JP7650157B2 - はみ出し制御のための枠硬化分解能を改善する方法および装置 - Google Patents

はみ出し制御のための枠硬化分解能を改善する方法および装置 Download PDF

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Publication number
JP7650157B2
JP7650157B2 JP2021017737A JP2021017737A JP7650157B2 JP 7650157 B2 JP7650157 B2 JP 7650157B2 JP 2021017737 A JP2021017737 A JP 2021017737A JP 2021017737 A JP2021017737 A JP 2021017737A JP 7650157 B2 JP7650157 B2 JP 7650157B2
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Prior art keywords
curing
region
cure
dose
pitch
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Japanese (ja)
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JP2021163961A5 (enExample
JP2021163961A (ja
Inventor
ケー ロイ ニラブ
チェララ アンシュマン
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
    • H04N9/3111—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying the colours sequentially, e.g. by using sequentially activated light sources
    • H04N9/3114—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying the colours sequentially, e.g. by using sequentially activated light sources by using a sequential colour filter producing one colour at a time
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021017737A 2020-03-30 2021-02-05 はみ出し制御のための枠硬化分解能を改善する方法および装置 Active JP7650157B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/835,039 2020-03-30
US16/835,039 US11199774B2 (en) 2020-03-30 2020-03-30 Method and apparatus to improve frame cure imaging resolution for extrusion control

Publications (3)

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JP2021163961A JP2021163961A (ja) 2021-10-11
JP2021163961A5 JP2021163961A5 (enExample) 2024-02-08
JP7650157B2 true JP7650157B2 (ja) 2025-03-24

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JP2021017737A Active JP7650157B2 (ja) 2020-03-30 2021-02-05 はみ出し制御のための枠硬化分解能を改善する方法および装置

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Country Link
US (1) US11199774B2 (enExample)
JP (1) JP7650157B2 (enExample)
KR (1) KR102813176B1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12321103B2 (en) 2021-12-20 2025-06-03 Canon Kabushiki Kaisha System and method of generating a set of illumination patterns for use in a photomechanical shaping system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005502909A (ja) 2001-09-12 2005-01-27 マイクロニック レーザー システムズ アクチボラゲット 高精度リソグラフィ用グラフィックス・エンジン
JP2018092997A (ja) 2016-11-30 2018-06-14 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2019080047A (ja) 2017-10-23 2019-05-23 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2020502577A (ja) 2016-12-20 2020-01-23 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 感光性の層を露光するための装置および方法

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US5912773A (en) 1997-03-21 1999-06-15 Texas Instruments Incorporated Apparatus for spatial light modulator registration and retention
US20020104970A1 (en) * 1999-01-06 2002-08-08 Winter Stacey J. Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
US6476986B2 (en) 1999-12-28 2002-11-05 Texas Instruments Incorporated Six-axis attachment apparatus and method for spatial light modulators
JP2008244194A (ja) * 2007-03-28 2008-10-09 Nuflare Technology Inc 電子ビーム描画装置及び電子ビーム描画方法
US9034542B2 (en) * 2011-06-25 2015-05-19 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
JP2016042498A (ja) 2014-08-13 2016-03-31 キヤノン株式会社 インプリント装置および物品製造方法
JP6674306B2 (ja) 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法
US10153325B2 (en) * 2016-06-10 2018-12-11 Applied Materials, Inc. Maskless parallel pick-and-place transfer of micro-devices
JP7062953B2 (ja) * 2016-08-29 2022-05-09 東レ株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ表示装置、半導体電子部品、半導体装置
US9971249B1 (en) 2017-02-27 2018-05-15 Canon Kabushiki Kaisha Method and system for controlled ultraviolet light exposure
CN116300314A (zh) * 2017-03-01 2023-06-23 旭化成株式会社 感光性树脂组合物
CN112166023A (zh) * 2018-02-15 2021-01-01 Ddm系统有限责任公司 铸造技术，铸件以及三维打印系统和方法
KR102442297B1 (ko) * 2018-03-20 2022-09-13 후지필름 가부시키가이샤 감광성 조성물, 막, 패턴의 형성 방법, 컬러 필터, 고체 촬상 소자, 및 화상 표시 장치
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005502909A (ja) 2001-09-12 2005-01-27 マイクロニック レーザー システムズ アクチボラゲット 高精度リソグラフィ用グラフィックス・エンジン
JP2018092997A (ja) 2016-11-30 2018-06-14 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2020502577A (ja) 2016-12-20 2020-01-23 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 感光性の層を露光するための装置および方法
JP2019080047A (ja) 2017-10-23 2019-05-23 キヤノン株式会社 インプリント装置及び物品の製造方法

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Publication number Publication date
KR102813176B1 (ko) 2025-05-28
US11199774B2 (en) 2021-12-14
KR20210122103A (ko) 2021-10-08
US20210302829A1 (en) 2021-09-30
JP2021163961A (ja) 2021-10-11

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