JP2019133785A5 - - Google Patents

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JP2019133785A5
JP2019133785A5 JP2018013338A JP2018013338A JP2019133785A5 JP 2019133785 A5 JP2019133785 A5 JP 2019133785A5 JP 2018013338 A JP2018013338 A JP 2018013338A JP 2018013338 A JP2018013338 A JP 2018013338A JP 2019133785 A5 JP2019133785 A5 JP 2019133785A5
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JP
Japan
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data
processing apparatus
plasma processing
plasma
prediction device
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JP2018013338A
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English (en)
Japanese (ja)
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JP6914211B2 (ja
JP2019133785A (ja
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Priority to JP2018013338A priority Critical patent/JP6914211B2/ja
Priority claimed from JP2018013338A external-priority patent/JP6914211B2/ja
Priority to KR1020180083771A priority patent/KR102101222B1/ko
Priority to TW107127537A priority patent/TWI684843B/zh
Priority to US16/123,176 priority patent/US11107664B2/en
Publication of JP2019133785A publication Critical patent/JP2019133785A/ja
Publication of JP2019133785A5 publication Critical patent/JP2019133785A5/ja
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JP2018013338A 2018-01-30 2018-01-30 プラズマ処理装置及び状態予測装置 Active JP6914211B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018013338A JP6914211B2 (ja) 2018-01-30 2018-01-30 プラズマ処理装置及び状態予測装置
KR1020180083771A KR102101222B1 (ko) 2018-01-30 2018-07-19 플라스마 처리 장치 및 상태 예측 장치
TW107127537A TWI684843B (zh) 2018-01-30 2018-08-08 電漿處理裝置及狀態預測裝置
US16/123,176 US11107664B2 (en) 2018-01-30 2018-09-06 Plasma processing apparatus and prediction apparatus of the condition of plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018013338A JP6914211B2 (ja) 2018-01-30 2018-01-30 プラズマ処理装置及び状態予測装置

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JP2019133785A JP2019133785A (ja) 2019-08-08
JP2019133785A5 true JP2019133785A5 (https=) 2020-05-28
JP6914211B2 JP6914211B2 (ja) 2021-08-04

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US (1) US11107664B2 (https=)
JP (1) JP6914211B2 (https=)
KR (1) KR102101222B1 (https=)
TW (1) TWI684843B (https=)

Families Citing this family (15)

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Publication number Priority date Publication date Assignee Title
WO2020123322A2 (en) 2018-12-10 2020-06-18 Lam Research Corporation Low temperature direct copper-copper bonding
KR102791775B1 (ko) 2019-05-07 2025-04-03 램 리써치 코포레이션 폐루프 다중 출력 rf 매칭
KR102254446B1 (ko) * 2019-06-20 2021-05-24 주식회사 히타치하이테크 플라스마 처리 장치 및 플라스마 처리 방법
CN118866641A (zh) 2019-07-31 2024-10-29 朗姆研究公司 具有多个输出端口的射频功率产生器
JP7531111B2 (ja) * 2019-09-30 2024-08-09 パナソニックＩｐマネジメント株式会社 プラズマ処理の異常判定システムおよび異常判定方法
WO2021113387A1 (en) 2019-12-02 2021-06-10 Lam Research Corporation Impedance transformation in radio-frequency-assisted plasma generation
JP2021144832A (ja) * 2020-03-11 2021-09-24 東京エレクトロン株式会社 プラズマ計測装置、及びプラズマ計測方法
US11994542B2 (en) * 2020-03-27 2024-05-28 Lam Research Corporation RF signal parameter measurement in an integrated circuit fabrication chamber
KR20230021739A (ko) 2020-06-12 2023-02-14 램 리써치 코포레이션 Rf 커플링 구조체들에 의한 플라즈마 형성의 제어
US11784028B2 (en) * 2020-12-24 2023-10-10 Applied Materials, Inc. Performing radio frequency matching control using a model-based digital twin
WO2022168313A1 (ja) * 2021-02-08 2022-08-11 株式会社日立ハイテク プラズマ処理装置
JP7710398B2 (ja) * 2022-03-17 2025-07-18 東京エレクトロン株式会社 予測方法及び情報処理装置
TW202406412A (zh) * 2022-07-15 2024-02-01 日商東京威力科創股份有限公司 電漿處理系統、支援裝置、支援方法及支援程式
JP2024016522A (ja) * 2022-07-26 2024-02-07 パナソニックＩｐマネジメント株式会社 プラズマ処理装置およびプラズマ処理方法
JP2025066441A (ja) * 2023-10-11 2025-04-23 東京エレクトロン株式会社 プラズマ処理装置およびシャワーヘッド

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU87812A1 (fr) 1990-09-26 1992-05-25 Arbed Dispositif de manutention automatique d'objets
US6151532A (en) * 1998-03-03 2000-11-21 Lam Research Corporation Method and apparatus for predicting plasma-process surface profiles
TW508693B (en) * 1999-08-31 2002-11-01 Tokyo Electron Limted Plasma treating apparatus and plasma treating method
TW492106B (en) * 2000-06-20 2002-06-21 Hitachi Ltd Inspection method for thickness of film to be processed using luminous beam-splitter and method of film processing
WO2002003441A1 (en) 2000-07-04 2002-01-10 Tokyo Electron Limited Operation monitoring method for treatment apparatus
JP4570736B2 (ja) * 2000-07-04 2010-10-27 東京エレクトロン株式会社 運転状態の監視方法
TW529085B (en) * 2000-09-22 2003-04-21 Alps Electric Co Ltd Method for evaluating performance of plasma treatment apparatus or performance confirming system of plasma treatment system
US6908529B2 (en) * 2002-03-05 2005-06-21 Hitachi High-Technologies Corporation Plasma processing apparatus and method
JP4455887B2 (ja) * 2002-03-28 2010-04-21 東京エレクトロン株式会社 電気的特性を利用して、プラズマ反応炉内の膜の状態を判断するシステムおよび方法
JP2004039952A (ja) * 2002-07-05 2004-02-05 Tokyo Electron Ltd プラズマ処理装置の監視方法およびプラズマ処理装置
WO2004019396A1 (ja) 2002-08-13 2004-03-04 Tokyo Electron Limited プラズマ処理方法及びプラズマ処理装置
JP2004349419A (ja) * 2003-05-21 2004-12-09 Tokyo Electron Ltd プラズマ処理装置の異常原因判定方法及び異常原因判定装置
JP4448335B2 (ja) * 2004-01-08 2010-04-07 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
CN102156443B (zh) * 2011-03-17 2012-06-27 浙江大学 一种等离子体裂解煤工艺过程的三维可视化数据监控方法
TW201737297A (zh) * 2014-12-26 2017-10-16 Ａ Ｓａｔ股份有限公司 用於電漿蝕刻裝置的電極
JP6328071B2 (ja) 2015-03-31 2018-05-23 東芝メモリ株式会社 異常予兆検知システム及び半導体デバイスの製造方法
CN106298502B (zh) * 2015-05-18 2019-04-09 中微半导体设备(上海)股份有限公司 一种利用等离子体对多层材料刻蚀的方法
JP6446334B2 (ja) * 2015-06-12 2018-12-26 東京エレクトロン株式会社 プラズマ処理装置、プラズマ処理装置の制御方法及び記憶媒体

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