JP2021072405A5 - - Google Patents

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Publication number
JP2021072405A5
JP2021072405A5 JP2019199623A JP2019199623A JP2021072405A5 JP 2021072405 A5 JP2021072405 A5 JP 2021072405A5 JP 2019199623 A JP2019199623 A JP 2019199623A JP 2019199623 A JP2019199623 A JP 2019199623A JP 2021072405 A5 JP2021072405 A5 JP 2021072405A5
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JP
Japan
Prior art keywords
valve
gas supply
gas
substrate processing
air
Prior art date
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Application number
JP2019199623A
Other languages
English (en)
Japanese (ja)
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JP2021072405A (ja
JP7373968B2 (ja
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Publication date
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Priority claimed from JP2019199623A external-priority patent/JP7373968B2/ja
Priority to JP2019199623A priority Critical patent/JP7373968B2/ja
Priority to TW109136078A priority patent/TWI853108B/zh
Priority to KR1020200136122A priority patent/KR102782426B1/ko
Priority to CN202011144922.1A priority patent/CN112786424B/zh
Priority to US17/079,947 priority patent/US11538665B2/en
Publication of JP2021072405A publication Critical patent/JP2021072405A/ja
Publication of JP2021072405A5 publication Critical patent/JP2021072405A5/ja
Publication of JP7373968B2 publication Critical patent/JP7373968B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2019199623A 2019-11-01 2019-11-01 ガス供給システム Active JP7373968B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019199623A JP7373968B2 (ja) 2019-11-01 2019-11-01 ガス供給システム
TW109136078A TWI853108B (zh) 2019-11-01 2020-10-19 氣體供給系統、基板處理裝置及氣體供給系統之控制方法
KR1020200136122A KR102782426B1 (ko) 2019-11-01 2020-10-20 가스 공급 시스템, 기판 처리 장치 및 가스 공급 시스템의 제어 방법
CN202011144922.1A CN112786424B (zh) 2019-11-01 2020-10-23 气体供给系统、基板处理装置和气体供给系统的控制方法
US17/079,947 US11538665B2 (en) 2019-11-01 2020-10-26 Gas supply system, substrate processing apparatus, and control method for gas supply system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019199623A JP7373968B2 (ja) 2019-11-01 2019-11-01 ガス供給システム

Publications (3)

Publication Number Publication Date
JP2021072405A JP2021072405A (ja) 2021-05-06
JP2021072405A5 true JP2021072405A5 (https=) 2022-09-16
JP7373968B2 JP7373968B2 (ja) 2023-11-06

Family

ID=75687779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019199623A Active JP7373968B2 (ja) 2019-11-01 2019-11-01 ガス供給システム

Country Status (5)

Country Link
US (1) US11538665B2 (https=)
JP (1) JP7373968B2 (https=)
KR (1) KR102782426B1 (https=)
CN (1) CN112786424B (https=)
TW (1) TWI853108B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11437230B2 (en) 2020-04-06 2022-09-06 Applied Materials, Inc. Amorphous carbon multilayer coating with directional protection
US12068135B2 (en) 2021-02-12 2024-08-20 Applied Materials, Inc. Fast gas exchange apparatus, system, and method
JP7653860B2 (ja) * 2021-07-30 2025-03-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
KR20250002454A (ko) * 2022-05-02 2025-01-07 램 리써치 코포레이션 가스 공급 라인 배열
KR102779634B1 (ko) * 2022-12-28 2025-03-12 세메스 주식회사 액 공급장치, 기판처리장치 및 기판처리방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0691038B2 (ja) 1988-08-12 1994-11-14 日本電気株式会社 ガス供給装置
JP4078982B2 (ja) * 2002-04-22 2008-04-23 東京エレクトロン株式会社 処理システム及び流量測定方法
JP2007048926A (ja) 2005-08-10 2007-02-22 Tokyo Electron Ltd Ｗ系膜の成膜方法、ゲート電極の形成方法、半導体装置の製造方法およびコンピュータ読取可能な記憶媒体
KR100694666B1 (ko) * 2005-08-24 2007-03-13 삼성전자주식회사 원자층 증착 챔버의 에어 밸브 장치
JP2009076856A (ja) * 2007-08-28 2009-04-09 Dainippon Screen Mfg Co Ltd 基板処理装置
CN101276732A (zh) * 2008-03-25 2008-10-01 大连八方经济技术有限公司 一种微电子气源柜吹扫系统
JP5378706B2 (ja) * 2008-05-22 2013-12-25 東京エレクトロン株式会社 プラズマ処理装置及びそれに用いられる処理ガス供給装置
JP6023854B1 (ja) * 2015-06-09 2016-11-09 株式会社日立国際電気 半導体装置の製造方法、基板処理装置およびプログラム
JP6571022B2 (ja) * 2016-02-04 2019-09-04 東京エレクトロン株式会社 基板処理装置
JP6091038B1 (ja) * 2016-10-28 2017-03-08 大成ラミック株式会社 包装袋
JP2019054140A (ja) * 2017-09-15 2019-04-04 東芝メモリ株式会社 半導体製造装置
JP6902991B2 (ja) 2017-12-19 2021-07-14 株式会社日立ハイテク プラズマ処理装置
KR20190090494A (ko) * 2018-01-25 2019-08-02 주식회사 명신 전자소재 제조장치의 가스배관 시스템 및 퍼지가스의 역류를 방지시스템

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