JP2003163152A5 - - Google Patents

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Publication number
JP2003163152A5
JP2003163152A5 JP2001360923A JP2001360923A JP2003163152A5 JP 2003163152 A5 JP2003163152 A5 JP 2003163152A5 JP 2001360923 A JP2001360923 A JP 2001360923A JP 2001360923 A JP2001360923 A JP 2001360923A JP 2003163152 A5 JP2003163152 A5 JP 2003163152A5
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JP
Japan
Prior art keywords
pupil
illumination
mask
radius
optical system
Prior art date
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Granted
Application number
JP2001360923A
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English (en)
Japanese (ja)
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JP3962581B2 (ja
JP2003163152A (ja
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Priority to JP2001360923A priority Critical patent/JP3962581B2/ja
Priority claimed from JP2001360923A external-priority patent/JP3962581B2/ja
Publication of JP2003163152A publication Critical patent/JP2003163152A/ja
Publication of JP2003163152A5 publication Critical patent/JP2003163152A5/ja
Application granted granted Critical
Publication of JP3962581B2 publication Critical patent/JP3962581B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001360923A 2001-11-27 2001-11-27 露光方法及びデバイス製造方法 Expired - Fee Related JP3962581B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001360923A JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001360923A JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2003163152A JP2003163152A (ja) 2003-06-06
JP2003163152A5 true JP2003163152A5 (enExample) 2005-06-16
JP3962581B2 JP3962581B2 (ja) 2007-08-22

Family

ID=19171664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001360923A Expired - Fee Related JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

Country Status (1)

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JP (1) JP3962581B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7331676B2 (en) * 2005-02-09 2008-02-19 Coherent, Inc. Apparatus for projecting a reduced image of a photomask using a schwarzschild objective
JP4921512B2 (ja) * 2009-04-13 2012-04-25 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
CN118169959A (zh) 2017-10-11 2024-06-11 Asml荷兰有限公司 图案化过程的优化流程

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