JP2020535425A5 - - Google Patents

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Publication number
JP2020535425A5
JP2020535425A5 JP2020517826A JP2020517826A JP2020535425A5 JP 2020535425 A5 JP2020535425 A5 JP 2020535425A5 JP 2020517826 A JP2020517826 A JP 2020517826A JP 2020517826 A JP2020517826 A JP 2020517826A JP 2020535425 A5 JP2020535425 A5 JP 2020535425A5
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JP
Japan
Prior art keywords
optical element
calculation
coordinate system
interference measurement
shape
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Pending
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JP2020517826A
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English (en)
Japanese (ja)
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JP2020535425A (ja
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Priority claimed from DE102017217371.8A external-priority patent/DE102017217371A1/de
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Publication of JP2020535425A publication Critical patent/JP2020535425A/ja
Publication of JP2020535425A5 publication Critical patent/JP2020535425A5/ja
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JP2020517826A 2017-09-29 2018-09-04 光学素子の表面形状を特性化する方法及び装置 Pending JP2020535425A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017217371.8 2017-09-29
DE102017217371.8A DE102017217371A1 (de) 2017-09-29 2017-09-29 Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
PCT/EP2018/073703 WO2019063247A1 (de) 2017-09-29 2018-09-04 Verfahren und vorrichtung zur charakterisierung der oberflächenform eines optischen elements

Publications (2)

Publication Number Publication Date
JP2020535425A JP2020535425A (ja) 2020-12-03
JP2020535425A5 true JP2020535425A5 (enExample) 2021-10-14

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ID=63592689

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JP2020517826A Pending JP2020535425A (ja) 2017-09-29 2018-09-04 光学素子の表面形状を特性化する方法及び装置

Country Status (5)

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US (1) US11118900B2 (enExample)
JP (1) JP2020535425A (enExample)
CN (1) CN111148964B (enExample)
DE (1) DE102017217371A1 (enExample)
WO (1) WO2019063247A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017217251A1 (de) 2017-09-27 2019-03-28 Carl Zeiss Smt Gmbh Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems
WO2019081187A1 (en) 2017-10-25 2019-05-02 Carl Zeiss Smt Gmbh METHOD FOR REGULATING THE TEMPERATURE OF A COMPONENT
US12053240B2 (en) * 2020-05-20 2024-08-06 Arizona Optical Metrology Llc Systems and methods for measurement of optical wavefronts
WO2022170160A1 (en) * 2021-02-07 2022-08-11 Arizona Optical Metrology Llc Alignment of a measurement optical system and a sample under test
DE102021211172B3 (de) 2021-10-04 2023-03-23 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
DE102022209513A1 (de) 2022-09-12 2023-10-19 Carl Zeiss Smt Gmbh Verfahren zum Kalibrieren einer sphärischen Welle, sowie Prüfsystem zur interferometrischen Bestimmung der Oberflächenform eines Prüflings

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5416586A (en) * 1993-10-15 1995-05-16 Tropel Corporation Method of testing aspherical optical surfaces with an interferometer
US6956657B2 (en) 2001-12-18 2005-10-18 Qed Technologies, Inc. Method for self-calibrated sub-aperture stitching for surface figure measurement
JP2005345260A (ja) * 2004-06-03 2005-12-15 Canon Inc 平面干渉計測方法および平面干渉計測装置
US7221461B2 (en) * 2004-08-13 2007-05-22 Zygo Corporation Method and apparatus for interferometric measurement of components with large aspect ratios
DE102008048844A1 (de) * 2007-09-25 2009-05-14 Carl Zeiss Smt Ag Verfahren und System zum Vermessen einer Oberfläche eines Objektes
WO2009126269A2 (en) * 2008-04-08 2009-10-15 Qed Technologies International, Inc. Stitching of near-nulled subaperture measurements
JP5483993B2 (ja) * 2009-10-20 2014-05-07 キヤノン株式会社 干渉計
KR101336399B1 (ko) * 2009-11-19 2013-12-04 캐논 가부시끼가이샤 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체
CN101709955B (zh) * 2009-11-24 2011-02-23 中国科学院长春光学精密机械与物理研究所 子孔径拼接干涉检测光学非球面面形的装置
DE102011004376B3 (de) * 2011-02-18 2012-06-21 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Bestimmen einer Form einer optischen Testfläche
JP5300929B2 (ja) * 2011-07-22 2013-09-25 キヤノン株式会社 測定方法、測定装置及びプログラム
CN102661719B (zh) * 2012-04-16 2014-03-26 中国人民解放军国防科学技术大学 用于非球面子孔径拼接测量的近零位补偿器及面形测量仪和测量方法
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102014202755A1 (de) 2014-02-14 2015-08-20 Carl Zeiss Smt Gmbh Verfahren zur Verlagerung mindestens eines optischen Bauelements
JP2016017744A (ja) * 2014-07-04 2016-02-01 キヤノン株式会社 非球面計測方法、非球面計測装置、プログラム、光学素子の加工装置、および、光学素子
DE102015202695A1 (de) * 2015-02-13 2016-08-18 Carl Zeiss Smt Gmbh Prüfvorrichtung sowie Verfahren zum Prüfen eines Spiegels

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