JP2020013814A - 局所パージ機能を有する搬送装置 - Google Patents
局所パージ機能を有する搬送装置 Download PDFInfo
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- JP2020013814A JP2020013814A JP2018133067A JP2018133067A JP2020013814A JP 2020013814 A JP2020013814 A JP 2020013814A JP 2018133067 A JP2018133067 A JP 2018133067A JP 2018133067 A JP2018133067 A JP 2018133067A JP 2020013814 A JP2020013814 A JP 2020013814A
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- atmosphere
- inert gas
- replacement function
- wafer
- atmosphere replacement
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- 239000004065 semiconductor Substances 0.000 claims abstract description 76
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- 238000001514 detection method Methods 0.000 description 14
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
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- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
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- 238000004080 punching Methods 0.000 description 1
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- 238000007789 sealing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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Classifications
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- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
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- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
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- B25J15/00—Gripping heads and other end effectors
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- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
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- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (14)
- 半導体ウエハを収容する密閉可能な容器を載置して前記容器の内部を不活性ガス雰囲気に置換する雰囲気置換機能付きロードポートと、前記半導体ウエハを保持して、前記半導体ウエハの被処理面の雰囲気を置換する雰囲気置換機能付き搬送ロボットと、前記半導体ウエハを保持して前記半導体ウエハの被処理面の雰囲気を置換する雰囲気置換機能付きアライナとを備え、半導体ウエハの被処理面の雰囲気を清浄な不活性ガス雰囲気に置換しながら前記半導体ウエハを搬送することを特徴とする搬送装置。
- 前記雰囲気置換機能付きアライナは、前記不活性ガスを噴出するノズルと、前記半導体ウエハを搬送するための開口と、前記開口を閉鎖可能な蓋とを備える置換容器に収納されていることを特徴とする、請求項1に記載の搬送装置。
- 前記ノズルには、不活性ガスに含まれる塵埃を除去するフィルタが備えられていることを特徴とする、請求項1もしくは請求項2に記載の搬送装置。
- 前記雰囲気置換機能付きアライナは、アライナ制御部を備えており、前記アライナ制御部は前記開口を開放している間、前記ノズルから噴出される不活性ガスの流量を大きくすることを特徴とする、請求項1から請求項3のいずれか一項に記載の搬送装置。
- 前記雰囲気置換機能付きアライナは、スピンドル上に保持される前記半導体ウエハの前記被処理面に向かって前記不活性ガスを噴出するシャワープレートを備えることを特徴とする、請求項1に記載の搬送装置。
- 前記雰囲気置換機能付きアライナは、前記シャワープレートを上下方向に移動させるシャワープレート昇降機構をさらに備えることを特徴とする、請求項5に記載の搬送装置。
- 請求項1から請求項6のいずれか一項に記載の搬送装置であって、前記搬送装置はさらに雰囲気置換機能付きバッファ装置を備え、前記雰囲気置換機能付きバッファ装置は、前記不活性ガスを噴出するノズルと、前記半導体ウエハを載置する棚板に対応する位置に配置される開口と、前記開口を閉鎖可能な蓋とを備える置換容器を備えることを特徴とする搬送装置。
- 前記雰囲気置換機能付きバッファ装置は、バッファ制御部を備えており、前記バッファ制御部は前記開口を開放している間、前記ノズルから噴出される不活性ガスの流量を大きくすることを特徴とする、請求項7に記載の搬送装置。
- 前記雰囲気置換機能付きバッファ装置は、前記棚板が形成されるカセットと、前記カセットを昇降移動させるカセット昇降機構と、前記カセットと前記カセット昇降機構とを覆うカバーとを備えることを特徴とする、請求項7もしくは請求項8に記載の搬送装置。
- 前記雰囲気置換機能付きバッファ装置は、前記棚板の上方にシャワープレートを備えており、前記シャワープレートは前記棚板に載置される前記半導体ウエハの被処理面に不活性ガスを噴出することを特徴とする請求項7に記載の搬送装置。
- 請求項1から請求項10のいずれか一項に記載の搬送装置であって、前記搬送装置はさらに雰囲気置換機能付きロードロックチャンバを備え、前記雰囲気置換機能付きロードロックチャンバは、前記半導体ウエハを載置する棚板と、前記前記雰囲気置換機能付きロードロックチャンバの内部空間とミニエンバイロメント空間とを連通する第1の開口と、前記前記雰囲気置換機能付きロードロックチャンバの内部空間と搬送チャンバの内部空間とを連通する第2の開口と、前記第1の開口を閉鎖可能な第1の蓋部材と、前記第2の開口を閉鎖可能な第2の蓋部材と前記不活性ガスを噴出するシャワープレートとを備えることを特徴とする搬送装置。
- 前記シャワープレートは前記棚板に載置される前記半導体ウエハの被処理面に前記不活性ガスを噴出することを特徴とする請求項11に記載の搬送装置。
- 請求項11もしくは請求項12のいずれかに記載の搬送装置であって、前記雰囲気置換機能付きロードロックは棚段状に前記半導体ウエハを載置する前記棚板を備え、前記シャワープレートは、前記棚段状に載置される前記半導体ウエハのそれぞれの上方に配置されることを特徴とする搬送装置。
- 清浄な空気をミニエンバイロメント空間に供給するFFUと、雰囲気置換機能付きロードポートと、雰囲気置換機能付きアライナと、雰囲気置換機能付きバッファ装置と、前記雰囲気置換機能付きバッファ装置に関して互いに対向する位置に配置される2台の雰囲気置換機能付き搬送ロボットとを備え、前記雰囲気置換機能付きバッファ装置は、前記2台の雰囲気置換機能付き搬送ロボットがそれぞれアクセス可能な開口と、前記開口を閉鎖可能な蓋とを備えることを特徴とする搬送装置。
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