JPH10170399A5 - - Google Patents

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Publication number
JPH10170399A5
JPH10170399A5 JP1996326988A JP32698896A JPH10170399A5 JP H10170399 A5 JPH10170399 A5 JP H10170399A5 JP 1996326988 A JP1996326988 A JP 1996326988A JP 32698896 A JP32698896 A JP 32698896A JP H10170399 A5 JPH10170399 A5 JP H10170399A5
Authority
JP
Japan
Prior art keywords
optical system
aberration
aerial image
image
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996326988A
Other languages
English (en)
Japanese (ja)
Other versions
JP3612903B2 (ja
JPH10170399A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP32698896A priority Critical patent/JP3612903B2/ja
Priority claimed from JP32698896A external-priority patent/JP3612903B2/ja
Publication of JPH10170399A publication Critical patent/JPH10170399A/ja
Publication of JPH10170399A5 publication Critical patent/JPH10170399A5/ja
Application granted granted Critical
Publication of JP3612903B2 publication Critical patent/JP3612903B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP32698896A 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法 Expired - Lifetime JP3612903B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32698896A JP3612903B2 (ja) 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32698896A JP3612903B2 (ja) 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH10170399A JPH10170399A (ja) 1998-06-26
JPH10170399A5 true JPH10170399A5 (enExample) 2004-12-24
JP3612903B2 JP3612903B2 (ja) 2005-01-26

Family

ID=18194056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32698896A Expired - Lifetime JP3612903B2 (ja) 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3612903B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003257812A (ja) 2002-02-27 2003-09-12 Nikon Corp 結像光学系の評価方法、結像光学系の調整方法、露光装置および露光方法
DE10327019A1 (de) 2003-06-12 2004-12-30 Carl Zeiss Sms Gmbh Verfahren zur Bestimmung der Abbildungsgüte eines optischen Abbildungssystems
US20050259269A1 (en) * 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
US7518703B2 (en) * 2005-06-28 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and method
US7557934B2 (en) * 2006-12-07 2009-07-07 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2008186912A (ja) * 2007-01-29 2008-08-14 Nikon Corp 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
WO2008153023A1 (ja) * 2007-06-11 2008-12-18 Nikon Corporation 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
US8692974B2 (en) * 2007-06-14 2014-04-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control
NL1036026A1 (nl) * 2007-10-10 2009-04-15 Asml Netherlands Bv Apparatus and method for obtaining information indicative of the uniformity of a projection system of a lithographic apparatus.
JP5391085B2 (ja) * 2010-01-06 2014-01-15 キヤノン株式会社 計測方法、計測装置及び露光装置
JP6116457B2 (ja) * 2013-09-26 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス 描画装置
CN107389319A (zh) * 2017-08-03 2017-11-24 豪威半导体（上海）有限责任公司 模组镜头测试方法及系统
CN110149506A (zh) * 2019-06-28 2019-08-20 浙江水晶光电科技股份有限公司 图像投影检测设备及图像投影检测方法
JP7361599B2 (ja) * 2019-12-26 2023-10-16 キヤノン株式会社 露光装置および物品製造方法

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