JP2020517107A5 - - Google Patents
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- Publication number
- JP2020517107A5 JP2020517107A5 JP2019555587A JP2019555587A JP2020517107A5 JP 2020517107 A5 JP2020517107 A5 JP 2020517107A5 JP 2019555587 A JP2019555587 A JP 2019555587A JP 2019555587 A JP2019555587 A JP 2019555587A JP 2020517107 A5 JP2020517107 A5 JP 2020517107A5
- Authority
- JP
- Japan
- Prior art keywords
- resist layer
- layer
- carrier
- metal
- die
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 9
- 229910052751 metal Inorganic materials 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 8
- 239000000463 material Substances 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 238000000206 photolithography Methods 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 238000004026 adhesive bonding Methods 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000005553 drilling Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000004377 microelectronic Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762484974P | 2017-04-13 | 2017-04-13 | |
| US62/484,974 | 2017-04-13 | ||
| US15/873,218 | 2018-01-17 | ||
| US15/873,218 US10593563B2 (en) | 2017-04-13 | 2018-01-17 | Fan-out wafer level package with resist vias |
| PCT/US2018/027112 WO2018191380A1 (en) | 2017-04-13 | 2018-04-11 | Fan-out wafer level package with resist vias |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020517107A JP2020517107A (ja) | 2020-06-11 |
| JP2020517107A5 true JP2020517107A5 (enExample) | 2021-03-04 |
| JP6972171B2 JP6972171B2 (ja) | 2021-11-24 |
Family
ID=63790230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019555587A Active JP6972171B2 (ja) | 2017-04-13 | 2018-04-11 | レジストビアを有するファンアウトウエハレベルパッケージ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10593563B2 (enExample) |
| JP (1) | JP6972171B2 (enExample) |
| TW (1) | TWI743351B (enExample) |
| WO (1) | WO2018191380A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11735570B2 (en) * | 2018-04-04 | 2023-08-22 | Intel Corporation | Fan out packaging pop mechanical attach method |
| US10748831B2 (en) * | 2018-05-30 | 2020-08-18 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor packages having thermal through vias (TTV) |
| KR102762976B1 (ko) | 2020-01-03 | 2025-02-07 | 삼성전자주식회사 | 반도체 패키지 |
| JP7574747B2 (ja) | 2021-06-04 | 2024-10-29 | 株式会社デンソー | 半導体装置およびその製造方法 |
| KR20230141192A (ko) * | 2022-03-31 | 2023-10-10 | 삼성전자주식회사 | 집적회로 소자의 제조 방법 |
| CN115223973A (zh) * | 2022-09-20 | 2022-10-21 | 盛合晶微半导体(江阴)有限公司 | 一种扇出型芯片封装结构及封装方法 |
| CN117080087B (zh) * | 2023-10-13 | 2024-02-13 | 季华实验室 | 一种扇出型板级封装方法及扇出型板级封装结构 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5250843A (en) * | 1991-03-27 | 1993-10-05 | Integrated System Assemblies Corp. | Multichip integrated circuit modules |
| US5300813A (en) * | 1992-02-26 | 1994-04-05 | International Business Machines Corporation | Refractory metal capped low resistivity metal conductor lines and vias |
| JP2006108211A (ja) | 2004-10-01 | 2006-04-20 | North:Kk | 配線板と、その配線板を用いた多層配線基板と、その多層配線基板の製造方法 |
| US8253230B2 (en) * | 2008-05-15 | 2012-08-28 | Micron Technology, Inc. | Disabling electrical connections using pass-through 3D interconnects and associated systems and methods |
| TWI501376B (zh) * | 2009-10-07 | 2015-09-21 | 精材科技股份有限公司 | 晶片封裝體及其製造方法 |
| KR101059629B1 (ko) | 2009-12-29 | 2011-08-25 | 하나 마이크론(주) | 반도체 패키지 제조방법 |
| US8922021B2 (en) * | 2011-12-30 | 2014-12-30 | Deca Technologies Inc. | Die up fully molded fan-out wafer level packaging |
| US20110221018A1 (en) * | 2010-03-15 | 2011-09-15 | Xunqing Shi | Electronic Device Package and Methods of Manufacturing an Electronic Device Package |
| JP5570855B2 (ja) * | 2010-03-18 | 2014-08-13 | 新光電気工業株式会社 | 配線基板及びその製造方法並びに半導体装置及びその製造方法 |
| KR101151258B1 (ko) | 2010-04-13 | 2012-06-14 | 앰코 테크놀로지 코리아 주식회사 | 기준점 인식용 다이를 이용한 반도체 패키지 및 그 제조 방법 |
| US8535980B2 (en) * | 2010-12-23 | 2013-09-17 | Stmicroelectronics Pte Ltd. | Method for producing vias in fan-out wafers using dry film and conductive paste, and a corresponding semiconductor package |
| CN102376672B (zh) | 2011-11-30 | 2014-10-29 | 江苏长电科技股份有限公司 | 无基岛球栅阵列封装结构及其制造方法 |
| US8557632B1 (en) * | 2012-04-09 | 2013-10-15 | Monolithic 3D Inc. | Method for fabrication of a semiconductor device and structure |
| US9368438B2 (en) * | 2012-12-28 | 2016-06-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package on package (PoP) bonding structures |
| WO2016209207A1 (en) * | 2015-06-22 | 2016-12-29 | Intel Corporation | Integrating mems structures with interconnects and vias |
| US9368450B1 (en) * | 2015-08-21 | 2016-06-14 | Qualcomm Incorporated | Integrated device package comprising bridge in litho-etchable layer |
| US10242968B2 (en) * | 2015-11-05 | 2019-03-26 | Massachusetts Institute Of Technology | Interconnect structure and semiconductor structures for assembly of cryogenic electronic packages |
| US10396012B2 (en) * | 2016-05-27 | 2019-08-27 | International Business Machines Corporation | Advanced through substrate via metallization in three dimensional semiconductor integration |
| WO2018063347A1 (en) * | 2016-09-30 | 2018-04-05 | Intel Corporation | Systems, methods, and apparatuses for implementing a high mobility low contact resistance semiconducting oxide in metal contact vias for thin film transistors |
| US10586909B2 (en) * | 2016-10-11 | 2020-03-10 | Massachusetts Institute Of Technology | Cryogenic electronic packages and assemblies |
| US10163802B2 (en) * | 2016-11-29 | 2018-12-25 | Taiwan Semicondcutor Manufacturing Company, Ltd. | Fan-out package having a main die and a dummy die, and method of forming |
-
2018
- 2018-01-17 US US15/873,218 patent/US10593563B2/en active Active
- 2018-04-11 WO PCT/US2018/027112 patent/WO2018191380A1/en not_active Ceased
- 2018-04-11 JP JP2019555587A patent/JP6972171B2/ja active Active
- 2018-04-12 TW TW107112587A patent/TWI743351B/zh active
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