JP2019504926A - 連続的に走行する金属ストリップの流体力学的安定化のための装置 - Google Patents
連続的に走行する金属ストリップの流体力学的安定化のための装置 Download PDFInfo
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 17
- 239000002184 metal Substances 0.000 title claims abstract description 17
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- 229910001338 liquidmetal Inorganic materials 0.000 claims abstract description 25
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- 238000000034 method Methods 0.000 description 11
- 229910000831 Steel Inorganic materials 0.000 description 9
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
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- 230000009471 action Effects 0.000 description 2
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- 229910045601 alloy Inorganic materials 0.000 description 2
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- 238000001816 cooling Methods 0.000 description 2
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- 239000000243 solution Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
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- 230000015556 catabolic process Effects 0.000 description 1
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- 150000001875 compounds Chemical class 0.000 description 1
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- 238000005260 corrosion Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
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- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- 229910052718 tin Inorganic materials 0.000 description 1
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- -1 zinc Chemical class 0.000 description 1
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- B05C1/06—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length by rubbing contact, e.g. by brushes, by pads
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- C23C2/00342—Moving elements, e.g. pumps or mixers
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/06—Zinc or cadmium or alloys based thereon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
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Abstract
Description
− 各パッドの背面が、液体金属に対して湿潤しない性質のものであるか、又は非湿潤被覆を与えられている;
− 各パッドの背面に、戻り流れを運ぶ通路又は溝がさらに存在する;
− 液体金属被覆浴に対するパッドの遠位端が、乾燥領域にあり、細長くなっており、はねの危険を減少することによって被覆の予備乾燥を与えることができる;
− ヒンジが、パッドの細長い遠位端がほぼ静止状態にあるように配置されている;
− パッドが、液体金属被覆浴から完全に出ているか、又は液体金属被覆浴に部分的にもしくは完全に浸漬されている;
− 設備が、パッドを予備加熱するための外側手段を含む;
− ストリップの同じ側に位置されるパッドが、互いに本質的に平行であり、かつストリップの動きに対して横断方向に間隔を空けて分離されている;
− ストリップの同じ側に位置されるパッドが、間隔中に位置されるセラミックフェルトを介して側方接触している;
− ストリップの同じ側に位置されるパッドが、バッフリングを介して入れ子になって側方接触している;
− 設備が、各パッドを独立して負荷するための空気圧ジャッキを含む;
− 空気圧ジャッキが、ばね衝撃吸収装置によって助力されている;
− パッドが、対で互いに本質的に対面してストリップの各側に配置されている;
− パッドが、ストリップの各側にかつ千鳥配列で配置されている;
− パッドが、ストリップの反りの測定、欠陥の分析、及びパッドに付与される力の閉ループ修正のうちの少なくとも一つを与えるプログラム可能な論理制御装置によって群で又は個々に制御されている。
2 液体亜鉛浴
3 乾燥刃
4 底部ローラー
5a 反り除去ローラー
5b 安定化ローラー
6 流体力学的パッド
7 パットヒンジ
8 浸漬されるパッドの部分
9 空気圧ジャッキ
10 ばね/衝撃吸収装置
11 乾燥波
12 参照面
13 上方への流れ
14 戻ってくる流れ
15 液滴(はね)
16 パッドの細長い端
17 通路(溝)
18 セラミックフェルト
19 差し込まれたパッド(バッフル)
20 乾燥領域
21 プログラム可能な論理構成要素(PLC)
Claims (15)
- 連続移動する金属ストリップ(1)を浸漬被覆するための設備であって、前記設備が、ストリップ(1)が縦ストランドで出る液体金属被覆浴(2)、底部ローラー(4)、反り除去ローラー(5a)及び必要により安定化ローラー(5b)、乾燥刃(3)、並びに消波流体力学的安定化装置を含み、前記ローラーの全てが液体金属被覆浴(2)に浸漬され、乾燥刃(3)が、液体金属被覆浴(2)の出口に配置され、まだ凝固していない過剰の被覆を除去するために圧縮ガスを注入し、下方に戻ってくる液体金属の流れ(14)を有する乾燥波(11)を作り、消波流体力学的安定化装置が、乾燥刃(3)と最後の浸漬されたローラー(5a又は5b)の間に配置され、かつ金属ストリップ(1)の少なくとも一方の側に負荷を付与するために意図される複数の流体力学的パッド(6)を含み、複数の流体力学的パッド(6)が、前記パッド同士で位置合わせするためにヒンジ(7)のまわりで旋回するように装着され、さらにストリップ(1)の幅を横断して延び、かつ使用時に、乾燥波(11)の下方に戻ってくる液体金属の流れ(14)がパッド(6)の背面上に少なくとも部分的に流れるように配置されていることを特徴とする設備。
- 各パッド(6)の背面が、液体金属に対して湿潤しない性質のものであるか、又は非湿潤被覆を与えられていることを特徴とする請求項1に記載の設備。
- 各パッド(6)の背面に、戻ってくる流れ(14)を運ぶ通路又は溝(17)がさらに存在することを特徴とする請求項1に記載の設備。
- 液体金属被覆浴(2)に対するパッド(6)の遠位端(16)が、乾燥領域(20)にあり、細長くなっており、被覆の予備乾燥を与えることができることを特徴とする請求項1に記載の設備。
- ヒンジ(7)が、パッド(6)の細長い遠位端(16)がほぼ静止状態にあるように配置されていることを特徴とする請求項4に記載の設備。
- パッド(6)が、液体金属被覆浴(2)に部分的に浸漬された部分(8)を持つことを特徴とする請求項1に記載の設備。
- パッド(6)を予備加熱するための外側手段を含むことを特徴とする請求項1に記載の設備。
- ストリップの同じ側に位置されるパッド(6)が、互いに本質的に平行であり、かつストリップ(1)の動きに対して横断方向に間隔を空けて分離されていることを特徴とする請求項1に記載の設備。
- ストリップの同じ側に位置されるパッド(6)が、間隔中に位置されるセラミックフェルト(18)を介して側方接触していることを特徴とする請求項8に記載の設備。
- ストリップの同じ側に位置されるパッド(6)が、バッフリング(19)を介して差し込み側方接触していることを特徴とする請求項8に記載の設備。
- 各パッド(6)を独立して負荷するための空気圧ジャッキ(9)を含むことを特徴とする請求項1に記載の設備。
- 空気圧ジャッキ(9)が、ばね衝撃吸収装置(10)によって助力されていることを特徴とする請求項11に記載の設備。
- パッド(6)が、対で互いに本質的に対面してストリップ(1)の各側に配置されていることを特徴とする請求項1に記載の設備。
- パッド(6)が、ストリップ(1)の各側にかつ千鳥配列で配置されていることを特徴とする請求項1に記載の設備。
- パッドが、ストリップ(1)の反りの測定、欠陥の分析、及びパッド(6)に付与される力の閉ループ修正のうちの少なくとも一つを与えるプログラム可能な論理制御装置(20)によって群で又は個々に制御されていることを特徴とする請求項13又は14に記載の設備。
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BE2016/5073A BE1023837B1 (fr) | 2016-01-29 | 2016-01-29 | Dispositif pour la stabilisation hydrodynamique d'une bande metallique en defilement continu |
BE2016/5073 | 2016-01-29 | ||
PCT/EP2017/050379 WO2017129391A1 (fr) | 2016-01-29 | 2017-01-10 | Dispositif pour la stabilisation hydrodynamique d'une bande métallique en défilement continu |
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CA3011266A1 (fr) | 2017-08-03 |
BE1023837B1 (fr) | 2017-08-09 |
CN109072395B (zh) | 2021-02-26 |
PL3408424T3 (pl) | 2020-08-10 |
BR112018015424A2 (pt) | 2018-12-18 |
ZA201804419B (en) | 2019-05-29 |
RU2018128792A (ru) | 2020-03-03 |
BE1023837A1 (fr) | 2017-08-08 |
JP6869248B2 (ja) | 2021-05-12 |
CA3011266C (fr) | 2023-05-02 |
KR20180103992A (ko) | 2018-09-19 |
UA122708C2 (uk) | 2020-12-28 |
RU2018128792A3 (ja) | 2020-03-03 |
BR112018015424B1 (pt) | 2022-04-12 |
EP3408424A1 (fr) | 2018-12-05 |
ES2790198T3 (es) | 2020-10-27 |
US10550459B2 (en) | 2020-02-04 |
RU2715933C2 (ru) | 2020-03-04 |
WO2017129391A1 (fr) | 2017-08-03 |
US20190032188A1 (en) | 2019-01-31 |
EP3408424B1 (fr) | 2020-03-18 |
CN109072395A (zh) | 2018-12-21 |
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