JP7065885B2 - プラズマ発生装置及びガス処理装置 - Google Patents
プラズマ発生装置及びガス処理装置 Download PDFInfo
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- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/40—Details, e.g. electrodes, nozzles using applied magnetic fields, e.g. for focusing or rotating the arc
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- H—ELECTRICITY
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
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- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3468—Vortex generators
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
- B01D2257/404—Nitrogen oxides other than dinitrogen oxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/002—Cooling arrangements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/10—Cooling arrangements
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- H—ELECTRICITY
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/10—Treatment of gases
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Description
Claims (16)
- プラズマ発生装置であって、
カソードを含むカソード組立体と、
プラズマ生成空間を有するアノードを含むアノード組立体と、
磁力を発生するよう構成された1又は2以上の磁力発生器と、を備え、
前記アノード組立体は、ガス供給通路が設けられた一方の端部と、開口を有する他方の端部とを有し、前記ガス供給通路が、プラズマ生成ガスを前記プラズマ生成空間に供給するよう構成され、
前記ガス供給通路は、前記プラズマ生成空間において前記プラズマ生成ガスの渦を生成するよう構成され、前記1又は2以上の磁力発生器は、前記磁力が前記プラズマ生成ガスの渦の回転方向とは反対方向に生成されるように構成され、
前記1又は2以上の磁力発生器は、前記磁力が、前記プラズマ生成ガスの渦の回転方向とは反対方向に前記カソードと前記アノードとの間に生成されたアークスポットに加えられるように構成され、
前記アノード組立体は更に、前記アノードを囲むガイド部材を含み、前記ガイド部材がプラスチック材料から作られ、前記1又は2以上の磁力発生器は、前記ガイド部材の内部に設けられている、
ことを特徴とするプラズマ発生装置。 - 前記1又は2以上の磁力発生器は、その両極性が、前記アノード組立体の軸線の方向で互いに反対方向になるように構成される、
請求項1に記載のプラズマ発生装置。 - 前記開口から前記ガス供給通路に向けて見たときに、前記1又は2以上の磁力発生器のN極は、前記プラズマ生成ガスの渦の回転方向が反時計回り方向であるときに前記開口に向けて配向され、前記1又は2以上の磁力発生器のS極は、前記プラズマ生成ガスの渦の回転方向が時計回り方向であるときに前記開口に向けて配向される、
請求項2に記載のプラズマ発生装置。 - 前記ガス供給通路は、前記アノード組立体の軸線の回転方向に対して傾斜している、
請求項1に記載のプラズマ発生装置。 - 前記1又は2以上の磁力発生器は、前記アノード組立体の内部又は外部に設けられる、
請求項1に記載のプラズマ発生装置。 - 前記1又は2以上の磁力発生器は、前記アノード組立体の軸線を中心に周方向に一定の周方向間隔で配置された複数の永久磁石を含む、
請求項1に記載のプラズマ発生装置。 - 前記1又は2以上の磁力発生器は、リング形永久磁石を含む、
請求項1に記載のプラズマ発生装置。 - 前記1又は2以上の磁力発生器は、前記アノード組立体の軸線と平行な方向及び前記アノード組立体の軸線に垂直な方向で移動可能である、
請求項1に記載のプラズマ発生装置。 - 前記ガイド部材は、前記ガス供給通路側に設けられた第1のガイドと、前記開口側に設けられた第2のガイドとを有し、前記第2のガイドの熱抵抗は、前記第1のガイドの熱抵抗よりも高い、
請求項1に記載のプラズマ発生装置。 - 前記アノード組立体は更に、前記ガイド部材を囲むハウジングと、前記ハウジングと前記ガイド部材との間及び前記ガイド部材と前記アノードとの間に形成されたクーラント経路と、を有している、
請求項1に記載のプラズマ発生装置。 - 請求項1~10の何れか一項に記載の前記プラズマ発生装置と、
前記プラズマ発生装置に接続され、プラズマによって外部から供給されるガスを処理するよう構成され、前記処理されたガスが窒素酸化物を含有する、反応チャンバと、
前記反応チャンバに接続された窒素酸化物還元装置と、
を備える、ガス処理装置であって、
前記窒素酸化物還元装置が、前記処理されたガスを窒素酸化物生成温度よりも低い温度まで冷却するよう構成された冷却ユニットを有している、
ことを特徴とするガス処理装置。 - 前記冷却ユニットが、低温ガスを注入するよう構成された1又は2以上のガス注入ノズルを有している、
請求項11に記載のガス処理装置。 - 前記ガス注入ノズルが、前記窒素酸化物還元装置の複数の位置に設けられ、前記低温ガスが不活性ガスである、
請求項12に記載のガス処理装置。 - 前記窒素酸化物還元装置が更に、円筒ハウジングと、前記円筒ハウジングの内部に設けられた環状ガス供給リングと、を含み、前記1又は2以上のガス注入ノズルが、前記環状ガス供給リング上に設けられる、
請求項12に記載のガス処理装置。 - 前記不活性ガスが、窒素ガス及びアルゴンガスのうちの少なくとも1つを含んでいる、
請求項13に記載のガス処理装置。 - 前記冷却ユニットが熱交換器を有している、
請求項11に記載のガス処理装置。
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PCT/KR2017/015691 WO2018135771A1 (en) | 2017-01-23 | 2017-12-28 | Plasma generating apparatus and gas treating apparatus |
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KR20180086669A (ko) | 2017-01-23 | 2018-08-01 | 에드워드 코리아 주식회사 | 질소 산화물 감소 장치 및 가스 처리 장치 |
RU2762196C2 (ru) * | 2019-07-25 | 2021-12-16 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Липецкий государственный технический университет" (ЛГТУ) | Электродуговой плазмотрон |
JP7278174B2 (ja) * | 2019-08-23 | 2023-05-19 | 東京エレクトロン株式会社 | プラズマ溶射装置及びプラズマ溶射方法 |
TWI754245B (zh) * | 2020-03-17 | 2022-02-01 | 國立陽明交通大學 | 電漿系統及混合電漿與水霧的方法 |
KR102520818B1 (ko) * | 2020-09-16 | 2023-04-12 | 한국기계연구원 | 돌출 전극을 갖는 스크러버, 이를 포함하는 스크러버 시스템, 스크러버 구동 방법 |
CN112738968A (zh) * | 2020-12-18 | 2021-04-30 | 北京北方华创微电子装备有限公司 | 等离子体生成装置和半导体工艺设备 |
CN112807947B (zh) * | 2020-12-21 | 2022-04-05 | 西南大学 | 一种介质阻挡电晕放电装置及使用该装置的烟气脱硝方法 |
RU2763161C1 (ru) * | 2021-04-15 | 2021-12-27 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Липецкий государственный технический университет" (ЛГТУ) | Электродуговой плазмотрон для обработки поверхностей деталей |
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US11430638B2 (en) | 2022-08-30 |
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KR20180086668A (ko) | 2018-08-01 |
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JP2020507196A (ja) | 2020-03-05 |
EP3571899B1 (en) | 2023-03-22 |
EP3571899A4 (en) | 2020-12-16 |
CN110463357A (zh) | 2019-11-15 |
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