JP2019218627A5 - - Google Patents

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Publication number
JP2019218627A5
JP2019218627A5 JP2019103419A JP2019103419A JP2019218627A5 JP 2019218627 A5 JP2019218627 A5 JP 2019218627A5 JP 2019103419 A JP2019103419 A JP 2019103419A JP 2019103419 A JP2019103419 A JP 2019103419A JP 2019218627 A5 JP2019218627 A5 JP 2019218627A5
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JP
Japan
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ion
ions
halide
hydride
trifluoromethanesulfonyl
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JP2019103419A
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English (en)
Japanese (ja)
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JP2019218627A (ja
JP6814844B2 (ja
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Publication of JP2019218627A5 publication Critical patent/JP2019218627A5/ja
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Expired - Fee Related legal-status Critical Current
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JP2019103419A 2018-06-15 2019-06-03 無電解銅めっき用組成物および基材上に銅を無電解めっきするための方法 Expired - Fee Related JP6814844B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862685351P 2018-06-15 2018-06-15
US62/685,351 2018-06-15

Publications (3)

Publication Number Publication Date
JP2019218627A JP2019218627A (ja) 2019-12-26
JP2019218627A5 true JP2019218627A5 (https=) 2020-10-15
JP6814844B2 JP6814844B2 (ja) 2021-01-20

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ID=66793926

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Application Number Title Priority Date Filing Date
JP2019103419A Expired - Fee Related JP6814844B2 (ja) 2018-06-15 2019-06-03 無電解銅めっき用組成物および基材上に銅を無電解めっきするための方法

Country Status (6)

Country Link
US (1) US20190382900A1 (https=)
EP (1) EP3581678A1 (https=)
JP (1) JP6814844B2 (https=)
KR (1) KR20190142236A (https=)
CN (1) CN110607521B (https=)
TW (1) TW202000989A (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190382901A1 (en) * 2018-06-15 2019-12-19 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions and methods for electroless plating copper on substrates
US10590541B2 (en) * 2018-06-15 2020-03-17 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions and methods for electroless plating copper on substrates
EP4234758A4 (en) * 2020-10-21 2024-06-19 Asahi Kasei Kabushiki Kaisha METHOD FOR PRODUCING A STRUCTURE WITH CONDUCTIVE PATTERNS
CN114959664A (zh) * 2021-02-24 2022-08-30 超特国际股份有限公司 用于化学电镀处理非导电区域的活化溶液及方法
CN113133225B (zh) * 2021-04-13 2021-10-26 广州皓悦新材料科技有限公司 一种用于多层板和hdi板的水平沉铜工艺
CN114774899A (zh) * 2022-04-28 2022-07-22 合肥工业大学 一种铜纳米晶薄膜材料及其制备方法和应用
CN115418632B (zh) * 2022-07-27 2023-11-17 深圳市富利特科技有限公司 一种适用于水平线设备的高速高延展性化学铜及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5204576B2 (ja) * 2007-09-04 2013-06-05 三菱製紙株式会社 無電解銅めっき液用添加剤及びそれを用いた無電解銅めっき液
JP5622678B2 (ja) * 2011-07-14 2014-11-12 石原ケミカル株式会社 イミダゾール環結合型オキシアルキレン化合物を含有するメッキ浴
JP6100178B2 (ja) * 2014-01-06 2017-03-22 四国化成工業株式会社 銅被膜形成剤および銅被膜の形成方法
US9869026B2 (en) * 2014-07-15 2018-01-16 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions
KR20180034615A (ko) * 2015-07-30 2018-04-04 바스프 에스이 금속화를 위한 플라스틱 표면의 전처리 방법

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