JP2020501351A5 - - Google Patents
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- JP2020501351A5 JP2020501351A5 JP2019527869A JP2019527869A JP2020501351A5 JP 2020501351 A5 JP2020501351 A5 JP 2020501351A5 JP 2019527869 A JP2019527869 A JP 2019527869A JP 2019527869 A JP2019527869 A JP 2019527869A JP 2020501351 A5 JP2020501351 A5 JP 2020501351A5
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- JP
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- Prior art keywords
- voltage
- pulses
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- amplitude
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022181622A JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2024111356A JP7766751B2 (ja) | 2016-12-12 | 2024-07-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662433204P | 2016-12-12 | 2016-12-12 | |
| US62/433,204 | 2016-12-12 | ||
| US15/834,939 | 2017-12-07 | ||
| US15/834,939 US10312048B2 (en) | 2016-12-12 | 2017-12-07 | Creating ion energy distribution functions (IEDF) |
| PCT/US2017/065546 WO2018111751A1 (en) | 2016-12-12 | 2017-12-11 | Creating ion energy distribution functions (iedf) |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022181622A Division JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020501351A JP2020501351A (ja) | 2020-01-16 |
| JP2020501351A5 true JP2020501351A5 (enExample) | 2021-02-04 |
| JP7213808B2 JP7213808B2 (ja) | 2023-01-27 |
Family
ID=62490319
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019527869A Active JP7213808B2 (ja) | 2016-12-12 | 2017-12-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2022181622A Active JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2024111356A Active JP7766751B2 (ja) | 2016-12-12 | 2024-07-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022181622A Active JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2024111356A Active JP7766751B2 (ja) | 2016-12-12 | 2024-07-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US10312048B2 (enExample) |
| JP (3) | JP7213808B2 (enExample) |
| KR (3) | KR102335200B1 (enExample) |
| CN (2) | CN112701025B (enExample) |
| TW (3) | TW202503813A (enExample) |
| WO (1) | WO2018111751A1 (enExample) |
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| US10312048B2 (en) | 2016-12-12 | 2019-06-04 | Applied Materials, Inc. | Creating ion energy distribution functions (IEDF) |
| US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
| US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
| US11810761B2 (en) | 2018-07-27 | 2023-11-07 | Eagle Harbor Technologies, Inc. | Nanosecond pulser ADC system |
| US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
| KR20250100790A (ko) | 2019-01-22 | 2025-07-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 펄스 전압 파형을 제어하기 위한 피드백 루프 |
| US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
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| WO2021011450A1 (en) | 2019-07-12 | 2021-01-21 | Advanced Energy Industries, Inc. | Bias supply with a single controlled switch |
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| US11967484B2 (en) | 2020-07-09 | 2024-04-23 | Eagle Harbor Technologies, Inc. | Ion current droop compensation |
| NL2026071B1 (en) * | 2020-07-15 | 2022-03-18 | Prodrive Tech Bv | Voltage waveform generator for plasma assisted processing apparatuses |
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| JP7588222B2 (ja) * | 2020-10-02 | 2024-11-21 | イーグル ハーバー テクノロジーズ，インク． | イオン電流ドループ補償 |
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| US11798790B2 (en) * | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
| US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US20220375013A1 (en) * | 2021-05-21 | 2022-11-24 | Stanislav Chijik | Method And Apparatus For Cannabis and Cannabinoid Rights Certification, Verification, And Tracking System |
| US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
| US12148595B2 (en) | 2021-06-09 | 2024-11-19 | Applied Materials, Inc. | Plasma uniformity control in pulsed DC plasma chamber |
| US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
| US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
| US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
| US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
| US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
| US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
| US12046448B2 (en) | 2022-01-26 | 2024-07-23 | Advanced Energy Industries, Inc. | Active switch on time control for bias supply |
| US11996274B2 (en) * | 2022-04-07 | 2024-05-28 | Mks Instruments, Inc. | Real-time, non-invasive IEDF plasma sensor |
| US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US12315732B2 (en) | 2022-06-10 | 2025-05-27 | Applied Materials, Inc. | Method and apparatus for etching a semiconductor substrate in a plasma etch chamber |
| US11824542B1 (en) | 2022-06-29 | 2023-11-21 | Eagle Harbor Technologies, Inc. | Bipolar high voltage pulser |
| US12272524B2 (en) | 2022-09-19 | 2025-04-08 | Applied Materials, Inc. | Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
| CN119998919A (zh) | 2022-09-29 | 2025-05-13 | 鹰港科技有限公司 | 高压等离子控制 |
| US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
| CN116066319A (zh) * | 2023-03-14 | 2023-05-05 | 哈尔滨工业大学 | 抑制电推进空心阴极放电振荡的阴极外部电子补偿方法 |
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| JP7545607B1 (ja) * | 2024-05-09 | 2024-09-04 | 株式会社京三製作所 | パルス電源装置 |
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| FR1285343A (fr) * | 1961-01-10 | 1962-02-23 | Leybolds Nachfolger E | Dispositif pour la détection d'ions de masses différentes et son procédé de fonctionnement |
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| US6201208B1 (en) * | 1999-11-04 | 2001-03-13 | Wisconsin Alumni Research Foundation | Method and apparatus for plasma processing with control of ion energy distribution at the substrates |
| US6544895B1 (en) * | 2000-08-17 | 2003-04-08 | Micron Technology, Inc. | Methods for use of pulsed voltage in a plasma reactor |
| US6875700B2 (en) * | 2000-08-29 | 2005-04-05 | Board Of Regents, The University Of Texas System | Ion-Ion plasma processing with bias modulation synchronized to time-modulated discharges |
| JP4319514B2 (ja) | 2002-11-29 | 2009-08-26 | 株式会社日立ハイテクノロジーズ | サグ補償機能付き高周波電源を有するプラズマ処理装置 |
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| KR101860182B1 (ko) * | 2012-08-28 | 2018-05-21 | 어드밴스드 에너지 인더스트리즈 인코포레이티드 | 스위칭 모드 이온 에너지 분포 시스템을 제어하기 위한 방법 |
| JP6377060B2 (ja) | 2012-08-28 | 2018-08-22 | アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． | 広ダイナミックレンジイオンエネルギーバイアス制御、高速イオンエネルギー切り替え、イオンエネルギー制御およびパルスバイアス供給部、および仮想フロントパネル |
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| US9053908B2 (en) | 2013-09-19 | 2015-06-09 | Lam Research Corporation | Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etching |
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| US10968009B2 (en) | 2016-12-01 | 2021-04-06 | João Marques Fernandes | Constructive arrangement for the opening of a beverage can |
| US10312048B2 (en) * | 2016-12-12 | 2019-06-04 | Applied Materials, Inc. | Creating ion energy distribution functions (IEDF) |
| US11011351B2 (en) | 2018-07-13 | 2021-05-18 | Lam Research Corporation | Monoenergetic ion generation for controlled etch |
-
2017
- 2017-12-07 US US15/834,939 patent/US10312048B2/en active Active
- 2017-12-11 CN CN202011589113.1A patent/CN112701025B/zh active Active
- 2017-12-11 KR KR1020197019342A patent/KR102335200B1/ko active Active
- 2017-12-11 JP JP2019527869A patent/JP7213808B2/ja active Active
- 2017-12-11 KR KR1020237014022A patent/KR102770824B1/ko active Active
- 2017-12-11 WO PCT/US2017/065546 patent/WO2018111751A1/en not_active Ceased
- 2017-12-11 CN CN201780073879.4A patent/CN109997214B/zh active Active
- 2017-12-11 KR KR1020217039273A patent/KR102527251B1/ko active Active
- 2017-12-12 TW TW113129778A patent/TW202503813A/zh unknown
- 2017-12-12 TW TW111141611A patent/TWI855415B/zh active
- 2017-12-12 TW TW106143511A patent/TWI784991B/zh active
-
2019
- 2019-05-07 US US16/405,377 patent/US10685807B2/en active Active
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2020
- 2020-05-05 US US16/867,034 patent/US11069504B2/en active Active
-
2021
- 2021-07-16 US US17/377,639 patent/US11728124B2/en active Active
-
2022
- 2022-11-14 JP JP2022181622A patent/JP7703507B2/ja active Active
-
2024
- 2024-07-11 JP JP2024111356A patent/JP7766751B2/ja active Active
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