JP2020535425A - 光学素子の表面形状を特性化する方法及び装置 - Google Patents

光学素子の表面形状を特性化する方法及び装置 Download PDF

Info

Publication number
JP2020535425A
JP2020535425A JP2020517826A JP2020517826A JP2020535425A JP 2020535425 A JP2020535425 A JP 2020535425A JP 2020517826 A JP2020517826 A JP 2020517826A JP 2020517826 A JP2020517826 A JP 2020517826A JP 2020535425 A JP2020535425 A JP 2020535425A
Authority
JP
Japan
Prior art keywords
optical element
calculation
shape
measurement
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2020517826A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020535425A5 (enExample
Inventor
リーペンハウゼン フランク
リーペンハウゼン フランク
シュレーター マーティン
シュレーター マーティン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2020535425A publication Critical patent/JP2020535425A/ja
Publication of JP2020535425A5 publication Critical patent/JP2020535425A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02085—Combining two or more images of different regions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/52—Combining or merging partially overlapping images to an overall image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Geometry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2020517826A 2017-09-29 2018-09-04 光学素子の表面形状を特性化する方法及び装置 Pending JP2020535425A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017217371.8 2017-09-29
DE102017217371.8A DE102017217371A1 (de) 2017-09-29 2017-09-29 Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
PCT/EP2018/073703 WO2019063247A1 (de) 2017-09-29 2018-09-04 Verfahren und vorrichtung zur charakterisierung der oberflächenform eines optischen elements

Publications (2)

Publication Number Publication Date
JP2020535425A true JP2020535425A (ja) 2020-12-03
JP2020535425A5 JP2020535425A5 (enExample) 2021-10-14

Family

ID=63592689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020517826A Pending JP2020535425A (ja) 2017-09-29 2018-09-04 光学素子の表面形状を特性化する方法及び装置

Country Status (5)

Country Link
US (1) US11118900B2 (enExample)
JP (1) JP2020535425A (enExample)
CN (1) CN111148964B (enExample)
DE (1) DE102017217371A1 (enExample)
WO (1) WO2019063247A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017217251A1 (de) 2017-09-27 2019-03-28 Carl Zeiss Smt Gmbh Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems
WO2019081187A1 (en) 2017-10-25 2019-05-02 Carl Zeiss Smt Gmbh METHOD FOR REGULATING THE TEMPERATURE OF A COMPONENT
US12053240B2 (en) * 2020-05-20 2024-08-06 Arizona Optical Metrology Llc Systems and methods for measurement of optical wavefronts
WO2022170160A1 (en) * 2021-02-07 2022-08-11 Arizona Optical Metrology Llc Alignment of a measurement optical system and a sample under test
DE102021211172B3 (de) 2021-10-04 2023-03-23 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
DE102022209513A1 (de) 2022-09-12 2023-10-19 Carl Zeiss Smt Gmbh Verfahren zum Kalibrieren einer sphärischen Welle, sowie Prüfsystem zur interferometrischen Bestimmung der Oberflächenform eines Prüflings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005345260A (ja) * 2004-06-03 2005-12-15 Canon Inc 平面干渉計測方法および平面干渉計測装置
JP2011089804A (ja) * 2009-10-20 2011-05-06 Canon Inc 干渉計
WO2016128234A1 (de) * 2015-02-13 2016-08-18 Carl Zeiss Smt Gmbh Prüfvorrichtung sowie verfahren zum prüfen eines spiegels

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5416586A (en) * 1993-10-15 1995-05-16 Tropel Corporation Method of testing aspherical optical surfaces with an interferometer
US6956657B2 (en) 2001-12-18 2005-10-18 Qed Technologies, Inc. Method for self-calibrated sub-aperture stitching for surface figure measurement
US7221461B2 (en) * 2004-08-13 2007-05-22 Zygo Corporation Method and apparatus for interferometric measurement of components with large aspect ratios
DE102008048844A1 (de) * 2007-09-25 2009-05-14 Carl Zeiss Smt Ag Verfahren und System zum Vermessen einer Oberfläche eines Objektes
WO2009126269A2 (en) * 2008-04-08 2009-10-15 Qed Technologies International, Inc. Stitching of near-nulled subaperture measurements
KR101336399B1 (ko) * 2009-11-19 2013-12-04 캐논 가부시끼가이샤 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체
CN101709955B (zh) * 2009-11-24 2011-02-23 中国科学院长春光学精密机械与物理研究所 子孔径拼接干涉检测光学非球面面形的装置
DE102011004376B3 (de) * 2011-02-18 2012-06-21 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Bestimmen einer Form einer optischen Testfläche
JP5300929B2 (ja) * 2011-07-22 2013-09-25 キヤノン株式会社 測定方法、測定装置及びプログラム
CN102661719B (zh) * 2012-04-16 2014-03-26 中国人民解放军国防科学技术大学 用于非球面子孔径拼接测量的近零位补偿器及面形测量仪和测量方法
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102014202755A1 (de) 2014-02-14 2015-08-20 Carl Zeiss Smt Gmbh Verfahren zur Verlagerung mindestens eines optischen Bauelements
JP2016017744A (ja) * 2014-07-04 2016-02-01 キヤノン株式会社 非球面計測方法、非球面計測装置、プログラム、光学素子の加工装置、および、光学素子

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005345260A (ja) * 2004-06-03 2005-12-15 Canon Inc 平面干渉計測方法および平面干渉計測装置
JP2011089804A (ja) * 2009-10-20 2011-05-06 Canon Inc 干渉計
WO2016128234A1 (de) * 2015-02-13 2016-08-18 Carl Zeiss Smt Gmbh Prüfvorrichtung sowie verfahren zum prüfen eines spiegels

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"ＤＥ１０２０１３２０３８８３Ｂ４", , JPN7022004353, 4 February 2016 (2016-02-04), DE, ISSN: 0004873061 *
JON FLEIG, ET AL.: ""An automated subaperture stitching interferometer workstation for spherical and aspherical surfaces", PROCEEDINGS OF SPIE, ADVANCED CHARACTERIZATION TECHNIQUES FOR OPTICS, SEMICONDUCTORS, AND NANOTECHNO, vol. 5188, JPN7022004352, 4 November 2003 (2003-11-04), pages 296 - 307, ISSN: 0004873062 *

Also Published As

Publication number Publication date
CN111148964B (zh) 2022-04-12
US20200225029A1 (en) 2020-07-16
US11118900B2 (en) 2021-09-14
WO2019063247A1 (de) 2019-04-04
CN111148964A (zh) 2020-05-12
DE102017217371A1 (de) 2019-04-04

Similar Documents

Publication Publication Date Title
JP2020535425A (ja) 光学素子の表面形状を特性化する方法及び装置
US11079338B2 (en) Method for detecting a structure of a lithography mask and device for carrying out the method
JP6742322B2 (ja) ミラー検査用の検査装置および方法
JP6561110B2 (ja) 基板上の欠陥の場所を特定する方法
JP5798719B2 (ja) 目標形状からの光学試験面のずれを測定する方法および装置
JP7770568B2 (ja) 光学測定システムによる物体の照明および結像中の光学生成システムの照明および結像特性をシミュレートするための瞳絞り形状を最適化するための方法
KR102852636B1 (ko) 측정될 입사 동공 내에서 조명광에 의해 조명될 때의 광학 시스템의 이미징 품질을 결정하는 방법
US10535132B2 (en) Method for determining a distance between a first structure element on a substrate and a second structure element
TWI692681B (zh) 決定用於量測微影光罩之成像光學單元的成像像差貢獻度的方法
US20020057495A1 (en) Measuring system for performance of imaging optical system
KR20110065365A (ko) 비구면체 측정 방법 및 장치
JP3352298B2 (ja) レンズ性能測定方法及びそれを用いたレンズ性能測定装置
JP2006017485A (ja) 面形状測定装置および測定方法、並びに、投影光学系の製造方法、投影光学系及び投影露光装置
JP6558975B2 (ja) 形状計測方法、形状計測装置および形状計測プログラム
US11269260B2 (en) Method and assembly for characterizing a mask or a wafer for microlithography
CN117685876A (zh) 用于校准球面波的方法，以及测试系统
JP5451232B2 (ja) 評価方法、測定方法、プログラム、露光方法、デバイスの製造方法、測定装置、調整方法、露光装置、処理装置及び処理方法
CN119422034A (zh) 干涉测量地确定测试对象的表面形状的方法和测量组件
JP2003042711A (ja) 試料観察計測用可干渉ビーム装置
JP2022044113A (ja) 収差推定方法、収差推定装置、プログラム、及び記憶媒体
Matkivsky et al. A new method for finding optical aberrations on the basis of analysis of the object hologram without additional measurements
JP2004198381A (ja) 干渉装置
Fienup Phase retrieval for optical metrology: past, present and future
JP2001241929A (ja) 非球面形状測定方法、非球面形状測定装置、投影光学系、および露光方法
Balasubramanian et al. WFIRST/AFTA coronagraph technology development milestone 1 final report: reflective shaped pupil mask fabrication and characterization

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210902

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210902

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20220729

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220913

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20221205

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20221213

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20230509