JP2020172423A - 無アルカリガラス板 - Google Patents
無アルカリガラス板 Download PDFInfo
- Publication number
- JP2020172423A JP2020172423A JP2019093662A JP2019093662A JP2020172423A JP 2020172423 A JP2020172423 A JP 2020172423A JP 2019093662 A JP2019093662 A JP 2019093662A JP 2019093662 A JP2019093662 A JP 2019093662A JP 2020172423 A JP2020172423 A JP 2020172423A
- Authority
- JP
- Japan
- Prior art keywords
- glass plate
- content
- alkali
- glass
- young
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011521 glass Substances 0.000 title claims abstract description 103
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 239000007791 liquid phase Substances 0.000 claims abstract description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 37
- 239000003513 alkali Substances 0.000 claims description 28
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 18
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 13
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 8
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 32
- 238000004031 devitrification Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 239000013078 crystal Substances 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- 229910010413 TiO 2 Inorganic materials 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 6
- 238000007500 overflow downdraw method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000006025 fining agent Substances 0.000 description 5
- 239000006066 glass batch Substances 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000010583 slow cooling Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- 229910017976 MgO 4 Inorganic materials 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910052661 anorthite Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000009774 resonance method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/361—Temperature
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
(1)熱処理工程で成膜された半導体物質中にアルカリイオンが拡散する事態を防止するため、ほとんどアルカリ金属酸化物を含まないこと、つまり無アルカリガラスであること(ガラス組成中のアルカリ酸化物の含有量が0.5mol%以下であること)、
(2)ガラス板を低廉化するため、生産性に優れること、特に溶融性や耐失透性に優れること、
(3)LTPS(low temperature poly silicon)プロセスにおいて、ガラス板の熱収縮を低減するため、歪点が高いこと。
β−OH=(1/X)log(T1/T2)
X:板厚(mm)
T1:参照波長3846cm−1における透過率(%)
T2:水酸基吸収波長3600cm−1付近における最小透過率(%)
Claims (9)
- ガラス組成中のLi2O+Na2O+K2Oの含有量が0〜0.5mol%であり、ヤング率が78GPa以上、歪点が680℃以上、液相温度が1450℃以下であることを特徴とする無アルカリガラス板。
- ガラス組成として、mol%で、SiO2 58〜68%、Al2O3 11〜18%、B2O3 1.5〜6%、Li2O+Na2O+K2O 0〜0.5%、MgO 4〜10%、CaO 2〜10%、SrO+BaO 2〜13%を含有することを特徴とする請求項1に記載の無アルカリガラス板。
- ガラス組成として、mol%で、SiO2 58〜67%、Al2O3 11〜18%、B2O3 1.5〜6%、Li2O+Na2O+K2O 0〜0.5%、MgO 4〜10%、CaO 2〜10%、SrO 1.5〜8%、BaO 1.5〜8%を含有し、実質的にAs2O3、Sb2O3を含有しないことを特徴とする請求項1に記載の無アルカリガラス板。
- 更に、SnO2を0.001〜1mol%含むことを特徴とする請求項1〜3の何れか一項に記載の無アルカリガラス板。
- 歪点が690℃以上であることを特徴とする請求項1〜4の何れか一項に記載の無アルカリガラス板。
- ヤング率が80GPaより高いことを特徴とする請求項1〜5の何れか一項に記載の無アルカリガラス板。
- 30〜380℃の温度範囲における平均熱膨張係数が30×10−7〜50×10−7/℃であることを特徴とする請求項1〜6の何れか一項に記載の無アルカリガラス板。
- 液相粘度が104.5dPa・s以上であることを特徴とする請求項1〜7の何れか一項に記載の無アルカリガラス板。
- 有機ELデバイスに用いることを特徴とする請求項1〜8の何れか一項に記載の無アルカリガラス板。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17/284,917 US20210380465A1 (en) | 2018-10-15 | 2019-10-07 | Alkali-free glass plate |
KR1020217014125A KR20210073560A (ko) | 2018-10-15 | 2019-10-07 | 무알칼리 유리판 |
PCT/JP2019/039490 WO2020080163A1 (ja) | 2018-10-15 | 2019-10-07 | 無アルカリガラス板 |
CN202211512703.3A CN116161864A (zh) | 2018-10-15 | 2019-10-07 | 无碱玻璃板 |
CN201980067069.7A CN112823143A (zh) | 2018-10-15 | 2019-10-07 | 无碱玻璃板 |
TW112114066A TW202330419A (zh) | 2018-10-15 | 2019-10-08 | 無鹼玻璃板 |
TW108136429A TW202028140A (zh) | 2018-10-15 | 2019-10-08 | 無鹼玻璃板 |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018194038 | 2018-10-15 | ||
JP2018194038 | 2018-10-15 | ||
JP2018230725 | 2018-12-10 | ||
JP2018230725 | 2018-12-10 | ||
JP2019031628 | 2019-02-25 | ||
JP2019031628 | 2019-02-25 | ||
JP2019074958 | 2019-04-10 | ||
JP2019074958 | 2019-04-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020172423A true JP2020172423A (ja) | 2020-10-22 |
JP7389400B2 JP7389400B2 (ja) | 2023-11-30 |
Family
ID=72830747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019093662A Active JP7389400B2 (ja) | 2018-10-15 | 2019-05-17 | 無アルカリガラス板 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20210380465A1 (ja) |
JP (1) | JP7389400B2 (ja) |
KR (1) | KR20210073560A (ja) |
CN (1) | CN112823143A (ja) |
TW (1) | TW202028140A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115196876B (zh) * | 2022-08-30 | 2024-02-27 | 郑州大学 | 一种柔性超薄玻璃及其制备方法和应用 |
CN115745398A (zh) * | 2022-11-30 | 2023-03-07 | 成都光明光电股份有限公司 | 玻璃组合物 |
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JP2012184146A (ja) * | 2011-03-08 | 2012-09-27 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
JP2013151407A (ja) * | 2011-12-29 | 2013-08-08 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
WO2013183626A1 (ja) * | 2012-06-05 | 2013-12-12 | 旭硝子株式会社 | 無アルカリガラスおよびその製造方法 |
WO2014087971A1 (ja) * | 2012-12-05 | 2014-06-12 | 旭硝子株式会社 | 無アルカリガラス基板 |
JP2015083533A (ja) * | 2011-12-28 | 2015-04-30 | AvanStrate株式会社 | フラットパネルディスプレイ用ガラス基板およびその製造方法 |
US20160039710A1 (en) * | 2013-04-23 | 2016-02-11 | Asahi Glass Company, Limited | Alkali-free glass substrate and method for producing same |
JP2016029001A (ja) * | 2014-07-18 | 2016-03-03 | 旭硝子株式会社 | 無アルカリガラス |
JP2016188148A (ja) * | 2013-08-30 | 2016-11-04 | 旭硝子株式会社 | 無アルカリガラスおよびその製造方法 |
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2019
- 2019-05-17 JP JP2019093662A patent/JP7389400B2/ja active Active
- 2019-10-07 CN CN201980067069.7A patent/CN112823143A/zh active Pending
- 2019-10-07 US US17/284,917 patent/US20210380465A1/en active Pending
- 2019-10-07 KR KR1020217014125A patent/KR20210073560A/ko not_active Application Discontinuation
- 2019-10-08 TW TW108136429A patent/TW202028140A/zh unknown
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JP2009525942A (ja) * | 2006-02-10 | 2009-07-16 | コーニング インコーポレイテッド | 熱および化学安定性が高いガラス組成物ならびにその製造方法 |
JP2017007945A (ja) * | 2010-10-06 | 2017-01-12 | コーニング インコーポレイテッド | 高熱および化学安定性を有する無アルカリガラス組成物 |
JP2012184146A (ja) * | 2011-03-08 | 2012-09-27 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
JP2016199467A (ja) * | 2011-07-01 | 2016-12-01 | AvanStrate株式会社 | フラットパネルディスプレイ用ガラス基板及びその製造方法 |
JP2015083533A (ja) * | 2011-12-28 | 2015-04-30 | AvanStrate株式会社 | フラットパネルディスプレイ用ガラス基板およびその製造方法 |
JP2013151407A (ja) * | 2011-12-29 | 2013-08-08 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
WO2013183626A1 (ja) * | 2012-06-05 | 2013-12-12 | 旭硝子株式会社 | 無アルカリガラスおよびその製造方法 |
WO2014087971A1 (ja) * | 2012-12-05 | 2014-06-12 | 旭硝子株式会社 | 無アルカリガラス基板 |
US20160039710A1 (en) * | 2013-04-23 | 2016-02-11 | Asahi Glass Company, Limited | Alkali-free glass substrate and method for producing same |
JP2016188148A (ja) * | 2013-08-30 | 2016-11-04 | 旭硝子株式会社 | 無アルカリガラスおよびその製造方法 |
JP2016029001A (ja) * | 2014-07-18 | 2016-03-03 | 旭硝子株式会社 | 無アルカリガラス |
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TW202028140A (zh) | 2020-08-01 |
CN112823143A (zh) | 2021-05-18 |
KR20210073560A (ko) | 2021-06-18 |
JP7389400B2 (ja) | 2023-11-30 |
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