JP2020007575A5 - - Google Patents
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- Publication number
- JP2020007575A5 JP2020007575A5 JP2018126321A JP2018126321A JP2020007575A5 JP 2020007575 A5 JP2020007575 A5 JP 2020007575A5 JP 2018126321 A JP2018126321 A JP 2018126321A JP 2018126321 A JP2018126321 A JP 2018126321A JP 2020007575 A5 JP2020007575 A5 JP 2020007575A5
- Authority
- JP
- Japan
- Prior art keywords
- axis
- base material
- film forming
- cathode
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000463 material Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims 12
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000009434 installation Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018126321A JP7171270B2 (ja) | 2018-07-02 | 2018-07-02 | 成膜装置およびそれを用いた成膜方法 |
| US16/453,730 US11414746B2 (en) | 2018-07-02 | 2019-06-26 | Film forming apparatus and film forming method using the same |
| CN201910599227.5A CN110735122B (zh) | 2018-07-02 | 2019-07-02 | 成膜设备和使用该成膜设备的成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018126321A JP7171270B2 (ja) | 2018-07-02 | 2018-07-02 | 成膜装置およびそれを用いた成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020007575A JP2020007575A (ja) | 2020-01-16 |
| JP2020007575A5 true JP2020007575A5 (cg-RX-API-DMAC7.html) | 2021-08-05 |
| JP7171270B2 JP7171270B2 (ja) | 2022-11-15 |
Family
ID=69007942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018126321A Active JP7171270B2 (ja) | 2018-07-02 | 2018-07-02 | 成膜装置およびそれを用いた成膜方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US11414746B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP7171270B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN110735122B (cg-RX-API-DMAC7.html) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020112986A1 (de) | 2020-05-13 | 2021-11-18 | VON ARDENNE Asset GmbH & Co. KG | Magnetronanordnung |
| WO2022069050A1 (en) * | 2020-10-01 | 2022-04-07 | Applied Materials, Inc. | Method of depositing a material on a substrate |
| KR102828506B1 (ko) * | 2020-10-08 | 2025-07-03 | 가부시키가이샤 알박 | 회전식 캐소드 유닛용 구동 블록 |
| CN112251727B (zh) * | 2020-10-22 | 2022-08-26 | 凯盛信息显示材料(黄山)有限公司 | 磁控溅射镀膜设备及ito玻璃的制备方法 |
| EP4270444A1 (en) * | 2022-04-27 | 2023-11-01 | Bühler Alzenau GmbH | Magnetron sputtering system with tubular sputter cathode and method for controlling a layer thickness |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5108574A (en) * | 1991-01-29 | 1992-04-28 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
| JPH0835064A (ja) * | 1994-07-20 | 1996-02-06 | Matsushita Electric Ind Co Ltd | スパッタリング装置 |
| JP2002220664A (ja) | 2000-11-24 | 2002-08-09 | Murata Mfg Co Ltd | スパッタ粒子の放出角度分布計測方法、膜厚分布シミュレーション方法及びスパッタ装置 |
| DE10145201C1 (de) | 2001-09-13 | 2002-11-21 | Fraunhofer Ges Forschung | Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron-Zerstäuben |
| CN2656432Y (zh) | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | 旋转式磁控溅射靶 |
| JP2005133110A (ja) | 2003-10-28 | 2005-05-26 | Konica Minolta Opto Inc | スパッタリング装置 |
| DE502004010804D1 (de) * | 2004-05-05 | 2010-04-08 | Applied Materials Gmbh & Co Kg | Beschichtungsvorrichtung mit grossflächiger Anordnung von drehbaren Magnetronkathoden |
| US9175383B2 (en) * | 2008-01-16 | 2015-11-03 | Applied Materials, Inc. | Double-coating device with one process chamber |
| US8057649B2 (en) | 2008-05-06 | 2011-11-15 | Applied Materials, Inc. | Microwave rotatable sputtering deposition |
| EP2427586B1 (en) | 2009-05-07 | 2020-11-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the production of oxide and nitride coatings and its use |
| CN104350173A (zh) | 2012-05-29 | 2015-02-11 | 应用材料公司 | 用于涂布基板的方法及涂布机 |
| US20150187549A1 (en) * | 2012-05-31 | 2015-07-02 | Tokyo Electron Limited | Magnetron sputtering apparatus |
| JP5921351B2 (ja) | 2012-06-14 | 2016-05-24 | キヤノン株式会社 | 成膜装置 |
| WO2016136121A1 (ja) | 2015-02-24 | 2016-09-01 | 株式会社アルバック | マグネトロンスパッタリング装置用の回転式カソードユニット |
| CN104878356B (zh) | 2015-06-08 | 2017-11-24 | 光驰科技(上海)有限公司 | 一种磁控溅射靶材磁铁放置角度的确定方法 |
| CN111733389A (zh) | 2015-06-16 | 2020-10-02 | 施耐德两合公司 | 用于镜片覆层的装置 |
| CN112575301B (zh) | 2016-04-21 | 2023-05-23 | 应用材料公司 | 用于涂布基板的方法及涂布机 |
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2018
- 2018-07-02 JP JP2018126321A patent/JP7171270B2/ja active Active
-
2019
- 2019-06-26 US US16/453,730 patent/US11414746B2/en active Active
- 2019-07-02 CN CN201910599227.5A patent/CN110735122B/zh active Active