JP2020027825A5 - - Google Patents

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Publication number
JP2020027825A5
JP2020027825A5 JP2018150541A JP2018150541A JP2020027825A5 JP 2020027825 A5 JP2020027825 A5 JP 2020027825A5 JP 2018150541 A JP2018150541 A JP 2018150541A JP 2018150541 A JP2018150541 A JP 2018150541A JP 2020027825 A5 JP2020027825 A5 JP 2020027825A5
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JP
Japan
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oxide
insulator
conductor
film
insulating film
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JP2018150541A
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Japanese (ja)
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JP2020027825A (ja
JP7254462B2 (ja
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Publication of JP2020027825A5 publication Critical patent/JP2020027825A5/ja
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JP2018150541A 2018-08-09 2018-08-09 半導体装置の作製方法 Active JP7254462B2 (ja)

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Application Number Priority Date Filing Date Title
JP2018150541A JP7254462B2 (ja) 2018-08-09 2018-08-09 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018150541A JP7254462B2 (ja) 2018-08-09 2018-08-09 半導体装置の作製方法

Publications (3)

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JP2020027825A JP2020027825A (ja) 2020-02-20
JP2020027825A5 true JP2020027825A5 (enExample) 2021-09-16
JP7254462B2 JP7254462B2 (ja) 2023-04-10

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JP2018150541A Active JP7254462B2 (ja) 2018-08-09 2018-08-09 半導体装置の作製方法

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JP (1) JP7254462B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7705378B2 (ja) * 2020-03-26 2025-07-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
DE112021004337T5 (de) * 2020-08-19 2023-05-25 Semiconductor Energy Laboratory Co., Ltd. Herstellungsverfahren eines Metalloxids

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017072627A1 (ja) * 2015-10-28 2017-05-04 株式会社半導体エネルギー研究所 半導体装置、モジュール、電子機器および半導体装置の作製方法
US10115741B2 (en) * 2016-02-05 2018-10-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and electronic device
JP2018022879A (ja) * 2016-07-20 2018-02-08 株式会社リコー 電界効果型トランジスタ、及びその製造方法、並びに表示素子、画像表示装置、及びシステム

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