JP2019502959A5 - - Google Patents

Download PDF

Info

Publication number
JP2019502959A5
JP2019502959A5 JP2018536101A JP2018536101A JP2019502959A5 JP 2019502959 A5 JP2019502959 A5 JP 2019502959A5 JP 2018536101 A JP2018536101 A JP 2018536101A JP 2018536101 A JP2018536101 A JP 2018536101A JP 2019502959 A5 JP2019502959 A5 JP 2019502959A5
Authority
JP
Japan
Prior art keywords
along
sub
overlay target
elements
metric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018536101A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019502959A (ja
JP7117242B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2017/012490 external-priority patent/WO2017123464A1/en
Publication of JP2019502959A publication Critical patent/JP2019502959A/ja
Publication of JP2019502959A5 publication Critical patent/JP2019502959A5/ja
Priority to JP2022122800A priority Critical patent/JP7477564B2/ja
Application granted granted Critical
Publication of JP7117242B2 publication Critical patent/JP7117242B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018536101A 2016-01-11 2017-01-06 ホットスポット及び処理窓監視 Active JP7117242B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022122800A JP7477564B2 (ja) 2016-01-11 2022-08-01 ホットスポット及びプロセスウィンドウ監視装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662277274P 2016-01-11 2016-01-11
US62/277,274 2016-01-11
PCT/US2017/012490 WO2017123464A1 (en) 2016-01-11 2017-01-06 Hot spot and process window monitoring

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022122800A Division JP7477564B2 (ja) 2016-01-11 2022-08-01 ホットスポット及びプロセスウィンドウ監視装置

Publications (3)

Publication Number Publication Date
JP2019502959A JP2019502959A (ja) 2019-01-31
JP2019502959A5 true JP2019502959A5 (enExample) 2020-02-06
JP7117242B2 JP7117242B2 (ja) 2022-08-12

Family

ID=59312167

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018536101A Active JP7117242B2 (ja) 2016-01-11 2017-01-06 ホットスポット及び処理窓監視
JP2022122800A Active JP7477564B2 (ja) 2016-01-11 2022-08-01 ホットスポット及びプロセスウィンドウ監視装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022122800A Active JP7477564B2 (ja) 2016-01-11 2022-08-01 ホットスポット及びプロセスウィンドウ監視装置

Country Status (8)

Country Link
US (2) US10354035B2 (enExample)
EP (1) EP3403142B1 (enExample)
JP (2) JP7117242B2 (enExample)
KR (1) KR102424805B1 (enExample)
CN (2) CN108475026B (enExample)
IL (2) IL259823B (enExample)
TW (1) TWI730031B (enExample)
WO (1) WO2017123464A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10628544B2 (en) 2017-09-25 2020-04-21 International Business Machines Corporation Optimizing integrated circuit designs based on interactions between multiple integration design rules
CN109581817B (zh) * 2017-09-29 2021-07-06 联华电子股份有限公司 半导体装置的形成方法
KR102154959B1 (ko) 2020-04-29 2020-09-10 동아에스티 주식회사 지속형 glp-1 및 글루카곤 수용체 이중작용제
US11862524B2 (en) 2021-06-28 2024-01-02 Kla Corporation Overlay mark design for electron beam overlay
US11703767B2 (en) * 2021-06-28 2023-07-18 Kla Corporation Overlay mark design for electron beam overlay
JP7667884B2 (ja) * 2021-12-17 2025-04-23 ケーエルエー コーポレイション ターゲットの配置精度を向上させるためのオーバーレイターゲットの設計
US20240053673A1 (en) * 2022-08-11 2024-02-15 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method of signal enhancement for alignment patterns
CN116341139B (zh) * 2023-03-23 2025-10-17 浙江大学 一种提高非对称柱塞泵极限转速的过渡区偏置设计方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6128089A (en) * 1998-07-28 2000-10-03 International Business Machines Corporation Combined segmented and nonsegmented bar-in-bar targets
JP5180419B2 (ja) * 2000-08-30 2013-04-10 ケーエルエー−テンカー・コーポレーション 重ね合わせマーク、重ね合わせマークの設計方法および重ね合わせ測定の方法
US7068833B1 (en) * 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
US20030002043A1 (en) 2001-04-10 2003-01-02 Kla-Tencor Corporation Periodic patterns and technique to control misalignment
US6884552B2 (en) * 2001-11-09 2005-04-26 Kla-Tencor Technologies Corporation Focus masking structures, focus patterns and measurements thereof
US6772084B2 (en) * 2002-01-31 2004-08-03 Timbre Technologies, Inc. Overlay measurements using periodic gratings
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
US20070222088A1 (en) * 2003-04-08 2007-09-27 Aoti Operating Company, Inc, Overlay Metrology Mark
US7112890B2 (en) * 2003-10-30 2006-09-26 Asml Holding N.V. Tunable alignment geometry
JP2006039148A (ja) * 2004-07-26 2006-02-09 Toshiba Corp ホトマスク、それを用いたフォーカス測定方法および半導体装置の製造方法
US7655388B2 (en) 2005-01-03 2010-02-02 Chartered Semiconductor Manufacturing, Ltd. Mask and method to pattern chromeless phase lithography contact hole
US7557921B1 (en) * 2005-01-14 2009-07-07 Kla-Tencor Technologies Corporation Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
DE102005046973B4 (de) * 2005-09-30 2014-01-30 Globalfoundries Inc. Struktur und Verfahren zum gleichzeitigen Bestimmen einer Überlagerungsgenauigkeit und eines Musteranordnungsfehlers
US20070111109A1 (en) 2005-11-14 2007-05-17 Taiwan Semiconductor Manufacturing Company, Ltd. Photolithography scattering bar structure and method
NL1036856A1 (nl) 2008-04-24 2009-10-27 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
EP2392970A3 (en) * 2010-02-19 2017-08-23 ASML Netherlands BV Method and apparatus for controlling a lithographic apparatus
JP5821100B2 (ja) * 2010-12-17 2015-11-24 カール ツァイス エスエムエス ゲーエムベーハー フォトリソグラフィマスクによって処理されるウェーハ上の誤差を補正する方法及び装置
WO2013189724A2 (en) * 2012-06-22 2013-12-27 Asml Netherlands B.V. Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
WO2014169102A1 (en) * 2013-04-10 2014-10-16 Kla-Tencor Corporation Direct self assembly in target design and production
US20150043391A1 (en) 2013-08-08 2015-02-12 Sharp Laboratories Of America, Inc. Systems and methods for reconfiguration signaling
WO2015090839A1 (en) 2013-12-17 2015-06-25 Asml Netherlands B.V. Inspection method, lithographic apparatus, mask and substrate
KR102199324B1 (ko) * 2014-06-21 2021-01-07 케이엘에이 코포레이션 복합 이미징 계측 타겟들
JP6723269B2 (ja) * 2015-05-15 2020-07-15 ケーエルエー コーポレイション 焦点感応オーバーレイターゲットを使用する焦点決定のためのシステムおよび方法

Similar Documents

Publication Publication Date Title
JP2019502959A5 (enExample)
JP2013534314A5 (enExample)
JP2013157547A5 (enExample)
JP2021511532A5 (enExample)
HRP20210104T1 (hr) Profili
MA31191B1 (fr) Structure cylindrique composee d'elements rectangulaires
BR112016010248A2 (pt) camada de núcleo, método para a produção de uma camada de núcleo, compósito de camadas múltiplas e uso
RU2017122976A (ru) Твердотельный напольный осветительный блок и система
JP2015125162A5 (ja) マスクパターン作成方法、プログラム、マスク製造方法、露光方法及び物品製造方法
Muthukumar et al. Failure criteria of concrete-A review
Wang et al. Hamiltonicity of the basic WK-recursive pyramid with and without faulty nodes
JP2015158737A5 (enExample)
CN104375276B (zh) 一种显示装置及其制备方法
JP2016184825A5 (enExample)
EP3843627A4 (en) APPLICATION OF MACHINE LEARNING TO ITERATIVE AND MULTIMODAL IMAGE RECONSTRUCTION
JP2016112786A5 (ja) コーナーフィレット部の設計方法及び航空機
Sorouhesh et al. Quasi-commutative semigroups of finite order related to Hamiltonian groups
JP2018095063A5 (enExample)
JP2015073800A5 (enExample)
JP2016212567A5 (enExample)
JP2019110871A5 (enExample)
JP2019057390A5 (enExample)
JP2019057389A5 (enExample)
Higashiyama The semi-absolute anabelian geometry of geometrically pro-p arithmetic fundamental groups of associated low-dimensional configuration spaces
Thede Facilitating a behavioral change of carsharing customers towards a more sustainable personal mobility: the case of SHARE NOW.