JP2020526406A5 - - Google Patents
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- Publication number
- JP2020526406A5 JP2020526406A5 JP2020500814A JP2020500814A JP2020526406A5 JP 2020526406 A5 JP2020526406 A5 JP 2020526406A5 JP 2020500814 A JP2020500814 A JP 2020500814A JP 2020500814 A JP2020500814 A JP 2020500814A JP 2020526406 A5 JP2020526406 A5 JP 2020526406A5
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- layer
- compatible
- article according
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910003460 diamond Inorganic materials 0.000 claims 17
- 239000010432 diamond Substances 0.000 claims 17
- 230000002209 hydrophobic effect Effects 0.000 claims 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 11
- 229910052799 carbon Inorganic materials 0.000 claims 11
- 239000011521 glass Substances 0.000 claims 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 9
- 229910052760 oxygen Inorganic materials 0.000 claims 9
- 239000001301 oxygen Substances 0.000 claims 9
- 238000005498 polishing Methods 0.000 claims 9
- 229910052710 silicon Inorganic materials 0.000 claims 8
- 239000010703 silicon Substances 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 239000002245 particle Substances 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762530976P | 2017-07-11 | 2017-07-11 | |
| US62/530,976 | 2017-07-11 | ||
| PCT/IB2018/054978 WO2019012389A1 (en) | 2017-07-11 | 2018-07-05 | ABRASIVE ARTICLES COMPRISING ADAPTABLE COATINGS AND POLISHING SYSTEM MANUFACTURED THEREFROM |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020526406A JP2020526406A (ja) | 2020-08-31 |
| JP2020526406A5 true JP2020526406A5 (enExample) | 2021-08-12 |
| JP7198801B2 JP7198801B2 (ja) | 2023-01-04 |
Family
ID=65001911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020500814A Active JP7198801B2 (ja) | 2017-07-11 | 2018-07-05 | 適合性コーティングを含む研磨物品及びそれによる研磨システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12043785B2 (enExample) |
| JP (1) | JP7198801B2 (enExample) |
| CN (1) | CN110914016A (enExample) |
| TW (1) | TWI791028B (enExample) |
| WO (1) | WO2019012389A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102712203B1 (ko) * | 2019-07-24 | 2024-10-02 | 엠.씨.케이 (주) | 연마제품 및 이의 제조방법 |
| GB2590511B (en) * | 2019-11-20 | 2023-10-25 | Best Engineered Surface Tech Llc | Hybrid CMP conditioning head |
| US12370648B2 (en) | 2020-01-30 | 2025-07-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Surface clean system and method |
| TWI859404B (zh) * | 2020-01-30 | 2024-10-21 | 台灣積體電路製造股份有限公司 | 可攜式清潔裝置 |
| EP4121249A1 (en) * | 2020-03-18 | 2023-01-25 | 3M Innovative Properties Company | Abrasive article |
| WO2021262602A1 (en) * | 2020-06-26 | 2021-12-30 | Applied Materials, Inc. | Conditioner disk for use on soft or 3d printed pads during cmp |
| TWI772171B (zh) * | 2021-09-08 | 2022-07-21 | 明志科技大學 | 化學機械研磨墊修整器的保護膜及保護膜疊層 |
| US20230094483A1 (en) * | 2021-09-29 | 2023-03-30 | Entegris, Inc. | Pad conditioner with polymer backing plate |
| CN117464554A (zh) * | 2022-07-20 | 2024-01-30 | 格科半导体(上海)有限公司 | 一种研磨垫修整装置 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5352493A (en) | 1991-05-03 | 1994-10-04 | Veniamin Dorfman | Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films |
| US5435816A (en) | 1993-01-14 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
| BR9407536A (pt) | 1993-09-13 | 1997-08-26 | Minnesota Mining & Mfg | Artigo abrasivo processos de fabricação e de refino de peça em trabalho corn o mesmo ferramenta de produção para fabricação do mesmo e processo de produção de matriz mestra para formação da mesma |
| US6468642B1 (en) | 1995-10-03 | 2002-10-22 | N.V. Bekaert S.A. | Fluorine-doped diamond-like coatings |
| US6021559A (en) | 1996-11-01 | 2000-02-08 | 3M Innovative Properties Company | Methods of making a cube corner article master mold |
| US6368198B1 (en) | 1999-11-22 | 2002-04-09 | Kinik Company | Diamond grid CMP pad dresser |
| US5921856A (en) | 1997-07-10 | 1999-07-13 | Sp3, Inc. | CVD diamond coated substrate for polishing pad conditioning head and method for making same |
| US6123612A (en) | 1998-04-15 | 2000-09-26 | 3M Innovative Properties Company | Corrosion resistant abrasive article and method of making |
| US6696157B1 (en) * | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
| JP2004303983A (ja) | 2003-03-31 | 2004-10-28 | Fuji Photo Film Co Ltd | 研磨パッド |
| US7160178B2 (en) | 2003-08-07 | 2007-01-09 | 3M Innovative Properties Company | In situ activation of a three-dimensional fixed abrasive article |
| EP1726682A1 (en) | 2005-05-26 | 2006-11-29 | NV Bekaert SA | Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers. |
| KR101024674B1 (ko) | 2007-12-28 | 2011-03-25 | 신한다이아몬드공업 주식회사 | 소수성 절삭공구 및 그제조방법 |
| JP2011514848A (ja) | 2008-03-10 | 2011-05-12 | モルガン アドバンスド セラミックス， インコーポレイテッド | 非平面のｃｖｄダイヤモンド被覆ｃｍｐパッドコンディショナーおよびその製造方法 |
| MY155563A (en) | 2009-06-02 | 2015-10-30 | Saint Gobain Abrasives Inc | Corrosion-resistant cmp conditioning tools and methods for making and using same |
| KR101268287B1 (ko) * | 2009-07-16 | 2013-05-28 | 생-고벵 아브라시프 | Ｃｍｐ 패드를 컨디셔닝하기 위한 편평하고 일관된 표면 형태를 가지는 연마 공구 및 그 제조 방법 |
| US20150087212A1 (en) | 2012-05-04 | 2015-03-26 | Entegris, Inc. | Cmp conditioner pads with superabrasive grit enhancement |
| SG11201500802TA (en) | 2012-08-02 | 2015-04-29 | 3M Innovative Properties Co | Abrasive articles with precisely shaped features and method of making thereof |
| US20150224625A1 (en) * | 2012-08-02 | 2015-08-13 | 3M Innovative Properties Company | Abrasive Elements with Precisely Shaped Features, Abrasive Articles Fabricated Therefrom and Methods of Making Thereof |
| WO2014141889A1 (ja) | 2013-03-12 | 2014-09-18 | 国立大学法人九州大学 | 研磨パッド及び研磨方法 |
| US20170008143A1 (en) | 2014-01-24 | 2017-01-12 | 3M Innovative Properties Company | Abrasive material having a structured surface |
| KR102347711B1 (ko) | 2014-04-03 | 2022-01-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 폴리싱 패드 및 시스템과 이의 제조 및 사용 방법 |
| JP6611734B2 (ja) | 2014-04-24 | 2019-11-27 | スリーエム イノベイティブ プロパティズ カンパニー | 親水性表面を有する流体制御フィルム、その作製方法、及び構造化表面を洗浄する方法 |
| CN110869206B (zh) | 2017-07-11 | 2023-06-30 | 3M创新有限公司 | 包括可适形涂层的磨料制品和由此形成的抛光系统 |
| US20200130133A1 (en) | 2017-07-11 | 2020-04-30 | 3M Innovative Properties Company | Abrasive articles including conformable coatings and polishing system therefrom |
-
2018
- 2018-07-05 WO PCT/IB2018/054978 patent/WO2019012389A1/en not_active Ceased
- 2018-07-05 US US16/629,769 patent/US12043785B2/en active Active
- 2018-07-05 CN CN201880046028.5A patent/CN110914016A/zh active Pending
- 2018-07-05 JP JP2020500814A patent/JP7198801B2/ja active Active
- 2018-07-09 TW TW107123677A patent/TWI791028B/zh active
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