KR102813176B1 - 압출 제어를 위한 프레임 경화 이미징 해상도를 개선하기 위한 방법 및 장치 - Google Patents

압출 제어를 위한 프레임 경화 이미징 해상도를 개선하기 위한 방법 및 장치 Download PDF

Info

Publication number
KR102813176B1
KR102813176B1 KR1020210035660A KR20210035660A KR102813176B1 KR 102813176 B1 KR102813176 B1 KR 102813176B1 KR 1020210035660 A KR1020210035660 A KR 1020210035660A KR 20210035660 A KR20210035660 A KR 20210035660A KR 102813176 B1 KR102813176 B1 KR 102813176B1
Authority
KR
South Korea
Prior art keywords
curing
region
dsm
dose
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020210035660A
Other languages
English (en)
Korean (ko)
Other versions
KR20210122103A (ko
Inventor
닐라브 케이 로이
안슈만 체랄라
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20210122103A publication Critical patent/KR20210122103A/ko
Application granted granted Critical
Publication of KR102813176B1 publication Critical patent/KR102813176B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
    • H04N9/3111—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying the colours sequentially, e.g. by using sequentially activated light sources
    • H04N9/3114—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying the colours sequentially, e.g. by using sequentially activated light sources by using a sequential colour filter producing one colour at a time
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020210035660A 2020-03-30 2021-03-19 압출 제어를 위한 프레임 경화 이미징 해상도를 개선하기 위한 방법 및 장치 Active KR102813176B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/835,039 2020-03-30
US16/835,039 US11199774B2 (en) 2020-03-30 2020-03-30 Method and apparatus to improve frame cure imaging resolution for extrusion control

Publications (2)

Publication Number Publication Date
KR20210122103A KR20210122103A (ko) 2021-10-08
KR102813176B1 true KR102813176B1 (ko) 2025-05-28

Family

ID=77854550

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210035660A Active KR102813176B1 (ko) 2020-03-30 2021-03-19 압출 제어를 위한 프레임 경화 이미징 해상도를 개선하기 위한 방법 및 장치

Country Status (3)

Country Link
US (1) US11199774B2 (enExample)
JP (1) JP7650157B2 (enExample)
KR (1) KR102813176B1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12321103B2 (en) 2021-12-20 2025-06-03 Canon Kabushiki Kaisha System and method of generating a set of illumination patterns for use in a photomechanical shaping system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080237493A1 (en) 2007-03-28 2008-10-02 Nuflare Technology, Inc. Electron beam lithography system
US20140229904A1 (en) 2011-06-25 2014-08-14 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
US20160046045A1 (en) 2014-08-13 2016-02-18 Canon Kabushiki Kaisha Imprint apparatus, illumination optical system, and article manufacturing method

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5912773A (en) 1997-03-21 1999-06-15 Texas Instruments Incorporated Apparatus for spatial light modulator registration and retention
US20020104970A1 (en) * 1999-01-06 2002-08-08 Winter Stacey J. Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
US6476986B2 (en) 1999-12-28 2002-11-05 Texas Instruments Incorporated Six-axis attachment apparatus and method for spatial light modulators
US7302111B2 (en) * 2001-09-12 2007-11-27 Micronic Laser Systems A.B. Graphics engine for high precision lithography
JP6674306B2 (ja) 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法
US10153325B2 (en) * 2016-06-10 2018-12-11 Applied Materials, Inc. Maskless parallel pick-and-place transfer of micro-devices
JP7062953B2 (ja) * 2016-08-29 2022-05-09 東レ株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ表示装置、半導体電子部品、半導体装置
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
CN114185250B (zh) 2016-12-20 2024-12-06 Ev集团E·索尔纳有限责任公司 将一光敏层曝光之装置及方法
US9971249B1 (en) 2017-02-27 2018-05-15 Canon Kabushiki Kaisha Method and system for controlled ultraviolet light exposure
CN116300314A (zh) * 2017-03-01 2023-06-23 旭化成株式会社 感光性树脂组合物
JP6686090B2 (ja) 2017-10-23 2020-04-22 キヤノン株式会社 インプリント装置及び物品の製造方法
CN112166023A (zh) * 2018-02-15 2021-01-01 Ddm系统有限责任公司 铸造技术，铸件以及三维打印系统和方法
KR102442297B1 (ko) * 2018-03-20 2022-09-13 후지필름 가부시키가이샤 감광성 조성물, 막, 패턴의 형성 방법, 컬러 필터, 고체 촬상 소자, 및 화상 표시 장치
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080237493A1 (en) 2007-03-28 2008-10-02 Nuflare Technology, Inc. Electron beam lithography system
US20140229904A1 (en) 2011-06-25 2014-08-14 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
US20160046045A1 (en) 2014-08-13 2016-02-18 Canon Kabushiki Kaisha Imprint apparatus, illumination optical system, and article manufacturing method

Also Published As

Publication number Publication date
US11199774B2 (en) 2021-12-14
KR20210122103A (ko) 2021-10-08
US20210302829A1 (en) 2021-09-30
JP7650157B2 (ja) 2025-03-24
JP2021163961A (ja) 2021-10-11

Similar Documents

Publication Publication Date Title
US5247180A (en) Stereolithographic apparatus and method of use
US7271877B2 (en) Method and apparatus for maskless photolithography
KR100895566B1 (ko) 광 조형 방법
TWI497232B (zh) 用於轉換微影裝置中基於向量之所要器件圖案表示之裝置與方法、用於提供資料至可程式化圖案化器件之裝置與方法、微影裝置及器件製造方法
US20220363010A1 (en) Volumetric microlithography
JP7345769B2 (ja) 直接描画露光システム及び直接描画露光方法
JP5133841B2 (ja) スライス画像生成方法および造形装置
JP7598359B2 (ja) ウェハプロセス、物品を製造する装置および方法
KR102813176B1 (ko) 압출 제어를 위한 프레임 경화 이미징 해상도를 개선하기 위한 방법 및 장치
CN104040434B (zh) 光刻装置、用于提供设置点数据的装置、设备制造方法、用于提供设置点数据的方法
US11768445B2 (en) Method and apparatus to register template with spatial light modulator
US9488921B2 (en) Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program
US12498644B2 (en) Method and apparatus for identifying positions of a spatial light modulator relative to a template edge
TWI755963B (zh) 形成三維微結構的方法和裝置
KR20240130023A (ko) 액적 패턴을 생성하기 위한 시스템, 장치 및 방법
KR20110106079A (ko) 공간 광변조기를 이용한 리소그라피 장치를 이용한 리소그라피 방법

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20210319

PG1501 Laying open of application
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20220919

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20210319

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20240726

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20250317

PG1601 Publication of registration