JP2020002357A5 - - Google Patents
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- Publication number
- JP2020002357A5 JP2020002357A5 JP2019122998A JP2019122998A JP2020002357A5 JP 2020002357 A5 JP2020002357 A5 JP 2020002357A5 JP 2019122998 A JP2019122998 A JP 2019122998A JP 2019122998 A JP2019122998 A JP 2019122998A JP 2020002357 A5 JP2020002357 A5 JP 2020002357A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- mechanical polishing
- ceria
- chemical mechanical
- combinations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862692639P | 2018-06-29 | 2018-06-29 | |
| US201862692633P | 2018-06-29 | 2018-06-29 | |
| US62/692,639 | 2018-06-29 | ||
| US62/692,633 | 2018-06-29 | ||
| US16/450,753 US20200002607A1 (en) | 2018-06-29 | 2019-06-24 | Low Oxide Trench Dishing Chemical Mechanical Polishing |
| US16/450,753 | 2019-06-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020002357A JP2020002357A (ja) | 2020-01-09 |
| JP2020002357A5 true JP2020002357A5 (enExample) | 2022-05-02 |
Family
ID=67137867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019122998A Pending JP2020002357A (ja) | 2018-06-29 | 2019-07-01 | 低酸化物トレンチディッシング化学機械研磨 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20200002607A1 (enExample) |
| EP (1) | EP3587524A1 (enExample) |
| JP (1) | JP2020002357A (enExample) |
| KR (1) | KR102794696B1 (enExample) |
| CN (1) | CN110655869A (enExample) |
| IL (1) | IL267715A (enExample) |
| SG (1) | SG10201906088YA (enExample) |
| TW (1) | TWI791862B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021231090A1 (en) * | 2020-05-11 | 2021-11-18 | Versum Materials Us, Llc | Novel pad-1 n-a-bottle (pib) technology for advanced chemical-mechanical planarization (cmp) slurries and processes |
| JP7766050B2 (ja) * | 2020-05-29 | 2025-11-07 | バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー | シャロートレンチアイソレーション用途のための低ディッシング酸化物ｃｍｐ研磨組成物、及びその製造の方法 |
| KR102680336B1 (ko) * | 2024-02-28 | 2024-07-02 | 주식회사 야놀자 | Llm 서버 및 외부 서버와 연계하여 사용자가 요청한 기능을 자동으로 수행하는 챗봇 운영 서버 및 그 동작 방법 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5028620A (en) * | 1988-09-15 | 1991-07-02 | Rohm And Haas Company | Biocide composition |
| US5876490A (en) | 1996-12-09 | 1999-03-02 | International Business Machines Corporatin | Polish process and slurry for planarization |
| US6964923B1 (en) | 2000-05-24 | 2005-11-15 | International Business Machines Corporation | Selective polishing with slurries containing polyelectrolytes |
| US6616514B1 (en) * | 2002-06-03 | 2003-09-09 | Ferro Corporation | High selectivity CMP slurry |
| EP2438133B1 (en) * | 2009-06-05 | 2018-07-11 | Basf Se | Polishing slurry containing raspberry-type metal oxide nanostructures coated with CeO2 |
| EP2614121B1 (en) * | 2010-09-08 | 2019-03-06 | Basf Se | Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devices |
| TWI598434B (zh) * | 2010-09-08 | 2017-09-11 | 巴斯夫歐洲公司 | 含有Ｎ－取代重氮烯（ｄｉａｚｅｎｉｕｍ）二氧化鹽及／或Ｎ’－羥基－重氮烯（ｄｉａｚｅｎｉｕｍ）氧化鹽之水研磨組成物 |
| CN108276915A (zh) * | 2010-12-10 | 2018-07-13 | 巴斯夫欧洲公司 | 用于化学机械抛光包含氧化硅电介质和多晶硅膜的基底的含水抛光组合物和方法 |
| KR101931926B1 (ko) * | 2011-12-21 | 2018-12-24 | 바스프 에스이 | 폴리비닐 포스폰산 및 이의 유도체를 포함하는 화학적 기계 연마 조성물 |
| WO2018062401A1 (ja) * | 2016-09-29 | 2018-04-05 | 花王株式会社 | 研磨液組成物 |
-
2019
- 2019-06-24 US US16/450,753 patent/US20200002607A1/en not_active Abandoned
- 2019-06-28 TW TW108122870A patent/TWI791862B/zh active
- 2019-06-29 SG SG10201906088YA patent/SG10201906088YA/en unknown
- 2019-06-30 IL IL26771519A patent/IL267715A/en unknown
- 2019-07-01 KR KR1020190079028A patent/KR102794696B1/ko active Active
- 2019-07-01 EP EP19183697.2A patent/EP3587524A1/en not_active Withdrawn
- 2019-07-01 JP JP2019122998A patent/JP2020002357A/ja active Pending
- 2019-07-01 CN CN201910585884.4A patent/CN110655869A/zh active Pending
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