JP3612903B2 - 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法 - Google Patents

収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法 Download PDF

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Publication number
JP3612903B2
JP3612903B2 JP32698896A JP32698896A JP3612903B2 JP 3612903 B2 JP3612903 B2 JP 3612903B2 JP 32698896 A JP32698896 A JP 32698896A JP 32698896 A JP32698896 A JP 32698896A JP 3612903 B2 JP3612903 B2 JP 3612903B2
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optical system
image
aberration
aerial image
test
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JP32698896A
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Japanese (ja)
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JPH10170399A (ja
JPH10170399A5 (enExample
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匡 長山
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Nikon Corp
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Nikon Corp
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  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP32698896A 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法 Expired - Lifetime JP3612903B2 (ja)

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JP32698896A JP3612903B2 (ja) 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法

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JP32698896A JP3612903B2 (ja) 1996-12-06 1996-12-06 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法

Publications (3)

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JPH10170399A JPH10170399A (ja) 1998-06-26
JPH10170399A5 JPH10170399A5 (enExample) 2004-12-24
JP3612903B2 true JP3612903B2 (ja) 2005-01-26

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003257812A (ja) 2002-02-27 2003-09-12 Nikon Corp 結像光学系の評価方法、結像光学系の調整方法、露光装置および露光方法
DE10327019A1 (de) 2003-06-12 2004-12-30 Carl Zeiss Sms Gmbh Verfahren zur Bestimmung der Abbildungsgüte eines optischen Abbildungssystems
US20050259269A1 (en) * 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
US7518703B2 (en) * 2005-06-28 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and method
US7557934B2 (en) * 2006-12-07 2009-07-07 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2008186912A (ja) * 2007-01-29 2008-08-14 Nikon Corp 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
WO2008153023A1 (ja) * 2007-06-11 2008-12-18 Nikon Corporation 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
US8692974B2 (en) * 2007-06-14 2014-04-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control
NL1036026A1 (nl) * 2007-10-10 2009-04-15 Asml Netherlands Bv Apparatus and method for obtaining information indicative of the uniformity of a projection system of a lithographic apparatus.
JP5391085B2 (ja) * 2010-01-06 2014-01-15 キヤノン株式会社 計測方法、計測装置及び露光装置
JP6116457B2 (ja) * 2013-09-26 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス 描画装置
CN107389319A (zh) * 2017-08-03 2017-11-24 豪威半导体（上海）有限责任公司 模组镜头测试方法及系统
CN110149506A (zh) * 2019-06-28 2019-08-20 浙江水晶光电科技股份有限公司 图像投影检测设备及图像投影检测方法
JP7361599B2 (ja) * 2019-12-26 2023-10-16 キヤノン株式会社 露光装置および物品製造方法

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