JP2020126776A5 - - Google Patents

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Publication number
JP2020126776A5
JP2020126776A5 JP2019018831A JP2019018831A JP2020126776A5 JP 2020126776 A5 JP2020126776 A5 JP 2020126776A5 JP 2019018831 A JP2019018831 A JP 2019018831A JP 2019018831 A JP2019018831 A JP 2019018831A JP 2020126776 A5 JP2020126776 A5 JP 2020126776A5
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JP
Japan
Prior art keywords
high frequency
generate
power
frequency
frequency power
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JP2019018831A
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English (en)
Japanese (ja)
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JP2020126776A (ja
JP7122268B2 (ja
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Priority to JP2019018831A priority Critical patent/JP7122268B2/ja
Priority claimed from JP2019018831A external-priority patent/JP7122268B2/ja
Priority to CN202010070264.XA priority patent/CN111524781B/zh
Priority to KR1020200008820A priority patent/KR20200096734A/ko
Priority to US16/773,800 priority patent/US11087960B2/en
Publication of JP2020126776A publication Critical patent/JP2020126776A/ja
Publication of JP2020126776A5 publication Critical patent/JP2020126776A5/ja
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JP2019018831A 2019-02-05 2019-02-05 プラズマ処理装置 Active JP7122268B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019018831A JP7122268B2 (ja) 2019-02-05 2019-02-05 プラズマ処理装置
CN202010070264.XA CN111524781B (zh) 2019-02-05 2020-01-21 高频电源及等离子体处理装置
KR1020200008820A KR20200096734A (ko) 2019-02-05 2020-01-22 고주파 전원 및 플라즈마 처리 장치
US16/773,800 US11087960B2 (en) 2019-02-05 2020-01-27 Radio frequency power source and plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019018831A JP7122268B2 (ja) 2019-02-05 2019-02-05 プラズマ処理装置

Publications (3)

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JP2020126776A JP2020126776A (ja) 2020-08-20
JP2020126776A5 true JP2020126776A5 (enExample) 2021-12-16
JP7122268B2 JP7122268B2 (ja) 2022-08-19

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JP2019018831A Active JP7122268B2 (ja) 2019-02-05 2019-02-05 プラズマ処理装置

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US (1) US11087960B2 (enExample)
JP (1) JP7122268B2 (enExample)
KR (1) KR20200096734A (enExample)
CN (1) CN111524781B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6846387B2 (ja) * 2018-06-22 2021-03-24 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
JP7122268B2 (ja) * 2019-02-05 2022-08-19 東京エレクトロン株式会社 プラズマ処理装置
KR20220027803A (ko) * 2020-08-27 2022-03-08 주식회사 히타치하이테크 플라스마 처리 장치
CN114121589A (zh) * 2020-08-31 2022-03-01 东京毅力科创株式会社 等离子体处理装置和等离子体处理方法
JP2022159653A (ja) * 2021-04-05 2022-10-18 東京エレクトロン株式会社 エッチング方法及びエッチング処理装置
KR102803167B1 (ko) 2022-02-07 2025-05-07 주식회사 뉴파워 프라즈마 고주파 펄스 전원 장치 및 그의 운전 방법

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JP7122268B2 (ja) * 2019-02-05 2022-08-19 東京エレクトロン株式会社 プラズマ処理装置

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