JP2020079853A - 光学素子、光学系、および、光学機器 - Google Patents

光学素子、光学系、および、光学機器 Download PDF

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Publication number
JP2020079853A
JP2020079853A JP2018212708A JP2018212708A JP2020079853A JP 2020079853 A JP2020079853 A JP 2020079853A JP 2018212708 A JP2018212708 A JP 2018212708A JP 2018212708 A JP2018212708 A JP 2018212708A JP 2020079853 A JP2020079853 A JP 2020079853A
Authority
JP
Japan
Prior art keywords
optical element
optical
film
layer
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018212708A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020079853A5 (enExample
Inventor
和枝 内田
Kazue Uchida
和枝 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018212708A priority Critical patent/JP2020079853A/ja
Priority to US16/674,400 priority patent/US11513440B2/en
Publication of JP2020079853A publication Critical patent/JP2020079853A/ja
Publication of JP2020079853A5 publication Critical patent/JP2020079853A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/205—Neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/006—Filter holders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Blocking Light For Cameras (AREA)
JP2018212708A 2018-11-13 2018-11-13 光学素子、光学系、および、光学機器 Pending JP2020079853A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018212708A JP2020079853A (ja) 2018-11-13 2018-11-13 光学素子、光学系、および、光学機器
US16/674,400 US11513440B2 (en) 2018-11-13 2019-11-05 Optical element, optical system, and optical apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018212708A JP2020079853A (ja) 2018-11-13 2018-11-13 光学素子、光学系、および、光学機器

Publications (2)

Publication Number Publication Date
JP2020079853A true JP2020079853A (ja) 2020-05-28
JP2020079853A5 JP2020079853A5 (enExample) 2021-12-16

Family

ID=70551384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018212708A Pending JP2020079853A (ja) 2018-11-13 2018-11-13 光学素子、光学系、および、光学機器

Country Status (2)

Country Link
US (1) US11513440B2 (enExample)
JP (1) JP2020079853A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11435507B2 (en) 2019-02-12 2022-09-06 Canon Kabushiki Kaisha Optical element, optical system, and imaging apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1123810A (ja) * 1997-06-27 1999-01-29 Asahi Seimitsu Kk 輪帯状ｎｄフィルター
JP2011164494A (ja) * 2010-02-12 2011-08-25 Canon Inc 光学素子用の遮光膜、遮光塗料および光学素子
WO2013161767A1 (ja) * 2012-04-26 2013-10-31 旭硝子株式会社 光学素子
JP2017040909A (ja) * 2015-08-19 2017-02-23 キヤノン株式会社 光学フィルタおよびそれを有する光学系、撮像装置、レンズ装置
JP2017187729A (ja) * 2016-03-31 2017-10-12 キヤノン株式会社 光学素子、光学系、撮像装置及びレンズ装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938701A (ja) 1982-08-30 1984-03-02 Asahi Optical Co Ltd Ｎｄフイルタ−
FR2864251B1 (fr) * 2003-12-17 2006-04-28 Essilor Int Article d'optique revetu d'un revetement anti-reflets multicouches absorbant dans le visible et procede de fabrication
JP4613706B2 (ja) * 2004-11-24 2011-01-19 住友金属鉱山株式会社 吸収型多層膜ｎｄフィルター
JP4801442B2 (ja) 2005-12-28 2011-10-26 キヤノン電子株式会社 光量絞り用ｎｄフィルタ
JP5067133B2 (ja) 2007-11-13 2012-11-07 住友金属鉱山株式会社 吸収型ｎｄフィルター
DE102010018052B4 (de) * 2010-04-22 2011-12-08 Jenoptik Optical Systems Gmbh IR-Neutralfilter mit einem für Infrarotstrahlung transparenten Substrat
US10551534B2 (en) * 2016-03-31 2020-02-04 Canon Kabushiki Kaisha Optical element, optical system, image pickup apparatus, and lens apparatus
JP2019070687A (ja) 2017-10-06 2019-05-09 キヤノン株式会社 光学素子、光学素子の製造方法、光学系、および、光学機器

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1123810A (ja) * 1997-06-27 1999-01-29 Asahi Seimitsu Kk 輪帯状ｎｄフィルター
JP2011164494A (ja) * 2010-02-12 2011-08-25 Canon Inc 光学素子用の遮光膜、遮光塗料および光学素子
WO2013161767A1 (ja) * 2012-04-26 2013-10-31 旭硝子株式会社 光学素子
CN104246544A (zh) * 2012-04-26 2014-12-24 旭硝子株式会社 光学元件
US20150192783A1 (en) * 2012-04-26 2015-07-09 Asahi Glass Company, Limited Optical element
JP2017040909A (ja) * 2015-08-19 2017-02-23 キヤノン株式会社 光学フィルタおよびそれを有する光学系、撮像装置、レンズ装置
JP2017187729A (ja) * 2016-03-31 2017-10-12 キヤノン株式会社 光学素子、光学系、撮像装置及びレンズ装置

Also Published As

Publication number Publication date
US20200150534A1 (en) 2020-05-14
US11513440B2 (en) 2022-11-29

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