JP2020198350A - 基板のめっき方法 - Google Patents
基板のめっき方法 Download PDFInfo
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- JP2020198350A JP2020198350A JP2019102986A JP2019102986A JP2020198350A JP 2020198350 A JP2020198350 A JP 2020198350A JP 2019102986 A JP2019102986 A JP 2019102986A JP 2019102986 A JP2019102986 A JP 2019102986A JP 2020198350 A JP2020198350 A JP 2020198350A
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- Prior art keywords
- substrate
- resist film
- plating
- electrode
- clamp member
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4007—Surface contacts, e.g. bumps
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/105—Using an electrical field; Special methods of applying an electric potential
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
[基板のめっき方法]
図1は、実施例に係る基板のめっき方法の一例を示すフローチャートである。
10b 前面
10c 裏面
12 第1給電層
14 第2給電層
21 第1レジスト膜
21a 切欠き
22 第2レジスト膜
22a、22b 切欠き
52 クランプ部材
54 第1電極
55 第2電極
Claims (3)
- 基板の第1面に、前記第1面の被めっき領域の位置に開口を有し且つ前記第1面の外縁の少なくとも一部において第1給電層を露出させる第1レジスト膜を形成する工程と、
前記基板の前記第1面とは反対側の第2面に、前記第2面の外縁の少なくとも一部において第2給電層を露出させる第2レジスト膜を形成する工程と、
前記第1給電層及び前記第2給電層にクランプ部材を接触させた状態で前記クランプ部材により前記基板を保持するとともに、前記基板の第1面に対向して第1電極を配置し且つ前記基板の第2面に対向して第2電極を配置する工程と、
前記基板の第1面と前記第1電極との間に供給される電流の値よりも前記基板の第2面と前記第2電極との間に供給される電流の値が大きい条件下で、前記第1レジスト膜をマスクとして前記第1面の被めっき領域にめっき層を形成する工程と、
を有することを特徴とする基板のめっき方法。 - 前記第2レジスト膜は、前記第2面の外縁の全周に対応する位置に、前記第2給電層を露出させる枠形状の切欠きを有することを特徴とする請求項1に記載の基板のめっき方法。
- 前記第2レジスト膜は、前記第2面の外縁のうち前記第2面の前記クランプ部材と交差可能な一辺と該一辺に連続する他の2辺とに沿った部分に対応する位置に、前記第2給電層を露出させる略C字形状の切欠きを有することを特徴とする請求項1に記載の基板のめっき方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019102986A JP7274353B2 (ja) | 2019-05-31 | 2019-05-31 | 基板のめっき方法 |
US16/880,091 US11230779B2 (en) | 2019-05-31 | 2020-05-21 | Substrate plating method |
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---|---|---|---|
JP2019102986A JP7274353B2 (ja) | 2019-05-31 | 2019-05-31 | 基板のめっき方法 |
Publications (2)
Publication Number | Publication Date |
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JP2020198350A true JP2020198350A (ja) | 2020-12-10 |
JP7274353B2 JP7274353B2 (ja) | 2023-05-16 |
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JP2019102986A Active JP7274353B2 (ja) | 2019-05-31 | 2019-05-31 | 基板のめっき方法 |
Country Status (2)
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US (1) | US11230779B2 (ja) |
JP (1) | JP7274353B2 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06116799A (ja) * | 1992-10-01 | 1994-04-26 | Hitachi Chem Co Ltd | 電気めっき法 |
JP2008231539A (ja) * | 2007-03-22 | 2008-10-02 | Shinko Electric Ind Co Ltd | めっき装置及び配線基板の製造方法 |
JP2015086444A (ja) * | 2013-10-31 | 2015-05-07 | 凸版印刷株式会社 | 電解めっき装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3068596B1 (ja) | 1999-03-02 | 2000-07-24 | 富山日本電気株式会社 | プリント配線板の製造方法 |
JP2003309214A (ja) * | 2002-04-17 | 2003-10-31 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
-
2019
- 2019-05-31 JP JP2019102986A patent/JP7274353B2/ja active Active
-
2020
- 2020-05-21 US US16/880,091 patent/US11230779B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06116799A (ja) * | 1992-10-01 | 1994-04-26 | Hitachi Chem Co Ltd | 電気めっき法 |
JP2008231539A (ja) * | 2007-03-22 | 2008-10-02 | Shinko Electric Ind Co Ltd | めっき装置及び配線基板の製造方法 |
JP2015086444A (ja) * | 2013-10-31 | 2015-05-07 | 凸版印刷株式会社 | 電解めっき装置 |
Also Published As
Publication number | Publication date |
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US11230779B2 (en) | 2022-01-25 |
US20200378026A1 (en) | 2020-12-03 |
JP7274353B2 (ja) | 2023-05-16 |
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