JP2020193151A5 - - Google Patents
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- JP2020193151A5 JP2020193151A5 JP2019097582A JP2019097582A JP2020193151A5 JP 2020193151 A5 JP2020193151 A5 JP 2020193151A5 JP 2019097582 A JP2019097582 A JP 2019097582A JP 2019097582 A JP2019097582 A JP 2019097582A JP 2020193151 A5 JP2020193151 A5 JP 2020193151A5
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- JP
- Japan
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- -1 salt compound Chemical class 0.000 claims description 21
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 20
- 125000001153 fluoro group Chemical group F* 0.000 claims description 13
- 125000005842 heteroatom Chemical group 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 8
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 125000004434 sulfur atom Chemical group 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 229920005601 base polymer Polymers 0.000 description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000000686 lactone group Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 229910052760 oxygen Chemical group 0.000 description 2
- 239000001301 oxygen Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 150000008065 acid anhydrides Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 150000004292 cyclic ethers Chemical group 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical compound FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 125000005650 substituted phenylene group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000008053 sultones Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000008027 tertiary esters Chemical class 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019097582A JP7226095B2 (ja) | 2019-05-24 | 2019-05-24 | オニウム塩化合物、化学増幅レジスト組成物、及びパターン形成方法 |
| US16/858,160 US12275693B2 (en) | 2019-05-24 | 2020-04-24 | Onium salt, chemically amplified resist composition and patterning process |
| TW109116819A TWI741612B (zh) | 2019-05-24 | 2020-05-21 | 鎓鹽化合物、化學增幅光阻組成物、以及圖案形成方法 |
| KR1020200061910A KR102477759B1 (ko) | 2019-05-24 | 2020-05-22 | 오늄 염, 화학 증폭 레지스트 조성물 및 패턴 형성 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019097582A JP7226095B2 (ja) | 2019-05-24 | 2019-05-24 | オニウム塩化合物、化学増幅レジスト組成物、及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020193151A JP2020193151A (ja) | 2020-12-03 |
| JP2020193151A5 true JP2020193151A5 (enrdf_load_stackoverflow) | 2021-04-01 |
| JP7226095B2 JP7226095B2 (ja) | 2023-02-21 |
Family
ID=73457574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019097582A Active JP7226095B2 (ja) | 2019-05-24 | 2019-05-24 | オニウム塩化合物、化学増幅レジスト組成物、及びパターン形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12275693B2 (enrdf_load_stackoverflow) |
| JP (1) | JP7226095B2 (enrdf_load_stackoverflow) |
| KR (1) | KR102477759B1 (enrdf_load_stackoverflow) |
| TW (1) | TWI741612B (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6950357B2 (ja) * | 2017-08-24 | 2021-10-13 | 信越化学工業株式会社 | スルホニウム化合物、レジスト組成物及びパターン形成方法 |
| JP7636178B2 (ja) * | 2020-02-28 | 2025-02-26 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7310724B2 (ja) * | 2020-06-04 | 2023-07-19 | 信越化学工業株式会社 | オニウム塩、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2655369B2 (ja) | 1991-06-28 | 1997-09-17 | 富士写真フイルム株式会社 | 感光性組成物 |
| JP3969909B2 (ja) | 1999-09-27 | 2007-09-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| KR100422971B1 (ko) | 1999-12-29 | 2004-03-12 | 삼성전자주식회사 | 나프톨 구조를 가진 이온형 광산발생제 및 이를 이용한감광성 폴리이미드 조성물 |
| JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
| KR100718108B1 (ko) | 2005-10-07 | 2007-05-14 | 삼성에스디아이 주식회사 | 고분자 전해질막, 그 제조방법 및 이를 이용한 연료전지 |
| TWI381246B (zh) | 2005-12-27 | 2013-01-01 | Sumitomo Chemical Co | 適用於酸產生劑的鹽及含有該鹽之化學增幅型阻劑組成物 |
| JP5135791B2 (ja) | 2005-12-27 | 2013-02-06 | 住友化学株式会社 | 化学増幅型レジスト組成物の酸発生剤用の塩 |
| JP2009053518A (ja) | 2007-08-28 | 2009-03-12 | Fujifilm Corp | 電子線、ｘ線またはｅｕｖ用レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| EP2101217B1 (en) * | 2008-03-14 | 2011-05-11 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt-containing polymer, resist compositon, and patterning process |
| JP5407203B2 (ja) | 2008-07-14 | 2014-02-05 | セントラル硝子株式会社 | 新規スルホン酸塩及びその誘導体、光酸発生剤並びにスルホン酸塩の製造方法 |
| JP5723626B2 (ja) | 2010-02-19 | 2015-05-27 | 富士フイルム株式会社 | パターン形成方法、化学増幅型レジスト組成物及びレジスト膜 |
| EP2472323A3 (en) * | 2010-12-31 | 2013-01-16 | Rohm and Haas Electronic Materials LLC | Polymerizable photoacid generators |
| JP2013040164A (ja) | 2011-07-19 | 2013-02-28 | Sumitomo Chemical Co Ltd | 化合物、レジスト組成物及びレジストパターンの製造方法 |
| JP5948862B2 (ja) | 2011-12-26 | 2016-07-06 | 住友化学株式会社 | 新規化合物及びその製造方法 |
| JP6112018B2 (ja) | 2012-01-23 | 2017-04-12 | セントラル硝子株式会社 | 含フッ素スルホン酸塩類、含フッ素スルホン酸塩樹脂、レジスト組成物及びそれを用いたパターン形成方法 |
| KR102070057B1 (ko) | 2012-03-19 | 2020-01-29 | 제이에스알 가부시끼가이샤 | 포토레지스트 조성물, 화합물 및 그의 제조 방법 |
| JP5865199B2 (ja) | 2012-07-09 | 2016-02-17 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び、フォトマスクの製造方法 |
| KR102152485B1 (ko) * | 2015-10-23 | 2020-09-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 레지스트 재료, 패턴 형성 방법, 그리고 바륨염, 세슘염 및 세륨염 |
| JP6902832B2 (ja) | 2016-06-28 | 2021-07-14 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸発生剤 |
| JP7091760B2 (ja) | 2017-05-24 | 2022-06-28 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7055071B2 (ja) * | 2018-06-18 | 2022-04-15 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
| JP7373354B2 (ja) | 2018-10-22 | 2023-11-02 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7478572B2 (ja) | 2019-04-10 | 2024-05-07 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
-
2019
- 2019-05-24 JP JP2019097582A patent/JP7226095B2/ja active Active
-
2020
- 2020-04-24 US US16/858,160 patent/US12275693B2/en active Active
- 2020-05-21 TW TW109116819A patent/TWI741612B/zh active
- 2020-05-22 KR KR1020200061910A patent/KR102477759B1/ko active Active
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