JP2020522027A5 - - Google Patents
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- JP2020522027A5 JP2020522027A5 JP2019566822A JP2019566822A JP2020522027A5 JP 2020522027 A5 JP2020522027 A5 JP 2020522027A5 JP 2019566822 A JP2019566822 A JP 2019566822A JP 2019566822 A JP2019566822 A JP 2019566822A JP 2020522027 A5 JP2020522027 A5 JP 2020522027A5
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- JP
- Japan
- Prior art keywords
- grating
- elements
- lattice
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000151 deposition Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 4
- 210000001747 pupil Anatomy 0.000 claims description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001127 nanoimprint lithography Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175503 | 2017-06-02 | ||
| FI20175503A FI128376B (en) | 2017-06-02 | 2017-06-02 | Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating |
| PCT/FI2018/050378 WO2018220269A1 (en) | 2017-06-02 | 2018-05-18 | Method of manufacturing a variable efficiency diffractive grating and a diffractive grating |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020522027A JP2020522027A (ja) | 2020-07-27 |
| JP2020522027A5 true JP2020522027A5 (enExample) | 2021-06-10 |
| JP7338836B2 JP7338836B2 (ja) | 2023-09-05 |
Family
ID=64454468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019566822A Active JP7338836B2 (ja) | 2017-06-02 | 2018-05-18 | 可変効率回折格子を製造する方法及び回折格子 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11513268B2 (enExample) |
| EP (1) | EP3631537B1 (enExample) |
| JP (1) | JP7338836B2 (enExample) |
| CN (1) | CN111095042B (enExample) |
| FI (1) | FI128376B (enExample) |
| WO (1) | WO2018220269A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10649119B2 (en) | 2018-07-16 | 2020-05-12 | Facebook Technologies, Llc | Duty cycle, depth, and surface energy control in nano fabrication |
| US10690821B1 (en) * | 2018-12-14 | 2020-06-23 | Applied Materials, Inc. | Methods of producing slanted gratings |
| US12607779B2 (en) | 2019-05-14 | 2026-04-21 | Nil Technology Aps | Seed structures for structured coatings for optical and other devices |
| US11550083B2 (en) * | 2019-06-26 | 2023-01-10 | Meta Platforms Technologies, Llc | Techniques for manufacturing slanted structures |
| CN114641713A (zh) | 2019-11-08 | 2022-06-17 | 奇跃公司 | 具有包括多种材料的光重定向结构的超表面以及制造方法 |
| JP7455569B2 (ja) * | 2019-12-20 | 2024-03-26 | 浜松ホトニクス株式会社 | テラヘルツ波用レンズ及びテラヘルツ波用レンズの製造方法 |
| WO2021247287A1 (en) | 2020-06-03 | 2021-12-09 | Applied Materials, Inc. | Gradient encapsulation of waveguide gratings |
| FI131825B1 (en) * | 2020-06-17 | 2025-12-18 | Dispelix Oy | Method for producing an optical element, an optical element, and apparatus for producing an optical element |
| FI130103B (fi) | 2020-12-22 | 2023-03-01 | Dispelix Oy | Diffraktiivisen optisen elementin hilan leimasimen ja master-mallin valmistusmenetelmä, master-malli ja leimasin |
| WO2022196204A1 (ja) * | 2021-03-19 | 2022-09-22 | ソニーグループ株式会社 | 表示装置 |
| CN113514912B (zh) * | 2021-06-02 | 2022-12-02 | 中国计量科学研究院 | 梯度渐变微纳米光学结构制备方法及其结构 |
| CN114296168B (zh) * | 2021-12-08 | 2023-03-10 | 中国科学技术大学 | 一种利用宽光栅纳米压印模板制作变周期窄光栅的方法 |
| CN114325908B (zh) * | 2022-01-14 | 2023-03-03 | 西北工业大学 | 一种可见/近红外波段多模式微纳光栅阵列排布结构 |
| US20240329290A1 (en) * | 2023-03-30 | 2024-10-03 | Meta Platforms Technologies, Llc | Bilayer binary 2d gratings for waveguide display |
| CN120507825A (zh) * | 2023-06-16 | 2025-08-19 | 舜宇奥来微纳光学(上海)有限公司 | 光栅组件和光栅组件的制造方法 |
| CN116661156B (zh) * | 2023-07-25 | 2023-09-26 | 上海鲲游科技有限公司 | 一种光栅结构、衍射光波导以及显示设备 |
| US20250102738A1 (en) * | 2023-09-27 | 2025-03-27 | Tokyo Electron Limited | Surface relief grating performance and cost enhancements for augmented reality applications |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5113286A (en) | 1990-09-27 | 1992-05-12 | At&T Bell Laboratories | Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus |
| US5561558A (en) * | 1993-10-18 | 1996-10-01 | Matsushita Electric Industrial Co., Ltd. | Diffractive optical device |
| US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
| CA2197706A1 (en) | 1997-02-14 | 1998-08-14 | Peter Ehbets | Method of fabricating apodized phase mask |
| JPH1131863A (ja) * | 1997-07-11 | 1999-02-02 | Hitachi Ltd | 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム |
| US6475704B1 (en) | 1997-09-12 | 2002-11-05 | Canon Kabushiki Kaisha | Method for forming fine structure |
| JP2000258608A (ja) * | 1999-03-11 | 2000-09-22 | Canon Inc | 光学素子への成膜方法 |
| CN100592112C (zh) | 2002-02-12 | 2010-02-24 | 奥尔利康贸易股份公司（特吕巴赫） | 包括亚微米空心空间的部件 |
| US6913871B2 (en) | 2002-07-23 | 2005-07-05 | Intel Corporation | Fabricating sub-resolution structures in planar lightwave devices |
| JP2005202104A (ja) | 2004-01-15 | 2005-07-28 | Nikon Corp | 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置 |
| US20050275944A1 (en) * | 2004-06-11 | 2005-12-15 | Wang Jian J | Optical films and methods of making the same |
| WO2008022097A2 (en) * | 2006-08-15 | 2008-02-21 | Api Nanofabrication And Research Corp. | Methods for forming patterned structures |
| DE102007021036A1 (de) * | 2007-05-04 | 2008-11-06 | Carl Zeiss Ag | Anzeigevorrichtung und Anzeigeverfahren zur binokularen Darstellung eines mehrfarbigen Bildes |
| JP4999556B2 (ja) | 2007-05-31 | 2012-08-15 | リコー光学株式会社 | 表面に微細凹凸形状をもつ光学素子の製造方法 |
| US20090231702A1 (en) | 2008-03-17 | 2009-09-17 | Qihong Wu | Optical films and methods of making the same |
| US7972959B2 (en) | 2008-12-01 | 2011-07-05 | Applied Materials, Inc. | Self aligned double patterning flow with non-sacrificial features |
| JP5402317B2 (ja) | 2009-06-29 | 2014-01-29 | セイコーエプソン株式会社 | 偏光素子および偏光素子の製造方法、投写型表示装置、液晶装置、電子機器 |
| JP2011215267A (ja) * | 2010-03-31 | 2011-10-27 | Nagoya Univ | 色消しレンズとその製造方法、および色消しレンズを備えた光学装置 |
| WO2011129814A1 (en) * | 2010-04-13 | 2011-10-20 | Hewlett-Packard Development Company, L.P. | Controlling phase response in a sub-wavelength grating optical device |
| JP2012013930A (ja) | 2010-06-30 | 2012-01-19 | Nagoya Univ | グリズムとその製造方法、およびグリズムを備えた光学装置 |
| JP2011227991A (ja) | 2011-08-03 | 2011-11-10 | Ricoh Co Ltd | 回折素子、光ピックアップおよび光情報処理装置 |
| JP6171740B2 (ja) | 2013-09-02 | 2017-08-02 | セイコーエプソン株式会社 | 光学デバイス及び画像表示装置 |
| WO2015035127A1 (en) | 2013-09-06 | 2015-03-12 | Massachusetts Institute Of Technology | Metallic dielectric photonic crystals and methods of fabrication |
| JP5929860B2 (ja) * | 2013-09-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子製造方法 |
| SG10202004257WA (en) * | 2015-11-24 | 2020-06-29 | Harvard College | Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum |
| CN109196387A (zh) * | 2016-04-05 | 2019-01-11 | 哈佛学院院长及董事 | 用于亚波长分辨率成像的超透镜 |
| US10061124B2 (en) * | 2016-04-29 | 2018-08-28 | Microsoft Technology Licensing, Llc | Robust architecture for large field of view components |
| JP6923277B2 (ja) * | 2016-12-23 | 2021-08-25 | インテル・コーポレーション | 高度なリソグラフィおよび自己組織化デバイス |
-
2017
- 2017-06-02 FI FI20175503A patent/FI128376B/en active IP Right Grant
-
2018
- 2018-05-18 WO PCT/FI2018/050378 patent/WO2018220269A1/en not_active Ceased
- 2018-05-18 CN CN201880038124.5A patent/CN111095042B/zh active Active
- 2018-05-18 JP JP2019566822A patent/JP7338836B2/ja active Active
- 2018-05-18 EP EP18810136.4A patent/EP3631537B1/en active Active
- 2018-05-18 US US16/618,175 patent/US11513268B2/en active Active
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