JP2019506515A - 硬化性組成物 - Google Patents
硬化性組成物 Download PDFInfo
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- JP2019506515A JP2019506515A JP2018544504A JP2018544504A JP2019506515A JP 2019506515 A JP2019506515 A JP 2019506515A JP 2018544504 A JP2018544504 A JP 2018544504A JP 2018544504 A JP2018544504 A JP 2018544504A JP 2019506515 A JP2019506515 A JP 2019506515A
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- silicone oligomer
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Abstract
Description
また、ディスプレイ用充填剤は、高い湿度の環境でも透明性を維持しなければならない特性が要求されるが、一般的にシリコーン組成物の場合、主な骨格を構成するポリジメチルシロキサン鎖は疎水性が強いため、含湿率に劣る。そのため、高温・高湿環境に露出したとき、流入した水分が常温で相分離が発生し、ヘイズが発生するという問題点がある。
実施例および比較例の硬化性組成物を京都電子工業社のAT−510装備を利用してJIS K 155701の規格で水酸基価を測定した。前記水酸基価は、ポリオール(水酸基含有成分を複数個含む物質)1gから得られたアセチル化合物に結合している酢酸を中和するのに必要なKOHのmg数(mgKOH/g)である。
実施例および比較例の硬化性組成物を、離型処理が施されたフィルムの間に塗布した後、メタルハライドUVランプ(D−bulb)を利用して、150nm〜450nm波長帯の紫外線を約4000mJ/cm2の光量で照射して、硬化後の厚さが1mmになるように硬化した。硬化物をカットして、径8mmおよび厚さ1mmの円形サンプルを製造した後、TAインスツルメント社のレオメーターARES−G2を利用して、1Hzにおける貯蔵弾性モジュラス(G’)を測定した。
−測定温度:25℃
−測定ストレイン:5%
−測定モード: 周波数掃引モード
実施例および比較例の硬化性組成物をTAインスツルメント社のレオメーターARES−G2 を利用して、1Hzにおける粘度を測定した。
−測定温度:25℃
−測定ストレイン:10%
−測定モード: 周波数掃引モード
実施例および比較例の硬化性組成物をソダライムグラス(1T)に塗布した後、モジュラス測定時と同じ条件で硬化した。硬化物を径5cmおよび厚さ150μmになるようにカットして円形サンプルを製造した後、日本電色工業社のヘーズメーターNDH−5000を使用して濁度計ASTM D1003の規格で25℃の温度および50%の相対湿度でヘイズを測定した。
測定例4のサンプルを85℃の温度および85%の相対湿度で1000時間保管した後、25℃の温度および50%の相対湿度で1時間放置した。前記放置されたサンプルを日本電色工業社のヘーズメーターNDH−5000を使用して濁度計ASTM D1003の規格で25℃の温度および50%の相対湿度でヘイズを測定した。
実施例および比較例の硬化性組成物をグラスの間に塗布し、モジュラス測定時と同じ条件で硬化した。硬化物を径1.5cmおよび厚さ200μmになるようにカットして円形サンプルを製造した後、105℃で1000時間放置した。Texture technology社のTA−XT2 plusを利用して接合部分を12.7mm/minの速度で上下に引っ張りながら接着力を測定した。熱処理前後の接着力を比較し、下記評価基準に基づいて接着耐久性を判断した。
<接着耐久性の評価基準>
−O:接着力の変化なし
−△:接着力が減少
−X:溶けて硬化物が流れる
機器
温度計、撹拌器、水冷コンデンサ、窒素ガス
製造方法
フラスコに化学式Aのポリジメチルシロキサンジオール(Silaplane FM−4411、チッソ社)350g、イソホロンジイソシアネート112g(イソシアネート基含有量37.8%)、ジブチルスズジラウレート1gを60℃で5時間反応させた。次に、ヒドロキシエチルアクリレート9.8gおよびラウリルアルコール15.6gを滴下してそのまま反応を継続し、イソシアネート基が消失した時点で反応を終了した。
機器
温度計、撹拌器、水冷コンデンサ、窒素ガス
製造方法
フラスコに化学式Aのポリジメチルシロキサンジオール(Silaplane FM−4411、チッソ社)350g、イソホロンジイソシアネート102.7g(イソシアネート基含有量37.8%)、ジブチルスズジラウレート1gを60℃で5時間反応させた。次に、ヒドロキシエチルアクリレート4.9g、ヒドロキシブチルアクリレート6.1gおよびラウリルアルコール7.4gを滴下してそのまま反応を継続し、イソシアネート基が消失した時点で反応を終了した。
機器
温度計、撹拌器、水冷コンデンサ、窒素ガス
製造方法
フラスコに化学式Aのポリジメチルシロキサンジオール(Silaplane FM−4411、チッソ社)350g、イソホロンジイソシアネート−イソシアヌレート276.7g(イソシアネート基の含有量17.0%)、ジブチルスズジラウレート1gを60℃で5時間反応させた。次に、ヒドロキシエチルアクリレート50.7gを滴下してそのまま反応を継続し、イソシアネート基が消失した時点で反応を終了した。
非反応性シリコーン非ウレタンオリゴマー(B1)として、下記化学式Bのモノヒドロキシルポリシロキサン(FM−0411、チッソ社)を用意した。
機器
温度計、撹拌器、水冷コンデンサ、窒素ガス
製造方法
フラスコに化学式Aのポリジメチルシロキサンジオール(Silaplane FM−4411、チッソ社)350g、イソホロンジイソシアネート124.4g(イソシアネート基含有量37.8%)、ジブチルスズジラウレート1gを60℃で5時間反応させた。次に、ラウリルアルコール52.2gを滴下してそのまま反応を継続し、イソシアネート基が消失した時点で反応を終了した。
硬化性組成物の製造
硬化性オリゴマーと希釈剤の和が100重量部になるようにし、開始剤(C1)、シランカップリング剤(C2)および酸化防止剤(C3)を表1の比率で配合して、実施例1〜4および比較例1〜4の硬化性組成物を製造した。
20 タッチパネル
30 ディスプレイパネル
40 硬化性組成物の硬化物
Claims (15)
- 反応性シリコーンオリゴマー20〜70重量部を含む硬化性成分と
水酸基を有する非反応性シリコーンオリゴマー20〜70重量部を含み、水酸基価(OH value)が2〜45mgKOH/gである水酸基含有成分を含む硬化性組成物。 - 前記硬化性組成物を厚さ150μmで硬化した試験片を85℃の温度および85%の相対湿度で1000時間保管した後、25℃の温度および50%の相対湿度で1時間放置して濁度計ASTM D1003の規格で測定したヘイズが1.0%以下である、請求項1に記載の硬化性組成物。
- 前記反応性シリコーンオリゴマーは、ポリシロキサン系ウレタン(メタ)アクリレートを含む、請求項1に記載の硬化性組成物。
- 前記反応性シリコーンオリゴマーは、一官能性シリコーンオリゴマーおよび二官能性シリコーンオリゴマーを含む、請求項1に記載の硬化性組成物。
- 前記反応性シリコーンオリゴマーは、三官能性以上のシリコーンオリゴマーをさらに含む、請求項4に記載の硬化性組成物。
- 前記反応性シリコーンオリゴマーの重量平均分子量(Mw)は、10,000〜100,000である、請求項1に記載の硬化性組成物。
- 前記非反応性シリコーンオリゴマーは、非反応性ポリシロキサンオリゴマーおよび非反応性ポリシロキサン変性ウレタンオリゴマーのうち一つ以上のオリゴマーを含む、請求項1に記載の硬化性組成物。
- 前記非反応性シリコーンオリゴマーの重量平均分子量(Mw)は、1,000〜50,000である、請求項1に記載の硬化性組成物。
- 前記水酸基含有成分は、水酸基含有反応性モノマー1〜30重量部をさらに含む、請求項1に記載の硬化性組成物。
- 前記水酸基含有反応性モノマーは、ヒドロキシアルキル(メタ)アクリレートである、請求項9に記載の硬化性組成物。
- 前記硬化性組成物は、開始剤、シランカップリング剤または酸化防止剤をさらに含む、請求項1に記載の硬化性組成物。
- 前記硬化性組成物の硬化後の弾性モジュラスは、1Hzで10,000Pa〜100,000Paである、請求項1に記載の硬化性組成物。
- 前記硬化性組成物の1Hzおよび25℃における粘度は、1,000cp〜10,000cpである、請求項1に記載の硬化性組成物。
- 光学部材間の少なくとも一つのエアーギャップを含み、前記エアーギャップを充填する請求項1に記載の硬化性組成物の硬化物を含むディスプレイ装置。
- ディスプレイパネルとタッチパネルとを含むディスプレイ装置であって、
前記ディスプレイパネルとタッチパネルを付着する請求項1に記載の硬化性組成物の硬化物を含むディスプレイ装置。
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