JP2019143245A - 酸化物膜、酸化物膜の製造方法、及び、窒素含有酸化物スパッタリングターゲット - Google Patents

酸化物膜、酸化物膜の製造方法、及び、窒素含有酸化物スパッタリングターゲット Download PDF

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Publication number
JP2019143245A
JP2019143245A JP2019027792A JP2019027792A JP2019143245A JP 2019143245 A JP2019143245 A JP 2019143245A JP 2019027792 A JP2019027792 A JP 2019027792A JP 2019027792 A JP2019027792 A JP 2019027792A JP 2019143245 A JP2019143245 A JP 2019143245A
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JP
Japan
Prior art keywords
nitrogen
oxide film
oxide
atomic
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2019027792A
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English (en)
Japanese (ja)
Inventor
啓太 梅本
Keita Umemoto
啓太 梅本
山口　剛
Takeshi Yamaguchi
山口　　剛
孝典 白井
Takanori Shirai
孝典 白井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to CN201980007041.4A priority Critical patent/CN111542643A/zh
Priority to KR1020207018449A priority patent/KR20200123775A/ko
Priority to PCT/JP2019/006258 priority patent/WO2019163811A1/ja
Priority to TW108105910A priority patent/TW201936954A/zh
Publication of JP2019143245A publication Critical patent/JP2019143245A/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2019027792A 2018-02-22 2019-02-19 酸化物膜、酸化物膜の製造方法、及び、窒素含有酸化物スパッタリングターゲット Pending JP2019143245A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201980007041.4A CN111542643A (zh) 2018-02-22 2019-02-20 氧化物膜、氧化物膜的制造方法及含氮氧化物溅射靶
KR1020207018449A KR20200123775A (ko) 2018-02-22 2019-02-20 산화물막, 산화물막의 제조 방법, 및, 질소 함유 산화물 스퍼터링 타깃
PCT/JP2019/006258 WO2019163811A1 (ja) 2018-02-22 2019-02-20 酸化物膜、酸化物膜の製造方法、及び、窒素含有酸化物スパッタリングターゲット
TW108105910A TW201936954A (zh) 2018-02-22 2019-02-22 氧化物膜、氧化物膜之製造方法及含氮氧化物濺鍍靶

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018029641 2018-02-22
JP2018029641 2018-02-22

Publications (1)

Publication Number Publication Date
JP2019143245A true JP2019143245A (ja) 2019-08-29

Family

ID=67770936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019027792A Pending JP2019143245A (ja) 2018-02-22 2019-02-19 酸化物膜、酸化物膜の製造方法、及び、窒素含有酸化物スパッタリングターゲット

Country Status (4)

Country Link
JP (1) JP2019143245A (zh)
KR (1) KR20200123775A (zh)
CN (1) CN111542643A (zh)
TW (1) TW201936954A (zh)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002322561A (ja) 2001-04-25 2002-11-08 Sumitomo Bakelite Co Ltd スパッタリング成膜方法
JP4501057B2 (ja) 2003-10-29 2010-07-14 東洋紡績株式会社 ガスバリア性フィルム
JP4583277B2 (ja) 2005-09-21 2010-11-17 富士フイルム株式会社 ガスバリアフィルムおよびこれを用いた有機デバイス
JP2009095989A (ja) 2007-10-12 2009-05-07 Fujifilm Corp ガスバリアフィルムおよび環境感受性デバイス
JP5776260B2 (ja) * 2011-01-26 2015-09-09 三菱マテリアル株式会社 水蒸気バリア膜
WO2012114713A1 (ja) 2011-02-25 2012-08-30 三菱マテリアル株式会社 透明酸化物膜およびその製造方法
JP6197428B2 (ja) * 2012-08-01 2017-09-20 東レ株式会社 ガスバリア性フィルム
JP6638401B2 (ja) 2016-01-06 2020-01-29 凸版印刷株式会社 ガスバリアフィルム積層体およびその製造方法

Also Published As

Publication number Publication date
KR20200123775A (ko) 2020-10-30
CN111542643A (zh) 2020-08-14
TW201936954A (zh) 2019-09-16

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