JP2020516081A - アレイ基板、表示基板の製造方法及びディスプレイパネル - Google Patents
アレイ基板、表示基板の製造方法及びディスプレイパネル Download PDFInfo
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
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- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
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Abstract
Description
S101: ベース基板201上に第1電極層202、絶縁層203及び半導体層204を順に形成する。 そのうち、ベース基板201は、透明材質であってもよく、具体的には、酸素バリア防水透明有機材質又はガラスであってもよい。一般的には、ガラス基板、シリカ基板があり、いくつかの応用では、ポリ塩化ビニル(Polyvinyl chloride、PV)、可溶性ポリテトラフルオロエチレン(Polytetrafluoro ethylene、PFA)、ポリエチレンテレフタレート(Polyethylene terephthalate、PET)基板などを使用してもよい。
S201: 窒素ドープグラフェンを供給する。
そのうち、酸化グラフェン分散液は、酸化グラフェンと所定量の溶剤を用いて調製したものであってもよく、該溶剤は、具体的には、エタノール、アセトンなどの一般的な有機溶剤又は水などであってもよい。酸化グラフェン分散液の濃度は、0.1〜5mg/mLであってもよく、具体的には、0.1mg/mL、0.5mg/mL、1mg/mL、1.5mg/mL、2mg/mL、2.5mg/mL、3mg/mL、3.5mg/mL、4mg/mL、4.5mg/mL、5mg/mLなどであってもよい。本実施形態では、使用される酸化グラフェン分散液は、具体的には、濃度が0.5mg/mLであり、体積が30mLである。
酸化グラフェンと尿素の混合液を加熱し、加熱の温度範囲が120〜250℃であり、具体的には、120℃、140℃、160℃、180℃、200℃、225℃、250℃などであってもよく、且つ、2〜3時間反応させ、本実施形態では、具体的には、水熱反応釜を用いて160℃に加熱し、且つ該温度で3時間反応させ、窒素ドープグラフェン固体を析出し、窒素ドープグラフェン粗製品を形成する。
そのうち、補助層303の材質は、具体的には、ポリメタクリル酸メチル(polymethyl methacrylate、PMMA)、ポリスチレン(Polystyrene、PS)、ポリカーボネート(Polycarbonate、PC)、ポリ塩化ビニル(Polyvinyl chloride、PVC)などのうちの少なくとも1種であってもよい。1つの応用場面では、補助層303は、ナノインプリントによって形成されてもよい。
補助層303にナノスケールパターン化処理を行う際に、具体的には、リソグラフィ、電子線直接描画、X線露光、極端紫外線光源露光、真空紫外線エッチング技術、ソフトリソグラフィ及びナノインプリント技術などを採用できる。1つの応用場面では、ナノインプリント技術を採用して補助層303にナノスケールパターン化処理を行うことにより、補助層303にナノスケールパターンを形成する。ナノインプリント技術を採用することで、必要に応じてPMMA層上に解像度がナノスケールの三次元人工構造を形成し、さらにそのナノスケールパターン化処理を実現することができる。ナノインプリント技術は、光学露光における回折現象や電子ビーム露光における散乱現象がなく、超高解像度を有するが、光学露光のように並列処理を行って、何百ものデバイスを同時に製造することができることにより、高生産量という利点を有し、また、ナノインプリント技術は、光学露光機のような複雑な光学系、又は電子ビーム露光機のような複雑な電磁集束システムを必要としないため、コストが低く、且つマスク上のパターンをほぼ差別なくウェハーに転写でき、ハイフィデリティを有する。
1つの応用場面では、n型ドープグラフェン層302を処理することは、具体的には、プラズマ表面処理技術、リソグラフィ、レーザエッチングなどを採用でき、本実施形態では、具体的には、プラズマ表面処理技術を採用し、n型ドープグラフェン層302にナノスケールパターンを有する補助層3031と同じパターンを形成させる。
102 電極層
103 絶縁層
104 半導体層
105 n型ドープグラフェン層
106 電極層
201 ベース基板
202 第1電極層
203 絶縁層
204 半導体層
205 n型ドープグラフェン層
301 半導体層
302 n型ドープグラフェン層
303 補助層
304 金型
1051 第1n型ドープグラフェン層
1052 第2n型ドープグラフェン層
3021 n型ドープグラフェン層
3031 補助層
Claims (19)
- アレイ基板であって、
ガラス基板と、
前記ガラス基板上に形成されるゲート電極の電極層と、
前記ガラス基板と前記ゲート電極の電極層上に被覆される絶縁層と、
前記絶縁層上に被覆される半導体層と、
前記半導体層上に形成され、第1n型ドープグラフェン層と第2n型ドープグラフェン層を含むn型ドープグラフェン層であって、前記第1n型ドープグラフェン層と第2n型ドープグラフェン層が間隔をあけて設置され、且つ前記ゲート電極の電極層の垂直上方の両端に位置し、前記第1n型ドープグラフェン層と第2n型ドープグラフェン層がそれぞれ前記ゲート電極の電極層と部分的に重なるn型ドープグラフェン層と、
前記n型ドープグラフェン層上に形成されるソース電極及びドレイン電極の電極層と、を含み、
前記n型ドープグラフェンは、窒素ドープグラフェン及びリンドープグラフェンのうちの少なくとも1種であるアレイ基板。 - 前記窒素ドープグラフェンは、尿素と酸化グラフェン分散液を反応させて製造されてなる請求項1に記載のアレイ基板。
- 前記n型ドープグラフェン層は、ナノスケールパターンを有する請求項2に記載のアレイ基板。
- 前記グラフェン電極層の前記ナノスケール電極パターン層は、ナノインプリント技術によって形成される請求項3に記載のアレイ基板。
- 前記ナノインプリント技術は、サーマルインプリントリソグラフィ技術である請求項4に記載のアレイ基板。
- 表示基板の製造方法であって、
1つのベース基板上に第1電極層、絶縁層及び半導体層を順に形成するステップと、
前記半導体層上にナノスケールパターンを有するn型ドープグラフェン層を形成するステップと、を含む表示基板の製造方法。 - 前記n型ドープグラフェン層は、窒素ドープグラフェン層である請求項6に記載の表示基板の製造方法。
- 前記半導体層上にナノスケールパターンを有する窒素ドープグラフェン層を形成する前、
前記窒素ドープグラフェンを提供するステップをさらに含むことを特徴とする請求項7に記載の表示基板の製造方法。 - 前記窒素ドープグラフェンを提供することは、
酸化グラフェン分散液に尿素を加え、混合液を形成するステップと、
前記混合液を第1温度に加熱して且つ保温することにより、窒素ドープグラフェン粗製品を得るステップと、
前記窒素ドープグラフェン粗製品を精製処理し、前記窒素ドープグラフェンを得るステップと、を含む請求項8に記載の表示基板の製造方法。 - 前記半導体層上にナノスケールパターンを有するn型ドープグラフェン層を形成することは、
前記半導体層上にn型ドープグラフェン層及び補助層を順に形成するステップと、
前記補助層にナノスケールパターン化処理を行うことにより、前記補助層にナノスケールパターンを形成するステップと、
前記n型ドープグラフェン層を処理することにより、ナノスケールパターンを有するn型ドープグラフェン層を形成するステップと、
前記補助層を除去するステップと、を含むことを特徴とする請求項6に記載の表示基板の製造方法。 - 前記補助層にナノスケールパターン化処理を行うことにより、前記補助層にナノスケールパターンを形成することは、
ナノインプリント技術によって前記補助層にナノスケールパターン化処理を行うことにより、前記補助層にナノスケールパターンを形成するステップを含む請求項10に記載の表示基板の製造方法。 - 前記n型ドープグラフェン層を処理することにより、ナノスケールパターンを有するn型ドープグラフェン層を形成することは、
プラズマ表面処理技術によって、前記n型ドープグラフェン層を処理し、ナノスケールパターンを有するn型ドープグラフェン層を形成するステップを含むことを特徴とする請求項10に記載の表示基板の製造方法。 - ディスプレイパネルであって、
表示基板を含み、
前記表示基板は、
ガラス基板と、
前記ガラス基板上に形成されるゲート電極の電極層と、
前記ガラス基板と前記ゲート電極の電極層上に被覆される絶縁層と、
前記絶縁層上に被覆される半導体層と、
前記半導体層上に形成され、第1n型ドープグラフェン層と第2n型ドープグラフェン層を含むn型ドープグラフェン層であって、前記第1n型ドープグラフェン層と第2n型ドープグラフェン層が間隔をあけて設置され、且つ前記ゲート電極の電極層の垂直上方の両端に位置し、前記第1n型ドープグラフェン層と第2n型ドープグラフェン層がそれぞれ前記ゲート電極の電極層と部分的に重なるn型ドープグラフェン層と、
前記n型ドープグラフェン層上に形成されるソース電極及びドレイン電極の電極層と、を含むディスプレイパネル。 - 前記n型ドープグラフェン層は、リンドープグラフェン層である請求項13に記載のディスプレイパネル。
- 前記n型ドープグラフェン層は、窒素ドープグラフェン層である請求項13に記載のディスプレイパネル。
- 前記窒素ドープグラフェンは、尿素と酸化グラフェン分散液を反応させて製造されてなる請求項15に記載のディスプレイパネル。
- 前記n型ドープグラフェン層は、ナノスケールパターンを有する請求項16に記載のディスプレイパネル。
- 前記グラフェン電極層の前記ナノスケール電極パターンは、ナノインプリント技術によって形成される請求項17に記載のディスプレイパネル。
- 前記ナノインプリント技術は、サーマルインプリントリソグラフィ技術である請求項18に記載のディスプレイパネル。
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