JP2019510650A5 - - Google Patents

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JP2019510650A5
JP2019510650A5 JP2018549965A JP2018549965A JP2019510650A5 JP 2019510650 A5 JP2019510650 A5 JP 2019510650A5 JP 2018549965 A JP2018549965 A JP 2018549965A JP 2018549965 A JP2018549965 A JP 2018549965A JP 2019510650 A5 JP2019510650 A5 JP 2019510650A5
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Japan
Prior art keywords
polishing pad
substrate
polishing
casing
contact
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JP2018549965A
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JP2019510650A (ja
JP6979030B2 (ja
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Priority claimed from PCT/US2017/022924 external-priority patent/WO2017165216A1/en
Publication of JP2019510650A publication Critical patent/JP2019510650A/ja
Publication of JP2019510650A5 publication Critical patent/JP2019510650A5/ja
Priority to JP2021184805A priority Critical patent/JP7326405B2/ja
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Publication of JP6979030B2 publication Critical patent/JP6979030B2/ja
Priority to JP2023126338A priority patent/JP2023162199A/ja
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次に、位置決め駆動システム５６０は、基板１０の上の所望の位置に研磨パッドキャリア３００と研磨パッド２００を配置する。研磨パッド２００は基板１０に接触させられる。例えば、研磨パッドキャリア３００は、研磨パッド２００を動かして基板１０の上に研磨パッド２００を押圧することができる。代替的に、又は追加的に、一又は複数の垂直アクチュエータは、研磨パッドキャリア３００全体を下げて、及び／又は基板支持体を持ち上げて、基板１０に接触させることが可能になりうる。研磨駆動システム５００は、研磨パッドキャリア３００と基板支持体１０５との間の相対運動を生み出し、基板１０の研磨を引き起す。
研磨パッドキャリアは、ケーシング３１０を含む。ケーシング３１０は一般的に、研磨パッドアセンブリ２５０を取り囲むことができる。例えば、ケーシング３１０は、少なくとも研磨パッドアセンブリ２５０の膜２５０が配置される内部空洞を含みうる。
下方駆動シャフト５２６がローター５１０の中心に接触すると仮定すると、下方駆動シャフト５２６は、上方駆動シャフト５２２から、軌道の望ましい半径をもたらす距離Ｓだけオフセットされうる。具体的には、オフセットによって、下方駆動シャフト５２２が半径Ｓの円で回転する場合には、凹部３４４の直径をＴ、ローターの直径をＵとすると、Ｒ＝Ｓ−（（Ｔ−Ｕ）／２）となる。
JP2018549965A 2016-03-24 2017-03-17 化学機械研磨のためのテクスチャード加工された小型パッド Active JP6979030B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021184805A JP7326405B2 (ja) 2016-03-24 2021-11-12 化学機械研磨のためのテクスチャード加工された小型パッド
JP2023126338A JP2023162199A (ja) 2016-03-24 2023-08-02 化学機械研磨のためのテクスチャード加工された小型パッド

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662313023P 2016-03-24 2016-03-24
US62/313,023 2016-03-24
PCT/US2017/022924 WO2017165216A1 (en) 2016-03-24 2017-03-17 Textured small pad for chemical mechanical polishing

Related Child Applications (1)

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JP2021184805A Division JP7326405B2 (ja) 2016-03-24 2021-11-12 化学機械研磨のためのテクスチャード加工された小型パッド

Publications (3)

Publication Number Publication Date
JP2019510650A JP2019510650A (ja) 2019-04-18
JP2019510650A5 true JP2019510650A5 (ja) 2020-05-14
JP6979030B2 JP6979030B2 (ja) 2021-12-08

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JP2018549965A Active JP6979030B2 (ja) 2016-03-24 2017-03-17 化学機械研磨のためのテクスチャード加工された小型パッド
JP2021184805A Active JP7326405B2 (ja) 2016-03-24 2021-11-12 化学機械研磨のためのテクスチャード加工された小型パッド
JP2023126338A Pending JP2023162199A (ja) 2016-03-24 2023-08-02 化学機械研磨のためのテクスチャード加工された小型パッド

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Application Number Title Priority Date Filing Date
JP2021184805A Active JP7326405B2 (ja) 2016-03-24 2021-11-12 化学機械研磨のためのテクスチャード加工された小型パッド
JP2023126338A Pending JP2023162199A (ja) 2016-03-24 2023-08-02 化学機械研磨のためのテクスチャード加工された小型パッド

Country Status (6)

Country Link
US (1) US10589399B2 (ja)
JP (3) JP6979030B2 (ja)
KR (2) KR102535628B1 (ja)
CN (1) CN108883515A (ja)
TW (3) TW202406679A (ja)
WO (1) WO2017165216A1 (ja)

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