JP2020506052A - 窒素酸化物還元装置及びガス処理装置 - Google Patents
窒素酸化物還元装置及びガス処理装置 Download PDFInfo
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
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- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
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- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
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- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
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- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
Claims (17)
- プラズマによって外部から供給されるガスを処理するよう構成され、前記処理されたガスが窒素酸化物を含有する反応チャンバと、
前記反応チャンバに接続された窒素酸化物還元装置と、
を備えているガス処理装置であって、
前記窒素酸化物還元装置が、前記処理されたガスを窒素酸化物生成温度よりも低い温度まで冷却するよう構成された冷却ユニットを有している、
ことを特徴とするガス処理装置。 - 前記冷却ユニットが、低温ガスを注入するよう構成された1又は2以上のガス注入ノズルを有している、
請求項1に記載のガス処理装置。 - 前記ガス注入ノズルが、前記窒素酸化物還元装置の複数の位置に設けられ、前記低温ガスが不活性ガスである、
請求項2に記載のガス処理装置。 - 前記窒素酸化物還元装置が更に、円筒ハウジングと、前記円筒ハウジングの内部に設けられた環状ガス供給リングと、を有し、前記1又は2以上のガス注入ノズルが、前記環状ガス供給リング上に設けられている、
請求項2に記載のガス処理装置。 - 前記不活性ガスが、窒素ガス及びアルゴンガスのうちの少なくとも1つを含有する、
請求項3に記載のガス処理装置。 - 前記冷却ユニットが熱交換器を含む、
請求項1に記載のガス処理装置。 - プラズマによって処理されたガスに含有される窒素酸化物を低減するための窒素酸化物還元装置であって、前記処理されたガスを窒素酸化物生成温度よりも低い温度まで冷却するよう構成された冷却ユニットを備える、
窒素酸化物還元装置。 - 前記冷却ユニットは、低温ガスを注入するよう構成された1又は2以上のガス注入ノズルを有している、
請求項7に記載の窒素酸化物還元装置。 - 前記ガス注入ノズルは、前記窒素酸化物還元装置の複数の位置に設けられ、前記低温ガスが不活性ガスである、
請求項8に記載の窒素酸化物還元装置。 - 円筒ハウジングと、該円筒ハウジングの内部に設けられた環状ガス供給リングと、を更に備え、前記1又は2以上のガス注入ノズルが、前記環状ガス供給リング上に設けられている、
請求項8に記載の窒素酸化物還元装置。 - 前記冷却ユニットが熱交換器を含む、
請求項7に記載の窒素酸化物還元装置。 - ガス処理装置であって、
プラズマを生成するよう構成されたプラズマ発生装置と、
前記プラズマ発生装置に接続され、プラズマによって外部から供給されるガスを処理するよう構成され、前記処理されたガスが窒素酸化物を含有する、反応チャンバと、
前記反応チャンバに接続された窒素酸化物還元装置と、を備え、
前記窒素酸化物還元装置は、前記処理されたガスを窒素酸化物生成温度よりも低い温度まで冷却するよう構成された冷却ユニットを有している、
ことを特徴とするガス処理装置。 - 水注入ノズルを有するパイプを更に備え、前記窒素酸化物還元装置が、前記反応チャンバと前記パイプとの間に設けられている、
請求項12に記載のガス処理装置。 - 前記プラズマ発生装置が、
カソードを含むカソード組立体と、
プラズマ生成空間を有するアノードを含むアノード組立体と、
磁力を発生するよう構成された1又は2以上の磁力発生器と、
を備え、
前記アノード組立体は、ガス供給通路が設けられた一方の端部と、開口を有する他方の端部とを有し、前記ガス供給通路が、プラズマ生成ガスを前記プラズマ生成空間に供給するよう構成され、
前記ガス供給通路は、前記プラズマ生成空間において前記プラズマ生成ガスの渦を生成するよう構成され、前記1又は2以上の磁力発生器は、前記磁力が前記プラズマ生成ガスの渦の回転方向とは反対方向に生成されるように構成されている、
請求項13に記載のガス処理装置。 - 前記1又は2以上の磁力発生器は、前記磁力が、前記プラズマ生成ガスの渦の回転方向とは反対方向で前記カソードと前記アノードとの間に生成されたアークスポットに加えられるように構成されている、
請求項14に記載のガス処理装置。 - 前記1又は2以上の磁力発生器は、その両極性が、前記アノード組立体の軸線の方向で互いに反対方向になるように構成される、
請求項14に記載のガス処理装置。 - 前記開口から前記ガス供給通路に向けて見たときに、前記1又は2以上の磁力発生器のN極は、前記プラズマ生成ガスの渦の回転方向が反時計回り方向であるときに前記開口に向けて配向され、前記1又は2以上の磁力発生器のS極は、前記プラズマ生成ガスの渦の回転方向が時計回り方向であるときに前記開口に向けて配向される、
請求項16に記載のガス処理装置。
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Cited By (1)
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JP2021034209A (ja) * | 2019-08-23 | 2021-03-01 | 東京エレクトロン株式会社 | プラズマ溶射装置及びプラズマ溶射方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102646623B1 (ko) | 2017-01-23 | 2024-03-11 | 에드워드 코리아 주식회사 | 플라즈마 발생 장치 및 가스 처리 장치 |
CN110461082B (zh) * | 2019-07-10 | 2021-11-30 | 江苏天楹环保能源成套设备有限公司 | 一种降低空气等离子体炬火焰中NOx含量的装置与方法 |
GB2622259A (en) * | 2022-09-09 | 2024-03-13 | Edwards Ltd | NOx reduction |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51117977A (en) * | 1975-03-14 | 1976-10-16 | Inst Chiepuro I Matsusoobumena | Gas heating method and arc plasma chemical reaction furnace carrying out the method |
JPS6340299A (ja) * | 1986-08-05 | 1988-02-20 | 株式会社小松製作所 | 非移行式プラズマト−チの電極構造 |
JPH0389920A (ja) * | 1989-08-31 | 1991-04-15 | Toyonobu Yoshida | プラズマ反応法による有機ハロゲン化合物の分解装置 |
JP2000288510A (ja) * | 1999-03-31 | 2000-10-17 | Toshiba Corp | 有害物質分解方法および有害物質分解装置 |
JP2003251146A (ja) * | 2002-02-07 | 2003-09-09 | Tbi Co Ltd | 高温プラズマを用いたダイオキシンと粉塵除去方法及びその装置 |
WO2006031075A1 (en) * | 2004-09-15 | 2006-03-23 | Automit Co., Ltd. | Plasma apparatus for treating harmful gas |
JP2008194674A (ja) * | 2007-01-15 | 2008-08-28 | Kanken Techno Co Ltd | ガス処理装置およびガス処理方法 |
KR20120131959A (ko) * | 2011-05-27 | 2012-12-05 | 주식회사 에이피시스 | 플라즈마와 유해가스의 대향류를 이용한 유해가스 처리장치 및 처리방법 |
Family Cites Families (77)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3663792A (en) | 1970-03-02 | 1972-05-16 | Westinghouse Electric Corp | Apparatus and method of increasing arc voltage and gas enthalpy in a self-stabilizing arc heater |
US4144444A (en) * | 1975-03-20 | 1979-03-13 | Dementiev Valentin V | Method of heating gas and electric arc plasmochemical reactor realizing same |
NL7512635A (nl) | 1975-10-29 | 1977-05-03 | Ultra Centrifuge Nederland Nv | Procesreactor gebaseerd op een magneto hydrodyna- misch aangedreven supersone gaswervel. |
US4455470A (en) | 1981-08-14 | 1984-06-19 | The Perkin-Elmer Corporation | Plasma spray gun nozzle and coolant deionizer |
DE3430383A1 (de) * | 1984-08-17 | 1986-02-27 | Plasmainvent AG, Zug | Plasmaspritzbrenner fuer innenbeschichtungen |
US4818837A (en) * | 1984-09-27 | 1989-04-04 | Regents Of The University Of Minnesota | Multiple arc plasma device with continuous gas jet |
DE3642375A1 (de) | 1986-12-11 | 1988-06-23 | Castolin Sa | Verfahren zur aufbringung einer innenbeschichtung in rohre od. dgl. hohlraeume engen querschnittes sowie plasmaspritzbrenner dafuer |
FR2609358B1 (fr) | 1987-01-07 | 1991-11-29 | Electricite De France | Torche a plasma a pied d'arc amont mobile longitudinalement et procede pour maitriser son deplacement |
JP2517588B2 (ja) | 1987-04-06 | 1996-07-24 | 株式会社小松製作所 | プラズマト−チ |
US4882465A (en) | 1987-10-01 | 1989-11-21 | Olin Corporation | Arcjet thruster with improved arc attachment for enhancement of efficiency |
US5041713A (en) | 1988-05-13 | 1991-08-20 | Marinelon, Inc. | Apparatus and method for applying plasma flame sprayed polymers |
CA1323670C (en) | 1988-05-17 | 1993-10-26 | Subramania Ramakrishnan | Electric arc reactor |
US5026464A (en) | 1988-08-31 | 1991-06-25 | Agency Of Industrial Science And Technology | Method and apparatus for decomposing halogenated organic compound |
US4896017A (en) | 1988-11-07 | 1990-01-23 | The Carborundum Company | Anode for a plasma arc torch |
CA2047807A1 (fr) | 1991-07-24 | 1993-01-25 | My Dung Nguyen Handfield | Vitrification des cendres |
US5090340A (en) * | 1991-08-02 | 1992-02-25 | Burgess Donald A | Plasma disintegration for waste material |
JPH05144593A (ja) | 1991-11-18 | 1993-06-11 | Mitsubishi Heavy Ind Ltd | プラズマ切断トーチ |
JPH06340299A (ja) | 1993-06-01 | 1994-12-13 | Mitsubishi Heavy Ind Ltd | 宇宙機用相対位置検出装置 |
JP3089920B2 (ja) | 1993-12-03 | 2000-09-18 | 株式会社日立製作所 | 電気車の制御装置 |
JPH08199372A (ja) | 1995-01-26 | 1996-08-06 | Nisshin Steel Co Ltd | 傾斜機能材料の製法および装置 |
JP3571800B2 (ja) * | 1995-05-25 | 2004-09-29 | 新日本製鐵株式会社 | 有機ハロゲン化合物の処理設備における排ガスの冷却装置 |
US6045618A (en) | 1995-09-25 | 2000-04-04 | Applied Materials, Inc. | Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
US6187072B1 (en) | 1995-09-25 | 2001-02-13 | Applied Materials, Inc. | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
US6193802B1 (en) | 1995-09-25 | 2001-02-27 | Applied Materials, Inc. | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
JP2000096247A (ja) | 1998-09-22 | 2000-04-04 | Komatsu Ltd | 表面処理装置 |
RU2200058C1 (ru) | 2002-02-12 | 2003-03-10 | Открытое акционерное общество "ТВЭЛ" | Способ проведения гомогенных и гетерогенных химических реакций с использованием плазмы |
JP2006501980A (ja) * | 2002-07-23 | 2006-01-19 | イープラス ゲーエムベーハー | ガス反応を実行するためのプラズマ反応器およびプラズマ支援ガス反応の方法 |
KR100500246B1 (ko) * | 2003-04-09 | 2005-07-11 | 삼성전자주식회사 | 가스공급장치 |
US7494527B2 (en) * | 2004-01-26 | 2009-02-24 | Tekna Plasma Systems Inc. | Process for plasma synthesis of rhenium nano and micro powders, and for coatings and near net shape deposits thereof and apparatus therefor |
SE529056C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning |
KR100750406B1 (ko) * | 2006-02-06 | 2007-08-17 | 크린시스템스코리아(주) | 반도체 폐가스 처리용 스크러버의 파우더 제거 장치 |
JPWO2007040033A1 (ja) * | 2005-09-30 | 2009-04-16 | シャープ株式会社 | 冷却システム、その運転方法およびその冷却システムが用いられたプラズマ処理システム |
EP2343114B1 (en) | 2005-10-10 | 2012-07-25 | Korea Institute Of Machinery & Materials | Plasma reaction apparatus, and plasma reaction method of persistent gas |
KR100656093B1 (ko) * | 2006-08-25 | 2006-12-11 | 김영정 | 가연성 폐기물을 연료로 사용하는 소각장치 및 이를 활용한에너지 회수시스템 |
DE102006058078A1 (de) | 2006-12-07 | 2008-06-19 | Systec System- Und Anlagentechnik Gmbh & Co. Kg | Vakuumbeschichtungsanlage zur homogenen PVD-Beschichtung |
KR101147484B1 (ko) | 2007-01-26 | 2012-05-22 | 가부시끼가이샤 오오사까 신꾸우기끼 세이사꾸쇼 | 스퍼터링 방법 및 스퍼터링 장치 |
US7928338B2 (en) | 2007-02-02 | 2011-04-19 | Plasma Surgical Investments Ltd. | Plasma spraying device and method |
JP2008194637A (ja) | 2007-02-14 | 2008-08-28 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 微粒子製造装置 |
US7589473B2 (en) | 2007-08-06 | 2009-09-15 | Plasma Surgical Investments, Ltd. | Pulsed plasma device and method for generating pulsed plasma |
KR100967016B1 (ko) | 2007-09-20 | 2010-06-30 | 주식회사 포스코 | 플라즈마 토치장치 및 플라즈마를 이용한 반광 처리방법 |
KR101003731B1 (ko) | 2008-01-07 | 2011-01-13 | (주) 플라즈닉스 | 아크 플라즈마 불꽃을 이용한 기체상 물질의 전환 및처리기 |
US8536481B2 (en) * | 2008-01-28 | 2013-09-17 | Battelle Energy Alliance, Llc | Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma |
JP2009240983A (ja) | 2008-03-31 | 2009-10-22 | Mitsui Eng & Shipbuild Co Ltd | 焼却炉排ガスの処理方法 |
KR101006384B1 (ko) * | 2008-05-28 | 2011-01-11 | 주식회사 케이피씨 | 폐가스 처리장치 |
IT1391148B1 (it) | 2008-08-06 | 2011-11-18 | Reco 2 S R L | Metodo e apparato per purificare gas |
WO2010107744A1 (en) | 2009-03-16 | 2010-09-23 | Drexel University | Apparatus for atmospheric pressure pin-to-hole spark discharge and uses thereof |
RU2009110298A (ru) | 2009-03-24 | 2010-09-27 | Ооо "Твинн" (Ru) | Плазменная печь |
JP4576467B2 (ja) | 2009-03-31 | 2010-11-10 | 株式会社フェローテック | 絶縁体介装型プラズマ処理装置 |
JP4955027B2 (ja) * | 2009-04-02 | 2012-06-20 | クリーン・テクノロジー株式会社 | 排ガス処理装置における磁場によるプラズマの制御方法 |
US8800483B2 (en) | 2009-05-08 | 2014-08-12 | Peter F. Vandermeulen | Methods and systems for plasma deposition and treatment |
KR101111207B1 (ko) | 2009-05-20 | 2012-02-20 | 주식회사 에이피시스 | 플라즈마 발생장치 |
FR2953278B1 (fr) | 2009-11-27 | 2012-01-27 | Commissariat Energie Atomique | Procede et dispositif de destruction thermique de composes organiques par un plasma d'induction. |
DK2514280T3 (da) | 2009-12-15 | 2014-09-01 | Univ Danmarks Tekniske | Indretning til behandling af en overflade med mindst en glidende lysbuekilde |
IT1397734B1 (it) | 2010-01-15 | 2013-01-24 | Nuova Rivart S R L | Uso di estratti naturali di tannini e non tannini atti a migliorare la fertilita' del suolo e determinare un effetto starter sulle colture, e fitocomplesso di tannini e di non tannini per tale uso. |
KR101179650B1 (ko) | 2010-03-19 | 2012-09-04 | 서울대학교산학협력단 | 양극 주변에 영구자석 자장을 인가하여 성능개선을 한 공동형 플라즈마 토치 |
CN102387653B (zh) | 2010-09-02 | 2015-08-05 | 松下电器产业株式会社 | 等离子体处理装置及等离子体处理方法 |
US8773020B2 (en) | 2010-10-22 | 2014-07-08 | Applied Materials, Inc. | Apparatus for forming a magnetic field and methods of use thereof |
CN106508113B (zh) | 2011-05-30 | 2014-07-23 | 中国航天空气动力技术研究院 | 自磁场加速超高焓电弧加热器 |
CN102244060B (zh) * | 2011-06-02 | 2013-09-25 | 日月光半导体制造股份有限公司 | 封装基板及其制造方法 |
TW201328437A (zh) | 2011-12-22 | 2013-07-01 | Atomic Energy Council | 具移動式磁鐵機構之電漿火炬裝置 |
US9150949B2 (en) | 2012-03-08 | 2015-10-06 | Vladmir E. BELASHCHENKO | Plasma systems and methods including high enthalpy and high stability plasmas |
WO2014105819A1 (en) | 2012-12-28 | 2014-07-03 | Sputtering Components, Inc. | Plasma enhanced chemical vapor deposition (pecvd) source |
SK500062013A3 (sk) | 2013-03-05 | 2014-10-03 | Ga Drilling, A. S. | Generovanie elektrického oblúka, ktorý priamo plošne tepelne a mechanicky pôsobí na materiál a zariadenie na generovanie elektrického oblúka |
JP6151945B2 (ja) | 2013-03-28 | 2017-06-21 | 株式会社荏原製作所 | 除害機能付真空ポンプ |
EP2804450B1 (de) | 2013-05-16 | 2022-05-04 | Kjellberg-Stiftung | Mehrteiliges Isolierteil für einen Lichtbogenplasmabrenner, Brenner und zugehörige Anordnungen mit demselben und zugehörigen Verfahren |
CN203582762U (zh) | 2013-09-25 | 2014-05-07 | 新疆天业(集团)有限公司 | 一种多电弧等离子体裂解煤制乙炔反应装置 |
JP6643979B2 (ja) | 2013-10-04 | 2020-02-12 | シェルベリ−シュティフトゥングKjellberg−Stiftung | プラズマ切断トーチ用の複数部分からなる絶縁部分、ならびにそれを有するアセンブリおよびプラズマ切断トーチ |
CA2948681A1 (en) | 2014-05-16 | 2015-11-19 | Pyrogenesis Canada Inc. | Energy efficient high power plasma torch |
JP6494411B2 (ja) | 2014-06-24 | 2019-04-03 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
JP6473889B2 (ja) | 2014-09-19 | 2019-02-27 | パナソニックIpマネジメント株式会社 | プラズマ処理装置及び方法、電子デバイスの製造方法 |
JP6340299B2 (ja) | 2014-10-17 | 2018-06-06 | ローム株式会社 | スイッチ駆動回路及びこれを用いたスイッチング電源装置 |
CN104707987B (zh) | 2014-11-25 | 2017-06-20 | 张利 | 一种四塔组合等离子体处理铸造废气的系统 |
CN204362408U (zh) | 2014-12-24 | 2015-05-27 | 徐州燃控科技股份有限公司 | 一种大功率空冷等离子发生器 |
GB2540994A (en) | 2015-08-04 | 2017-02-08 | Edwards Ltd | Control of power supplied to a plasma torch to compensate for changes at an electrode |
GB2540992A (en) | 2015-08-04 | 2017-02-08 | Edwards Ltd | Control of gas flow and power supplied to a plasma torch in a multiple process chamber gas treatment system |
KR102646623B1 (ko) | 2017-01-23 | 2024-03-11 | 에드워드 코리아 주식회사 | 플라즈마 발생 장치 및 가스 처리 장치 |
US20200109473A1 (en) | 2018-10-08 | 2020-04-09 | Ascentool, Inc. | High throughput vacuum deposition sources and system thereof |
-
2017
- 2017-12-28 JP JP2019560612A patent/JP7319928B2/ja active Active
- 2017-12-28 EP EP17892132.6A patent/EP3570964B1/en active Active
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- 2017-12-28 WO PCT/KR2017/015694 patent/WO2018135772A1/en active Application Filing
-
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- 2018-01-23 TW TW107102385A patent/TWI794201B/zh active
-
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- 2022-08-22 JP JP2022131674A patent/JP7357735B2/ja active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51117977A (en) * | 1975-03-14 | 1976-10-16 | Inst Chiepuro I Matsusoobumena | Gas heating method and arc plasma chemical reaction furnace carrying out the method |
JPS6340299A (ja) * | 1986-08-05 | 1988-02-20 | 株式会社小松製作所 | 非移行式プラズマト−チの電極構造 |
JPH0389920A (ja) * | 1989-08-31 | 1991-04-15 | Toyonobu Yoshida | プラズマ反応法による有機ハロゲン化合物の分解装置 |
JP2000288510A (ja) * | 1999-03-31 | 2000-10-17 | Toshiba Corp | 有害物質分解方法および有害物質分解装置 |
JP2003251146A (ja) * | 2002-02-07 | 2003-09-09 | Tbi Co Ltd | 高温プラズマを用いたダイオキシンと粉塵除去方法及びその装置 |
WO2006031075A1 (en) * | 2004-09-15 | 2006-03-23 | Automit Co., Ltd. | Plasma apparatus for treating harmful gas |
JP2008194674A (ja) * | 2007-01-15 | 2008-08-28 | Kanken Techno Co Ltd | ガス処理装置およびガス処理方法 |
KR20120131959A (ko) * | 2011-05-27 | 2012-12-05 | 주식회사 에이피시스 | 플라즈마와 유해가스의 대향류를 이용한 유해가스 처리장치 및 처리방법 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021034209A (ja) * | 2019-08-23 | 2021-03-01 | 東京エレクトロン株式会社 | プラズマ溶射装置及びプラズマ溶射方法 |
JP7278174B2 (ja) | 2019-08-23 | 2023-05-19 | 東京エレクトロン株式会社 | プラズマ溶射装置及びプラズマ溶射方法 |
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US20210410264A1 (en) | 2021-12-30 |
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US11985754B2 (en) | 2024-05-14 |
JP7319928B2 (ja) | 2023-08-02 |
CN110612151A (zh) | 2019-12-24 |
EP3570964A4 (en) | 2020-12-02 |
WO2018135772A1 (en) | 2018-07-26 |
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