JP7368124B2 - 撮像分解能を向上させた電子顕微鏡 - Google Patents
撮像分解能を向上させた電子顕微鏡 Download PDFInfo
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- JP7368124B2 JP7368124B2 JP2019125665A JP2019125665A JP7368124B2 JP 7368124 B2 JP7368124 B2 JP 7368124B2 JP 2019125665 A JP2019125665 A JP 2019125665A JP 2019125665 A JP2019125665 A JP 2019125665A JP 7368124 B2 JP7368124 B2 JP 7368124B2
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/361—Optical details, e.g. image relay to the camera or image sensor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/24—Base structure
- G02B21/26—Stages; Adjusting means therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0264—Shields magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0268—Liner tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18182145.5 | 2018-07-06 | ||
| EP18182145.5A EP3591685A1 (en) | 2018-07-06 | 2018-07-06 | Electron microscope with improved imaging resolution |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020009765A JP2020009765A (ja) | 2020-01-16 |
| JP2020009765A5 JP2020009765A5 (enExample) | 2022-05-19 |
| JP7368124B2 true JP7368124B2 (ja) | 2023-10-24 |
Family
ID=62874744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019125665A Active JP7368124B2 (ja) | 2018-07-06 | 2019-07-05 | 撮像分解能を向上させた電子顕微鏡 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20200013580A1 (enExample) |
| EP (2) | EP3591685A1 (enExample) |
| JP (1) | JP7368124B2 (enExample) |
| KR (1) | KR102856649B1 (enExample) |
| CN (1) | CN110690093B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7369486B2 (ja) * | 2020-03-02 | 2023-10-26 | 国立研究開発法人物質・材料研究機構 | 観測対象ガスの透過拡散経路観測装置及び観測対象ガスの計測方法、点欠陥位置検出装置及び点欠陥位置検出方法、並びに観測用の試料 |
| US11437216B2 (en) | 2020-12-31 | 2022-09-06 | Fei Company | Reduction of thermal magnetic field noise in TEM corrector systems |
| US11715618B2 (en) * | 2021-08-03 | 2023-08-01 | Fei Company | System and method for reducing the charging effect in a transmission electron microscope system |
| DE102022124933A1 (de) * | 2022-09-28 | 2024-03-28 | Carl Zeiss Multisem Gmbh | Vielstrahl-Teilchenmikroskop mit verbessertem Strahlrohr |
| DE102023101628B4 (de) | 2023-01-24 | 2024-08-08 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlmikroskop |
| CN119470525A (zh) * | 2025-01-15 | 2025-02-18 | 华东师范大学 | 一种在原位电子显微镜中测试电子元器件性能的方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004241190A (ja) | 2003-02-04 | 2004-08-26 | Jeol Ltd | 多極子レンズ用の多極子製造方法、多極子レンズ及び荷電粒子線装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2034981A1 (enExample) * | 1969-03-17 | 1970-12-18 | Jeol Ltd | |
| US3787696A (en) * | 1972-03-15 | 1974-01-22 | Etec Corp | Scanning electron microscope electron-optical column construction |
| US4143298A (en) * | 1977-09-01 | 1979-03-06 | Zenith Radio Corporation | Television cathode ray tube having a voltage divider providing temperature-invariant voltage and associated method |
| DE3010376A1 (de) * | 1980-03-18 | 1981-09-24 | Siemens AG, 1000 Berlin und 8000 München | Abschirmzylinder fuer ein magnetisches ablenksystem |
| JPS60192358U (ja) * | 1984-05-31 | 1985-12-20 | 株式会社島津製作所 | 荷電粒子線装置 |
| US4864228A (en) * | 1985-03-15 | 1989-09-05 | Fairchild Camera And Instrument Corporation | Electron beam test probe for integrated circuit testing |
| US5364390A (en) * | 1988-05-19 | 1994-11-15 | Refractive Laser Research And Development, Inc. | Handpiece and related apparatus for laser surgery and dentistry |
| JP2934707B2 (ja) * | 1989-06-19 | 1999-08-16 | 株式会社ニコン | 走査電子顕微鏡 |
| EP0451370B1 (en) | 1990-04-12 | 1996-03-27 | Koninklijke Philips Electronics N.V. | Correction system for a charged-particle beam apparatus |
| US6511575B1 (en) * | 1998-11-12 | 2003-01-28 | Canon Kabushiki Kaisha | Treatment apparatus and method utilizing negative hydrogen ion |
| JP3403970B2 (ja) * | 1999-05-27 | 2003-05-06 | 住友重機械工業株式会社 | 荷電粒子ビームの集群装置と集群方法 |
| JP2005050579A (ja) * | 2003-07-30 | 2005-02-24 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
| DE10344492B4 (de) * | 2003-09-24 | 2006-09-07 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät |
| EP1605492B1 (en) * | 2004-06-11 | 2015-11-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with retarding field analyzer |
| JP2007294850A (ja) * | 2006-03-30 | 2007-11-08 | Tokyo Electron Ltd | 静電偏向器及び電子線照射装置及び基板処理装置及び基板処理方法及び基板の製造方法 |
| DE102008035297B4 (de) * | 2007-07-31 | 2017-08-17 | Hitachi High-Technologies Corporation | Aberrationskorrektureinrichtung für Ladungsteilchenstrahlen in einem optischen System einer Ladungsteilchenstrahlvorrichtung und Ladungsteilchenstrahlvorrichtung mit der Aberrationskorrektureinrichtung |
| EP2487703A1 (en) * | 2011-02-14 | 2012-08-15 | Fei Company | Detector for use in charged-particle microscopy |
| EP2511936B1 (en) * | 2011-04-13 | 2013-10-02 | Fei Company | Distortion free stigmation of a TEM |
| EP3104155A1 (en) * | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| EP3133633B1 (en) * | 2016-02-24 | 2018-03-28 | FEI Company | Studying dynamic specimen behavior in a charged-particle microscope |
| US9997327B1 (en) * | 2016-12-08 | 2018-06-12 | Jeol Ltd. | Liner tube and electron microscope |
-
2018
- 2018-07-06 EP EP18182145.5A patent/EP3591685A1/en not_active Withdrawn
-
2019
- 2019-06-26 US US16/453,699 patent/US20200013580A1/en not_active Abandoned
- 2019-07-03 EP EP19184057.8A patent/EP3594987A3/en active Pending
- 2019-07-04 KR KR1020190080637A patent/KR102856649B1/ko active Active
- 2019-07-05 JP JP2019125665A patent/JP7368124B2/ja active Active
- 2019-07-08 CN CN201910610201.6A patent/CN110690093B/zh active Active
-
2023
- 2023-02-21 US US18/171,750 patent/US20230207254A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004241190A (ja) | 2003-02-04 | 2004-08-26 | Jeol Ltd | 多極子レンズ用の多極子製造方法、多極子レンズ及び荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110690093B (zh) | 2025-04-04 |
| US20200013580A1 (en) | 2020-01-09 |
| CN110690093A (zh) | 2020-01-14 |
| KR20200005474A (ko) | 2020-01-15 |
| US20230207254A1 (en) | 2023-06-29 |
| EP3594987A3 (en) | 2020-12-23 |
| JP2020009765A (ja) | 2020-01-16 |
| EP3594987A2 (en) | 2020-01-15 |
| KR102856649B1 (ko) | 2025-09-05 |
| EP3591685A1 (en) | 2020-01-08 |
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