JP3962581B2 - 露光方法及びデバイス製造方法 - Google Patents

露光方法及びデバイス製造方法 Download PDF

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Publication number
JP3962581B2
JP3962581B2 JP2001360923A JP2001360923A JP3962581B2 JP 3962581 B2 JP3962581 B2 JP 3962581B2 JP 2001360923 A JP2001360923 A JP 2001360923A JP 2001360923 A JP2001360923 A JP 2001360923A JP 3962581 B2 JP3962581 B2 JP 3962581B2
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Japan
Prior art keywords
light
optical system
order diffracted
diffracted light
pupil
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Expired - Fee Related
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JP2001360923A
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Japanese (ja)
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JP2003163152A5 (enExample
JP2003163152A (ja
Inventor
美代子 川島
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001360923A 2001-11-27 2001-11-27 露光方法及びデバイス製造方法 Expired - Fee Related JP3962581B2 (ja)

Priority Applications (1)

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JP2001360923A JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

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Application Number Priority Date Filing Date Title
JP2001360923A JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

Publications (3)

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JP2003163152A JP2003163152A (ja) 2003-06-06
JP2003163152A5 JP2003163152A5 (enExample) 2005-06-16
JP3962581B2 true JP3962581B2 (ja) 2007-08-22

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JP2001360923A Expired - Fee Related JP3962581B2 (ja) 2001-11-27 2001-11-27 露光方法及びデバイス製造方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7331676B2 (en) * 2005-02-09 2008-02-19 Coherent, Inc. Apparatus for projecting a reduced image of a photomask using a schwarzschild objective
JP4921512B2 (ja) * 2009-04-13 2012-04-25 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
CN118169959A (zh) 2017-10-11 2024-06-11 Asml荷兰有限公司 图案化过程的优化流程

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JP2003163152A (ja) 2003-06-06

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