JP2024133686A5 - - Google Patents
Info
- Publication number
- JP2024133686A5 JP2024133686A5 JP2024111356A JP2024111356A JP2024133686A5 JP 2024133686 A5 JP2024133686 A5 JP 2024133686A5 JP 2024111356 A JP2024111356 A JP 2024111356A JP 2024111356 A JP2024111356 A JP 2024111356A JP 2024133686 A5 JP2024133686 A5 JP 2024133686A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- voltage
- applying
- distribution function
- energy distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025181382A JP2026012871A (ja) | 2016-12-12 | 2025-10-28 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662433204P | 2016-12-12 | 2016-12-12 | |
| US62/433,204 | 2016-12-12 | ||
| US15/834,939 US10312048B2 (en) | 2016-12-12 | 2017-12-07 | Creating ion energy distribution functions (IEDF) |
| US15/834,939 | 2017-12-07 | ||
| PCT/US2017/065546 WO2018111751A1 (en) | 2016-12-12 | 2017-12-11 | Creating ion energy distribution functions (iedf) |
| JP2019527869A JP7213808B2 (ja) | 2016-12-12 | 2017-12-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2022181622A JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022181622A Division JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025181382A Division JP2026012871A (ja) | 2016-12-12 | 2025-10-28 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024133686A JP2024133686A (ja) | 2024-10-02 |
| JP2024133686A5 true JP2024133686A5 (enExample) | 2025-07-22 |
| JP7766751B2 JP7766751B2 (ja) | 2025-11-10 |
Family
ID=62490319
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019527869A Active JP7213808B2 (ja) | 2016-12-12 | 2017-12-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2022181622A Active JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2024111356A Active JP7766751B2 (ja) | 2016-12-12 | 2024-07-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2025181382A Pending JP2026012871A (ja) | 2016-12-12 | 2025-10-28 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019527869A Active JP7213808B2 (ja) | 2016-12-12 | 2017-12-11 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
| JP2022181622A Active JP7703507B2 (ja) | 2016-12-12 | 2022-11-14 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025181382A Pending JP2026012871A (ja) | 2016-12-12 | 2025-10-28 | イオンエネルギー分布関数（ｉｅｄｆ）の生成 |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US10312048B2 (enExample) |
| JP (4) | JP7213808B2 (enExample) |
| KR (3) | KR102770824B1 (enExample) |
| CN (2) | CN109997214B (enExample) |
| TW (3) | TWI855415B (enExample) |
| WO (1) | WO2018111751A1 (enExample) |
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| KR20250100790A (ko) | 2019-01-22 | 2025-07-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 펄스 전압 파형을 제어하기 위한 피드백 루프 |
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| US11967484B2 (en) | 2020-07-09 | 2024-04-23 | Eagle Harbor Technologies, Inc. | Ion current droop compensation |
| NL2026071B1 (en) * | 2020-07-15 | 2022-03-18 | Prodrive Tech Bv | Voltage waveform generator for plasma assisted processing apparatuses |
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| US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11798790B2 (en) * | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
| US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US20220375013A1 (en) * | 2021-05-21 | 2022-11-24 | Stanislav Chijik | Method And Apparatus For Cannabis and Cannabinoid Rights Certification, Verification, And Tracking System |
| US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
| US12148595B2 (en) | 2021-06-09 | 2024-11-19 | Applied Materials, Inc. | Plasma uniformity control in pulsed DC plasma chamber |
| US12525441B2 (en) | 2021-06-09 | 2026-01-13 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
| US12525433B2 (en) | 2021-06-09 | 2026-01-13 | Applied Materials, Inc. | Method and apparatus to reduce feature charging in plasma processing chamber |
| US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
| US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
| US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
| US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
| US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
| US12046448B2 (en) | 2022-01-26 | 2024-07-23 | Advanced Energy Industries, Inc. | Active switch on time control for bias supply |
| US11996274B2 (en) | 2022-04-07 | 2024-05-28 | Mks Instruments, Inc. | Real-time, non-invasive IEDF plasma sensor |
| US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US12315732B2 (en) | 2022-06-10 | 2025-05-27 | Applied Materials, Inc. | Method and apparatus for etching a semiconductor substrate in a plasma etch chamber |
| US11824542B1 (en) | 2022-06-29 | 2023-11-21 | Eagle Harbor Technologies, Inc. | Bipolar high voltage pulser |
| US12272524B2 (en) | 2022-09-19 | 2025-04-08 | Applied Materials, Inc. | Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
| KR20250084155A (ko) | 2022-09-29 | 2025-06-10 | 이글 하버 테크놀로지스, 인코포레이티드 | 고전압 플라즈마 제어 |
| US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
| CN116066319A (zh) * | 2023-03-14 | 2023-05-05 | 哈尔滨工业大学 | 抑制电推进空心阴极放电振荡的阴极外部电子补偿方法 |
| US12567572B2 (en) | 2023-07-11 | 2026-03-03 | Advanced Energy Industries, Inc. | Plasma behaviors predicted by current measurements during asymmetric bias waveform application |
| JP7545608B1 (ja) * | 2024-05-09 | 2024-09-04 | 株式会社京三製作所 | パルス電源装置 |
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| WO2025255272A1 (en) * | 2024-06-07 | 2025-12-11 | Lam Research Corporation | Systems and methods for creating an iedf using a non-sinusoidal generator |
| CN121366847A (zh) * | 2024-07-18 | 2026-01-20 | 北京北方华创微电子装备有限公司 | 一种脉冲偏压信号生成方法以及半导体工艺设备 |
| US20260066226A1 (en) * | 2024-08-29 | 2026-03-05 | Tokyo Electron Limited | Method of sustaining plasma for plasma processing |
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-
2017
- 2017-12-07 US US15/834,939 patent/US10312048B2/en active Active
- 2017-12-11 JP JP2019527869A patent/JP7213808B2/ja active Active
- 2017-12-11 KR KR1020237014022A patent/KR102770824B1/ko active Active
- 2017-12-11 CN CN201780073879.4A patent/CN109997214B/zh active Active
- 2017-12-11 CN CN202011589113.1A patent/CN112701025B/zh active Active
- 2017-12-11 KR KR1020197019342A patent/KR102335200B1/ko active Active
- 2017-12-11 WO PCT/US2017/065546 patent/WO2018111751A1/en not_active Ceased
- 2017-12-11 KR KR1020217039273A patent/KR102527251B1/ko active Active
- 2017-12-12 TW TW111141611A patent/TWI855415B/zh active
- 2017-12-12 TW TW113129778A patent/TW202503813A/zh unknown
- 2017-12-12 TW TW106143511A patent/TWI784991B/zh active
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2019
- 2019-05-07 US US16/405,377 patent/US10685807B2/en active Active
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2020
- 2020-05-05 US US16/867,034 patent/US11069504B2/en active Active
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2021
- 2021-07-16 US US17/377,639 patent/US11728124B2/en active Active
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2022
- 2022-11-14 JP JP2022181622A patent/JP7703507B2/ja active Active
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2024
- 2024-07-11 JP JP2024111356A patent/JP7766751B2/ja active Active
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2025
- 2025-10-28 JP JP2025181382A patent/JP2026012871A/ja active Pending
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