JP2019178339A5 - - Google Patents
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- JP2019178339A5 JP2019178339A5 JP2019117807A JP2019117807A JP2019178339A5 JP 2019178339 A5 JP2019178339 A5 JP 2019178339A5 JP 2019117807 A JP2019117807 A JP 2019117807A JP 2019117807 A JP2019117807 A JP 2019117807A JP 2019178339 A5 JP2019178339 A5 JP 2019178339A5
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- substrate
- illustrates
- block copolymer
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920001577 copolymer Polymers 0.000 description 9
- 229920001400 block copolymer Polymers 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 210000003109 clavicle Anatomy 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 229910020486 P2VP Inorganic materials 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 241000446313 Lamella Species 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/924,891 US20140377465A1 (en) | 2013-06-24 | 2013-06-24 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US13/924,891 | 2013-06-24 | ||
| US14/297,095 | 2014-06-05 | ||
| US14/297,095 US9382444B2 (en) | 2013-06-24 | 2014-06-05 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014128101A Division JP2015007233A (ja) | 2013-06-24 | 2014-06-23 | 中立層ポリマー、その製造の方法、およびそれを含む物品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019178339A JP2019178339A (ja) | 2019-10-17 |
| JP2019178339A5 true JP2019178339A5 (enExample) | 2020-11-26 |
Family
ID=52111423
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014128101A Pending JP2015007233A (ja) | 2013-06-24 | 2014-06-23 | 中立層ポリマー、その製造の方法、およびそれを含む物品 |
| JP2019117807A Pending JP2019178339A (ja) | 2013-06-24 | 2019-06-25 | 中立層ポリマー、その製造の方法、およびそれを含む物品 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014128101A Pending JP2015007233A (ja) | 2013-06-24 | 2014-06-23 | 中立層ポリマー、その製造の方法、およびそれを含む物品 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9382444B2 (enExample) |
| JP (2) | JP2015007233A (enExample) |
| KR (1) | KR101686059B1 (enExample) |
| CN (2) | CN107459726B (enExample) |
| TW (1) | TWI548689B (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP6239813B2 (ja) | 2012-07-18 | 2017-11-29 | 株式会社Screenセミコンダクターソリューションズ | 基板処理装置および基板処理方法 |
| US9802400B2 (en) | 2013-06-24 | 2017-10-31 | Dow Global Technologies Llc | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers |
| US9382444B2 (en) * | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| JP6702649B2 (ja) * | 2013-12-31 | 2020-06-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ブロックコポリマーの性質を制御する方法及びブロックコポリマーから製造された物品 |
| JP2015170723A (ja) * | 2014-03-06 | 2015-09-28 | Jsr株式会社 | パターン形成方法及び自己組織化組成物 |
| US11021630B2 (en) * | 2014-12-30 | 2021-06-01 | Rohm And Haas Electronic Materials Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US10011713B2 (en) * | 2014-12-30 | 2018-07-03 | Dow Global Technologies Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US10294359B2 (en) | 2014-12-30 | 2019-05-21 | Rohm And Haas Electronic Materials Llc | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same |
| US9574107B2 (en) | 2015-02-16 | 2017-02-21 | International Business Machines Corporation | Fluoro-alcohol additives for orientation control of block copolymers |
| US10259907B2 (en) | 2015-02-20 | 2019-04-16 | Az Electronic Materials (Luxembourg) S.À R.L. | Block copolymers with surface-active junction groups, compositions and processes thereof |
| TWI669337B (zh) * | 2015-02-26 | 2019-08-21 | 美商羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI588200B (zh) * | 2015-02-26 | 2017-06-21 | 羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI627219B (zh) | 2015-02-26 | 2018-06-21 | 羅門哈斯電子材料有限公司 | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| TWI612379B (zh) * | 2015-02-26 | 2018-01-21 | Rohm And Haas Electronic Materials Llc | 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件 |
| WO2016181834A1 (ja) * | 2015-05-11 | 2016-11-17 | 国立大学法人名古屋大学 | 非共有結合性ソフトエラストマー及びその製法 |
| FR3037071B1 (fr) * | 2015-06-02 | 2019-06-21 | Arkema France | Procede de reduction de la defectivite d'un film de copolymere a blocs |
| FR3037070B1 (fr) * | 2015-06-02 | 2019-05-31 | Arkema France | Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose |
| TWI627220B (zh) * | 2015-06-03 | 2018-06-21 | 羅門哈斯電子材料有限公司 | 用於圖案處理之組合物及方法 |
| KR101946776B1 (ko) * | 2015-06-04 | 2019-02-13 | 주식회사 엘지화학 | 중성층 조성물 |
| US9368350B1 (en) * | 2015-06-23 | 2016-06-14 | International Business Machines Corporation | Tone inverted directed self-assembly (DSA) fin patterning |
| JP6039028B1 (ja) | 2015-09-11 | 2016-12-07 | 株式会社東芝 | 自己組織化材料及びパターン形成方法 |
| WO2017138440A1 (ja) * | 2016-02-08 | 2017-08-17 | Jsr株式会社 | コンタクトホールパターンの形成方法及び組成物 |
| KR102112439B1 (ko) * | 2016-07-21 | 2020-05-18 | 오츠카 가가쿠 가부시키가이샤 | 블록 공중합체, 조성물 및 필름 |
| US10691019B2 (en) * | 2016-10-07 | 2020-06-23 | Jsr Corporation | Pattern-forming method and composition |
| JP2018154760A (ja) * | 2017-03-17 | 2018-10-04 | 東芝メモリ株式会社 | パターン形成材料及びパターン形成方法 |
| KR102096276B1 (ko) * | 2017-07-14 | 2020-04-03 | 주식회사 엘지화학 | 중성층 조성물 |
| US10347486B1 (en) * | 2017-12-19 | 2019-07-09 | International Business Machines Corporation | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography |
| US10961383B2 (en) * | 2018-02-01 | 2021-03-30 | Brewer Science, Inc. | Gradient block copolymers for directed self-assembly |
| WO2019232011A1 (en) | 2018-06-01 | 2019-12-05 | Dow Global Technologies Llc | Inhibition of silica scale using bottle brush polymers |
| JP7135554B2 (ja) * | 2018-08-03 | 2022-09-13 | Jsr株式会社 | 下層膜形成用組成物、自己組織化膜の下層膜及びその形成方法並びに自己組織化リソグラフィープロセス |
| JP7354042B2 (ja) * | 2020-03-27 | 2023-10-02 | パナソニックホールディングス株式会社 | 電気音響変換器 |
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|---|---|---|---|---|
| US4929510A (en) | 1988-04-29 | 1990-05-29 | State University Of New York | Biocompatible polymer articles |
| SG55445A1 (en) * | 1997-01-07 | 1998-12-21 | Denki Kagaku Kogyo Kabushili K | Block copolymer block copolymer compostion and heat shrinkable films made thereof |
| DE19829397A1 (de) * | 1998-07-01 | 2000-01-05 | Basf Ag | Verwendung mikrophasenseparierter Polymermischungen für die Herstellung von permeablen Membranen |
| US7160551B2 (en) | 2002-07-09 | 2007-01-09 | The Board Of Trustees Of The University Of Illinois | Injectable system for controlled drug delivery |
| US7407554B2 (en) | 2005-04-12 | 2008-08-05 | International Business Machines Corporation | Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent |
| JP2009538384A (ja) * | 2006-05-25 | 2009-11-05 | アーケマ・インコーポレイテッド | 酸性官能基を有するグラジエントブロック共重合体 |
| JP2008231233A (ja) | 2007-03-20 | 2008-10-02 | Kyoto Univ | 高分子薄膜、パターン基板、磁気記録用パターン媒体及びこれらの製造方法 |
| US7763319B2 (en) | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
| CN102196849B (zh) * | 2008-10-28 | 2014-12-31 | 阿科玛股份有限公司 | 水通性聚合物薄膜 |
| KR101535227B1 (ko) * | 2008-12-31 | 2015-07-08 | 삼성전자주식회사 | 블록 공중합체를 이용한 미세 패턴 형성 방법 |
| US8114306B2 (en) | 2009-05-22 | 2012-02-14 | International Business Machines Corporation | Method of forming sub-lithographic features using directed self-assembly of polymers |
| JP5300799B2 (ja) * | 2010-07-28 | 2013-09-25 | 株式会社東芝 | パターン形成方法及びポリマーアロイ下地材料 |
| US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
| JP5555111B2 (ja) | 2010-09-27 | 2014-07-23 | 株式会社日立製作所 | シルセスキオキサンを有する高分子薄膜、微細構造体及びこれらの製造方法 |
| WO2012071330A1 (en) * | 2010-11-24 | 2012-05-31 | Dow Corning Corporation | Controlling morphology of block copolymers |
| US9156682B2 (en) | 2011-05-25 | 2015-10-13 | The University Of Massachusetts | Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles |
| US9718250B2 (en) | 2011-09-15 | 2017-08-01 | Wisconsin Alumni Research Foundation | Directed assembly of block copolymer films between a chemically patterned surface and a second surface |
| US8691925B2 (en) | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| WO2013104499A1 (en) | 2012-01-13 | 2013-07-18 | Asml Netherlands B.V. | Self-assemblable polymer and methods for use in lithography |
| US9040121B2 (en) | 2012-02-10 | 2015-05-26 | Board Of Regents The University Of Texas System | Using chemical vapor deposited films to control domain orientation in block copolymer thin films |
| US8697810B2 (en) * | 2012-02-10 | 2014-04-15 | Rohm And Haas Electronic Materials Llc | Block copolymer and methods relating thereto |
| US20140377465A1 (en) * | 2013-06-24 | 2014-12-25 | Rohm And Haas Electronic Materials Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US9382444B2 (en) | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US9802400B2 (en) | 2013-06-24 | 2017-10-31 | Dow Global Technologies Llc | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers |
-
2014
- 2014-06-05 US US14/297,095 patent/US9382444B2/en active Active
- 2014-06-19 TW TW103121140A patent/TWI548689B/zh active
- 2014-06-23 JP JP2014128101A patent/JP2015007233A/ja active Pending
- 2014-06-23 KR KR1020140076456A patent/KR101686059B1/ko active Active
- 2014-06-24 CN CN201710264644.5A patent/CN107459726B/zh active Active
- 2014-06-24 CN CN201410288684.XA patent/CN104231514B/zh active Active
-
2016
- 2016-06-23 US US15/190,481 patent/US10167411B2/en active Active
-
2019
- 2019-06-25 JP JP2019117807A patent/JP2019178339A/ja active Pending
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