JP2021163961A5 - - Google Patents

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Publication number
JP2021163961A5
JP2021163961A5 JP2021017737A JP2021017737A JP2021163961A5 JP 2021163961 A5 JP2021163961 A5 JP 2021163961A5 JP 2021017737 A JP2021017737 A JP 2021017737A JP 2021017737 A JP2021017737 A JP 2021017737A JP 2021163961 A5 JP2021163961 A5 JP 2021163961A5
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JP
Japan
Prior art keywords
curing
photocurable material
region
area
spatial modulator
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JP2021017737A
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English (en)
Japanese (ja)
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JP7650157B2 (ja
JP2021163961A (ja
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Priority claimed from US16/835,039 external-priority patent/US11199774B2/en
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JP2021017737A 2020-03-30 2021-02-05 はみ出し制御のための枠硬化分解能を改善する方法および装置 Active JP7650157B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/835,039 US11199774B2 (en) 2020-03-30 2020-03-30 Method and apparatus to improve frame cure imaging resolution for extrusion control
US16/835,039 2020-03-30

Publications (3)

Publication Number Publication Date
JP2021163961A JP2021163961A (ja) 2021-10-11
JP2021163961A5 true JP2021163961A5 (enExample) 2024-02-08
JP7650157B2 JP7650157B2 (ja) 2025-03-24

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JP2021017737A Active JP7650157B2 (ja) 2020-03-30 2021-02-05 はみ出し制御のための枠硬化分解能を改善する方法および装置

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US (1) US11199774B2 (enExample)
JP (1) JP7650157B2 (enExample)
KR (1) KR102813176B1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12321103B2 (en) 2021-12-20 2025-06-03 Canon Kabushiki Kaisha System and method of generating a set of illumination patterns for use in a photomechanical shaping system

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5912773A (en) 1997-03-21 1999-06-15 Texas Instruments Incorporated Apparatus for spatial light modulator registration and retention
US20020104970A1 (en) * 1999-01-06 2002-08-08 Winter Stacey J. Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
US6476986B2 (en) 1999-12-28 2002-11-05 Texas Instruments Incorporated Six-axis attachment apparatus and method for spatial light modulators
US7302111B2 (en) 2001-09-12 2007-11-27 Micronic Laser Systems A.B. Graphics engine for high precision lithography
JP2008244194A (ja) * 2007-03-28 2008-10-09 Nuflare Technology Inc 電子ビーム描画装置及び電子ビーム描画方法
US9034542B2 (en) * 2011-06-25 2015-05-19 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
JP2016042498A (ja) 2014-08-13 2016-03-31 キヤノン株式会社 インプリント装置および物品製造方法
JP6674306B2 (ja) 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法
TWI723178B (zh) * 2016-06-10 2021-04-01 美商應用材料股份有限公司 微型裝置的無遮罩並行取放轉印
JP7062953B2 (ja) * 2016-08-29 2022-05-09 東レ株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ表示装置、半導体電子部品、半導体装置
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
CN110337611B (zh) * 2016-12-20 2024-08-16 Ev集团E·索尔纳有限责任公司 将一光敏层曝光之装置及方法
US9971249B1 (en) 2017-02-27 2018-05-15 Canon Kabushiki Kaisha Method and system for controlled ultraviolet light exposure
JP6750088B2 (ja) * 2017-03-01 2020-09-02 旭化成株式会社 感光性樹脂組成物
JP6686090B2 (ja) 2017-10-23 2020-04-22 キヤノン株式会社 インプリント装置及び物品の製造方法
CN112166023A (zh) * 2018-02-15 2021-01-01 Ddm系统有限责任公司 铸造技术，铸件以及三维打印系统和方法
KR102442297B1 (ko) * 2018-03-20 2022-09-13 후지필름 가부시키가이샤 감광성 조성물, 막, 패턴의 형성 방법, 컬러 필터, 고체 촬상 소자, 및 화상 표시 장치
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template

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