JP2020009765A5 - - Google Patents
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- Publication number
- JP2020009765A5 JP2020009765A5 JP2019125665A JP2019125665A JP2020009765A5 JP 2020009765 A5 JP2020009765 A5 JP 2020009765A5 JP 2019125665 A JP2019125665 A JP 2019125665A JP 2019125665 A JP2019125665 A JP 2019125665A JP 2020009765 A5 JP2020009765 A5 JP 2020009765A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- microscope according
- microscope
- conduit
- aberration corrector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004075 alteration Effects 0.000 claims 8
- 239000002131 composite material Substances 0.000 claims 4
- 239000004020 conductor Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 3
- 239000012772 electrical insulation material Substances 0.000 claims 2
- 238000010894 electron beam technology Methods 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 2
- 230000005405 multipole Effects 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Chemical compound [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 229910010293 ceramic material Inorganic materials 0.000 claims 1
- 238000010292 electrical insulation Methods 0.000 claims 1
- 239000012777 electrically insulating material Substances 0.000 claims 1
- 210000002615 epidermis Anatomy 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 210000003491 skin Anatomy 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18182145.5 | 2018-07-06 | ||
| EP18182145.5A EP3591685A1 (en) | 2018-07-06 | 2018-07-06 | Electron microscope with improved imaging resolution |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020009765A JP2020009765A (ja) | 2020-01-16 |
| JP2020009765A5 true JP2020009765A5 (enExample) | 2022-05-19 |
| JP7368124B2 JP7368124B2 (ja) | 2023-10-24 |
Family
ID=62874744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019125665A Active JP7368124B2 (ja) | 2018-07-06 | 2019-07-05 | 撮像分解能を向上させた電子顕微鏡 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20200013580A1 (enExample) |
| EP (2) | EP3591685A1 (enExample) |
| JP (1) | JP7368124B2 (enExample) |
| KR (1) | KR102856649B1 (enExample) |
| CN (1) | CN110690093B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7369486B2 (ja) * | 2020-03-02 | 2023-10-26 | 国立研究開発法人物質・材料研究機構 | 観測対象ガスの透過拡散経路観測装置及び観測対象ガスの計測方法、点欠陥位置検出装置及び点欠陥位置検出方法、並びに観測用の試料 |
| US11437216B2 (en) | 2020-12-31 | 2022-09-06 | Fei Company | Reduction of thermal magnetic field noise in TEM corrector systems |
| US11715618B2 (en) * | 2021-08-03 | 2023-08-01 | Fei Company | System and method for reducing the charging effect in a transmission electron microscope system |
| DE102022124933A1 (de) * | 2022-09-28 | 2024-03-28 | Carl Zeiss Multisem Gmbh | Vielstrahl-Teilchenmikroskop mit verbessertem Strahlrohr |
| DE102023101628B4 (de) | 2023-01-24 | 2024-08-08 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlmikroskop |
| CN119470525A (zh) * | 2025-01-15 | 2025-02-18 | 华东师范大学 | 一种在原位电子显微镜中测试电子元器件性能的方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2034981A1 (enExample) * | 1969-03-17 | 1970-12-18 | Jeol Ltd | |
| US3787696A (en) * | 1972-03-15 | 1974-01-22 | Etec Corp | Scanning electron microscope electron-optical column construction |
| US4143298A (en) * | 1977-09-01 | 1979-03-06 | Zenith Radio Corporation | Television cathode ray tube having a voltage divider providing temperature-invariant voltage and associated method |
| DE3010376A1 (de) * | 1980-03-18 | 1981-09-24 | Siemens AG, 1000 Berlin und 8000 München | Abschirmzylinder fuer ein magnetisches ablenksystem |
| JPS60192358U (ja) * | 1984-05-31 | 1985-12-20 | 株式会社島津製作所 | 荷電粒子線装置 |
| US4864228A (en) * | 1985-03-15 | 1989-09-05 | Fairchild Camera And Instrument Corporation | Electron beam test probe for integrated circuit testing |
| US5364390A (en) * | 1988-05-19 | 1994-11-15 | Refractive Laser Research And Development, Inc. | Handpiece and related apparatus for laser surgery and dentistry |
| JP2934707B2 (ja) * | 1989-06-19 | 1999-08-16 | 株式会社ニコン | 走査電子顕微鏡 |
| EP0451370B1 (en) | 1990-04-12 | 1996-03-27 | Koninklijke Philips Electronics N.V. | Correction system for a charged-particle beam apparatus |
| US6511575B1 (en) * | 1998-11-12 | 2003-01-28 | Canon Kabushiki Kaisha | Treatment apparatus and method utilizing negative hydrogen ion |
| JP3403970B2 (ja) * | 1999-05-27 | 2003-05-06 | 住友重機械工業株式会社 | 荷電粒子ビームの集群装置と集群方法 |
| JP2004241190A (ja) * | 2003-02-04 | 2004-08-26 | Jeol Ltd | 多極子レンズ用の多極子製造方法、多極子レンズ及び荷電粒子線装置 |
| JP2005050579A (ja) * | 2003-07-30 | 2005-02-24 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
| DE10344492B4 (de) * | 2003-09-24 | 2006-09-07 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät |
| EP1605492B1 (en) * | 2004-06-11 | 2015-11-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with retarding field analyzer |
| JP2007294850A (ja) * | 2006-03-30 | 2007-11-08 | Tokyo Electron Ltd | 静電偏向器及び電子線照射装置及び基板処理装置及び基板処理方法及び基板の製造方法 |
| DE102008035297B4 (de) * | 2007-07-31 | 2017-08-17 | Hitachi High-Technologies Corporation | Aberrationskorrektureinrichtung für Ladungsteilchenstrahlen in einem optischen System einer Ladungsteilchenstrahlvorrichtung und Ladungsteilchenstrahlvorrichtung mit der Aberrationskorrektureinrichtung |
| EP2487703A1 (en) * | 2011-02-14 | 2012-08-15 | Fei Company | Detector for use in charged-particle microscopy |
| EP2511936B1 (en) * | 2011-04-13 | 2013-10-02 | Fei Company | Distortion free stigmation of a TEM |
| EP3104155A1 (en) * | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| EP3133633B1 (en) * | 2016-02-24 | 2018-03-28 | FEI Company | Studying dynamic specimen behavior in a charged-particle microscope |
| US9997327B1 (en) * | 2016-12-08 | 2018-06-12 | Jeol Ltd. | Liner tube and electron microscope |
-
2018
- 2018-07-06 EP EP18182145.5A patent/EP3591685A1/en not_active Withdrawn
-
2019
- 2019-06-26 US US16/453,699 patent/US20200013580A1/en not_active Abandoned
- 2019-07-03 EP EP19184057.8A patent/EP3594987A3/en active Pending
- 2019-07-04 KR KR1020190080637A patent/KR102856649B1/ko active Active
- 2019-07-05 JP JP2019125665A patent/JP7368124B2/ja active Active
- 2019-07-08 CN CN201910610201.6A patent/CN110690093B/zh active Active
-
2023
- 2023-02-21 US US18/171,750 patent/US20230207254A1/en not_active Abandoned
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