JP2020517107A - レジストビアを有するファンアウトウエハレベルパッケージ - Google Patents
レジストビアを有するファンアウトウエハレベルパッケージ Download PDFInfo
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- JP2020517107A JP2020517107A JP2019555587A JP2019555587A JP2020517107A JP 2020517107 A JP2020517107 A JP 2020517107A JP 2019555587 A JP2019555587 A JP 2019555587A JP 2019555587 A JP2019555587 A JP 2019555587A JP 2020517107 A JP2020517107 A JP 2020517107A
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- die
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
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- 230000000717 retained effect Effects 0.000 description 1
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Abstract
Description
本特許出願は、2017年4月13日出願のHabaらに対する米国仮特許出願第62/484,974号の優先権の利益を主張し、その全体が参照により本明細書に組み込まれる。
図1は、組立品の例示的なプロセス中の1つ以上のファンアウト導体層124を有する例示的なウエハレベルパッケージ100を示す。図は図式的なものであり、構成要素は、実物大又は互いに相対的なスケールでは示されていないが、説明のために様式化されている。初めの工程では、アルミニウムに結合された銅などの金属(複数可)などからなり得る、又は別の剛性材料からなり得るキャリア102が提供される。アルミニウムは、例えば、キャリア102の支持層を提供することができ、一方で銅は、キャリア102の導電層を提供することができる。ダイ104は、キャリア102に恒久的に接着される。ダイ104は、単一列のダイとして、パッケージングされたダイとして、積層されたダイとして、並列ダイとして、又は再配線層(RDL)を有するダイとして、キャリア102に取り付けられてもよい。光画像形成可能なレジスト106などの仮レジスト106が、ダイ104上及びキャリア102上に塗布され、仮レジスト106は、例えば、フォトリソグラフィによって現像される。成形材料108は、パッケージの上部にわたって塗布される。成形材料108の上面及び仮フォトレジスト106の上面を含む上面110は、平坦化112されてもよい。次いで、仮フォトレジスト106を除去し、パッケージオンパッケージ(package-on-package、POP)貫通ビアを提供するのに好適な成形材料108を通して、ダイ104の上部のビア114及びビア116を残す。このパターン化された成形材料108は、導電ビア120及びパッド122を形成するために金属化118される。1つ以上のRDL層124が、隙間内に誘電体126又は他の充填材を用いて上部に形成されてもよい。アルミニウム層128などのキャリア102の支持層は、除去され得、キャリア102と共に使用されるとき、キャリア102の銅層130は、例えば、後側RDL層132として残り得る。
図10は、パッケージ内に永久ビアを形成するために使用される仮レジストを有する電子機器パッケージを作製する例示的な方法1000を示す。例示的な方法1000の動作は、個々のブロックとして示される。
Claims (20)
- 方法であって、
マイクロエレクトロニクスパッケージを作製するためにダイをキャリアに接着することと、
レジスト層を前記ダイ及び前記キャリアに塗布することと、
前記レジスト層内に空間を形成することと、
前記マイクロエレクトロニクスパッケージのためのビアを作製するために前記空間を使用することと、
前記マイクロエレクトロニクスパッケージのための導電経路を提供するために前記ビアを金属化することと、
を含む、方法。 - 前記レジスト層内にビアを直接形成するために前記レジスト層を現像することと、
前記マイクロエレクトロニクスパッケージのための導電経路を提供するために前記レジスト層内の前記ビアを金属化することと、
を更に含む、請求項1に記載の方法。 - 前記レジスト層が、光画像形成可能なレジストを含む、請求項2に記載の方法。
- 前記ビアのうちの少なくとも1つを形成するために前記レジスト層内に1つ以上の孔を穿設または形成することを更に含む、請求項2に記載の方法。
- 前記レジスト層内にコンタクトビア及び垂直パッケージオンパッケージ(POP)ビアを形成することと、
前記コンタクトビア及び前記垂直パッケージオンパッケージ(POP)ビア内で金属を同時に、かつ共形にめっき又は蒸着させることと、
を更に含む、請求項2に記載の方法。 - 前記マイクロエレクトロニクスパッケージの成形材料内でビアを作製するために仮レジスト層を使用することを更に含む、請求項1に記載の方法。
- 前記レジスト層内にチャネルまたは空間を形成するために前記仮レジスト層を現像することと、
前記チャネル又は前記空間を成形材料で充填することと、
前記成形材料内にビアを作るために前記仮レジスト層の残りのレジスト材料を除去することと、
前記マイクロエレクトロニクスパッケージのための導電経路を提供するために前記成形材料内の前記ビアを金属化することと、
を更に含む、請求項6に記載の方法。 - 前記ビアを金属化することが、前記ビアの少なくとも一部を金属でライニングすることと、前記ビア内の残りの空間を誘電材料又は非導電性充填材料で充填することと、を更に含む、請求項6に記載の方法。
- 前記マイクロエレクトロニクスパッケージの上部に1つ以上の再配線層を形成することを更に含み、前記再配線層のうちの少なくとも1つが、前記導電経路に結合されている、請求項1に記載の方法。
- 前記キャリアの導電部分が、前記導電経路に結合された再配線層(RDL)となるようにパターン化される、請求項1に記載の方法。
- 前記キャリアの支持構成要素を除去することと、前記マイクロエレクトロニクスパッケージの底部に1つ以上の再配線層(RDL)を形成することと、を更に含む、請求項10に記載の方法。
- 前記ダイが、前記キャリア上で上向きに接着される、請求項1に記載の方法。
- 前記ダイが、前記キャリア上で下向きに接着される、請求項1に記載の方法。
- 前記キャリアが、アルミニウム層又は支持材料層と、前記アルミニウム又は前記支持材料に剥離可能に取り付けられた銅層と、を含む、請求項1に記載の方法。
- 装置であって、
マイクロエレクトロニクスパッケージのキャリア、基材、又はパネルと、
前記キャリア、前記基材、又は前記パネル上の、レジスト層内又は成形材料内のビアと、
前記マイクロエレクトロニクスパッケージのための導電経路を提供するための前記ビア内の金属と、
を備える、装置。 - 前記レジスト層が、光画像形成可能な材料を含む、請求項15に記載の装置。
- 前記レジスト層が、前記成形材料内の前記ビアのための成形型を含む、請求項15に記載の装置。
- 前記レジスト層が、前記ビアのための成形型を含み、前記ビアが前記レジスト層内にある、請求項15に記載の装置。
- 前記キャリア、前記基材、又は前記パネルに接着された半導体ダイを更に備え、前記半導体ダイを前記キャリア、前記基材、又は前記パネルに接着する接着剤の厚さ及び密度が、前記マイクロエレクトロニクスパッケージ内の誘電体若しくは充填材料の物理的特性を均衡させる、請求項15に記載の装置。
- 前記マイクロエレクトロニクスパッケージの前記導電経路のうちの1つ以上に結合された、前記マイクロエレクトロニクスパッケージの上部又は底部上に1つ以上の再配線層(RDL)を更に備える、請求項15に記載の装置。
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