JP2020529702A5 - - Google Patents

Download PDF

Info

Publication number
JP2020529702A5
JP2020529702A5 JP2020503802A JP2020503802A JP2020529702A5 JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5 JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5
Authority
JP
Japan
Prior art keywords
electron beam
lens
electrostatic
electron
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020503802A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020529702A (ja
JP7116154B2 (ja
Filing date
Publication date
Priority claimed from US15/666,666 external-priority patent/US10096447B1/en
Application filed filed Critical
Publication of JP2020529702A publication Critical patent/JP2020529702A/ja
Publication of JP2020529702A5 publication Critical patent/JP2020529702A5/ja
Application granted granted Critical
Publication of JP7116154B2 publication Critical patent/JP7116154B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020503802A 2017-08-02 2018-07-24 高解像度の電子ビーム装置 Active JP7116154B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/666,666 2017-08-02
US15/666,666 US10096447B1 (en) 2017-08-02 2017-08-02 Electron beam apparatus with high resolutions
PCT/US2018/043353 WO2019027714A1 (en) 2017-08-02 2018-07-24 HIGH RESOLUTION ELECTRON BEAM APPARATUS

Publications (3)

Publication Number Publication Date
JP2020529702A JP2020529702A (ja) 2020-10-08
JP2020529702A5 true JP2020529702A5 (https=) 2021-08-26
JP7116154B2 JP7116154B2 (ja) 2022-08-09

Family

ID=63685156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020503802A Active JP7116154B2 (ja) 2017-08-02 2018-07-24 高解像度の電子ビーム装置

Country Status (9)

Country Link
US (1) US10096447B1 (https=)
EP (1) EP3662326A4 (https=)
JP (1) JP7116154B2 (https=)
KR (1) KR102363263B1 (https=)
CN (1) CN111051985B (https=)
IL (1) IL272051B2 (https=)
SG (1) SG11202000608VA (https=)
TW (1) TWI751362B (https=)
WO (1) WO2019027714A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12165838B2 (en) * 2018-12-14 2024-12-10 Kla Corporation Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
US11830699B2 (en) * 2021-07-06 2023-11-28 Kla Corporation Cold-field-emitter electron gun with self-cleaning extractor using reversed e-beam current
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US11664186B1 (en) * 2022-08-07 2023-05-30 Borries Pte. Ltd. Apparatus of electron beam comprising pinnacle limiting plate and method of reducing electron-electron interaction
WO2025203155A1 (ja) * 2024-03-25 2025-10-02 中和科学株式会社 荷電粒子源制御装置
CN120413392A (zh) * 2025-04-27 2025-08-01 电子科技大学 一种用于回旋波保护器的新型电子枪

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426583A (en) * 1982-05-10 1984-01-17 International Business Machines Corporation Electron beam potential switching apparatus
GB8401578D0 (en) 1984-01-19 1984-02-22 Cleaver J R A Ion and electron beam electrostatic and magnetic lens systems
US5493116A (en) * 1993-10-26 1996-02-20 Metrologix, Inc. Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices
EP0821393B1 (en) * 1996-07-25 1999-06-16 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Detector objective lens
US6664546B1 (en) 2000-02-10 2003-12-16 Kla-Tencor In-situ probe for optimizing electron beam inspection and metrology based on surface potential
US6977375B2 (en) 2000-02-19 2005-12-20 Multibeam Systems, Inc. Multi-beam multi-column electron beam inspection system
EP1296351A4 (en) 2000-06-27 2009-09-23 Ebara Corp INVESTIGATION DEVICE FOR LOADED PARTICLE RAYS AND METHOD FOR PRODUCING A COMPONENT ELEVATED WITH THIS INSPECTION DEVICE
EP1271604A4 (en) 2001-01-10 2005-05-25 Ebara Corp APPARATUS AND METHOD FOR INSPECTING ELECTRON BEAM, AND DEVICE MANUFACTURING METHOD COMPRISING THE INSPECTION APPARATUS
US6897442B2 (en) 2003-04-25 2005-05-24 Applied Materials Israel, Ltd. Objective lens arrangement for use in a charged particle beam column
US7462848B2 (en) * 2003-10-07 2008-12-09 Multibeam Systems, Inc. Optics for generation of high current density patterned charged particle beams
JP2006216396A (ja) 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
EP1947674B1 (en) * 2005-11-08 2015-06-17 Advantest Corporation Electron gun, electron beam exposure system and exposure method
JP4616180B2 (ja) * 2006-01-20 2011-01-19 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US7825386B2 (en) 2006-10-25 2010-11-02 Hermes-Microvision, Inc. System and method for a charged particle beam
DE112007000045T5 (de) * 2007-02-20 2010-04-22 Advantest Corporation Elektronenkanone, Elektronenstrahl-Bestrahlungsgerät und Bestrahlungsverfahren
KR101118698B1 (ko) * 2007-05-29 2012-03-12 전자빔기술센터 주식회사 시엔티 팁을 이용한 전자 칼럼 및 시엔티 팁을 정렬하는방법
US7821187B1 (en) * 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
KR100962243B1 (ko) * 2008-06-09 2010-06-11 한국기계연구원 포컬 렌스를 활용한 전자빔 전류 제어 장치 및 방법
WO2010070837A1 (ja) * 2008-12-16 2010-06-24 株式会社日立ハイテクノロジーズ 電子線装置およびそれを用いた電子線応用装置
WO2010132265A2 (en) * 2009-05-12 2010-11-18 Carl Zeiss Nts, Llc. Gas delivery in a microscope system
JP5063715B2 (ja) * 2010-02-04 2012-10-31 株式会社日立ハイテクノロジーズ 電子源，電子銃、それを用いた電子顕微鏡装置及び電子線描画装置
EP2492950B1 (en) * 2011-02-25 2018-04-11 FEI Company Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
US8664594B1 (en) 2011-04-18 2014-03-04 Kla-Tencor Corporation Electron-optical system for high-speed and high-sensitivity inspections
TWI472751B (zh) * 2011-05-03 2015-02-11 Hermes Microvision Inc 用於檢查與複檢光罩/晶圓缺陷的帶電粒子系統
US8455838B2 (en) 2011-06-29 2013-06-04 Kla-Tencor Corporation Multiple-column electron beam apparatus and methods
JP5687157B2 (ja) * 2011-08-22 2015-03-18 株式会社日立ハイテクノロジーズ 電子銃、電界放出電子銃、荷電粒子線装置および透過型電子顕微鏡
US9053900B2 (en) * 2012-04-03 2015-06-09 Kla-Tencor Corporation Apparatus and methods for high-resolution electron beam imaging
US8859982B2 (en) 2012-09-14 2014-10-14 Kla-Tencor Corporation Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
EP2779204A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron gun arrangement
EP2801997B1 (en) 2013-05-06 2016-03-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam wafer inspection system and method for operation thereof
US9105440B2 (en) 2013-08-30 2015-08-11 Hermes Microvision, Inc. Apparatus of plural charged particle beams with multi-axis magnetic lens
US10056228B2 (en) * 2014-07-29 2018-08-21 Applied Materials Israel Ltd. Charged particle beam specimen inspection system and method for operation thereof
US9437395B2 (en) 2014-12-09 2016-09-06 Hermes Microvision Inc. Method and compound system for inspecting and reviewing defects
US9595417B2 (en) 2014-12-22 2017-03-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution charged particle beam device and method of operating the same

Similar Documents

Publication Publication Date Title
JP2020529702A5 (https=)
TWI576885B (zh) Ｘ射線產生裝置
JP6310920B2 (ja) 高ビーム電流および低ビーム電流の両方を用いた、高解像度イメージングのための二重レンズ銃電子ビーム装置
US8455838B2 (en) Multiple-column electron beam apparatus and methods
CN102598195B (zh) 分布式离子源加速镜筒
CN106711003B (zh) 一种电子源产生装置及电子束控制方法
JP2014183046A (ja) 電子銃装置
US8314401B2 (en) Electron gun with magnetic immersion double condenser lenses
CN111051985A (zh) 具有高分辨率的电子束设备
US10319563B2 (en) Electronic beam machining system
US8063365B1 (en) Non-shot-noise-limited source for electron beam lithography or inspection
JP2017054737A (ja) 質量分析装置および質量分析方法
JP6877462B2 (ja) チューナビリティ用非磁性金属部分が組み込まれた永久磁石粒子ビーム装置及び方法
GB865050A (en) Improvements in or relating to x-ray shadow microscopes with adjustable optical focussing
TW202205336A (zh) 具有多源系統和多射束粒子顯微鏡的粒子束系統
JPS63216256A (ja) 荷電粒子線装置
JP6441702B2 (ja) イオン源、イオンビーム装置および試料の加工方法
JP2014041733A (ja) 荷電粒子線装置
Big A short history of the electron microscope
JP2008204749A (ja) 永久磁石レンズを使用した走査電子顕微鏡
CN107655869A (zh) 离子荧光超分辨成像方法
CN102148122A (zh) 应用于透射电子显微镜的层叠式低像差会聚小透镜
KR20140015834A (ko) 전기장 형성방식의 렌즈를 갖는 전자현미경
JPH07169423A (ja) 電界放射型電子ビーム装置