JP2020522027A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2020522027A5 JP2020522027A5 JP2019566822A JP2019566822A JP2020522027A5 JP 2020522027 A5 JP2020522027 A5 JP 2020522027A5 JP 2019566822 A JP2019566822 A JP 2019566822A JP 2019566822 A JP2019566822 A JP 2019566822A JP 2020522027 A5 JP2020522027 A5 JP 2020522027A5
- Authority
- JP
- Japan
- Prior art keywords
- grating
- elements
- lattice
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000151 deposition Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 4
- 210000001747 pupil Anatomy 0.000 claims description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001127 nanoimprint lithography Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175503A FI128376B (en) | 2017-06-02 | 2017-06-02 | Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating |
| FI20175503 | 2017-06-02 | ||
| PCT/FI2018/050378 WO2018220269A1 (en) | 2017-06-02 | 2018-05-18 | Method of manufacturing a variable efficiency diffractive grating and a diffractive grating |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020522027A JP2020522027A (ja) | 2020-07-27 |
| JP2020522027A5 true JP2020522027A5 (enExample) | 2021-06-10 |
| JP7338836B2 JP7338836B2 (ja) | 2023-09-05 |
Family
ID=64454468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019566822A Active JP7338836B2 (ja) | 2017-06-02 | 2018-05-18 | 可変効率回折格子を製造する方法及び回折格子 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11513268B2 (enExample) |
| EP (1) | EP3631537B1 (enExample) |
| JP (1) | JP7338836B2 (enExample) |
| CN (1) | CN111095042B (enExample) |
| FI (1) | FI128376B (enExample) |
| WO (1) | WO2018220269A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10649119B2 (en) | 2018-07-16 | 2020-05-12 | Facebook Technologies, Llc | Duty cycle, depth, and surface energy control in nano fabrication |
| US10690821B1 (en) * | 2018-12-14 | 2020-06-23 | Applied Materials, Inc. | Methods of producing slanted gratings |
| CN114051650A (zh) * | 2019-05-14 | 2022-02-15 | 尼尔技术有限公司 | 用于光学装置和其他装置的结构化涂层的基种结构 |
| US11550083B2 (en) | 2019-06-26 | 2023-01-10 | Meta Platforms Technologies, Llc | Techniques for manufacturing slanted structures |
| JP7467619B2 (ja) * | 2019-11-08 | 2024-04-15 | マジック リープ， インコーポレイテッド | 複数の材料を含む光再指向構造を伴うメタ表面およびその加工方法 |
| JP7455569B2 (ja) * | 2019-12-20 | 2024-03-26 | 浜松ホトニクス株式会社 | テラヘルツ波用レンズ及びテラヘルツ波用レンズの製造方法 |
| CN115698778A (zh) | 2020-06-03 | 2023-02-03 | 应用材料公司 | 波导光栅的梯度密封 |
| FI20205642A1 (en) * | 2020-06-17 | 2021-12-18 | Dispelix Oy | Manufacturing method of optical element, optical element and apparatus for manufacturing optical element |
| FI130103B (fi) * | 2020-12-22 | 2023-03-01 | Dispelix Oy | Diffraktiivisen optisen elementin hilan leimasimen ja master-mallin valmistusmenetelmä, master-malli ja leimasin |
| US20240184245A1 (en) * | 2021-03-19 | 2024-06-06 | Sony Group Corporation | Display device |
| CN113514912B (zh) * | 2021-06-02 | 2022-12-02 | 中国计量科学研究院 | 梯度渐变微纳米光学结构制备方法及其结构 |
| CN114296168B (zh) * | 2021-12-08 | 2023-03-10 | 中国科学技术大学 | 一种利用宽光栅纳米压印模板制作变周期窄光栅的方法 |
| CN114325908B (zh) * | 2022-01-14 | 2023-03-03 | 西北工业大学 | 一种可见/近红外波段多模式微纳光栅阵列排布结构 |
| CN119200063B (zh) * | 2023-06-16 | 2025-07-18 | 舜宇奥来微纳光学(上海)有限公司 | 光栅组件和光栅组件的制造方法 |
| CN116661156B (zh) * | 2023-07-25 | 2023-09-26 | 上海鲲游科技有限公司 | 一种光栅结构、衍射光波导以及显示设备 |
| US20250102738A1 (en) * | 2023-09-27 | 2025-03-27 | Tokyo Electron Limited | Surface relief grating performance and cost enhancements for augmented reality applications |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5113286A (en) * | 1990-09-27 | 1992-05-12 | At&T Bell Laboratories | Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus |
| US5561558A (en) * | 1993-10-18 | 1996-10-01 | Matsushita Electric Industrial Co., Ltd. | Diffractive optical device |
| US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
| CA2197706A1 (en) * | 1997-02-14 | 1998-08-14 | Peter Ehbets | Method of fabricating apodized phase mask |
| JPH1131863A (ja) * | 1997-07-11 | 1999-02-02 | Hitachi Ltd | 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム |
| US6475704B1 (en) | 1997-09-12 | 2002-11-05 | Canon Kabushiki Kaisha | Method for forming fine structure |
| JP2000258608A (ja) | 1999-03-11 | 2000-09-22 | Canon Inc | 光学素子への成膜方法 |
| ATE419550T1 (de) | 2002-02-12 | 2009-01-15 | Oc Oerlikon Balzers Ag | Optisches bauteil mit submikrometer-hohlräumen |
| US6913871B2 (en) | 2002-07-23 | 2005-07-05 | Intel Corporation | Fabricating sub-resolution structures in planar lightwave devices |
| JP2005202104A (ja) * | 2004-01-15 | 2005-07-28 | Nikon Corp | 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置 |
| US20050275944A1 (en) * | 2004-06-11 | 2005-12-15 | Wang Jian J | Optical films and methods of making the same |
| WO2008022097A2 (en) * | 2006-08-15 | 2008-02-21 | Api Nanofabrication And Research Corp. | Methods for forming patterned structures |
| DE102007021036A1 (de) | 2007-05-04 | 2008-11-06 | Carl Zeiss Ag | Anzeigevorrichtung und Anzeigeverfahren zur binokularen Darstellung eines mehrfarbigen Bildes |
| JP4999556B2 (ja) * | 2007-05-31 | 2012-08-15 | リコー光学株式会社 | 表面に微細凹凸形状をもつ光学素子の製造方法 |
| US20090231702A1 (en) * | 2008-03-17 | 2009-09-17 | Qihong Wu | Optical films and methods of making the same |
| US7972959B2 (en) | 2008-12-01 | 2011-07-05 | Applied Materials, Inc. | Self aligned double patterning flow with non-sacrificial features |
| JP5402317B2 (ja) | 2009-06-29 | 2014-01-29 | セイコーエプソン株式会社 | 偏光素子および偏光素子の製造方法、投写型表示装置、液晶装置、電子機器 |
| JP2011215267A (ja) * | 2010-03-31 | 2011-10-27 | Nagoya Univ | 色消しレンズとその製造方法、および色消しレンズを備えた光学装置 |
| WO2011129814A1 (en) * | 2010-04-13 | 2011-10-20 | Hewlett-Packard Development Company, L.P. | Controlling phase response in a sub-wavelength grating optical device |
| JP2012013930A (ja) | 2010-06-30 | 2012-01-19 | Nagoya Univ | グリズムとその製造方法、およびグリズムを備えた光学装置 |
| JP2011227991A (ja) * | 2011-08-03 | 2011-11-10 | Ricoh Co Ltd | 回折素子、光ピックアップおよび光情報処理装置 |
| JP6171740B2 (ja) * | 2013-09-02 | 2017-08-02 | セイコーエプソン株式会社 | 光学デバイス及び画像表示装置 |
| US9523152B2 (en) * | 2013-09-06 | 2016-12-20 | Massachusetts Institute Of Technology | Metallic dielectric photonic crystals and methods of fabrication |
| JP5929860B2 (ja) * | 2013-09-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子製造方法 |
| CN108474869B (zh) | 2015-11-24 | 2020-06-09 | 哈佛学院院长及董事 | 制造针对可见光谱波长的电介质超颖表面的原子层沉积处理 |
| EP3440484B1 (en) | 2016-04-05 | 2024-07-24 | President and Fellows of Harvard College | Meta-lenses for sub-wavelength resolution imaging |
| US10061124B2 (en) * | 2016-04-29 | 2018-08-28 | Microsoft Technology Licensing, Llc | Robust architecture for large field of view components |
| KR102712059B1 (ko) * | 2016-12-23 | 2024-10-02 | 인텔 코포레이션 | 진보된 리소그래피 및 자기-조립 디바이스들 |
-
2017
- 2017-06-02 FI FI20175503A patent/FI128376B/en active IP Right Grant
-
2018
- 2018-05-18 JP JP2019566822A patent/JP7338836B2/ja active Active
- 2018-05-18 US US16/618,175 patent/US11513268B2/en active Active
- 2018-05-18 EP EP18810136.4A patent/EP3631537B1/en active Active
- 2018-05-18 CN CN201880038124.5A patent/CN111095042B/zh active Active
- 2018-05-18 WO PCT/FI2018/050378 patent/WO2018220269A1/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2020522027A5 (enExample) | ||
| JP7338836B2 (ja) | 可変効率回折格子を製造する方法及び回折格子 | |
| JP2020522023A5 (enExample) | ||
| JP2018538582A5 (enExample) | ||
| US11391870B2 (en) | Height-modulated diffractive master plate and method of manufacturing thereof | |
| JP7143974B2 (ja) | 高さ調整された光回折格子を製造する方法 | |
| FI127799B (en) | Process for producing a diffraction grating | |
| EP1542043A1 (en) | Diffractive optical device and method for producing same | |
| JPWO2004031815A1 (ja) | 反射防止用回折格子 | |
| CN1241036C (zh) | 在衬底表面优先沉积材料的方法 | |
| JP5632760B2 (ja) | 無機偏光ブレーズド回折格子 | |
| JP2011059141A (ja) | 回折格子 | |
| JP2010066468A (ja) | 波長分波分光光学素子 |