CN111148964B - 表征光学元件的表面形状的方法及装置 - Google Patents
表征光学元件的表面形状的方法及装置 Download PDFInfo
- Publication number
- CN111148964B CN111148964B CN201880063801.9A CN201880063801A CN111148964B CN 111148964 B CN111148964 B CN 111148964B CN 201880063801 A CN201880063801 A CN 201880063801A CN 111148964 B CN111148964 B CN 111148964B
- Authority
- CN
- China
- Prior art keywords
- optical element
- calculation
- mirror
- carrying
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02085—Combining two or more images of different regions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/52—Combining or merging partially overlapping images to an overall image
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Geometry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017217371.8 | 2017-09-29 | ||
| DE102017217371.8A DE102017217371A1 (de) | 2017-09-29 | 2017-09-29 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
| PCT/EP2018/073703 WO2019063247A1 (de) | 2017-09-29 | 2018-09-04 | Verfahren und vorrichtung zur charakterisierung der oberflächenform eines optischen elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111148964A CN111148964A (zh) | 2020-05-12 |
| CN111148964B true CN111148964B (zh) | 2022-04-12 |
Family
ID=63592689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880063801.9A Active CN111148964B (zh) | 2017-09-29 | 2018-09-04 | 表征光学元件的表面形状的方法及装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11118900B2 (enExample) |
| JP (1) | JP2020535425A (enExample) |
| CN (1) | CN111148964B (enExample) |
| DE (1) | DE102017217371A1 (enExample) |
| WO (1) | WO2019063247A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017217251A1 (de) | 2017-09-27 | 2019-03-28 | Carl Zeiss Smt Gmbh | Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems |
| WO2019081187A1 (en) | 2017-10-25 | 2019-05-02 | Carl Zeiss Smt Gmbh | METHOD FOR REGULATING THE TEMPERATURE OF A COMPONENT |
| US12053240B2 (en) * | 2020-05-20 | 2024-08-06 | Arizona Optical Metrology Llc | Systems and methods for measurement of optical wavefronts |
| WO2022170160A1 (en) * | 2021-02-07 | 2022-08-11 | Arizona Optical Metrology Llc | Alignment of a measurement optical system and a sample under test |
| DE102021211172B3 (de) | 2021-10-04 | 2023-03-23 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
| DE102022209513A1 (de) | 2022-09-12 | 2023-10-19 | Carl Zeiss Smt Gmbh | Verfahren zum Kalibrieren einer sphärischen Welle, sowie Prüfsystem zur interferometrischen Bestimmung der Oberflächenform eines Prüflings |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5416586A (en) * | 1993-10-15 | 1995-05-16 | Tropel Corporation | Method of testing aspherical optical surfaces with an interferometer |
| CN101709955A (zh) * | 2009-11-24 | 2010-05-19 | 中国科学院长春光学精密机械与物理研究所 | 子孔径拼接干涉检测光学非球面面形的装置 |
| CN102645181A (zh) * | 2011-02-18 | 2012-08-22 | 卡尔蔡司Smt有限责任公司 | 确定光学测试表面的形状的方法和设备 |
| CN106030410A (zh) * | 2014-02-14 | 2016-10-12 | 卡尔蔡司Smt有限责任公司 | 移动至少一个光学部件的方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6956657B2 (en) | 2001-12-18 | 2005-10-18 | Qed Technologies, Inc. | Method for self-calibrated sub-aperture stitching for surface figure measurement |
| JP2005345260A (ja) * | 2004-06-03 | 2005-12-15 | Canon Inc | 平面干渉計測方法および平面干渉計測装置 |
| US7221461B2 (en) * | 2004-08-13 | 2007-05-22 | Zygo Corporation | Method and apparatus for interferometric measurement of components with large aspect ratios |
| DE102008048844A1 (de) * | 2007-09-25 | 2009-05-14 | Carl Zeiss Smt Ag | Verfahren und System zum Vermessen einer Oberfläche eines Objektes |
| WO2009126269A2 (en) * | 2008-04-08 | 2009-10-15 | Qed Technologies International, Inc. | Stitching of near-nulled subaperture measurements |
| JP5483993B2 (ja) * | 2009-10-20 | 2014-05-07 | キヤノン株式会社 | 干渉計 |
| KR101336399B1 (ko) * | 2009-11-19 | 2013-12-04 | 캐논 가부시끼가이샤 | 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체 |
| JP5300929B2 (ja) * | 2011-07-22 | 2013-09-25 | キヤノン株式会社 | 測定方法、測定装置及びプログラム |
| CN102661719B (zh) * | 2012-04-16 | 2014-03-26 | 中国人民解放军国防科学技术大学 | 用于非球面子孔径拼接测量的近零位补偿器及面形测量仪和测量方法 |
| DE102014208770A1 (de) | 2013-07-29 | 2015-01-29 | Carl Zeiss Smt Gmbh | Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik |
| JP2016017744A (ja) * | 2014-07-04 | 2016-02-01 | キヤノン株式会社 | 非球面計測方法、非球面計測装置、プログラム、光学素子の加工装置、および、光学素子 |
| DE102015202695A1 (de) * | 2015-02-13 | 2016-08-18 | Carl Zeiss Smt Gmbh | Prüfvorrichtung sowie Verfahren zum Prüfen eines Spiegels |
-
2017
- 2017-09-29 DE DE102017217371.8A patent/DE102017217371A1/de not_active Ceased
-
2018
- 2018-09-04 WO PCT/EP2018/073703 patent/WO2019063247A1/de not_active Ceased
- 2018-09-04 CN CN201880063801.9A patent/CN111148964B/zh active Active
- 2018-09-04 JP JP2020517826A patent/JP2020535425A/ja active Pending
-
2020
- 2020-03-30 US US16/834,038 patent/US11118900B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5416586A (en) * | 1993-10-15 | 1995-05-16 | Tropel Corporation | Method of testing aspherical optical surfaces with an interferometer |
| CN101709955A (zh) * | 2009-11-24 | 2010-05-19 | 中国科学院长春光学精密机械与物理研究所 | 子孔径拼接干涉检测光学非球面面形的装置 |
| CN102645181A (zh) * | 2011-02-18 | 2012-08-22 | 卡尔蔡司Smt有限责任公司 | 确定光学测试表面的形状的方法和设备 |
| CN106030410A (zh) * | 2014-02-14 | 2016-10-12 | 卡尔蔡司Smt有限责任公司 | 移动至少一个光学部件的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200225029A1 (en) | 2020-07-16 |
| US11118900B2 (en) | 2021-09-14 |
| WO2019063247A1 (de) | 2019-04-04 |
| CN111148964A (zh) | 2020-05-12 |
| JP2020535425A (ja) | 2020-12-03 |
| DE102017217371A1 (de) | 2019-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111148964B (zh) | 表征光学元件的表面形状的方法及装置 | |
| JP6742322B2 (ja) | ミラー検査用の検査装置および方法 | |
| US10108085B2 (en) | Method for localizing defects on substrates | |
| US11391643B2 (en) | Method and device for calibrating a diffractive measuring structure | |
| JP2014527633A (ja) | 瞳位相解析によるオーバレイ計測 | |
| US10359703B2 (en) | Method for aligning a mirror of a microlithographic projection exposure apparatus | |
| JP2022545015A (ja) | 計測デバイスを較正する方法 | |
| JP3728187B2 (ja) | 結像光学系性能測定方法及び装置 | |
| CN117083501A (zh) | 用于表面形状的干涉测量的测量装置 | |
| US20060012799A1 (en) | Method and apparatus for determining telecentricity and microlithography projection exposure apparatus | |
| US9261402B2 (en) | Lithographic method and apparatus | |
| JP2006017485A (ja) | 面形状測定装置および測定方法、並びに、投影光学系の製造方法、投影光学系及び投影露光装置 | |
| CN113424104B (zh) | 用于表征测试物体的表面形状的设备和方法 | |
| CN119422034A (zh) | 干涉测量地确定测试对象的表面形状的方法和测量组件 | |
| CN117685876A (zh) | 用于校准球面波的方法,以及测试系统 | |
| JP2009283635A (ja) | 測定装置、測定方法、露光装置及びデバイス製造方法 | |
| US7956994B2 (en) | Measurement apparatus for measuring transmittance distribution of optical system | |
| CN117470129A (zh) | 测量设备、干涉测量及处理方法、光学元件和光刻系统 | |
| US12292281B2 (en) | Method and device for characterizing the surface shape of an optical element | |
| US10948833B2 (en) | Wafer holding device and projection microlithography system | |
| TW202501166A (zh) | 檢查組件的設備與方法以及微影系統 | |
| CN115943285A (zh) | 用于表征光学元件的表面形状的方法和设备 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |