ja) 2019-10-18 2019-10-18 露光装置、露光方法及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021067734A JP2021067734A (ja) 2021-04-30
JP2021067734A5 true JP2021067734A5 (enExample) 2022-10-17
JP7378265B2 JP7378265B2 (ja) 2023-11-13

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JP2019191156A Active JP7378265B2 (ja) 2019-10-18 2019-10-18 露光装置、露光方法及び物品の製造方法

Country Status (3)

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US (1) US11656554B2 (enExample)
JP (1) JP7378265B2 (enExample)
KR (1) KR102865160B1 (enExample)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3548464B2 (ja) * 1999-09-01 2004-07-28 キヤノン株式会社 露光方法及び走査型露光装置
JP2001250761A (ja) 2000-03-06 2001-09-14 Canon Inc 露光収差補正方法
WO2005022614A1 (ja) 2003-08-28 2005-03-10 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
JP4425239B2 (ja) 2005-05-16 2010-03-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
US7511799B2 (en) 2006-01-27 2009-03-31 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method
JP2009010131A (ja) * 2007-06-27 2009-01-15 Canon Inc 露光装置及びデバイス製造方法
US7855776B2 (en) 2008-03-26 2010-12-21 Qimonda Ag Methods of compensating lens heating, lithographic projection system and photo mask
US20100290020A1 (en) * 2009-05-15 2010-11-18 Shinichi Mori Optical apparatus, exposure apparatus, exposure method, and method for producing device
JP5662717B2 (ja) 2010-07-08 2015-02-04 キヤノン株式会社 露光装置及びデバイスの製造方法
JP6260847B2 (ja) 2013-02-23 2018-01-17 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
US10890849B2 (en) 2016-05-19 2021-01-12 Nikon Corporation EUV lithography system for dense line patterning
WO2018194975A2 (en) * 2017-04-19 2018-10-25 Nikon Corporation Figoptical objective for operation in euv spectral region

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