TWI684843B - 電漿處理裝置及狀態預測裝置 - Google Patents

電漿處理裝置及狀態預測裝置 Download PDF

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Publication number
TWI684843B
TWI684843B TW107127537A TW107127537A TWI684843B TW I684843 B TWI684843 B TW I684843B TW 107127537 A TW107127537 A TW 107127537A TW 107127537 A TW107127537 A TW 107127537A TW I684843 B TWI684843 B TW I684843B
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TW
Taiwan
Prior art keywords
data
plasma
plasma processing
physical environment
processing chamber
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TW107127537A
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English (en)
Chinese (zh)
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TW201933016A (zh
Inventor
釜地義人
角屋誠浩
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日商日立全球先端科技股份有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0283—Predictive maintenance, e.g. involving the monitoring of a system and, based on the monitoring results, taking decisions on the maintenance schedule of the monitored system; Estimating remaining useful life [RUL]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0616—Monitoring of warpages, curvatures, damages, defects or the like
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N20/00—Machine learning

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
TW107127537A 2018-01-30 2018-08-08 電漿處理裝置及狀態預測裝置 TWI684843B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018013338A JP6914211B2 (ja) 2018-01-30 2018-01-30 プラズマ処理装置及び状態予測装置
JP2018-013338 2018-01-30

Publications (2)

Publication Number Publication Date
TW201933016A TW201933016A (zh) 2019-08-16
TWI684843B true TWI684843B (zh) 2020-02-11

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Family Applications (1)

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TW107127537A TWI684843B (zh) 2018-01-30 2018-08-08 電漿處理裝置及狀態預測裝置

Country Status (4)

Country Link
US (1) US11107664B2 (https=)
JP (1) JP6914211B2 (https=)
KR (1) KR102101222B1 (https=)
TW (1) TWI684843B (https=)

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CN113454766B (zh) 2018-12-10 2024-07-19 朗姆研究公司 低温铜-铜直接接合
KR102791775B1 (ko) 2019-05-07 2025-04-03 램 리써치 코포레이션 폐루프 다중 출력 rf 매칭
CN112424911B (zh) * 2019-06-20 2023-09-22 株式会社日立高新技术 等离子体处理装置以及等离子体处理方法
WO2021022303A1 (en) 2019-07-31 2021-02-04 Lam Research Corporation Radio frequency power generator having multiple output ports
WO2021065295A1 (ja) * 2019-09-30 2021-04-08 パナソニックＩｐマネジメント株式会社 プラズマ処理の異常判定システムおよび異常判定方法
JP7569858B2 (ja) 2019-12-02 2024-10-18 ラム リサーチ コーポレーション 無線周波数支援プラズマ生成におけるインピーダンス変換
JP2021144832A (ja) * 2020-03-11 2021-09-24 東京エレクトロン株式会社 プラズマ計測装置、及びプラズマ計測方法
US11994542B2 (en) * 2020-03-27 2024-05-28 Lam Research Corporation RF signal parameter measurement in an integrated circuit fabrication chamber
WO2021252353A1 (en) 2020-06-12 2021-12-16 Lam Research Corporation Control of plasma formation by rf coupling structures
US11784028B2 (en) 2020-12-24 2023-10-10 Applied Materials, Inc. Performing radio frequency matching control using a model-based digital twin
US20240096599A1 (en) * 2021-02-08 2024-03-21 Hitachi High-Tech Corporation Plasma processing device
JP7710398B2 (ja) * 2022-03-17 2025-07-18 東京エレクトロン株式会社 予測方法及び情報処理装置
TW202406412A (zh) * 2022-07-15 2024-02-01 日商東京威力科創股份有限公司 電漿處理系統、支援裝置、支援方法及支援程式
JP2024016522A (ja) * 2022-07-26 2024-02-07 パナソニックＩｐマネジメント株式会社 プラズマ処理装置およびプラズマ処理方法
JP2025066441A (ja) * 2023-10-11 2025-04-23 東京エレクトロン株式会社 プラズマ処理装置およびシャワーヘッド

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TW492106B (en) * 2000-06-20 2002-06-21 Hitachi Ltd Inspection method for thickness of film to be processed using luminous beam-splitter and method of film processing
US20020149317A1 (en) * 2000-09-22 2002-10-17 Akira Nakano Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
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TW200527256A (en) * 2004-01-08 2005-08-16 Tokyo Electron Ltd Plasma processing method and apparatus thereof
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CN106298502A (zh) * 2015-05-18 2017-01-04 中微半导体设备(上海)有限公司 一种利用等离子体对多层材料刻蚀的方法
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JP2004349419A (ja) * 2003-05-21 2004-12-09 Tokyo Electron Ltd プラズマ処理装置の異常原因判定方法及び異常原因判定装置
JP6328071B2 (ja) 2015-03-31 2018-05-23 東芝メモリ株式会社 異常予兆検知システム及び半導体デバイスの製造方法

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US6151532A (en) * 1998-03-03 2000-11-21 Lam Research Corporation Method and apparatus for predicting plasma-process surface profiles
TW508693B (en) * 1999-08-31 2002-11-01 Tokyo Electron Limted Plasma treating apparatus and plasma treating method
TW492106B (en) * 2000-06-20 2002-06-21 Hitachi Ltd Inspection method for thickness of film to be processed using luminous beam-splitter and method of film processing
US20020149317A1 (en) * 2000-09-22 2002-10-17 Akira Nakano Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
TW200527256A (en) * 2004-01-08 2005-08-16 Tokyo Electron Ltd Plasma processing method and apparatus thereof
CN102156443A (zh) * 2011-03-17 2011-08-17 浙江大学 一种等离子体裂解煤工艺过程的三维可视化数据监控方法
CN106663625A (zh) * 2014-12-26 2017-05-10 A·Sat株式会社 等离子体蚀刻装置用电极上设置的气体导入孔的测量方法、电极、电极的再生方法、再生电极、等离子体蚀刻装置、气体导入孔的状态分布图及其显示方法
CN106298502A (zh) * 2015-05-18 2017-01-04 中微半导体设备(上海)有限公司 一种利用等离子体对多层材料刻蚀的方法
JP2017004827A (ja) * 2015-06-12 2017-01-05 東京エレクトロン株式会社 プラズマ処理装置、プラズマ処理装置の制御方法及び記憶媒体

Also Published As

Publication number Publication date
US20190237309A1 (en) 2019-08-01
JP6914211B2 (ja) 2021-08-04
TW201933016A (zh) 2019-08-16
US11107664B2 (en) 2021-08-31
JP2019133785A (ja) 2019-08-08
KR102101222B1 (ko) 2020-04-17
KR20190092218A (ko) 2019-08-07

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